Multizone showerhead for semiconductor processing

- Lam Research Corporation
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Description

FIG. 1 is an isometric view of a first embodiment of a multi-zone showerhead for semiconductor processing, showing our new design.

FIG. 2 is another isometric view thereof.

FIG. 3 is a front view thereof.

FIG. 4 is a back view thereof.

FIG. 5 is a right view thereof.

FIG. 6 is a left view thereof.

FIG. 7 is a top view thereof.

FIG. 8 is a bottom view thereof.

FIG. 9 is an isometric view of a second embodiment of a multi-zone showerhead for semiconductor processing, showing our new design.

FIG. 10 is another isometric view thereof.

FIG. 11 is a front view thereof.

FIG. 12 is a back view thereof.

FIG. 13 is a right view thereof.

FIG. 14 is a left view thereof.

FIG. 15 is a top view thereof; and,

FIG. 16 is a bottom view thereof.

The even broken lines shown in the drawings represent portions of the multi-zone showerhead for semiconductor processing that form no part of the claimed design.

Claims

The ornamental design for a multizone showerhead for semiconductor processing, as shown and described.

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Patent History
Patent number: D1129396
Type: Grant
Filed: Jun 17, 2024
Date of Patent: Jun 9, 2026
Assignee: Lam Research Corporation (Fremont, CA)
Inventors: Tongtong Guo (Beaverton, OR), Prasanna Kulkarni (Tigard, OR), Rachel E. Batzer (Tigard, OR), Kamal Tewari (Kathgodam), Ching-Yun Chang (West Linn, OR), Yuxi Wang (Beaverton, OR), Madison Wren Zeng (Portland, OR), Michael Philip Roberts (Tigard, OR), Lav Kaushik (Rewari)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/947,736