Abstract: The present invention relates to a negative photosensitive composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is less than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator.

Abstract: A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).

Abstract: There are provided a resin composition for laser engraving that can give a relief printing plate having excellent hardness, film elasticity, printing durability, and aqueous ink transfer properties and that has excellent rinsing properties for engraving residue generated when laser-engraving a printing plate and excellent engraving sensitivity in laser engraving, a relief printing plate precursor employing the resin composition for laser engraving, a process for producing a relief printing plate employing the same, and a relief printing plate obtained thereby.

Abstract: A negative-working lithographic printing plate precursor is designed for improved printout or contrast between exposed and non-exposed regions in its imageable layer. The imaged precursor can be developed on-press. The improvement in printout is achieved by using a combination of at least two infrared radiation absorbing cyanine dyes. At least one of these cyanine dyes comprises a methine chain substituent that comprises a group represented by Structure (I): wherein Q1 and Q2 are hydrogen atoms or the same or different monovalent substituents, or Q1 and Q2 together provide carbon or heteroatoms to form a substituted or unsubstituted unsaturated ring. At least one other infrared radiation absorbing cyanine dyes does not comprise a group represented by Structure (I).

Abstract: A colored curable composition including: a resin obtained by reacting a polymer of an alkylene imine having 2 to 4 carbon atoms, a number average molecular weight of the polymer being 300 to 1,500, with a polyester having a carboxyl group at least one terminal, a number average molecular weight of the polyester being 1,000 to 1,000,000; a pigment; a photopolymerization initiator; a compound containing an ethylenically unsaturated double bond; and a solvent.

Abstract: A process for making a relief printing plate is provided that includes (1) a step of crosslinking by means of heat and/or light a relief-forming layer formed from a resin composition containing (Component A) a compound having a hydrolyzable silyl group and/or a silanol group, (Component B) a thermoplastic elastomer, and (Component C) a polymerizable compound, and (2) a step of forming a relief layer by laser-engraving the crosslinked relief-forming layer.

Abstract: A lithographic printing plate precursor includes: an aluminum support; an intermediate layer; and an image-recording layer, in this order, wherein at least one of the intermediate layer and the image-recording layer contains a compound having an amino group and a functional group capable of interacting with the aluminum support in a molecule.

Abstract: A photoresist composition which comprises a resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom, R2 represents a C1-C6 alkyl group, R3 represents a hydrogen atom or a C1-C6 alkyl group, and an acid generator represented by formula (B1) wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lb1 represents a single bond or a C1-C24 divalent aliphatic hydrocarbon group where a methylene group can be replaced by —O— or —CO—, Y represents a hydrogen atom, or a C3-C18 alicyclic hydrocarbon group in which a methylene group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic cation.

Abstract: The present invention relates to a resist composition for EUV or EB containing a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, and a resin component (W) that contains at least one atom selected from a fluorine atom or a silicon atom and contains a polarity conversion group that exhibits increased polarity after decomposition by the action of base, wherein the base component (A) contains a component (A1) which contains a structural unit (a0) having a group represented by general formula (a0-1) or (a0-2) shown below, and the amount of the resin component (W) relative to 100 parts by weight of the base component (A) is 1 to 15 parts by weight.

Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1) and a base polymer. In the formula (1), R1 represents a monovalent cyclic organic group having a cyclic ester structure or a cyclic ketone structure; R2 represents a single bond or —CH2—; X is —O—*, —COO—*, —O—CO—O—* or —SO2-O—*, wherein * denotes a binding site to R3; R3 represents a bivalent chain hydrocarbon group having 1 to 5 carbon atoms; and M+ is a monovalent cation. The base polymer has a structural unit derived from (meth)acrylate that includes a lactone skeleton, a structural unit derived from (meth)acrylate that includes a cyclic carbonate skeleton, a structural unit derived from (meth)acrylate that includes a sultone skeleton, a structural unit derived from (meth)acrylate that includes a polar group, or a combination thereof.

Abstract: Disclosed is a positive photosensitive resin composition that includes: (A) a polybenzoxazole precursor including a repeating unit represented by the Chemical Formula 1, a repeating unit represented by the Chemical Formula 2, or a combination thereof, and a thermally polymerizable functional group at least one terminal end of the polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound including a cross-linking functional group; and (E) a solvent.

Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.

Abstract: The present invention provides a hologram recording medium which can attain high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimension change (low shrinkage) and high multiplicity in holographic memory record using a blue laser. A hologram recording medium (11) comprising at least a hologram recording material layer, wherein the hologram recording material layer (21) comprises at least a metal oxide and a photopolymerizable compound; and said hologram recording medium has a light transmittance of 50% or more at a wavelength of 405 nm, or a light reflectance of 25% or more at a wavelength of 405 nm.

Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.

Abstract: The present invention provides a hologram recording material which is suitable for volume hologram record and attains high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage and high multiplicity in holographic memory record using not only a green laser but also a blue laser; a process for producing the same; and a hologram recording medium having the hologram recording material. A hologram recording material comprising: a metal oxide comprising Si and at least one selected from the group consisting of Ta and Zr, as metals, wherein a complexing ligand is coordinated to Ta and/or Zr; and a photopolymerizable compound. The complexing ligand is preferably selected from the group consisting of ?-dicarbonyl compounds, polyhydroxylated ligands, and ?- or ?-hydroxy acids. A hologram recording medium (11) comprising the hologram recording material layer (21).

Abstract: Disclosed is a method of making a lithographic printing plate which includes providing a lithographic printing plate precursor having a coating therein, image-wise exposing the coating, and developing the precursor. The coating includes (i) a contiguous photopolymerizable layer of a photopolymerizable composition or (ii) a contiguous intermediate layer with a photopolymerizable layer of a photopolymerizable composition thereon. The photopolymerizable composition includes a polymerizable compound, a polymerization initiator and a first polymer. The contiguous photopolymerizable layer or the contiguous intermediate layer also includes an adhesion promoting compound and a second polymer.

Abstract: A photo-resist and a method for performing photolithography using the photo-resist are described. The photo-resist comprises a matrix resin, a first component and a second component. The first component is configured to produce a chemical amplification action and generates a first chemical substance when exposed to a light of a first wavelength band. The first chemical substance will react with the matrix resin to form a latent image. The second component is configured to generate a second chemical substance when exposed to a light of a second wavelength band. The second chemical substance reacts with the first chemical substance to reduce a mass concentration of the first chemical substance.

Abstract: A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.

Abstract: A method for forming multicolor color filters is disclosed. First, a first patterned color layer is formed on a substrate. Second, a second patterned color layer and a third patterned color layer are respectively formed on the substrate with the first patterned color layer. Then the first patterned color layer, the second patterned color layer and the third patterned color layer are baked together to simultaneously transform the first patterned color layer, the second patterned color layer and the third patterned color layer to respectively become a first pixel color layer, a second pixel color layer and a third pixel color layer of the multicolor color filters, respectively.

Abstract: A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye comprising an infrared radiation absorbing cation and a counter anion, and a polymeric binder. The salt formed between the infrared radiation absorbing cation and a tetraphenyl borate has solubility in 2-methoxy propanol at 20° C. that is greater than or equal to 3.5 g/l. The use of these infrared radiation absorbing dyes in the imageable layers provides a reduced tendency of these dyes to crystallize in the presence of tetraaryl borate counter anions.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.

Abstract: Provided are a photosensitive resin composition which is excellent in a moisture and heat resistance and provides a cured product thereof with a high elastic modulus at high temperature and which is excellent as well in a hollow structure holding property and a photosensitive film prepared by using the same, a forming method for a rib pattern, a hollow structure and a forming method for the same and an electronic component. In an electronic component having a hollow structure, a photosensitive resin composition is used as a rib material or a cover material for forming the hollow structure described above, and it is characterized by using a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator and a photosensitive film obtained from the above photosensitive resin composition.

Abstract: The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern, in the general formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a linear or branched alkyl group.

Abstract: A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye that is defined by Structure (I) shown in the disclosure, which dyes comprise one or more ethylenically unsaturated polymerizable groups in an organic group that is attached to the methine chain. These infrared radiation absorbing dyes exhibit a reduced tendency to crystallize in the imageable layers in the presence of tetraaryl borate counter anions and therefore provide improved shelf life.

Abstract: A resist composition used in a method of forming a resist pattern including applying a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component to a substrate to form a resist film; subjecting the resist film to exposure; baking after subjecting the resist film to exposure, wherein at an exposed portion of the resist film, the base generated from the photo-base generator component upon exposure and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of acid provided to the resist film in advance; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern.

Abstract: A photopolymerizable system comprises an organic-inorganic compound with a metal and an organic unit having a organic photopolymerizable subunit capable of undergoing a polymerization, a support matrix compound being polymer or capable of forming a polymer upon polymerization, and a photoinitiator system adapted to initiate the polymerization of the photopolymerizable subunits. The molecules of the organic-inorganic compound are distributed on a molecular level in the photopolymerizable system.

Abstract: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can be developed by a water-soluble resin-containing aqueous solution and a method of lithographic printing that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits an excellent fine line reproducibility in nonimage areas even when printing is performed using ultraviolet-curing ink (UV ink). Also provided is a negative-working lithographic printing plate precursor that exhibits an excellent combination of fine line reproducibility and printing durability and that resists the production of scum during on-press development.

Abstract: Photopolymer resins are disclosed which includes metal and/or ceramic surface chelating agents to provide strong bonding of the photopolymer resin to the inorganic surface of the first information layer of an optical disc. The resins also include a fast surface cure and glass transition temperature controlling monomers that provides easy stamper separation The disclosed photopolymer resins also include short wavelength (<405 nm) surface cure initiators. The resins may also optionally include shrinkage control oligomers and/or polymer fillers or a combination of both Use of the disclosed resins eliminates two steps from the manufacture of a multiple information layer optical disc as the formation of spacer layers and the curing of spacer layers is no longer necessary.

Abstract: Disclosed are a volume phase hologram recording material having high sensitivity, high contrast, and excellent multiple recording and record holding properties and a volume phase hologram recording medium using the same. The volume phase hologram recording material comprises mainly a polymer matrix (a), a radically photopolymerizable compound (b), and a radical photopolymerization initiator (c) and the polymer matrix is a three-dimensionally crosslinked or linear polymer matrix formed from a polymer matrix-forming material containing 0.5-50 wt % of an episulfide compound (f), an epoxy compound (g), and a curing agent (h).

Abstract: A photoresist composition for a color filter is provided which includes a) a coloring agent, b) a binder resin, c) a photopolymerization initiator, d) a photopolymerizable monomer, and e) a solvent, wherein a siloxane-based material is bonded to the binder resin.

Abstract: The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process.

Abstract: A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.

Abstract: A lithographic printing plate precursor includes, in the following order: a support; an image-recording layer which is capable of forming an image by removing an unexposed area by an automatic development processor in the presence of a developer having pH of from 2 to 14 after exposure and contains (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound and (D) a polymer which is insoluble in water and alkali-soluble; and a protective layer, and the protective layer contains (E) a hydrophilic polymer which has a repeating unit represented by the formula (1) as defined herein and a repeating unit represented by the formula (2) as defined herein and a sum of the repeating unit represented by the formula (1) and the repeating unit represented by the formula (2) is at least 95% by mole based on total repeating units constituting the polymer.

Abstract: Provided is a method of forming a pattern, including forming an actinic-ray- or radiation-sensitive resin composition into a film, the actinic-ray- or radiation-sensitive resin composition including a resin (A) including a repeating unit containing a group that when acted on by an acid, is decomposed to thereby produce a polar group and including an aromatic group, which resin when acted on by an acid, decreases its solubility in an organic solvent, a nonionic compound (B) that when exposed to actinic rays or radiation, generates an acid and a solvent (C), exposing the film to actinic rays or radiation, and developing the exposed film with a developer including an organic solvent to thereby form a negative pattern.

Abstract: Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.

Abstract: A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern.

Abstract: A negative pattern is formed by coating a resist composition comprising a methylol-substituted urea, amide or urethane compound, a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, and developing in an organic solvent developer such that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.

Abstract: A composition for holographic recording medium, which can be coated in a uniform thickness and enables to simply produce a high definition holographic recording medium is provided. And a holographic medium having a low error rate, high storage capacity, high-performance, high-density, which is produced using the composition for the holographic recording medium, is also provided. The composition comprises a (meth)acrylic acid ester group-containing polymerizable substance, an alicyclic epoxy group-containing cationical polymerizable substance of which is ring-opening polymerized by heat, and a hydroxyl group-containing substance which is reactive with the alicyclic epoxy group-containing cationical polymerizable substance. The holographic recording medium is produced by forming a holographic recording layer on a substrate by applying the composition on the base material and polymerizing the alicyclic epoxy group-containing cationical polymerizable substance and the hydroxyl group-containing substance.

Abstract: A radiation-sensitive resin composition includes a sulfonium compound represented by a general formula (1), and a first polymer that serves as a base resin. R represents a group represented by a general formula (2). n1 to n3 each independently represent an integer of 0 to 5 and n1+n2+n3?1. X? represents an anion. The sulfonium compound is preferably a compound represented by a following general formula (1-1).

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising a repeating unit (A) containing a group that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) containing a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and any of compounds (Q) of general formula (1) below.

Abstract: There is disclosed a positive resist composition comprising (A) a resin having repeating units shown by the following general formulae (1) and (2) as repeating units that contain acid labile groups and being capable of increasing its alkaline solubility by an acid, (B) a photoacid generator, (C) a compound shown by the following general formula (3), and (D) a solvent. There can be a positive resist composition having high resolution, and at the same time giving an excellent pattern profile; and a patterning process in which an immersion lithography is carried out using a formed top coat.

Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Abstract: A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.

Abstract: The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.

Abstract: The present invention relates to a pattern forming method comprising: (1) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) of which the polarity increases by the action of an acid and thereby the solubility in a developer containing an organic solvent decreases and a compound (B) which generates an acid which is represented by the following general formula (I) by irradiation with actinic rays or radiation; (2) exposing the film; and (3) forming a negative-type pattern by developing with a developer which contains an organic solvent, the actinic ray-sensitive or radiation-sensitive resin composition and the resist film which are used in the method, a method for preparing an electronic device and the electronic device.

Abstract: The present invention provides a hologram recording material which attains high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage, and high multiplicity, and is suitable for volume hologram recording. Also, the present invention provides a hologram recording medium. A hologram recording material comprising: an organometallic compound at least containing at least two kinds of metals, oxygen, and an aromatic group, and having an organometallic unit wherein two aromatic groups are bonded directly to one metal; and a photopolymerizable compound containing at least a monofunctional compound (A) having one polymerizable functional group in the molecule. The hologram recording material may comprise, as the photopolymerizable compound, a polyfunctional compound (B) having two or more polymerizable functional groups in the molecule. A hologram recording medium 11 has a hologram recording material layer 21.

Abstract: Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern.

Abstract: A flexographic printing plate precursor for thermal development is provided that comprises a relief-forming layer on/above a support; the relief-forming layer comprising (Component A) a polymer having a glass transition temperature (Tg) of at least 25° C., (Component B) a photopolymerization initiator, and (Component C) an ethylenically unsaturated compound having a molecular weight of no greater than 3,000.

Abstract: A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, an alkyl vinyl ether polymer, a photoacid generator, and a benzotriazole compound in a solvent. The composition forms on a substrate a resist film of 5-100 ?m thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.

Abstract: [Purpose] To provide a photosensitive resin composition having satisfactory compatibility during dry film formation, exhibiting similar sensitivity for exposure with both i-line radiation and h-line radiation type exposure devices, having excellent resolution and adhesiveness, allowing development with aqueous alkali solutions, and preferably, having no generation of aggregates during development. [Solution Means] A photosensitive resin composition comprising (a) 20-90 wt % of a thermoplastic copolymer having a specific copolymerizing component copolymerized, and having a carboxyl group content of 100-600 acid equivalents and a weight-average molecular weight of 5,000-500,000, (b) 5-75 wt % of an addition polymerizable monomer having at least one terminal ethylenic unsaturated group, (c) 0.01-30 wt % of a photopolymerization initiator containing a triarylimidazolyl dimer, and (d) 0.001-10 wt % of a pyrazoline compound.