Abstract: A charged particle beam system includes a charged particle source, a multi beam generator, an objective lens, a projection system, and a detector system. The projection system includes a first subcomponent configured to provide low frequency adjustments, and the projection system comprises a second subcomponent configured to provide a high frequency adjustments.

Abstract: A system for producing cryogenic electron microscopy (cryo-EM) grids. A grid holding element holds a cryo-EM grid in place while a sample deposit element deposits liquid sample from a sample supply onto the grid. A sample shaping element shapes the liquid sample and then a cryogenic sample vitrifying element vitrifies the liquid sample. The shaping element may direct a gas jet towards the grid to reduce the thickness of the liquid sample. The gas jet may mix first and second liquid samples together in midair or on the grid. A storage element stores vitrified cryo-EM grids and includes an electromagnetic field (EMF) source that creates an EMF within the storage element such that the vitrified sample is exposed to the EMF. As a result of being exposed to the EMF, a protein provided with the sample is re-oriented from a first orientation to a second orientation.

Abstract: A method of operating an atomic force microscope, comprising a probe, the probe being moved forth and back during respective trace and retrace times of a scan line, the method comprising: a) during trace time, oscillating the probe, b) generating a z feedback signal to keep an amplitude of oscillation of the probe constant at a setpoint value, the z feedback signal being generated by a first feedback loop, c) during retrace time, placing the probe in a drift compensation state by changing the setpoint value to a different value so that the z feedback signal being generated by the first feedback loop causes the probe to move away from the sample and oscillate free, d) detecting an amplitude of free oscillation of the probe and adjusting with a second feedback loop its excitation signal to maintain the amplitude of free oscillation of the probe close to a set value.

Abstract: A charged-particle source for emission of electrons or other electrically charged particles comprises, located between the emitter electrode having an emitter surface and a counter electrode, at least two adjustment electrodes; a pressure regulator device is configured to control the gas pressure in the source space at a pre-defined pressure value. In a first cleaning mode of the particle source, applying a voltage between the emitter and counter electrodes directs gas particles towards the counter electrode, generating secondary electrons which ionize particles of the gas in the source space, and electrostatic potentials are applied to at least some of the adjustment electrodes, generating an electric field directing the ionized gas particles onto the emitter surface.

Abstract: A radiotherapy apparatus is disclosed, with a linear accelerator for producing a beam of electrons, a target aligned with the electron beam, the target being capable of producing photons when electrons are incident thereon, and a material which is capable of producing neutrons when photons of sufficient energy are incident thereon. A neutron detector capable of providing a signal to a controller of the linear accelerator is provided, the controller being capable of varying the energy of the electrons of the electron beam.

Abstract: There is provided a tilting parameters calculating device for use in a charged particle beam device for making a charged particle beam irradiated to a surface of a sample mounted on a sample stage, the tilting parameters calculating device being configured to calculate tilting parameters, the tilting parameters being input parameters to control a tilting direction and a tilting value of the sample and/or the charged particle beam, the input parameters being necessary to change an incident direction of the charged particle beam with respect to the sample, the tilting parameters calculating device including a tilting parameters calculating unit for calculating the tilting parameters based on information that indicates the incident direction of the charged particle beam with respect to a crystal lying at a selected position on the surface in a state where the incident direction of the charged particle beam with respect to the sample is in a predetermined incident direction, the information being designated on a

Abstract: There is provided a crystal orientation figure creating device for use in a charged particle beam device for making a charged particle beam irradiated to a surface of a sample, the crystal orientation figure creating device being configured to create a crystal orientation figure, which is a figure representing a crystal coordinate system of a crystal at a position selected on the surface with respect to an incident direction of the charged particle beam, the crystal orientation figure creating device including: an orientation information acquiring unit configured to acquire crystal orientation information with respect to the incident direction at the selected position; an incident direction information acquiring unit configured to acquire information relating to an incident direction of the charged particle beam with respect to the sample; and a crystal orientation figure creating unit configured to create a crystal orientation figure in a changed incident direction at the selected position, based on the crys

Abstract: An electron sensor and a system with a plurality of electron sensors for electron microscopy using an electron microscope. More specifically, the electron microscope generates an electron beam that includes at least one electron that impacts on a lateral reception surface of said electron sensor and this generates an electrical charge of electron-hole (e-h) pairs that are detected and/or measured by at least electrodes linked to an electric circuit unit to form a high dynamic range image and measure the energy of the electrons impacting each pixel of the image.

Abstract: The disclosure relates to systems and method for processing images. The method includes selecting a predetermined reference structure, the predetermined reference structure having a known feature size/shape. The method also includes obtaining a reference image of the predetermined reference structure, and capturing a calibration image of the predetermined reference structure using an observation device. The calibration image includes a plurality of features. Additionally, the method includes identifying at least one portion of the plurality of features of the calibration image that include a feature size/shape substantially similar to the known feature size and shape of the predetermined reference structure. Finally, the method includes combining the identified portion of the plurality of features of the calibration image to form a stacked feature image, and determining a point spread function (PSF) of the observation device by comparing the obtained reference image with the stacked feature image.

Abstract: Disclosed is a substrate processing apparatus including a chamber having a processing space inside, a support unit that supports a substrate in the processing space, a gas supply unit that supplies gas into the processing space, a plasma source that generates plasma from the gas supplied into the processing space, and a detection unit that is provided in a sidewall of the chamber and that measures an impedance change to detect a degree of adsorption of particles on an inner wall of the chamber or a surface of a part that is exposed to the processing space.

Abstract: A charged particle imaging apparatus comprising: A specimen holder, for holding a specimen; A particle-optical column, for: Producing a plurality of charged particle beams, by directing a progenitor charged particle beam onto an aperture plate having a corresponding plurality of apertures within a footprint of the progenitor beam; Directing said beams toward said specimen, wherein: Said aperture plate comprises a plurality of different zones, which comprise mutually different aperture patterns, arranged within said progenitor beam footprint; The particle-optical column comprises a selector device, located downstream of said aperture plate, for selecting a beam array from a chosen one of said zones to be directed onto the specimen.

Abstract: An apparatus includes at least one conductive layer, an electromagnetic (EM) wave source, and an electron source. The conductive layer has a thickness less than 5 nm. The electromagnetic (EM) wave source is in electromagnetic communication with the at least one conductive layer and transmits a first EM wave at a first wavelength in the at least one conductive layer so as to generate a surface plasmon polariton (SPP) field near a surface of the at least one conductive layer. The electron source propagates an electron beam at least partially in the SPP field so as to generate a second EM wave at a second wavelength less than the first wavelength.

Abstract: A fabrication method for the fabrication of special nano-scale structures, such as AFM probe tip(s) at the edge of a silicon and/or silicon nitride platform, called the cantilever. An array of these special AFM probes with the AFM tip structure located at the edge is fabricated from an array of regular AFM probes where the AFM tip structure may not originally have been located at the edge of the cantilever. A hard mask is formed on the probe's tip from a hard material, such as a metal mask, where more than one side of the tip could be uncovered. The non-covered side(s) of the probe tip structure(s) are subsequently etched to remove substrate materials, so that a sharp shaft (tip) is formed on the edge of the cantilever, when the process is done in a batch manner it results in an array of such AFM probe tips.

Abstract: A low voltage scanning electron microscope is disclosed, which includes: an electron source configured to generate an electron beam; an electron beam accelerator configured to accelerate the electron beam; a compound objective lens configured to converge the electron beams accelerated by the electron beam accelerator; a deflection device arranged between the inner wall of the magnetic lens and the optical axis of the electron beam and configured to deflect the electron beam; a detection device comprising a first sub-detection device for receiving secondary and backscattered electrons from the specimen, a second sub-detection device for receiving backscattered electrons, and a control device for changing the trajectories of the secondary electrons and the backscattered electrons; an electrostatic lens comprising the second sub-detection device, a specimen stage, and a control electrode for reducing the moving speed of the electron beam and changing the moving directions of the secondary and the backscattered e

Abstract: A multiple beam image acquisition apparatus includes a stage to mount thereon a target object, a beam forming mechanism to form multiple primary electron beams and a measurement primary electron beam, a primary electron optical system to collectively irradiate the target object surface with the multiple primary electron beams and the measurement primary electron beam, a secondary electron optical system to collectively guide multiple secondary electron beams generated because the target object is irradiated with the multiple primary electron beams, and a measurement secondary electron beam generated because the target object is irradiated with the measurement primary electron beam, a multi-detector to detect the multiple secondary electron beams collectively guided, a measurement mechanism to measure a position of the measurement secondary electron beam collectively guided, and a correction mechanism to correct a trajectory of the multiple secondary electron beams by using a measured position of the measureme

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group.

Abstract: A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide. The flat top profile can be generated using an optical array. The laser beam can be split into multiple laser beams or beamlets, each of which can have the flat top profile. A phosphor screen can be imaged to determine space charge effects or electron energy of the electron beam.

Abstract: A method of observing a liquid specimen in an electron microscope includes: housing the liquid specimen in a space formed by a specimen stage and a lid member; and observing the liquid specimen, wherein the lid member includes a water retaining material, and a supporting member for supporting the water retaining material, and the water retaining material is provided with a through-hole that enables passage of an electron beam with which the liquid specimen is irradiated.

Abstract: A method for monitoring a first nanometric structure formed by a multiple patterning process, the method may include performing a first plurality of measurements to provide a first plurality of measurement results; wherein the performing of the first plurality of measurements comprises illuminating first plurality of locations of a first sidewall of the first nanometric structure by oblique charged particle beams of different tilt angles; and processing, by a hardware processor, the first plurality of measurement results to determine a first attribute of the first nanometric structure.

Abstract: Apparatus and methods for creating deposits of uniformly spaced or uniformly overlapping droplets of selected chemicals where each droplet has an a priori known amount of the selected chemical or chemicals is taught (including biological and microbial materials). In some embodiments the deposits may be used as samples of different but known concentrations that may be used to calibrate spectroscopic inspection instruments to enable such instruments to not only provide identification in situ of unknown materials but also to provide calibrated and traceable surface concentrations of such materials. In some embodiments, such calibrated instruments may be used in enhanced processes for validating the cleanliness of manufacturing surfaces such as surfaces of equipment used in the preparation of pharmaceuticals, food, or semiconductor devices.

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

Abstract: A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.

Abstract: A semiconductor device of an embodiment includes a silicon carbide layer; a gate electrode; a gate insulating layer disposed between the silicon carbide layer and the gate electrode; a first region disposed in the silicon carbide layer and containing nitrogen (N); and a second region disposed between the first region and the gate insulating layer, and containing at least one element selected from the group consisting of nitrogen (N), phosphorus (P), arsenic (As), antimony (Sb), scandium (Sc), yttrium (Y), lanthanum (La), lanthanoids (Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu), hydrogen (H), deuterium (D), and fluorine (F).

Abstract: An imaging system that selectively alternates between a first, non-destructive imaging mode and a second, destructive imaging mode to analyze a specimen so as to determine an atomic structure and composition of the specimen is provided. The field ionization mode can be used to acquire first images of ionized atoms of an imaging gas present in a chamber having the specimen disposed therein, and the field evaporation mode can be used to acquire second images of ionized specimen atoms evaporated from a surface of the specimen with the imaging gas remaining in the chamber. The first and second image data can be analyzed in real time, during the specimen analysis, and results can be used to dynamically adjust operating parameters of the imaging system.

Abstract: A charged particle beam apparatus automatically prepares a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system that emits a charged particle beam. A sample stage with a sample placed thereon is movable relative to the charged particle beam irradiation optical system. A sample piece transferring device holds and transports a sample piece separated and extracted from the sample, and a holder fixing base holds a sample piece holder to which the sample piece is to be transferred. An electrical conduction sensor detects electrical conduction between the sample piece transferring device and an object, and a computer sets a time management mode when electrical conduction between the sample piece transferring device and the sample piece is not detected when the sample piece transferring device and the sample piece are connected to each other.

Abstract: Techniques are disclosed for stabilizing soft specimen traditionally considered too fragile for APT instruments. These specimens include biological samples, polymers and other fragile materials. For this purpose, a protective structure is disclosed that surrounds the sides of the specimen by supporting walls while only exposing the very end or terminus of the specimen to the electrostatic field of the APT instrument. The protective structure may take the form of a nanoscale conical grinder which continually machines the specimen to regenerate the terminus of the specimen in-situ. Alternately, the protective structure may take the form of a nanopipette in which the specimen is first frozen before undergoing field evaporation together with the tip of the nanopipette. Heretofore only routinely possible for rigid and hard materials, the design thus extends APT analysis to produce three-dimensional atomic-scale maps of soft specimens.

Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method includes generating, using an imaging device, a set of one or more images, each including an instance of a feature within a respective pattern structure. The method also includes detecting edges of the features within the pattern structure of each image using an inverse linescan model, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure provided as part of a training data set to a machine learning model.

Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.

Abstract: A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.

Abstract: A method of imaging a specimen in a Scanning Transmission Charged Particle Microscope, comprising the following steps: Providing the specimen on a specimen holder; Providing a beam of charged particles that is directed from a source through an illuminator so as to irradiate the specimen; Providing a segmented detector for detecting a flux of charged particles traversing the specimen; Causing said beam to scan across a surface of the specimen, and combining signals from different segments of the detector so as to produce a vector output from the detector at each scan position, said vector output having components Dx, Dy along respective X, Y coordinate axes, specifically comprising: Performing a relatively coarse pre-scan of the specimen, along a pre-scan trajectory; At selected positions pi on said pre-scan trajectory, analyzing said components Dx, Dy and also a scalar intensity sensor value Ds; Using said analysis of Dx, Dy and Ds to classify a specimen composition at each position pi into one of a grou

Abstract: Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technologies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. The first XPS and XRF intensity signals include information for the first layer and for the substrate. The method also involves determining a thickness of the first layer based on the first XPS and XRF intensity signals. The method also involves combining the information for the first layer and for the substrate to estimate an effective substrate. The method also involves measuring second XPS and XRF intensity signals for a sample having a second layer above the first layer above the substrate. The second XPS and XRF intensity signals include information for the second layer, for the first layer and for the substrate.

Abstract: Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.

Abstract: According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.

Abstract: A height detection apparatus is configured to project a pattern on a sample arranged at any of a plurality of reference positions and configured to detect a height of the sample. The apparatus includes: a projection optical system that generates a plurality of spatially separated light beams each having the pattern and projects the generated spatially separated light beams onto the sample; an imaging element that images the pattern reflected from the sample; a detection optical system that guides the pattern reflected from the sample to the imaging element; and at least one optical path length correction member disposed on an optical path different from an optical path having a shortest optical path length among a plurality of optical paths corresponding to the plurality of light beams at a position where the plurality of light beams is spatially separated.

Abstract: A semiconductor device including a substrate including a central region and a peripheral region surrounding the central region, a semiconductor integrated circuit in the central region, and a three-dimensional crack detection structure in the peripheral region, the three-dimensional crack detection structure surrounding the central region, the three-dimensional crack detection structure including a first pattern, a second pattern, and a third pattern, the first and second patterns extending in a first direction and spaced apart from each other, the third pattern being parallel to an upper surface of the substrate and connecting the first and second patterns to each other, the third pattern including a first portion and a second portion, the first and second portions extending in a second direction and a third direction respectively, the second direction intersecting with the first direction, the third direction intersecting with the first and second directions may be provided.

Abstract: An electron microscope sample holder that includes at least one capillary having a sufficient inner diameter to act as a catheter pathway that allows objects that can be accommodated within the at least one capillary to be replaced or swapped with other objects. The sample holder having at least one capillary allows the user to insert and remove temporary fluidic pathways, sensors or other tools without the need to dissemble the holder.

Abstract: A method of performing sub-surface imaging of a specimen in a charged-particle microscope of a scanning transmission type, comprising the following steps: Providing a beam of charged particles that is directed from a source along a particle-optical axis through an illuminator so as to irradiate the specimen; Providing a detector for detecting a flux of charged particles traversing the specimen; Causing said beam to follow a scan path across a surface of said specimen, and recording an output of said detector as a function of scan position, thereby acquiring a scanned charged-particle image I of the specimen; Repeating this procedure for different members n of an integer sequence, by choosing a value Pn of a variable beam parameter P and acquiring an associated scanned image In, thereby compiling a measurement set M={(In, Pn)}; Using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set representing depth-resolved imagery of the specimen,

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

Abstract: A device may capture, using a camera associated with the device, a first image of a first set of optical fibers associated with an optical connector within a field of view of the camera. The device may determine that an actual distance of a relative movement of the camera and the optical connector and an expected distance of the relative movement of the camera and the optical connector fail to match. The device may perform one or more actions after determining that the actual distance and the expected distance fail to match.

Abstract: A distortion measurement method for an electron microscope image includes: loading a distortion measurement specimen having structures arranged in a lattice to a specimen plane of an electron microscope or a plane conjugate to the specimen plane in order to obtain an electron microscope image of the distortion measurement specimen; and measuring a distortion from the obtained electron microscope image of the distortion measurement specimen.

Abstract: A charged particle beam system comprises a particle beam source having a particle emitter at a first voltage, a first electrode downstream of the particle beam source at a second voltage, a multi-aperture plate downstream of the first electrode, a second electrode downstream of the multi-aperture plate at a third voltage, a third electrode downstream of the second electrode at a fourth voltage, a deflector downstream of the third electrode, an objective lens downstream of the deflector, a fourth electrode downstream of the deflector at a fifth voltage; and an object mount at a sixth voltage. Voltage differences between the first, second, third, fourth and fifth voltages have same and opposite signs.

Abstract: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.

Abstract: An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.

Abstract: Provision is made of a method for determining a distance between a first structure element on a substrate and a second structure element, comprising the following steps: providing a first series of first images, wherein each of the first images comprises at least the first structure element, providing a second series of second images, wherein each of the second images comprises at least the second structure element. The method includes, for each image of the first and second series: determining a respective correlation function from a respective first image of the first series and a respective second image of the second series. The method includes determining an ensemble correlation function from the correlation functions, and determining the distance from the ensemble correlation function. Furthermore, a microscope for carrying out the method is provided.

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

Abstract: A device with an ion column and a scanning electron microscope comprises at least one column detector of signal electrons placed inside or on the ion column. Signal generated on the sample is detected on the column detector during landing of a broad beam generated by the scanning electron microscope on the sample surface.

Abstract: A method and apparatus for analysis of a specimen in a microscope are provided. A first survey is performed that collects analytical data from a region of interest on the specimen surface using a first set of conditions. A second survey is performed that collects additional analytical data from selected parts of the region of interest on the specimen surface using a second set of conditions, different from the first set of conditions. The analytical data from the first survey is used to select the parts used for data collection in the second survey and to decide the order in which they are used.

Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.

Abstract: An edge detection system is provided that generates a scanning electron microscope (SEM) linescan image of a pattern structure including a feature with edges that require detection. The edge detection system includes an inverse linescan model tool that receives measured linescan information for the feature from the SEM. In response, the inverse linescan model tool provides feature geometry information that includes the position of the detected edges of the feature.

Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.