Gas nozzle for a substrate processing apparatus

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Description

FIG. 1 is a front, bottom and left side perspective view of a gas nozzle for a substrate processing apparatus, showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof; and

FIG. 5 is a rear elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof;

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2;

FIG. 9 is an enlarged portion view taken from encircled portion labeled, “9,” in FIG. 1;

FIG. 10 is a cross sectional view taken along line 10-10 in FIG. 2;

FIG. 11 is a cross sectional view taken along line 11-11 in FIG. 2;

FIG. 12 is an enlarged view of FIG. 6; and,

FIG. 13 is an enlarged view of FIG. 7.

The dot-dashed lines shown in FIGS. 1 and 9 represent boundary lines of the enlarged portion view of FIG. 9 and form no part of the claimed design.

Claims

The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.

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  • Linde launches advanced gas delivery system to control Cold Spray Additive Manufacturing,https://www.metal-am.com/linde-launches-advanced-gas-delivery-system-to-control-cold-spray-additive-manufacturing/, Mar. 28, 2023. (Year: 2023).
Patent History
Patent number: D1109711
Type: Grant
Filed: Sep 5, 2024
Date of Patent: Jan 20, 2026
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Taketoshi Moriya (Toyama), Yusaku Okajima (Toyama), Mika Urushihara (Toyama)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/961,397