Bump-on-lead flip chip interconnection
A semiconductor device has a semiconductor die with a plurality of bumps formed over the die. A substrate has a plurality of conductive traces formed on the substrate. Each trace has an interconnect site for mating to the bumps. The interconnect sites have parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density. The bumps have a noncollapsible portion for attaching to a contact pad on the die and fusible portion for attaching to the interconnect site. The fusible portion melts at a temperature which avoids damage to the substrate during reflow. The noncollapsible portion includes lead solder, and fusible portion includes eutectic solder. The interconnect sites have a width which is less than 1.2 times a width of the conductive trace. Alternatively, the interconnect sites have a width which is less than one-half a diameter of the bump.
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The present application is a reissue application of U.S. patent application Ser. No. 12/716,455, now U.S. Pat. No. 7,973,406, which is a continuation of U.S. application Ser. No. patent application Ser. No. 12/062,293, filed Apr. 3, 2008, now U.S. Pat. No. 7,700,407, which is a division of U.S. application Ser. patent application Ser. No. 10/985,654, filed Nov. 10, 2004, now U.S. Pat. No. 7,368,817, filed Nov. 10, 2004 which claims the benefit of U.S. Provisional Application No. 60/533,918, filed Dec. 31, 2003, and U.S. Provisional Application No. 60/518,864, filed Nov. 10, 2003.
FIELD OF THE INVENTIONThis invention relates to semiconductor packaging and, particularly, to flip chip interconnection.
BACKGROUND OF THE INVENTIONFlip chip packages include a semiconductor die mounted onto a package substrate with the active side of the die facing the substrate. Conventionally, interconnection of the circuitry in the die with circuitry in the substrate is made by way of bumps which are attached to an array of interconnect pads on the die, and bonded to a corresponding (complementary) array of interconnect pads (often referred to as “capture pads”) on the substrate.
The areal density of electronic features on integrated circuits has increased enormously, and chips having a greater density of circuit features also may have a greater density of sites for interconnection with a package substrate.
The package is connected to underlying circuitry, such as a printed circuit board (e.g., a “motherboard) in the device in which it is employed, by way of second level interconnects (e.g., pins) between the package and the underlying circuit. The second level interconnects have a greater pitch than the flip chip interconnects, and so the routing on the substrate conventionally “fans out”. Significant technological advances have enabled construction of fine lines and spaces; but in the conventional arrangement space between adjacent pads limits the number of traces than can escape from the more inward capture pads in the array, and the fan out routing between the capture pads beneath the die and the external pins of the package is conventionally formed on multiple metal layers within the package substrate. For a complex interconnect array, substrates having multiple layers may be required to achieve routing between the die pads and the second level interconnects on the package.
Multiple layer substrates are expensive, and in conventional flip chip constructs the substrate alone typically accounts for more than half the package cost (about 60% in some typical instances). The high cost of multilayer substrates has been a factor in limiting proliferation of flip chip technology in mainstream products.
In conventional flip chip constructs the escape routing pattern typically introduces additional electrical parasitics, because the routing includes short runs of unshielded wiring and vias between wiring layers in the signal transmission path. Electrical parasitics can significantly limit package performance.
SUMMARY OF THE INVENTIONAccording to the invention flip chip interconnect is accomplished by connecting the interconnect bump directly onto a lead, rather than onto a pad. The invention provides more efficient routing of traces on the substrate. Particularly, the signal routing can be formed entirely in a single metal layer of the substrate. This reduces the number of layers in the substrate, and forming the signal traces in a single layer also permits relaxation of some of the via, line and space design rules that the substrate must meet. This simplification of the substrate greatly reduces the overall cost of the flip chip package. The bump-on-lead architecture also helps eliminate such features as vias and “stubs” from the substrate design, and enables a microstrip controlled impedance electrical environment for signal transmission, thereby greatly improving performance.
In one general aspect the invention features a flip chip interconnection having solder bumps attached to interconnect pads on a die and mated onto corresponding traces on a substrate.
In another general aspect the invention features a flip chip package including a die having solder bumps attached to interconnect pads in an active surface, and a substrate having electrically conductive traces in a die attach surface, in which the bumps are mated directly onto the traces.
In general the bump-on-lead interconnection is formed according to methods of the invention without use of a solder mask to confine the molten solder during a re-melt stage in the process. Avoiding the need for a solder mask allows for finer interconnection geometry.
In some embodiments the substrate is further provided with a solder mask having openings over the interconnect sites on the leads. In some embodiments the substrate is further provided with solder paste on the leads at the interconnect sites.
In another general aspect the invention features a method for forming flip chip interconnection, by providing a substrate having traces formed in a die attach surface and a die having bumps attached to interconnect pads in an active surface; supporting the substrate and the die; dispensing a quantity of a curable adhesive on the substrate (covering at least the connection sites on the traces) or on the active side of the die (covering at least the bumps); positioning the die with the active side of the die toward the die attach surface of the substrate, and aligning the die and substrate and moving one toward the other so that the bumps contact the corresponding traces (leads) on the substrate; applying a force to press the bumps onto the mating traces, sufficient to displace the adhesive from between the bump and the mating trace; at least partially curing the adhesive; melting and then re-solidifying the solder, forming a metallurgical interconnection between the bump and the trace.
In another general aspect the invention features a method for forming flip chip interconnection, by providing a substrate having traces formed in a die attach surface and having a solder mask having openings over interconnect sites on the leads, and a die having bumps attached to interconnect pads in an active surface; supporting the substrate and the die; positioning the die with the active side of the die toward the die attach surface of the substrate, and aligning the die and substrate and moving one toward the other so that the bumps contact the corresponding traces (leads) on the substrate; melting and then re-solidifying to form the interconnection between the bump and the trace.
In some embodiments the solder bump includes a collapsible solder portion, and the melt and solidifying step melts the bump to form the interconnection on the lead. In some embodiments the substrate is further provided with a solder paste on the leads, and the step of moving the die and the substrate toward one another effects a contact between the bumps and the solder on the leads, and the melt and solidifying step melts the solder on the lead to form the interconnection.
In another general aspect the invention features a method for forming flip chip interconnection, by providing a substrate having traces formed in a die attach surface and having a solder mask having openings over interconnect sites on the leads and having solder paste on the leads at the interconnect sites, and a die having bumps attached to interconnect pads in an active surface; supporting the substrate and the die; positioning the die with the active side of the die toward the die attach surface of the substrate, and aligning the die and substrate and moving one toward the other so that the bumps contact the solder paste on the corresponding traces (leads) on the substrate; melting and then re-solidifying the solder paste, forming a metallurgical interconnection between the bump and the trace.
The invention will now be described in further detail by reference to the drawings, which illustrate alternative embodiments of the invention. The drawings are diagrammatic, showing features of the invention and their relation to other features and structures, and are not made to scale. For improved clarity of presentation, in the figures illustrating embodiments of the invention, elements corresponding to elements shown in other drawings are not all particularly renumbered, although they are all readily identifiable in all the figures.
The conventional flip chip interconnection is made by using a melting process to join the bumps (conventionally, solder bumps) onto the mating surfaces of the corresponding capture pads and, accordingly, this is known as a “bump-on-capture pad” (“BOC”) interconnect. Two features are evident in the BOC design: first, a comparatively large capture pad is required to mate with the bump on the die; second, an insulating material, typically known as a “solder mask” is required to confine the flow of solder during the interconnection process. The solder mask opening may define the contour of the melted solder at the capture pad (“solder mask defined”), or the solder contour may not be defined by the mask opening (“non-solder mask defined”); in the latter case—as in the example of
As
Escape routing patterns for bump-on-lead (“BOL”) substrates according to the invention are shown by way of example in
As
Referring particularly now to
Conventional capture pads typically are about the same width (diameter) as the bumps, and are typically two to four times as wide as the trace or lead width. As will be appreciated, some variation in the width of leads is expected. As used herein, a variation in trace width of as much as 120% of the nominal or trace design rule width does not constitute a capture pad, and bump-on-lead interconnection according to the invention includes bumps formed on such wider portions of leads.
Similarly, referring to
As
The BOL interconnection structure of embodiments such as are shown by way of example in
In embodiments as in
In embodiments as in
In embodiments as in
Accordingly, in some embodiments the solder-on-lead configuration according to the invention is employed for interconnection of a die having high-melting temperature solder bumps (such as a high-lead solder, conventionally used for interconnection with ceramic substrates) onto an organic substrate. The solder paste can be selected to have a melting temperature low enough that the organic substrate is not damaged during reflow. To form the interconnect in such embodiments the high-melting interconnect bumps are contacted with the solder-on-lead sites, and the remelt fuses the solder-on-lead to the bumps. Where a noncollapsible bump is used, together with a solder-on-lead process, no preapplied adhesive is required, as the displacement or flow of the solder is limited by the fact that only a small quantity of solder is present at each interconnect, and the noncollapsible bump prevents collapse of the assembly.
In other embodiments the solder-on-lead configuration according to the invention is employed for interconnection of a die having eutectic solder bumps.
One embodiment of a preferred method for making a bump-on-lead interconnection is shown diagrammatically in
Referring to the figures, a substrate 112 is provided, having at least one dielectric layer and having a metal layer on a die attach surface 113, the metal layer being patterned to provide circuitry, particularly traces or leads 114 having sites for interconnection, on the die attach surface. The substrate 112 is supported, for example on a carrier or stage 116, with a substrate surface 111 opposite the die attach surface 113 facing the support. A quantity of an encapsulating resin 122 is dispensed over the die attach surface 113 of the substrate, covering at least the interconnect sites on the leads 114. A die 102 is provided, having bumps 104 attached to die pads (not shown in the figure) on the active side 103. The bumps include a fusible material which contacts the mating surfaces of the leads. A pick-and-place tool 108 including a chuck 106 picks up the die by contact of the chuck 106 with the backside 101 of the die. Using the pick-and-place tool, the die is positioned facing the substrate with the active side of the die toward the die attach surface of the substrate, as shown in
The process is shown in further detail in
In an alternative embodiment of a preferred method, the adhesive can be pre-applied to the die surface, or at least to the bumps on the die surface, rather than to the substrate. The adhesive can, for example, be pooled in a reservoir, and the active side of the die can be dipped in the pool and removed, so that a quantity of the adhesive is carried on the bumps; then, using a pick-and-place tool, the die is positioned facing a supported substrate with the active side of the die toward the die attach surface of the substrate, and the die and substrate are aligned and moved one toward the other so that the bumps contact the corresponding traces (leads) on the substrate. Such a method is described in U.S. Pat. No. 6,780,682, Aug. 24, 2004, which is hereby incorporated by reference. Then forcing, curing, and melting are carried out as described above.
A force and temperature schedule for a process according to the invention is shown diagrammatically by way of example in
The adhesive in embodiments as in
Alternative bump structures may be employed in the bump-on-lead interconnects according to the invention. Particularly, for example, so-called composite solder bumps may be used. Composite solder bumps have at least two bump portions, made of different bump materials, including one which is collapsible under reflow conditions, and one which is substantially non-collapsible under reflow conditions. The non-collapsible portion is attached to the interconnect site on the die; typical conventional materials for the non-collapsible portion include various solders having a high lead (Pb) content, for example. The collapsible portion is joined to the non-collapsible portion, and it is the collapsible portion that makes the connection with the lead according to the invention. Typical conventional materials for the collapsible portion of the composite bump include eutectic solders, for example.
An example of a bump-on-lead interconnect employing a composite bump is shown in a diagrammatic sectional view in
As may be appreciated, the bumps in embodiments as shown in, for example,
Other embodiments are within the following claims.
Claims
1. A method of forming a semiconductor device, comprising:
- providing a semiconductor die;
- forming a plurality of bumps over the semiconductor die;
- providing a substrate; and
- forming a plurality of conductive traces on the substrate, each trace having an interconnect site for mating to the bumps, the interconnect sites having parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density, wherein the interconnect sites have a width which is less than 1.2 times a width of the conductive trace.
2. The method of claim 1, wherein one of the bumps has a noncollapsible portion for attaching to a contact pad on the semiconductor die and fusible portion for attaching to the interconnect site.
3. The method of claim 2, wherein the noncollapsible portion includes lead solder.
4. The method of claim 2, wherein the fusible portion melts at a temperature which avoids damage to the substrate during reflow.
5. The method of claim 2, wherein the fusible portion includes eutectic solder.
6. The method of claim 1, further including disposing an underfill material between the semiconductor die and substrate.
7. The method of claim 1, wherein the interconnect sites have a width which is less than one-half a diameter of the bump.
8. A method of making a semiconductor device, comprising;
- providing a semiconductor die;
- forming a bump over the semiconductor die; and
- providing a substrate having a conductive trace formed on a die attach surface of the substrate for mating to the bump, the conductive trace having an interconnect site with parallel edges along a length of the conductive trace under the bump from a plan view such that a width of the interconnect site under the bump is no greater than a width of the conductive trace away from the bump.
9. The method of claim 8, wherein each interconnect bump has a noncollapsible portion including lead solder for attaching to a contact pad on the semiconductor die and fusible portion including eutectic solder for attaching to the interconnect site.
10. The method of claim 9, wherein the fusible portion melts at a temperature which avoids damage to the substrate during reflow.
11. The method of claim 8, further including disposing an underfill material between the semiconductor die and substrate.
12. The method of claim 8, wherein the interconnect sites have a width which is less than one-half a diameter of the bump.
13. A method of making a semiconductor device, comprising;
- providing a semiconductor die;
- forming a bump over the semiconductor die; and
- providing a substrate having a conductive trace formed on a die attach surface of the substrate, the conductive trace having an interconnect site for mating with the bump, the interconnect sites having a width substantially equal to a width of the trace away from the interconnect site.
14. The method of claim 13, wherein the bump has a noncollapsible portion for attaching to a contact pad on the semiconductor die and fusible portion for attaching to the interconnect site.
15. The method of claim 14, wherein the fusible portion melts at a temperature which avoids damage to the substrate during reflow.
16. The method of claim 14, wherein the noncollapsible portion includes lead solder.
17. The method of claim 14, wherein the fusible portion includes eutectic solder.
18. The method of claim 13, wherein the interconnect sites have a width which is less than one-half a diameter of the bump.
19. A semiconductor device, comprising:
- a semiconductor die;
- a plurality of bumps formed over the semiconductor die;
- a substrate; and
- a plurality of conductive traces formed on the substrate, each trace having an interconnect site for mating to the bumps, the interconnect sites having parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density, wherein the interconnect sites have a width which is less than 1.2 times a width of the conductive trace.
20. The semiconductor device of claim 19, wherein one of the bumps has a noncollapsible portion for attaching to a contact pad on the semiconductor die and fusible portion for attaching to the interconnect site.
21. The semiconductor device of claim 20, wherein the noncollapsible portion includes lead solder.
22. The semiconductor device of claim 20, wherein the fusible portion includes eutectic solder.
23. The semiconductor device of claim 19, wherein the interconnect sites have a width which is less than one-half a diameter of the bump.
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Type: Grant
Filed: Jul 23, 2012
Date of Patent: Aug 13, 2013
Assignee: STATS ChipPAC, Ltd. (Singapore)
Inventor: Rajendra D. Pendse (Fremont, CA)
Primary Examiner: Hsien Ming Lee
Application Number: 13/556,106
International Classification: H01L 23/48 (20060101); H01L 21/44 (20060101);