Electrode cover for a plasma processing apparatus

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Description

FIG. 1 is a front, bottom, and right side perspective view of an electrode cover for a plasma processing apparatus according to the design;

FIG. 2 is a rear, bottom, and left side perspective view thereof;

FIG. 3 is a rear, bottom, and right side perspective view thereof;

FIG. 4 is a front view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a rear view thereof;

FIG. 10 is a cross-sectional view taken along line 10-10 of FIG. 4;

FIG. 11 is an enlarged view of the portion shown in box, labeled, “FIG. 11,” in FIG. 10;

FIG. 12 is an enlarged front, bottom, and right side perspective view of the cross-sectional view taken along line 10-10 of FIG. 4;

FIG. 13 is an enlarged rear, bottom, and right side perspective view of the cross-sectional view taken along line 10-10 of FIG. 4; and,

FIG. 14 is an enlarged rear, bottom, and left side perspective view of the cross-sectional view taken along line 10-10 of FIG. 4.

The dot-dash line box shown in FIG. 10 defines the enlarged portion view shown in FIG. 11 and forms no part of the claimed design.

Claims

The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

Referenced Cited
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Patent History
Patent number: D1005245
Type: Grant
Filed: Oct 18, 2021
Date of Patent: Nov 21, 2023
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventors: Shintarou Nakatani (Tokyo), Takamasa Ichino (Tokyo), Kazunori Nakamoto (Tokyo), Yuki Tanaka (Tokyo)
Primary Examiner: David G Muller
Assistant Examiner: Noah Perez
Application Number: 29/789,775