Abstract: Provided is a method for controlling a fabrication cluster using an optical metrology system that includes an optical metrology tool, an optical metrology model, and a profile extraction algorithm. The method comprises: selecting a number of rays for the illumination beam, selecting beam propagation parameters, using a processor, determining beam propagation parameters from the light source of the to the sample structure, determining the beam propagation parameters from the sample structure to the detector, calculating intensity and polarization of each ray on the detector, generating a total intensity and polarization of the diffraction beam, calculating a metrology output signal from the total intensity and polarization, extracting the one or more profile parameters using the metrology output signal, transmitting at least one profile parameter to a fabrication cluster, and adjusting at least one process parameter or equipment setting of the fabrication cluster.

Abstract: System and method for evaluating coating thickness variations along a turbine blade contour. In one embodiment, applied to a first region extending 360 degrees about the blade and to a second region including an exposed reference surface, the first region includes a first surface over which the coating is formed and a second surface formed by the coating. The system provides a source of structured light positionable to cast patterns suitable for determination of coordinate position information along the surfaces. One or more imaging cameras are positionable to acquire image data based on the light patterns. A computer system processes image information to (1) characterize the first and second surfaces with respect to a coordinate along the reference surface; (2) compare coordinate data corresponding to the first surface with coordinate data corresponding to the second surface; and (3) determine thickness of the coating as a function of position.

Abstract: Provided herein are methods for imaging subwavelength structures in three dimensions and with high resolution. The methods comprise illuminating subwavelength structures with an illuminating wavelength of light and detecting the self-image generated thereby at a distance distal to the structures. Also provided is a method for confining propagating light to a sub-diffraction limit dimension by illuminating a surface of a metal structure with subwavelength features with a wavelength of coherent light such that light propagating from the features is confined to a dimension that is a sub-diffraction limit thereof.

Abstract: In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.

Abstract: One or more optical fibers (20, 20A, 20B, 20C, 20D), each with a second end (21) with a phosphor (26) disposed in a substrate (32) at a given depth (Dn) below a wear surface (34). A first photonic energy (52) is injected into a first end (19) of the optical fibers. The phosphor (26) emits a second photonic energy (54) into the fiber in response to the first photonic energy (52) incident on the phosphor from the fiber. When wear removes the phosphor (26) from one or more fibers, a detector (48, 49) detects a proportional reduction of the second photonic energy, indicating that wear has reached the given depth. A band-pass optical filter (46) may block wavelengths of the first photonic energy (52) from reflecting into the detector. The substrate temperature may be determined using a temperature-dependent emission of the phosphor.

Abstract: The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam.

Abstract: A distance acquisition device is for acquiring a first rounded distance from a reference point to a basis point, and for subsequently acquiring a second rounded distance from an adjacent point to the basis point. The reference, adjacent, and basis points are disposed on a plane. The adjacent point is adjacent to the reference point. The distance acquisition device includes: a reference distance acquisition unit for acquiring a precise distance from the reference point to the basis point, and for subsequently performing rounding upon the precise distance so as to obtain the first rounded distance; a reference error acquisition unit for obtaining a first reference error corresponding to a difference between the precise distance and the first rounded distance; and a distance estimating unit for setting the second rounded distance based on the first rounded distance and the first reference error.

Abstract: A density sensor detects a density of a subject according to a variation in received light. The density sensor comprises a base plate, a light emitting element irradiating a subject with light, the light receiving element receiving light reflected by the subject, lead terminals connected at one end with bottoms of the light emitting and receiving elements, respectively, and electrically connected at the other end with the base plate, and a package containing the light emitting and receiving elements and supported by the base plate, wherein at least one of the lead terminals is configured to be inclined from a halfway position so as to reflect light from the light emitting element in a direction away from the bottom of the light receiving element.

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract: Disclosed is a method and apparatus for measuring the drop Y of sports netting (10) strung between opposed posts (14, 16), wherein a datum point (28) is provided on each post, a datum line (42) is provided between the datum points and the distance Y between the datum line and a specified part (38) of the net measured; the height X above ground (40) of the net is extrapolated by providing the datum points (28) at a known height Z above ground (40) and subtracting the measured drop Y from the datum point height Z: the datum line (42) may be a light-weight cord strung between the datum points or a beam of visible or invisible light.

Abstract: A system for indirectly measuring a geometric dimension related to an opening in an apertured exterior surface of a part such as an ammunition case based on direct measurements of the part when fixtured at a measurement station is provided. The system includes first and second holding devices for holding the part therebetween in a part-retaining position in which the part is firmly held between the devices at its end surfaces. In one embodiment, a portion of each of the holding devices extends into its respective opening in the part-retaining position. The system also includes a head apparatus which has a plurality of radiation sources for successively directing arrays of planes of radiation at the holding devices and at the part, and a plurality of receiver modules for measuring the amount of radiation present in unobstructed planar portions of the planes to obtain holding device and part signals.

Abstract: A depth estimation apparatus and method are provided. The depth estimation method includes grouping a plurality of frame signals generated by a depth pixel into a plurality of frame signal groups which are used to estimate a depth to an object without a depth estimation error caused by an omission of a frame signal, the grouping of the a plurality of frame signals based on whether an omitted frame signal exists in the plurality of frame signals and based on a continuous pattern of the plurality of frame signals; and estimating the depth to the object using each of the plurality of frame signal groups.

Abstract: An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.

Abstract: An optical metrology apparatus for measuring periodic structures using multiple incident azimuthal (phi) and polar (theta) incident angles is described. One embodiment provides the enhanced calculation speed for the special case of phi=90 incidence for 1-D (line and space) structures, which has the incident plane parallel to the grating lines, as opposed to the phi=0 classical mounting, which has incident plane perpendicular to the grating lines. The enhancement reduces the computation time of the phi=90 case to the same order as the corresponding phi=0 case, and in some cases the phi=90 case can be significantly faster. One advantageous configuration consists of two measurements for each sample structure, one perpendicular to the grating lines and one parallel. This provides additional information about the structure, equivalent to two simultaneous angles of incidence, without excessive increase in computation time.

Abstract: The measuring method for providing a precise determination of a geometry of a concave portion is provided.

Abstract: A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible methods of measurement: Shack-Hartmann wavefront sensing with wavefront stitching; phase diversity sensing; and white light interferometry.

Abstract: A highly accurate three-dimensional measurement base is specified with simple settings. When a peak occurs in the positive Z-axis direction, a hemisphere or semi-spheroid figure (z?0) is placed to contain a position (xi, yi) where a base point should be obtained, scanning is performed such that the bottom of the figure contains the position (xi, yi), and the minimum value lmin of the difference between the Z position of a surface profile image and the height of the hemisphere or semi-spheroid figure at each position, and the height of the hemisphere or semi-spheroid figure at the position (xi, yi) are obtained. The maximum value of the sums is expressed as L(xi, yi), and a base point (Xi, Yi, L(xi,yi)) is specified. Base points are specified throughout the target surface by the same base point setting method, and a three-dimensional measurement base is specified on the basis of the specified base points.

Abstract: A device and a method for measuring an elevator hoistway, includes at least one or more laser aligners and a measuring element. The measuring element is provided with an essentially long handle for extending the measuring element into the laser beams transmitted by the laser aligners.

Abstract: Disclosed are methods and systems for displaying images, and for implementing volumetric user interfaces. One exemplary embodiment provides a system comprising: a light source; an image producing unit, which produces an image upon interaction with light approaching the image producing unit from the light source; an eyepiece; and a mirror, directing light from the image to a surface of the eyepiece, wherein the surface has a shape of a solid of revolution formed by revolving a planar curve at least 180° around an axis of revolution.

Abstract: A display device and a method of measuring a surface structure of the same are provided. The display device includes first and second substrates, first and second patterned light-shielding layers, and first and second pixel units. The first patterned light-shielding layer disposed on a surface of the first substrate includes first openings. The second patterned light-shielding layer disposed on the surface of the first substrate in the first patterned light-shielding layer includes second openings. The first pixel unit includes first and second protrusions. The first protrusion correspondingly covers the first openings and a portion of the first patterned light-shielding layer. The second protrusion is disposed in the first and second patterned light-shielding layers. The second pixel unit includes a third protrusion correspondingly covering the second openings and a portion of the second patterned light-shielding layer, wherein sizes of the second openings are smaller than sizes of the first openings.

Abstract: In general, in one aspect, a method includes determining a critical dimension (CD) distribution on a photomask by measuring deep Ultra-Violet (DUV) transmission across the photomask.

Abstract: An optical measuring apparatus includes a light transmission unit, a light reception unit, a measurement value calculation unit, and a correction unit. The light transmission unit forms a beam of light that focuses in a measurement area where a measurement target object is placed and scans the measurement area with the beam of light. The light reception unit receives the beam of light that has passed through the measurement area and outputs a received-light signal on the basis of the received beam of light. The measurement value calculation unit calculates a measurement value that represents the dimension of the measurement target object on the basis of the received-light signal. The correction unit corrects the measurement value on the basis of the amount of change in the strength of the received-light signal per unit of time of scanning the beam of light.

Abstract: In the present invention, when dense and sparse resist patterns are formed above a substrate, respective resist pattern dimensions are measured, and a correction value for a first processing unit is calculated based on the dimension measurement result of the dense resist pattern and a correction value for a second processing unit is calculated based on the dimension measurement result of the sparse resist pattern. Based on these calculation results, processing conditions in the first processing unit and the second processing unit are changed, and thereafter processing in these processing units are implemented under these changed conditions.

Abstract: Methods and devices for measuring conductivity of ink in a printing system are disclosed. An embodiment of the method is used with a printing system comprising a developer roller, wherein the ink is formed on the developer roller using electrostatic forces. The method comprises printing on a substrate using the ink; measuring a first current that charges the developer roller during the printing; and determining the conductivity of the ink, wherein the conductivity is proportional to the square of the first current.

Abstract: A measuring apparatus for automatically measuring the height, the dimensions of the inner and outer surfaces, and the shape of a cylindrically-shaped object. The measuring apparatus includes a measuring head vertically moving along a positioning guide supported by a support post integral with a measuring table, a height displacement measuring device, which comprises a laser distance meter provided on the measuring table, and an arithmetic processing unit. The measurement starts as the measuring head is raised by a weight from a measuring start position of the measuring table. The inner and outer surfaces of a tire are measured based on the measurements by an inner surface measuring device provided with three laser distance meters mounted to the measuring head and an outer surface measuring device having a laser distance meter and the displacement change measurement of the measuring head by the height displacement measuring device.

Abstract: A method for obtaining a measurement in an in-line system for detecting presence of an out-of-parameter part is provided. The method includes conveying a tubular member to a detection system comprising a laser sensor arranged and configured to direct a beam of light onto an upper end surface of the tubular member for obtaining a measurement. The laser sensor is offset from a center of the tubular member such that the beam of light is directed onto an outer side of the upper end surface. The beam of light is directed onto the upper end surface at the outer side of the tubular member and the beam of light moves from a front quadrant of the upper end surface to a rearward quadrant of the upper end surface.

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract: A stereovision system is disclosed, which comprises: at least one diffractive optical element and an optical imaging device. Each of the diffractive optical element is used for allowing a first beam containing information relating to an object to pass through and thus transforming the same into a second beam containing information relating to the object. The optical imaging device is used for receiving the second beam so as to concentrate the energy thereof for forming an Mth-order diffraction image. By combining the aforesaid Mth-order diffraction image with another energy-concentrated Nth-order diffraction image, a series of images can be formed. Accordingly, by comparing the disparity between corresponding points in the series of images, the distance between the object and the diffractive optical element can be obtained. It is noted that the aforesaid M and N represent the order of diffraction.

Abstract: A non-contact method and system for inspecting parts using two different types of machine vision methodologies are provided. The system has enhanced versatility and includes a triangulation-based subsystem to obtain triangulation-based sensor data, a radiation plane-based profile inspection subsystem to obtain shadowed radiation plane-based sensor data and a data processor for processing or fusing the triangulation-based sensor data and the shadowed radiation plane-based sensor data to obtain dimensional information related to the part.

Abstract: A portable imaging-based measurement device is developed to perform 2D projection based measurements on an object that is difficult or dangerous to access. This device is equipped with self calibration capability and built-in operating procedures to ensure proper imaging based measurement.

Abstract: In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component analysis is applied to the difference spectra to obtain a calibration function that is less sensitive to variations in the underlying structure than a calibration function obtained from spectra obtained from a single target.

Abstract: A method for inspecting blade tip clearance between at least one rotor blade and a case spaced radially outward from the rotor blade is provided. The method includes inserting a probe into an aperture defined in the case and emitting electromagnetic energy into the case using the probe. The method also includes detecting electromagnetic energy reflected from a blade tip portion of the rotor blade and determining a blade tip clearance defined between the blade tip and the case based on the detected electromagnetic energy.

Abstract: A technology of acquiring and processing light field data for images is provided. A light field data acquisition apparatus includes a modulator with an attenuation pattern to spatially modulate a 4D light field for an image, and a sensor to acquire 2D signals of the spatially modulated 4D light field. By utilizing the attenuation pattern of the modulator, more spatial data may be acquired in a low angular frequency region than that acquired in a high angular frequency region.

Abstract: Various metrology systems and methods are provided.

Abstract: Disclosed is a tire shape inspection method that can reliably and without misidentification perform accurate shape defect inspection in a short period of time by excluding measurement values in a range in which embossed marks are formed from distribution information for surface height measurement values on the sidewall surface of a tire. In the method, a processor automatically detects the positions of the embossed marks based on sample surface shape information obtained from a sample of the tire, and automatically sets coordinate information for a mask range surrounding the area where said marks are present (S2-S15). The processor also causes a surface shape image based on the sample surface shape information and a mask range image based on the coordinate information for the mask range to be displayed superimposed on a display means, and changes the coordinate information for the mask range according to an operating input (S16).

Abstract: An apparatus for measuring the liquid level of molten metal comprises an image measuring device (5), a measuring probe (6), a lifting mechanism (1), a displacement sensor (11), an data processing system (4) and a correction marker(7). The lifting mechanism (1) is fixed to the molten metal container (10) or is independent of the molten metal container, the image measuring device (5) and the measuring probe (6) are installed on the lifting mechanism (1) or are independent of the lifting mechanism, and the optical axis of the image measuring device (5) is set at an angle with the geometric axis of the measuring probe (6), the measuring probe (6) is located within the field of view of the image measuring device (5), the image measuring device (5), the lifting mechanism (1) and the displacement sensor (11) are connected to the data processing system (4) respectively. A method for measuring the level of molten metal is also disclosed.

Abstract: The present invention relates to a device and method for measuring depth of a hydrophobic liquid, such as oil, on a surface of water. The device uses a conductivity sensor and/or an optical sensor to detect the depth of an oil-water boundary. The device may have a Global Positioning System (GPS) for determining the geographic position of the device. Measurements of oil depth taken at particular geographic locations may be transmitted in real-time by the device to a remote computer in order to generate a depth profile of an oil spill.

Abstract: Provided is a measuring apparatus for performing a highly accurate measurement of a three-dimensional shape having a rectangular groove shape portion, such as a micromachine, by using a contact tip formed of a fine particle, in which the contact tip is coupled to a holding portion via a flexible support member and a transparent fixed member, and a laser beam is condensed by an objective lens to be focused on a bottom surface of the contact tip so that the contact tip is brought into contact with a surface of an object to be measured by an optical radiation pressure, to thereby allow a highly accurate geometry measurement to be performed by adjusting a direction of vibration of the contact tip even when the object to be measured has a three-dimensional structure having a rectangular groove shape portion.

Abstract: A system for characterizing material properties in miniature semiconductor structures performs a scatterometry analysis on inelastically scattered light. The system can include a narrowband probe beam generator and a detector. A single wavelength probe beam from the narrowband probe beam generator produces scattered light from a measurement pattern on a test sample. The scattered light is measured by the detector, and the measurement data (e.g., Raman spectrum) is used in a scatterometry analysis to determine material properties for the measurement pattern. The detector can measure either incoherent inelastically scattered light (e.g., using a spectrometer) or coherent inelastically scattered light (e.g., using an array detector). If the measurement pattern dimensions are substantially similar to actual device dimensions, the material property distributions determined for the measurement pattern can be applied to the actual devices on the test sample.

Abstract: A multi-beam optical probe according to illustrative embodiments of the present invention generally reduce the limitations, difficulties and disadvantages of the conventional measurement devices and techniques by providing a non-contact multi-beam optical probe apparatus and system for the dimensional measurement of objects. The narrow elongated probe provides at least two orthogonal, divergent or parallel laser beams, the reflection of each beam on the object being simultaneously detectable without moving the probe.

Abstract: Wavelength dispersion of intensity of light reflected from an evaluation object is measured. A complex refractive index of a substance forming the evaluation object and the environment are prepared. Virtual component ratios comprising a mixture ratio of the substances forming the evaluation object and the environment are prepared. Reflectance wavelength dispersions to the virtual component ratios are calculated. Similar reflectance wavelength dispersions having a small difference with the measured wavelength dispersion are extracted from the reflectance wavelength dispersions. Weighted average to the virtual component ratios used for calculating the similar reflectance wavelength dispersions are calculated to obtain a component ratio of the substance forming the evaluation object and the environment so that weighting is larger when the difference is smaller. A structure of the evaluation object is determined from the calculated component ratio.

Abstract: This disclosure provides for an impression scanner system having improved calibration having a housing and a calibration plate of known geometry. The calibration plate has a plurality of different shapes thereon. The system also has a radiation source for emitting radiation towards the shapes on the plate and a surface for reflecting images created by the radiation on the shapes. A sensor for receiving the images of the shapes as the plate moves relative to the housing is also provided. A processor compares known geometry of the plate to the images received by the sensor and calibrates the sensor based upon the known geometry and images to reduce system aberration and distortion.

Abstract: An overlay measuring apparatus includes a light source which generates visible light with a plurality of wavelengths, an optical module which selects visible light with a single wavelength from the visible light generated by the light source, makes the visible light with a single wavelength incident on a plurality of overlay patterns, and uses visible light reflected from the plurality of overlay patterns to project the overlay patterns with a predetermined color, an imaging unit which acquires images of the plurality of overlay patterns according to individual wavelengths of the visible light and acquires corresponding image signals, and a control unit which outputs a control signal to the optical module so that the optical module can project the overlay pattern with a specific color using information associated with the individual wavelengths of the visible light that is used to project the overlay pattern image selected by a selection unit.

Abstract: An apparatus for measuring an internal dimension of a well-bore comprising a tool adapted to be positioned inside the well bore. The tool comprises an optical caliper comprising an optical sensor providing a response correlated to the internal dimension of the well bore, the optical sensor being coupled to an optical fiber.

Abstract: In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured height of the pattern, an appropriate number of rotations of the substrate during application of a coating solution is calculated, so that the rotation of the substrate during the application is controlled by the calculated number of rotations of the substrate. Since the number of rotations of the substrate when the coating solution is applied to the substrate is controlled, it is unnecessary to stop the system which performs photolithography processing on the substrate, resulting in improved productivity of the substrate.

Abstract: The present invention relates to pharmaceutical compositions comprising opioids and a liquid nasal carrier, to delivery devices comprising such compositions, and to methods of manufacture and use of such compositions.

Abstract: The probe comprises a light source (20), means for shaping (24, 25, 21) the beam emitted by said light source and the beam coming from a surface arranged close to a target distance, an optical detector unit (22), comprising a pinhole diaphragm (26) and a photoelectric detector (28), providing a voltage peak (31) when said surface is at said target distance and further comprising a diaphragm (27) with a hole larger than said pinhole and a photoelectric detector (29), providing a voltage greater than that produced by said detection sensor (28), except when said surface is a the target distance. The method uses the probe to measure the thickness of an optical lens.

Abstract: A method for the optical characterisation of repeat units repeated in a regular manner so as to form a diffraction structure, each repeat unit including at least one geometric pattern, each of the patterns being produced, at least in part, using a porous material. The method includes determining the geometric parameters of the patterns and performing a scatterometric acquisition of the experimental optical response of the diffraction structure placed in a chamber at a given pressure, the presence of an adsorbable gaseous substance in the chamber causing condensation of the adsorbable gaseous substance in at least one part of open pores of the patterns of the structure.

Abstract: Disclosed are techniques and apparatus are provided for determining overlay error or pattern placement error (PPE) across the field of a scanner which is used to pattern a sample, such as a semiconductor wafer or device. This determination is performed in-line on the product wafer or device. That is, the targets on which overlay or PPE measurements are performed are provided on the product wafer or device itself. The targets are either distributed across the field by placing the targets within the active area or by distributing the targets along the streets (the strips or scribe areas) which are between the dies of a field. The resulting overlay or PPE that is obtained from targets distributed across the field may then be used in a number of ways to improve the fabrication process for producing the sample.

Abstract: A surface gap detector facilitates determining conformance of a surface of an object by providing a light source integrated into the detector that diffusely illuminates the surface of the object so that a user may observe the light that passes between the detector and the object when the surface of the object is aligned in substantial contact with a gap detecting edge of the surface gap detector.