Abstract: A nonvolatile memory apparatus includes a a memory cell array, a page buffer unit connected to bit lines of the memory cell array through a high voltage switching unit, a first interconnection configured to connect a high voltage switch of the high voltage switching unit, connected to an even bit line, to the page buffer unit, and formed at a first layer, and a second interconnection configured to connect a high voltage switch of the high voltage switching unit, connected to an odd bit line, to the page buffer unit, and formed at a second layer different from the first layer.

Abstract: A memory array including a plurality of memory cells, a plurality of word lines, a dummy word line, and a plug is provided. Each word line is coupled to corresponding memory cells. A dummy word line is directly adjacent to an outmost word line of the plurality of word lines. The plug is located between the dummy word line and the outmost word line.

Abstract: A resistive random access memory utilizing gate induced drain leakage current as the read operation current and the write operation current and a method of operation the same, wherein the resistive random access memory including a plurality of arrayed memory cells, a plurality of bit-lines and a plurality word-lines, each memory cell including: a switching resistor having a first terminal and a second terminal, the first terminal of the switching resistor being connected to one bit-line; and a MOSFET being connected to the second terminal and having a gate, a source, a drain and a substrate, the gate being connected to one word-line, the read operation current and the write operation current of the memory cell being gate induced drain leakage current of the MOSFET. The RRAM array presented in this invention has superior scalability for resistors as well as transistors, which leads to a memory array with higher density.

Abstract: A semiconductor memory device and a method of manufacturing the same.

Abstract: A memory module has at least one secure and at least one insecure memory area, separate write/read electronic units for each of the memory areas and at least one shared analog circuit part such as a voltage supply circuit for supplying the write/read electronic units and/or the memory areas.

Abstract: Data, normally read using a page-by page read process, can be recovered from memory cells connected to a broken word line by performing a sequential read process. To determine whether a word line is broken, both a page-by page read process and a sequential read process are performed. The results of both read processes are compared. If the number of mismatches between the two read processes is greater than a threshold, it is concluded that there is a broken word line.

Abstract: Memories and their formation are disclosed. One such memory has first and second memory cells at a first vertical level of the memory, first and second memory cells at a second vertical level of the memory, a first data line is selectively coupled to the first memory cells at the first and second vertical levels, and a second data line over the first data line is selectively coupled to the second memory cells at the first and second vertical levels.

Abstract: A semiconductor memory device, a method of manufacturing the same, and a cell array of a semiconductor memory device are provided. The semiconductor memory device includes: a first gate insulation layer and a second gate insulation layer, being spaced a predetermined distance from each other, on a portion of a semiconductor substrate; a select gate on the first gate insulation layer; a floating gate on the second gate insulation layer; a third gate insulation layer on the floating gate; a control gate on the third gate insulation layer; a first ion implantation region in the semiconductor substrate between the select gate and the floating gate; a second ion implantation region in the semiconductor substrate at a side of the select gate opposite the first ion implantation region; and a third ion implantation region in the semiconductor substrate at a side of the floating gate opposite the first ion implantation region.

Abstract: A stacked semiconductor memory device comprises a semiconductor substrate having a functional circuit, a plurality of memory cell array layers, and at least one connection layer. The memory cell array layers are stacked above the semiconductor substrate. The connection layers are stacked above the semiconductor substrate independent of the memory cell array layers. The connection layers electrically connect memory cell selecting lines arranged on the memory cell array layers to the functional circuit.

Abstract: Various exemplary embodiments of a nonvolatile memory apparatus are disclosed. In one exemplary embodiment, the memory apparatus may include: a page buffer; an even bit line connected to the page buffer; an odd bit line connected to the page buffer; an even memory cell string installed on the even bit line; an odd memory cell string installed on the odd bit line; and a bit line select unit configured to selectively generate a signal read path between the even bit line and the even memory cell string or between the odd bit line and the odd memory cell string.

Abstract: In a NAND non-volatile memory system, a sensing process accounts for a relative position of a selected non-volatile storage element in a NAND string. In one approach, the storage elements are assigned to groups based on their position, and each group receives a common sensing adjustment during a verify or read process. A group which is closest to a source side of the NAND string may be the largest of all the groups, having at least twice as many storage elements as the other groups. The adjusting can include adjusting a sensing parameter such as body bias, source voltage, sensing time or sensing pre-charge level, based on the position of the sensed storage element or its associated word line position. The adjusting of the sensing may also be based on the control gate voltage and the associated data state involved in a specific sensing operation.

Abstract: Data capacity efficiency is improved by de-duplicating data assigned with a code that is different for each data. A storage apparatus comprising a flash memory control device equipped with one or more flash memory modules, wherein the flash memory module comprises at least one flash memory chip for providing a storage area, and a controller for controlling writing/reading of data including user data and a guarantee code accompanying the user data to and from the storage area provided by the flash memory chip, wherein the controller respectively divides a plurality of the data having the common user data into the user data and the guarantee code, stores one of the user data in an area of a predetermined unit of the storage area, and links and stores each of the guarantee codes accompanying the plurality of user data in an area of a predetermined unit of the storage area.

Abstract: In one embodiment, a semiconductor integrated circuit has memory cells. Each of the memory cells has non-volatile memories and switching elements. The non-volatile memories and switching elements are connected in series between a first power source and a second power source. Output wirings of at least two of the memory cells are connected to each other. Input wirings are connected with control gates of the switching elements included in each of the at least two memory cells. A plurality of the switching elements included in one of the at least two of the memory cells is turned off, when an input signal or an inverted signal is inputted. Further, another plurality of the switching elements included in another one of the at least two of memory cells other than the one of the memory cells is turned on, when the input signal or the inverted signal is inputted.

Abstract: A 3D memory device includes bottom and top memory cubes having respective arrays of vertical NAND string structures. A common source plane comprising a layer of conductive material is between the top and bottom memory cubes. The source plane is supplied a bias voltage such as ground, and is selectively coupled to an end of the vertical NAND string structures of the bottom and top memory cubes. Memory cells in a particular memory cube are read using current through the particular vertical NAND string between the source plane and a corresponding bit line coupled to another end of the particular vertical NAND string.

Abstract: To provide a semiconductor memory device including an oxide semiconductor that can deal with instability of a threshold characteristic, in which writing is possible by a simple method. The semiconductor memory device functions by utilizing a characteristic that a threshold shifts when a thin film transistor including an oxide semiconductor is irradiated with ultraviolet light. Readout can be performed by setting a readout voltage between the threshold before the ultraviolet light irradiation and the threshold after irradiation. The threshold characteristic of an initial characteristic can be controlled by providing a back gate or by using two thin film transistors.

Abstract: A device for storing error information of a memory device includes a plurality of parent memories and a plurality of child memories. Each of the parent memories stores a row address and a column address of one defective cell. Each of the child memories stores a column address of a defective cell, having a row address identical to a row address stored in the corresponding parent memory, or a row address of a defective cell, having a column address identical to a column address stored in the corresponding parent memory. Herein, each of the parent memories stores information about information about whether a row repair must be performed to repair a defective cell stored in the parent memory and information about whether a column repair must be performed to repair a defective cell stored in the parent memory.

Abstract: The present invention provides a semiconductor device having a nonvolatile memory function capable of shortening an erase time and executing data access efficiently. When, under the control of a command register/control circuit, an erase voltage is applied to an embedded erase gate wiring disposed in a memory cell boundary region, and an electrical charge is transferred between a floating gate and an embedded erase gate to thereby perform an erase operation, a read selection voltage is applied to a memory gate line and an assist gate line during the application of the erase voltage to thereby carry out the reading of data.

Abstract: A solution is provided to flexibly choose a combination of flash memory devices to reduce the overall cost of the flash memory devices or increase the overall utilization of the flash memory devices, while satisfying the capacity requirements for the flash memory devices in a system design, wherein a decoding unit is used for determining which flash memory devices will be accessed and re-mapping incoming serial addressing bits, for accessing one flash memory device, into an outgoing serial addressing bits for accessing another flash memory device.

Abstract: Embodiments of the invention relate generally to semiconductors and memory technology, and more particularly, to systems, integrated circuits, and methods to implement circuits configured to compensate for parameter variations in layers of memory by adjusting access signals during memory operations. In some embodiments, memory cells are based on third dimensional memory technology. In at least some embodiments, an integrated circuit includes multiple layers of memory, a layer including sub-layers of semiconductor material. The integrated circuit also includes an access signal generator configured to generate an access signal to facilitate an access operation, and a characteristic adjuster configured to adjust the access signal for each layer in the multiple layers of memory.

Abstract: A voltage switch circuit includes a positive voltage supply circuit configured to supply a positive voltage to a control node in response to an enable signal, a negative voltage supply circuit configured to supply a negative voltage to the control node in response to a negative voltage enable signal, a control signal generation circuit configured to generate the negative voltage enable signal in response to the enable signal, and a switch circuit configured to transfer an input voltage with a positive potential or a negative potential to an output node in response to a potential of the control node.

Abstract: At least one of a plurality of columns is an LM column for storing LM flag data indicating a progression state of a write operation. Each of column control circuits performs an LM address scan operation for confirming whether the LM column exists in a corresponding memory core or not. Each of the column control circuits stores a result of that LM address scan operation in a register. In various kinds of operations after the LM address scan operation, each of the column control circuits executes an operation of reading the LM flag data from the LM column in the corresponding one of the memory cores when data retained in the register is first data, and omits executing an operation of reading the LM flag data from the LM column in the corresponding one of the memory cores when data retained in the register is second data.

Abstract: Disclosed herein is a device that includes a plurality of first word lines each extending from an associated one of the first terminals in a second direction toward to the second terminals and terminating between the first and second terminals, the second direction being substantially perpendicular to the first direction, and a plurality of second word lines each extending from an associated one of the second terminals in a third direction toward to the first terminals and terminating near to an end of an associated one of the first word lines, the third direction being opposite to the second direction, each of the second word lines being substantially aligned with an associated one of the first word lines.

Abstract: Some embodiments include apparatus and methods having memory cells coupled in series and a module to cause an application of voltages with at least three different values to gates of the memory cells during an operation to retrieve information stored in at least one of the memory cells. Additional apparatus and methods are described.

Abstract: A semiconductor integrated circuit includes a phase change memory apparatus includes a plurality of row control cells and a plurality of phase change memory cells formed on the row control cells while being electrically connected to the row control cells. The plurality of row control cells and the plurality of phase change memory cells are vertically stacked in a cell array area.

Abstract: A period (inverted period) in which a high negative potential is applied to a gate of the transistor is provided between a writing period and a retention period. In the inverted period, supply of positive electric charge from the drain of the transistor to the oxide semiconductor layer is promoted. Thus, accumulation of positive electric charge in the oxide semiconductor layer or at the interface between the oxide semiconductor layer and a gate insulating film can converge in a short time. Therefore, it is possible to suppress a decrease in the positive electric charge in the node electrically connected to the drain of the transistor in the retention period after the inverted period. That is, the temporal change of data stored in the semiconductor device can be suppressed.

Abstract: A non-volatile memory storage apparatus having a connector, an energy storage circuit, a power regulator and supply circuit, a non-volatile memory module, a memory controller and a buffer memory is provided. The power regulator and supply circuit is configured for transforming an output voltage from the energy storage circuit into a first voltage used for the non-volatile memory module and a second voltage used for the memory controller and the buffer memory. The memory controller is configured for writing data stored temporarily in the buffer memory into the non-volatile memory module with a special writing mode when receiving a detecting signal indicating that an input voltage is continuously smaller than a predetermined voltage for a predetermined period or receiving a detecting signal indicating that an inactive status of the connector or receiving a suspend mode signal, a warm reset signal or a hot reset signal from a host system.

Abstract: A plurality of address conversion circuits are provided for memory cores respectively, and convert logical address data supplied from outside to physical address data. In an interleave operation, the address conversion circuits output the logical address data as the physical address data without converting the logical address data when a first memory core is to be accessed earlier than a second memory core, whereas output address data obtained by adding a certain value to the logical address data as the physical address data when the second memory core is to be accessed earlier than the first memory core.

Abstract: A pass transistor circuit according to an embodiment includes: a first input/output terminal connected to a first signal line; a second input/output terminal connected to a second signal line; a first device having a first terminal connected to a first power supply and a second terminal; a second device having a third terminal connected to the second terminal and a fourth terminal connected to a second power supply; a first transistor having one of source/drain connected to the second terminal, a gate receiving a first control signal; and a second transistor having a gate connected to the other one of source/drain of the first transistor, one of source/drain connected to the first input/output terminal, and the other one of source/drain connected to the second input/output terminal. One of the first and second devices is a nonvolatile memory device, the other one of the first and second devices is a MOSFET.

Abstract: An apparatus including a first electrode; a second electrode including graphene; and a dielectric between the first electrode and the second electrode; input circuitry configured to change a charge state of the dielectric by causing electric charges to be trapped in the dielectric; and output circuitry configured to detect a value dependent upon a quantum capacitance of the graphene of the second electrode, wherein the quantum capacitance of the graphene is dependent upon the charge state of the dielectric.

Abstract: A method includes minimizing current leaking through a virtual ground pipe during access of NROM memory cells. The minimizing includes operating two neighboring memory cells generally together, which includes connecting an operation voltage to a shared local bit line of the two neighboring memory cells and connecting the external local bit lines of two neighboring memory cells to a receiving unit, such as a ground supply or two sense amplifiers. Also included is an array performing the method.

Abstract: A nonvolatile semiconductor memory device in which a memory cell life can be prolonged while making it possible to perform writing in units of bits. When command information represents writing, a comparing unit 37 compares written data in a target memory cell with write target data to give a comparison result to a write/read control unit 40, when the comparison result represents matching, the write/read control unit 40 does not instruct a decoder unit (51A, 51B, and 53) to perform writing in the target memory cell, and when the comparison result represents mismatching, the write/read control unit 40 instructs the decoder unit to write the write target data in the target memory cell.

Abstract: A nonvolatile semiconductor memory device including a memory cell array of memory cells arranged in a matrix, each of which includes a selecting transistor and a memory cell transistor; a column decoder controlling the potential of bit lines; a voltage application circuit controlling the potential of the first word lines; a first row decoder controlling the potential of the second word lines; and a second row decoder controlling the potential of the source line. The column decoder is formed of a circuit whose withstand voltage is lower than the voltage application circuit and the second row decoder.

Abstract: An object is to provide a semiconductor device in which stored data can be retained even when power is not supplied, and there is no limitation on the number of write cycles. The semiconductor device includes a source line, a bit line, a first signal line, a second signal line, a word line, a memory cell connected between the source line and the bit line, a first driver circuit electrically connected to the bit line, a second driver circuit electrically connected to the first signal line, a third driver circuit electrically connected to the second signal line, and a fourth driver circuit electrically connected to the word line and the source line. The first transistor is formed using a semiconductor material other than an oxide semiconductor. The second transistor is formed using an oxide semiconductor material.

Abstract: An integrated circuit device (e.g., a logic device or a memory device) having a memory cell array including a plurality of bit lines (e.g., first and second bit lines) and a plurality of bit line segments (e.g., first and second bit line segments) wherein each bit line segment is selectively and responsively coupled to or decoupled from its associated bit line via an associated isolation circuit. The memory cell array further includes a plurality of memory cells, wherein each memory cell includes a transistor having a first region, a second region, a body region, and a gate coupled to an associated word line via an associated word line segment. A first group of memory cells is coupled to the first bit line via the first bit line segment and a second group of memory cells is coupled to the second bit line via the second bit line segment.

Abstract: According to one embodiment, a semiconductor memory device includes a first active area in a semiconductor substrate, memory cells on the semiconductor substrate, first bit lines, first line, a second line, a third line, and a fourth line. The first line extends in a direction that intersects with the first bit lines and transmits a control potential applied to unselected ones of second bit lines connected to the memory cells. The second line is electrically connected to the first line and extends along the first bit lines. The third line is electrically connected to the second line and extends in a direction that intersects with the first bit lines. The fourth line electrically connects both the third line and portions in the active area corresponding to nodes to which the control potential is applied.

Abstract: A non-volatile DRAM cell includes a pass-gate transistor and a cell capacitor. A read operation of the non-volatile cell begins by positively charging the cell capacitor. A cell capacitor of an associated dummy non-volatile DRAM cell is fully charged. The pass-gate transistor is activated and if the pass-gate transistor is erased it does not turn on and if it is programmed, it turns on. Charge is shared on the complementary pair of pre-charged bit lines connected to the non-volatile DRAM cell and its associated Dummy non-volatile DRAM cell. A sense amplifier detects the difference in the data state stored in the pass-gate transistor. The program and erase of the non-volatile DRAM cell is accomplished Gate-induced drain-lowering (GIDL) assisted band-to-band tunneling and Fowler-Nordheim tunneling respectively. Programming or erasing a selected row of cells does not affect the data states of the cells in the unselected rows.

Abstract: A nonvolatile memory capable of acting at each 1 bit and having a high integration density. A small-sized semiconductor device of multiple high functions having such nonvolatile memory. The nonvolatile memory is constructed to have a memory cell composed of two memory transistors so that it can realize a memory capacity of two times as large for a memory area as that of the full-function EEPROM of the prior art, in which the memory cell is composed of one memory transistor and one selection transistor, while retaining functions similar to those of the EEPROM. On the other hand, the small-sized semiconductor device of high functions or multiple functions is realized by forming the nonvolatile memory of the invention integrally with another semiconductor part over a substrate having an insulating surface.

Abstract: According to one embodiment, a semiconductor memory device includes first and second memory cell blocks and an interconnect rerouting unit provided therebetween. The first memory cell block includes first interconnects and second interconnects provided in each space between the first interconnects. The second memory cell block includes a plurality of third interconnects provided on lines extending from the first interconnects and a plurality of fourth interconnects provided on lines extending from the second interconnects. A width and a thickness of the second and fourth interconnects are smaller than a width and a thickness of the first and second interconnects. Each of the first to fourth interconnects is connected to one end of first to fourth cell units including memory cells. The interconnect rerouting unit connects one of the fourth interconnects to one of the first interconnects and connects one of the third interconnects to the second interconnects.

Abstract: A semiconductor memory apparatus comprises first and second memory blocks each comprising semiconductor elements coupled to first and second local line groups, a first switching circuit configured to couple a first global line group to the first local line group of the first memory block in response to a block selection signal, a second switching circuit configured to couple a second global line group to the second local line groups of the first and second memory blocks in response to the block selection signal, and a third switching circuit configured to couple the first global line group to the first local line group of the second memory block in response to the block selection signal.

Abstract: Memory, memory devices, and a method for a backup sequence are disclosed. In one such memory device, sense circuitry and page buffers are coupled between a three transistor memory cell device and a non-volatile memory device. Enable/disable gates enable selective access to the sense circuitry and page buffers by either the three transistor memory cell device or the non-volatile memory device.

Abstract: A memory has a memory array with a memory cell. The memory is adapted to program a first number of bits into the memory cell. The memory is adapted to sense a second number of bits, different from the first number of bits, from the memory cell.

Abstract: Example embodiments for providing enhanced addressability for a serial flash memory device may comprise providing an extended addressing mode to enable access to a larger range of memory locations.

Abstract: A three dimensional stacked nonvolatile semiconductor memory according to an example of the present invention includes a memory cell array comprised of first and second blocks. The first block has a first cell unit which includes a memory cell to be programmed and a second cell unit which does not include a memory cell to be programmed, and programming is executed by applying a program potential or a transfer potential to word lines in the first block after the initial potential of channels of the memory cells in the first and second cell units is set to a plus potential. In the programming, the program potential and the transfer potential are not applied to word lines in the second block.

Abstract: The MONOS vertical memory cell of the present invention allow miniaturization of the memory cell area. The two embodiments of split gate and single gate provide for efficient program and erase modes as well as preventing read disturb in the read mode.

Abstract: In a nonvolatile semiconductor memory device, a stacked body is provided on a silicon substrate by alternately stacking pluralities of isolation dielectric films and electrode films, a through-hole is formed in the stacked body to extend in the stacking direction, a memory film is formed by stacking a block layer, a charge layer and a tunnel layer in this order at an inner face of the through-hole, and thereby a silicon pillar is buried in the through-hole. At this time, the electrode film is protruded further than the isolation dielectric film toward the silicon pillar at the inner face of the through-hole, and an end face of the isolation dielectric film has a curved shape displacing toward the silicon pillar side as the electrode film is approached.

Abstract: A nonvolatile semiconductor memory device includes: a memory unit; and a control unit. The memory unit includes a multilayer structure including electrode films and inter-electrode insulating films alternately stacked in a first direction; a semiconductor pillar piercing the multilayer structure in the first direction; a memory layer provided between the semiconductor pillar and the electrode films; a inner insulating film provided between the memory layer and the semiconductor pillar; a outer insulating film provided between the memory layer and the electrode films; and a wiring electrically connected to the first semiconductor pillar. In erasing operation, the control unit sets the first wiring at a first potential and sets the electrode film at a second potential lower than the first potential, and then sets the first wiring at a third potential and sets the electrode film at a fourth potential higher than the third potential.

Abstract: A relaxed metal pitch architecture may include a bit line and a first active area string and a second active area string. The bit line may be directly coupled to the first active area string and to the second active area string. The relaxed metal pitch architecture may be applied to a non-volatile memory structure.

Abstract: A non-volatile memory cell includes a semiconductor substrate with isolation structures formed therein and thereby transistor region and capacitor region are defined therein. A conductor is disposed over the isolation structures, the transistor region and a first-type doped well disposed in the capacitor region. The conductor includes a capacitor portion disposed over the first-type doped well, a transistor portion disposed over the transistor region, a first edge disposed over the isolation structure at a side of the transistor region, and an opposite second edge disposed over the first-type doped well. Two first ion doped wells are disposed in the transistor region and respectively at two sides of the transistor portion, and constitutes a transistor with the transistor portion. A second ion doped region is disposed in the capacitor region excluding the conductor and constitutes a capacitor with the capacitor portion.

Abstract: A memory device, a manufacturing method and an operating method of the same are provided. The memory device includes a substrate, stacked structures, a channel element, a dielectric element, a source element, and a bit line. The stacked structures are disposed on the substrate. Each of the stacked structures includes a string selection line, a word line, a ground selection line and an insulating line. The string selection line, the word line and the ground selection line are separated from each other by the insulating line. The channel element is disposed between the stacked structures. The dielectric element is disposed between the channel element and the stacked structure. The source element is disposed between the upper surface of the substrate and the lower surface of the channel element. The bit line is disposed on the upper surface of the channel element.

Abstract: A non-volatile memory cell includes NMOS programming, read, erase, and control transistors having gate electrodes connected to a storage node. The erase and control transistors have interconnected source, drain, and bulk electrodes. The cell is programmed by setting source, drain, bulk, and gate electrodes of all transistors to a positive voltage. An inhibiting voltage is applied to source, drain, and bulk electrodes of the read transistor, while setting source and drain electrodes of the programming transistor to the positive voltage and the bulk electrode of the programming transistor to the positive voltage or the inhibiting voltage. Source, drain, and bulk electrodes of the control transistor are then ramped to a negative control voltage while ramping source, drain, and bulk electrodes of the erase transistor to a negative erase voltage and then back to the positive voltage. Source, drain.