Abstract: The present application discloses a new technique which reduces the dimensionality of a feature model by re-use of data that has been obtained by a prior measurement. The data re-used from the prior measurement may range from parameters, such as geometrical dimensions, to more complex data that describe the electromagnetic scattering function of an underlying layer (for example, a local solution of the electric field properties).

Abstract: An apparatus for and a method of fitting or removing a motor vehicle tyre (4) comprising a rotatably supported wheel receiving device (2) to which the rim (3) is to be fixed, at least one fitting or removal tool (5), a rotary drive device (10) for the wheel receiving device and a sensing device (6), (7), (8) for sensing the radially outer rim contour (12), (14) along which the at least one fitting or removal tool is to be guided during the fitting or removal operation, wherein the sensing device (6), (7), (8) is a sensing device which contact-lessly senses the rim contour and the sensing signals of which are converted into electrical sensing signals, and connected to the sensing device (6), (7), (8) is a control device (9) which evaluates the electrical sensing signals and which controls the at least one fitting or removal tool (5) in the fitting or removal operation in dependence on the sensing signals without contact with the rim surface.

Abstract: A method, apparatus and system for non-contact measurement of a railway wheel profile are disclosed herein. To measure the wheel profile, a laser having a distance displacement sensor and angular displacement sensor projects a beam of light onto the surface of a railway wheel to measure the wheel profile. In an alternate embodiment, a rail thickness measurement gauge is provided. In another alternate embodiment, a witness groove measurement gauge is provided.

Abstract: A method for inspecting blade tip clearance between at least one rotor blade and a case spaced radially outward from the rotor blade is provided. The method includes inserting a probe into an aperture defined in the case and emitting electromagnetic energy into the case using the probe. The method also includes detecting electromagnetic energy reflected from a blade tip portion of the rotor blade and determining a blade tip clearance defined between the blade tip and the case based on the detected electromagnetic energy.

Abstract: A method is described for measuring a dimension on a substrate, wherein a target pattern is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The target pattern formed on the substrate is then illuminated so that at least one non-zero diffracted order is detected. The response of the non-zero diffracted order to variation in the printed characteristic dimension relative to nominal is used to determine the dimension of interest, such as critical dimension or overlay, on the substrate. An apparatus for performing the method of the present invention includes an illumination source, a detector for detecting a non-zero diffracted order, and means for positioning the source relative to the target so that one or more non-zero diffracted orders from the target are detected at the detector.

Abstract: Provided is a method of determining one or more profile parameters of a photomask covered with a pellicle, the method comprising developing an optical metrology model of a pellicle covering a photomask, developing an optical metrology model of the photomask, the photomask separated from the pellicle by a medium and having a structure, the structure having profile parameters, the optical metrology model of the photomask taking into account the optical effects on the illumination beam transmitted through the pellicle and diffracted by the photomask structure. The optical metrology model of the pellicle and the optical metrology model of the photomask structure are integrated and optimized. At least one profile parameters of the photomask structure is determined using the optimized integrated optical metrology model.

Abstract: A method is described for measuring a dimension on a substrate, wherein a target pattern is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The target pattern formed on the substrate is then illuminated so that at least one non-zero diffracted order is detected. The response of the non-zero diffracted order to variation in the printed characteristic dimension relative to nominal is used to determine the dimension of interest, such as critical dimension or overlay, on the substrate. An apparatus for performing the method of the present invention includes an illumination source, a detector for detecting a non-zero diffracted order, and means for positioning the source relative to the target so that one or more non-zero diffracted orders from the target are detected at the detector.

Abstract: A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.

Abstract: A system for characterizing material properties in miniature semiconductor structures performs a scatterometry analysis on inelastically scattered light. The system can include a narrowband probe beam generator and a detector. A single wavelength probe beam from the narrowband probe beam generator produces scattered light from a measurement pattern on a test sample. The scattered light is measured by the detector, and the measurement data (e.g., Raman spectrum) is used in a scatterometry analysis to determine material properties for the measurement pattern. The detector can measure either incoherent inelastically scattered light (e.g., using a spectrometer) or coherent inelastically scattered light (e.g., using an array detector). If the measurement pattern dimensions are substantially similar to actual device dimensions, the material property distributions determined for the measurement pattern can be applied to the actual devices on the test sample.

Abstract: Methods and related program product for assessing and optimizing metrology instruments by determining a total measurement uncertainty (TMU) based on precision and accuracy. The TMU is calculated based on a linear regression analysis and removing a reference measuring system uncertainty (URMS) from a net residual error. The TMU provides an objective and more accurate representation of whether a measurement system under test has an ability to sense true product variation.

Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Abstract: A method for precisely measuring position of a part to be inspected at a part inspection station is provided. The method includes positioning a part having a part axis relative to a measurement axis at the part inspection station and scanning the positioned part with an array of planes of radiation so that the part occludes each of the planes of radiation over a measurement interval of the part to create a corresponding array of unobstructed planar portions of the planes of radiation. Each of the unobstructed planar portions contains an amount of radiation which is representative of a respective geometric dimension of the part. The method also includes measuring the amount of radiation present in each of the unobstructed planar portions to obtain measurement signals and processing the measurement signals to obtain a geometric measurement between the axes at the measurement interval. The geometric measurement may be a distance between the axes or angle between the axes.

Abstract: Described are an automated system, an apparatus, and a method adapted to tracking and dynamically measuring locations in a volume for determining a size and a position of a body during a performance of a repetitive motion, such as in using sporting equipment. The sporting equipment may be a bicycle, and the body may be a cyclist. The apparatus comprises a plurality of markers attached to the body, a three-dimensional marker tracking system, and a processing unit. The apparatus, system, or method computes a dimensional statistic from computed measurements of all strokes of at least two strokes included in a period of time of the repetitive motion.

Abstract: A method of optically inspecting a fastener to determine whether it meets two or more dimensional parameters is provided. The method includes using centrifugal force to place the fastener in a predetermined location. Two or more sets of image data of the fastener are generated from two or more corresponding different angles. Fastener pass/fail data is generated using a dimensional requirement associated with each set of image data.

Abstract: A method of measuring a dimension and/or position of an object located in a measuring field, includes projecting a fan-shaped reference wave onto a holographic optical element having a first interference pattern and a second interference pattern; forming a first parallel partial wave front from the fan-shaped reference wave using the first interference pattern, the first parallel partial wave front entering the measuring field; and forming a second parallel partial wave front from the fan-shaped reference wave using the second interference pattern, the second parallel partial wave front entering the measuring field; wherein the measuring field is located behind the holographic optical element, and the first parallel partial wave front and the second parallel partial wave front intersect in the measuring field. A method of making a holographic optical element is also disclosed.

Abstract: Embodiments of the invention relate to nanoscale measurement of displacement. In one embodiment, a measurement apparatus includes a first plurality of nanoparticles coupled to a first substrate electrically coupled to a second plurality of nanoparticles coupled to a second substrate with a guide or guides disposed between the first substrate and the second substrate that allow for the substrates to move relative to each other.

Abstract: A process step in fabricating a structure on a wafer in a wafer application having one or more process steps and one or more process parameters is controlled by determining a correlation between a set of profile models and one or more key profile shape variables. Each profile model is defined using a set of profile parameters to characterize the shape of the structure. Different sets of profile parameters define the profile models in the set. The one or more key profile shape variables include one or more profile parameters or one or more process parameters. One profile model is selected from the set of profile models based on the correlation and a value of at least one key profile shape variable of the process of the wafer application to be used in fabricating the structure. The structure is fabricated in a first fabrication process cluster using the process step and the value of the at least one key profile shape variable. A measured diffraction signal is obtained off the structure.

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

Abstract: An image taken by an imaging device is displayed on a display unit. When a confirmation instruction is inputted through an input unit, image teaching is performed while the image displayed on the display unit is set to a setting object image. A measurement item which is of a candidate of a measurement process including specification of a reference position is displayed as the measurement process to accept selection. Specification of cutout area which constitutes one measurement target region is accepted, a measurement point including a local region or a feature point which is used for the measurement is automatically set in the measurement target region based on pieces of information on the set measurement process and reference position.

Abstract: A method for tracking and measuring volume, shape and surfaces of objects, such as logs, simultaneously. In series of load and unload operations along a procurement line, series of images are captured by e.g., CCD stereo cameras with sufficient spatial resolution capabilities. Simultaneously, the location of objects (logs) are registered by a GPS system aiding the tracking of the objects. The load and unload operations are typically performed by machineries such as harvesters, forwarders or trucks all equipped with a crane. On such machines digital cameras are mounted on jib arms and a computer system is attached. A GPS system is mounted on the machines too and the computer system is attached here as well. Thus the real time processing of stereo images can be accomplished and the volume, shape and surface of the 3D objects are computed simultaneously with their location in space. The resulting data are sent to a central database that keeps track of objects and their locations.

Abstract: A system and method of continuously measuring the profile of a rail in real time is disclosed. The rail which the profile is obtained in position on a track bed, The system includes a means for transmitting a beam of light at a selected wavelength onto the rail to illuminate a portion of the rail. The light is preferably a beam of laser light. A digital image of said illuminated portion of said rail is recorded. The digital image is manipulated to filter all light except for the selected wavelength. Rail wear is determined from the digital image created by the selected wavelength of light.

Abstract: The invention relates to a method and arrangement for measuring a timber piece (4) in a wood handling machine (1). Such a wood handling machine comprises booms (2) arranged in a base machine and a wood handling device (3) operating therein. In such a wood handling machine (1), a wood handling device (3) grips the timber piece (4) to be handled, after which one end of the timber piece is guided into a measuring carriage (5) in the wood handling machine by the wood handling device. The timber piece arranged in the measuring carriage is subjected to one or more observation measures by observation means provided in the measuring carriage.

Abstract: An object detecting device for detecting the existence and general placement of an object residing upon a surface. A preferred embodiment of the invention uses at least one laser measuring scanner operated positioned by a servo motor to allow the laser measuring scanner to generate signals related to the placement of an object on a surface. Those placement signals are then processed by a computer to make a two or three dimensional determination of the object in coordinates that show the object's location in relation to another device such as a robotic depalletizer that can then be moved into position near the object to allow removal of the object by the robotic depalletizer.

Abstract: A method for determining one or more process parameter settings of a photolithographic system is disclosed.

Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.

Abstract: An optical metrology system is disclosed that has a measuring system configured to irradiate a metrology mark and record a portion of a reflected, a transmitted, or both, electromagnetic field and a characterization device configured to determine from the recorded field a mark shape parameter indicative of the structure of the metrology mark, the characterization device comprising: a field calculation unit configured to calculate an expected field for reflection, transmission, or both, from a theoretical reference mark based on an algebraic eigenvalue-eigenvector representation of the expected field, a field derivative calculation unit configured to calculate a first order derivative, a higher order derivative, or both, of the expected field with respect to the mark shape parameter by first deriving analytical forms for corresponding derivatives of eigenvalues and eigenvectors of the eigenvalue-eigenvector representation, and an optimization unit configured to use the outputs from the field and field derivati

Abstract: An optical measuring device includes: a screen having a reference line; a movable stage; an optical system for forming on the screen an optical image of a to-be-measured object placed on the stage; and an edge detecting sensor (112) for detecting a passage of a measurement edge of the optical image at an arbitrary position on the screen. The optical measuring device further includes: an offset value storage (143) storing a distance between the reference line and the edge detecting sensor (112) as an offset value; and a correction data calculator (144) for correcting measurement data measured with the reference line and the edge detecting sensor (112) by use of the offset value.

Abstract: Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffracted from the portion of the photomask. One or more geometric features of the portion of the photomask are determined using the measured light diffracted from the portion of the photomask. A wave coupling is determined using the determined one or more geometric features of the portion of the photomask. The transmittance of the photomask is determined using the determined wave coupling and the determined reflectance of the portion of the photomask.

Abstract: Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.

Abstract: A method is provided for monitoring degradation of a data storage medium. Multiple reactive elements are provided in the data storage medium. Properties of each one of these elements is determined, prior or subsequent to data being stored in the medium, to generate a baseline map of the medium. Updated properties of at least one of the elements are determined in order to generate an updated map of the medium. A determination can then be made as to whether degradation of the medium has occurred by comparing the baseline map to the updated map.

Abstract: A system, apparatus, method, and computer program product for evaluating an object disposed on an upper surface of an object holder. At least one first frame representing a captured portion of the object is acquired, while the object holder is positioned at each of a plurality of locations. At least one second frame representing a captured portion of at least one other surface of the object holder besides the upper surface is acquired, while the object holder is positioned at each of the plurality of locations. At least one spatial characteristic associated with the captured portion of the object is determined, based on at least one of the acquired frames. A three-dimensional representation of the object can be formed based on the first frames and at least one spatial characteristic.

Abstract: An optical measuring instrument captures an image of an object to be measured mounted on a table by moving an objective lens relative to the table and measures a dimension of the object based on the captured image of the object. The optical measuring instrument includes a reflective photoelectric sensor provided around the objective lens for detecting the approach of the object to the objective lens, and a collision avoidance unit for avoiding collision of the objective lens with the object when the reflective photoelectric sensor detects the approach of the objective lens to the object.

Abstract: A method for measuring the heights of patterns of an object, including: a light emission, the light includes a propagation mode of interest for at least one wavelength of interest, an illumination of the surface of the object by the light, a reflection of the light by the surface of the object, a collection of the reflected light, a division of the wavefront of the reflected light into division components, by at least one pattern of the illuminated surface, a filtering of the collected light, including a modal filtering removing all modes other than the propagation mode of interest, for the wavelengths of interest, and from the filtered light, and for the wavelengths of interest, an extraction of information about phase differences between the division components.

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

Abstract: A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible methods of measurement: Shack-Hartmann wavefront sensing with wavefront stitching; phase diversity sensing; and white light interferometry.

Abstract: A method of measuring dimensions for an optical system to measure the critical dimension of a sample object according to this aspect of the present invention includes the steps of preparing a plurality of standard objects, selecting a predetermined focus metric algorithm, performing an analyzing process on each standard object to generate a plurality of focus metric distributions using the predetermined focus metric algorithm, analyzing the focus metric distributions to determine a target order, generating a reference relation, acquiring a measured characteristic value from the sample object, and determining the critical dimension of the sample object based on the measured characteristic value and the reference relation. Each standard object has a grating-shaped standard pattern with a predetermined pitch and line width. The focus metric algorithm is a gradient energy method, a Laplacian method, a standard deviation method, or a contrast method.

Abstract: Microgloss is a novel two-dimensional representation of how light is reflected from a target surface area. Systems and methods for measuring the microgloss can yield data for characterizing the reflective properties of a variety of products for which surface appearance is important. These products include paper, plastics, metals, and ceramics. Microgloss characteristics can be used as parameters for controlling the supercalendering process in papermaking. Microgloss characteristics can be used in conjunction with standard gloss to classify products.

Abstract: Curved sensor array configurations and methods of processing the data gathered by the sensors. A 2 dimensional embodiment comprises singular ring of sensors that can monitor sources in a 2 dimensional plane. A sensor directly facing a target produces a maximum response. As the angle of a sensor relative to the target increases, the response decreases. Fitting the sensor response amplitudes to a 2D Gaussian curve and calculating the peak of the curve allows a very accurate calculation of the angular direction of the target. A 3D embodiment comprises sensors distributed over the surface of a sphere in order to monitor multiple targets in any spatial orientation. Again, the sensor amplitude data is fitted to a 3D curve or surface such as a Gaussian surface. The present invention can resolve more than one target using deconvoluting techniques.

Abstract: A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible methods of measurement: Shack-Hartmann wavefront sensing with wavefront stitching; phase diversity sensing; and white light interferometry.

Abstract: A system and method for inspecting railroad track is disclosed. The disclosed system includes lasers, cameras, and a processor. The lasers are positioned adjacent the track. The laser emits a beam of light across the railroad track, and the camera captures images of the railroad track having the beam of light emitted thereon. The processor formats the images so that they can be analyzed to determine various measurable aspects of the railroad track. The disclosed system can include a GPS receiver or a distance device for determining location data. The measurable aspects that can be determined by the disclosed system include but are not limited to the spacing between crossties, the angle of ties with respect to rail, cracks and defects in surface of ties, missing fastener components, misaligned fastener components, sunken tie plates, raised spikes, rail wear, gage of rail, ballast height relative to ties, size of ballast stones, and break or separation in the rail.

Abstract: A method of measuring the three-dimensional volume or perimeter shape of an interior cavity includes the steps of collecting a first optical slice of data that represents a partial volume or perimeter shape of the interior cavity, collecting additional optical slices of data that represents a partial volume or perimeter shape of the interior cavity, and combining the first optical slice of data and the additional optical slices of data to calculate of the three-dimensional volume or perimeter shape of the interior cavity.

Abstract: This present invention relates to an apparatus for measuring structural parts which includes a measuring system having at least two sensors for optoelectronic scanning of such a structural part wherein said part and said sensors are movable relatively to each other along a shifting path and wherein said sensors are provided with a radiation source directed to a surface of the structural part and with a receiver, characterized by the fact that at least one sensor is an area sensor adapted to scan one surface section of the structural part (2) in each measuring time interval and/or that at least one sensor is a line sensor adapted to detect one profile line of said structural part in each measuring interval.

Abstract: The present application discloses a method for selecting an optical configuration for a high-precision scatterometric measurement. A geometric parameterization of a grating is determined, wherein the grating comprises a periodic structure. The geometric parameterization is used to generate a representative set of model structures. An eigenvalue method is utilized to compute, for each model structure, a set of solutions which satisfy a Rayleigh condition within the grating. The Raleigh condition within the grating is satisfied when a vertical component of a propagating mode within the grating is zero. Other embodiments, features and aspects are also disclosed herein.

Abstract: A method for the automatic parameterization of measuring systems for the measurement of objects transported by means of a transport device, in particular volume measurement systems, wherein at least one image, which is at least one-dimensional and comprises picture elements, of a test object known at least in part to the measuring system with respect to its dimensions and located in the measuring zone of the measuring system is detected by at least one sensor for electromagnetic radiation, in particular a laser scanner, and the system parameters required for the measurement of the objects are determined from the image and the known dimensions of the test object.

Abstract: A device for determining dimensions of a workpiece includes a locating apparatus, a determining apparatus and a main processor. The locating apparatus includes a locating board supporting workpieces and defining at least one detecting aperture therethrough. The determining apparatus includes a detecting module, the detecting module includes at least one laser detector, each laser detector includes a laser emitter and a laser receiver respectively mounted on two opposite sides of the locating board. The main processor is connected to the locating apparatus and the determining apparatus, the laser emitter emits laser beams traveling through the detecting aperture and received by the laser receiver, and the main processor determines the dimension of the workpiece according to the dimension of parts on the laser receiver shielded by the workpiece.

Abstract: A standard component for length measurement includes a first diffraction grating and a second diffraction grating. Each of components of the second diffraction grating is disposed between components of the first diffraction grating.

Abstract: Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet a plurality of design goals. Primary components of the optical metrology system affecting the design goals are determined and used in the initial design. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.

Abstract: A method of generating a library of simulated-diffraction signals (simulated signals) of a periodic grating includes obtaining a measured-diffraction signal (measured signal). Hypothetical parameters are associated with a hypothetical profile. The hypothetical parameters are varied within a range to generate a set of hypothetical profiles. The range to vary the hypothetical parameters is adjusted based on the measured signal. A set of simulated signals is generated from the set of hypothetical profiles.

Abstract: A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma rays. The production of the sheet may be altered based on the measurements.