Diffraction, Reflection, Or Scattering Analysis Patents (Class 378/70)
  • Patent number: 7068753
    Abstract: A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: June 27, 2006
    Assignee: Jordan Valley Applied Radiation Ltd.
    Inventors: David Berman, Isaac Mazor, Boris Yokhin, Amos Gvirtzman
  • Patent number: 7065175
    Abstract: An x-ray diffraction-based scanning method and system are described. The method includes screening for a particular substance in a container at a transportation center using a flat panel detector having a photoconductor x-ray conversion layer to detect x-rays diffracted by a particular substance in the container. The diffracted x-rays may be characterized in different ways, for examples, by wavelength dispersive diffraction and energy dispersive diffraction.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: June 20, 2006
    Assignee: Varian Medical Systems Technologies, Inc.
    Inventor: Michael C. Green
  • Patent number: 7062013
    Abstract: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: June 13, 2006
    Assignee: Jordan Valley Applied Radiation Ltd.
    Inventors: David Berman, Alex Dikopoltsev, Dileep Agnihotri
  • Patent number: 7062015
    Abstract: Apparatus for imaging an object (13) irradiated with an X-ray beam (12) by detecting a transmitted X-ray beam transmitted through the object. A crystal analyser (15) receives the transmitted X-ray beam and emits a first diffracted X-ray beam to a detector assembly (14) comprising first and second X-ray detectors (16 and 17). The first detector (16) is a monochromating semiconductor detector which detects a first portion of the first diffracted X-ray beam to generate first image data, and which diffracts a second portion of the first diffracted beam to the second detector (17) which generates second image data. Image processing means (18) are provided for combining the first and second image data to derive a refraction image and an absorption image of the object (13).
    Type: Grant
    Filed: October 28, 2002
    Date of Patent: June 13, 2006
    Assignee: Council for the Central Laboratory of the Research Councils
    Inventor: Robert Lewis
  • Patent number: 7039161
    Abstract: A method and apparatus for analyzing a film structure analyze particle or pore size distribution with high accuracy and evaluate a shape of a surface or interface even in the case where the absolute amount of particles or pores in the thin film is small.
    Type: Grant
    Filed: October 19, 2004
    Date of Patent: May 2, 2006
    Assignee: Rigaku Corporation
    Inventors: Yoshiyasu Ito, Kazuhiko Omote
  • Patent number: 7031528
    Abstract: A scanner system analyses data plotted in a scatter plot in accordance with user-specified criteria or statistical measures from the data population, to produce a scatter plot that displays in the plotted data the boundaries for the selection of out-lyer points and/or otherwise visually denotes in the plotted data which points are the out-lyer points. The scanner system analyzes the underlying data based on user-specified differential expression ratios, or based on criteria associated with the statistics of the data population, to produce out-lyer boundaries that are represented by diverging lines. Alternatively, the system may analyze the underlying data based on absolute expression levels, to produce boundaries that are represented in the plot by lines that meet at an identity line of slope 1.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: April 18, 2006
    Assignee: PerkinElmer LAS, Inc.
    Inventors: Mack J. Schermer, Todd J. Stephan
  • Patent number: 7003075
    Abstract: The present invention provides a measuring device by which, even if a radiation intensity from a light source, a beam size or a beam intensity distribution of the light source changes, an optical characteristic of an optical element to be measured can be measured very precisely. In a measuring device according to the present invention, to this end, light from a light source is diffracted by a diffracting grating to thereby resolve the same into plural light beams, and by using different light beams, the object to be measured is measured and the intensity of incident light from the light source is measured. With this structure, even if the light from the light source changes, the intensity of the light from the light source is specified concurrently, and therefore, the optical characteristic of the object to be measured can be measured very accurately.
    Type: Grant
    Filed: July 11, 2003
    Date of Patent: February 21, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akira Miyake, Fumitaro Masaki
  • Patent number: 6996208
    Abstract: An X-ray optical system comprising an X-ray source (1), from which X-ray radiation (2) is guided to a sample (4) under investigation, and an X-ray detector (7) for receiving radiation (5) diffracted or scattered from the sample (4), wherein a beam-guiding X-ray optical element (3, 6), such as e.g. a collimator, a mono- or polycapillary, an X-ray mirror or a monochromator, is disposed between the source (1) and the sample (4) and/or between the sample (4) and the detector (7), is characterized in that a wobble means is provided for moving the X-ray optical element (3, 6) in an oscillating fashion during the measurement. The inventive X-ray optical system obtains averaged X-ray analysis information from objects under investigation having large mass which consist of macrocrystalline material without destroying or accelerating the object under investigation.
    Type: Grant
    Filed: March 29, 2004
    Date of Patent: February 7, 2006
    Assignee: Bruker Axs GmbH
    Inventors: Kurt Helming, Lutz Brügemann
  • Patent number: 6993113
    Abstract: Disclosed herein is a method of evaluating the performance of an ion-exchange film. In the method, small-angle scattering curves for the ion-exchange film are obtained by an X-ray measuring apparatus that can detect X-rays scattered at small angles with respect to the axis of an X-ray applied to film. From the positions of the peaks on the small-angle scattering curves and the X-ray intensities at these peaks, the molecular structure of the ion-exchange film is determined, thereby to evaluate the performance of the ion-exchange film.
    Type: Grant
    Filed: June 10, 2003
    Date of Patent: January 31, 2006
    Assignee: Rigaku Corporation
    Inventors: Kazuhito Hoshino, Yoshio Iwasaki
  • Patent number: 6990177
    Abstract: An X-ray optical system for small angle scattering has a parabolic multilayer mirror and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror, an optical-path selecting slit device, a small-angle selecting slit device and a Soller slit are arranged between an X-ray source and a specimen-side slit. An X-ray beam having passed through the first aperture of an aperture slit plate is interrupted by the optical-path selecting slit. An X-ray beam having passed through the second aperture of the aperture slit plate is reflected at the reflecting surface of the multilayer mirror to become a parallel beam. This parallel beam passes through an aperture of the optical-path selecting slit device. The beam width is restricted by a narrow slit of the small-angle selecting slit device.
    Type: Grant
    Filed: September 2, 2003
    Date of Patent: January 24, 2006
    Assignee: Rigaku Corporation
    Inventors: Go Fujinawa, Hitoshi Okanda
  • Patent number: 6987832
    Abstract: In the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films, an approach is presented for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another approach involves aligning an angle-resolved X-ray reflectometer using a focusing optic, such as a Johansson crystal. Another approach relates to validating the focusing optic. Another approach relates to the alignment of the focusing optic with the X-ray source. Another approach concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another approach concerns the calibration of the vertical position of the sample.
    Type: Grant
    Filed: June 4, 2004
    Date of Patent: January 17, 2006
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Louis N. Koppel, Craig E. Uhrich, Jon Opsal
  • Patent number: 6970532
    Abstract: The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.
    Type: Grant
    Filed: May 9, 2001
    Date of Patent: November 29, 2005
    Assignee: Rigaku Corporation
    Inventors: Seiichi Hayashi, Jimpei Harada, Tetsuo Kikuchi, Kazuhiko Omote, Katsuhiko Inaba
  • Patent number: 6956928
    Abstract: A small angle x-ray diffraction scattering system has a vertical orientation, allowing for simplified analysis of liquid samples. The system may function in a beam-up or a beam-down configuration. An x-ray source provides an initial x-ray beam that is directed vertically along a primary beampath to a sample located on a sample support. The small angle scattered x-ray energy travels through a secondary beampath to a detector. The primary and secondary beampaths may be evacuated and separated from a sample chamber by fluid seals. Beam conditioning optics and a collimator may be used in the primary beampath, and a beamstop used in the secondary beampath. The sample chamber may have a microscope or camera, which may be movable, for observing the sample, and a translation stage for moving the sample in at least two dimensions.
    Type: Grant
    Filed: May 5, 2003
    Date of Patent: October 18, 2005
    Assignee: Bruker AXS, Inc.
    Inventors: Bob Baoping He, Rolf Dieter Schipper
  • Patent number: 6947521
    Abstract: A method for detecting an image of an object by measuring the intensity at a plurality of positions of a transmitted beam of x-ray radiation emitted from the object as a function of angle within the transmitted beam. The intensity measurements of the transmitted beam are obtained by a crystal analyzer positioned at a plurality of angular positions. The plurality of intensity measurements are used to determine the angular intensity spectrum of the transmitted beam. One or more parameters, such as an attenuation property, a refraction property and a scatter property, can be obtained from the angular intensity spectrum and used to display an image of the object.
    Type: Grant
    Filed: June 17, 2003
    Date of Patent: September 20, 2005
    Assignee: Illinois Institute of Technology
    Inventors: Miles N. Wernick, Leroy Dean Chapman, Oral Oltulu, Zhong Zhong
  • Patent number: 6947520
    Abstract: A method for testing a surface of a sample includes irradiating the surface at a grazing incidence with a beam of radiation having a focal region, whereby the radiation is reflected from the surface. At least one of the focal region and the sample is adjusted through a plurality of adjustment stages within an adjustment range so as to vary a location of the focal region relative to the surface. Respective angular profiles of the radiation reflected from the surface are measured at the plurality of adjustment stages, and the angular profiles are compared in order to select an adjustment within the range at which the surface is in a desired alignment with the beam.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: September 20, 2005
    Assignee: Jordan Valley Applied Radiation Ltd.
    Inventors: Boris Yokhin, Isaac Mazor, David Berman
  • Patent number: 6937694
    Abstract: A method for measuring a pole of a sample, using a reflection method, is effective substantially over all measurement regions ranging from the region of high-tilting-angle ? of a conventional pole measuring to the in-plane diffraction region corresponding to low-tilting-angle ?.
    Type: Grant
    Filed: May 1, 2002
    Date of Patent: August 30, 2005
    Assignee: Rigaku Corporation
    Inventors: Ryouichi Yokoyama, Kazuhiko Omote, Kamihisa Endo, Ryuji Matsuo
  • Patent number: 6930188
    Abstract: A stable solid hydrate of a muscarinic receptor antagonist is useful in the treatment of irritable bowel syndrome, diverticular disease, oesophageal achalasia, chronic obstructive airways disease, over active bladder (including symptoms of incontinence, urge and frequency), urinary incontinence, neurogenic urinary urgency or pollakiuria, treatment of bladder functional disorder, urinary leakage, painful or difficult urination caused by neurogenic bladder, spastic or hypertonic bladder, dysfunctional bladder syndrome, gastrointestinal disorders including gastrointestinal hyperactivity, and relaxing effect on intestinal smooth muscle cells.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: August 16, 2005
    Assignee: Novartis International Pharmaceutical, Ltd.
    Inventors: Peter James Dunn, John George Matthews, Trevor Jack Newbury, Garry O'Connor
  • Patent number: 6917667
    Abstract: Parallel X-ray beams with two kinds of wavelength are made with the use of a single parabolic multilayer mirror. A single parabola prepared for a CuKa X-ray is used for making parallel X-ray beams of both the CuKa X-ray and the CoKa X-ray. The CuKa ray emitted from a first X-ray focal spot located at the focus of the parabola is reflected at a reflecting surface composed of the parabola to become a parallel beam going out. When a second X-ray focal spot is arranged at the position apart from the first X-ray focal spot by a predetermined distance, the CoKa X-ray emitted from the second X-ray focal spot is reflected at the same reflecting surface to become a parallel beam going out.
    Type: Grant
    Filed: September 2, 2003
    Date of Patent: July 12, 2005
    Assignee: Rigaku Corporation
    Inventors: Go Fujinawa, Hitoshi Okanda
  • Patent number: 6895074
    Abstract: A method for nondestructively measuring the density of a panel, comprising the steps of: directing a collimated radiation beam at the panel at an oblique angle; passing the panel under the collimated radiation beam or passing the collimated radiation beam over the panel; continuously detecting a resultant beam of a plurality of photons with a detector directed at the panel; counting only those photons with an energy level above a minimum energy level; correcting for inaccuracies at the edges of the panel; and generating a density profile of the panel throughout the thickness of the panel.
    Type: Grant
    Filed: May 20, 2002
    Date of Patent: May 17, 2005
    Assignee: IMAL Srl
    Inventor: Paolo Benedetti
  • Patent number: 6895075
    Abstract: Apparatus for inspection of a sample includes a radiation source and an array of detector elements arranged to receive radiation from the surface due to irradiation of an area of the surface by the radiation source. The array has a first operative configuration for resolving the received radiation along a first axis perpendicular to the surface, and a second operative configuration for resolving the received radiation along a second axis parallel to the surface. A signal processor processes the signal from the detector array in the two configurations so as to determine a reflectance of the surface as a function of elevation angle relative to the surface and a scattering profile of the surface as a function of azimuthal angle in a plane of the surface.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: May 17, 2005
    Assignee: Jordan Valley Applied Radiation Ltd.
    Inventors: Boris Yokhin, Alexander Dikopoltsev, Tzachi Rafaeli, Amos Gvirtzman
  • Patent number: 6891925
    Abstract: The invention presents an x-ray method for determining the three-dimensional molecular structure of molecules having an unknown structure. The molecules having unknown structure are arranged in a two-dimensional periodic array on a substrate molecular crystal having a known structure. It is a requirement of the method that the dimensions of the molecules with the unknown structure are smaller than the corresponding dimensions of the substrate crystal unit cell.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: May 10, 2005
    Assignee: Yissum Research Development
    Inventor: Yizhak Yacoby
  • Patent number: 6882739
    Abstract: An apparatus and method for performing rapid grain size analysis on a textured polycrystalline material, by generating average grain size and grain size distribution data from x-ray diffraction data of such material. Raw diffraction data is obtained by capturing a plurality of diffraction arcs within a single data capture frame. The raw diffraction data is digitally registered; (3) and the registered diffraction data is filtered to remove background noise, exclude diffraction overlaps or truncations, and compensate for biased data obtained from regions of highly preferred orientations. Average grain size and grain size distribution data are then correlated with the filtered diffraction data. The apparatus for acquiring raw diffraction data includes a collimated x-ray source having means for adjusting beam size and divergence of the x-ray generated, a 2-dimensional area detector for registering diffracted x-ray, and a sample motion assembly for moving the sample in the sample plane.
    Type: Grant
    Filed: June 19, 2001
    Date of Patent: April 19, 2005
    Assignee: HyperNex, Inc.
    Inventors: David S. Kurtz, Kryzsztof J. Kozaczek, Paul R. Moran
  • Patent number: 6876723
    Abstract: A pump-probe scheme measures the rise time of ultrafast x-ray pulses. Conventional high speed x-ray diagnostics (x-ray streak cameras, PIN diodes, diamond PCD devices) do not provide sufficient time resolution to resolve rise times of x-ray pulses on the order of 50 fs or less as they are being produced by modern fast x-ray sources. Here, we are describing a pump-probe technique that can be employed to measure events where detector resolution is insufficient to resolve the event. The scheme utilizes a diamond plate as an x-ray transducer and a p-polarized probe beam.
    Type: Grant
    Filed: July 1, 2003
    Date of Patent: April 5, 2005
    Assignee: The United States of America as represented by the Department of Energy
    Inventors: Peter M. Celliers, Franz A. Weber, Stephen J. Moon
  • Patent number: 6839406
    Abstract: A method and an apparatus for detecting items in objects, such as in luggage, wherein a detector apparatus, functioning as a second detector is divided into a lower testing stage and a higher testing stage. In the lower testing stage, the coordinates of the object location are determined, and subsequently, a diffraction apparatus is moved to this location in the higher testing stage. In particular, X-ray diffraction can be employed to determine the explosive material of the item in the object. The diffraction apparatus comprises a collimator/detector arrangement, which is disposed to be adjusted height-wise and laterally in the higher testing stage, with a laterally-adjustable X-ray source, which is synchronized with the collimator/detector arrangement. The collimator/detector arrangement preferably has only one collimator and one detector. The collimator preferably has a conically-expanding ring slot, which a predetermined angle ?M of a scatter radiation.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: January 4, 2005
    Assignee: Smiths Heimann GmbH
    Inventors: Hermann Ries, Patricia Schall, Frank Cordes, Martin Hartick
  • Publication number: 20040258202
    Abstract: A method for detecting an image of an object by measuring the intensity at a plurality of positions of a transmitted beam of x-ray radiation emitted from the object as a function of angle within the transmitted beam. The intensity measurements of the transmitted beam are obtained by a crystal analyzer positioned at a plurality of angular positions. The plurality of intensity measurements are used to determine the angular intensity spectrum of the transmitted beam. One or more parameters, such as an attenuation property, a refraction property and a scatter property, can be obtained from the angular intensity spectrum and used to display an image of the object.
    Type: Application
    Filed: June 17, 2003
    Publication date: December 23, 2004
    Inventors: Miles N. Wernick, Leroy Dean Chapman, Oral Oltulu, Zhong Zhong
  • Patent number: 6825048
    Abstract: The present invention relates to a method for the wet chemical preparation of materials libraries consisting of a large number of solids, the solids being deposited from reaction mixtures in microreaction chambers onto a bottom plate which simultaneously serves as the library substrate. Depending on the material selected for the library substrate, the solids can subsequently be examined non-destructively, for example, by reflecting or penetrating microarea X-ray diffraction.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: November 30, 2004
    Assignee: hte Aktiengesellschaft the high throughput experimentation company
    Inventors: Wilhelm F. Maier, Jens Klein, Christian Lehmann, Hans-Werner Schmidt
  • Publication number: 20040234029
    Abstract: A device (1; 1a) for the examination of at least one material sample (3; 3a, 3b, 3c) which can be inserted into the device (1; 1a) and is irradiated by means of electromagnetic waves (4), notably X-rays; in the measuring position the material sample (3; 3a, 3b, 3c) can be subjected to irradiation by means of the electromagnetic waves (4) and during a change of sample the beam path (4) can be interrupted by means of a closure element (8) which can be moved into the beam path. The device is constructed in such a manner that the closure element (8) is provided with a reference sample (9) on its side which faces the rays (4) in a manner such that a reference measurement can be performed thereon during a change of sample.
    Type: Application
    Filed: June 8, 2004
    Publication date: November 25, 2004
    Inventors: Roelof De Lange, Bruno A.R. Vrebos
  • Publication number: 20040218717
    Abstract: In the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films, an approach is presented for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another approach involves aligning an angle-resolved X-ray reflectometer using a focusing optic, such as a Johansson crystal. Another approach relates to validating the focusing optic. Another approach relates to the alignment of the focusing optic with the X-ray source. Another approach concerns the correction of measurements errors caused by the tilt or slope of the sample. Yet another approach concerns the calibration of the vertical position of the sample.
    Type: Application
    Filed: June 4, 2004
    Publication date: November 4, 2004
    Inventors: Louis N. Koppel, Craig E. Uhrich, Jon Opsal
  • Patent number: 6813338
    Abstract: High-resolution powder diffraction is performed using high-energy synchrotron radiation as an x-ray source in such a way that a detector mounted on a measuring instrument such as a diffractometer is moved by smaller distances than the distance between adjacent x-ray detection units (pixels) in order to measure data for interpolation between pixels and the obtained interpolating data are put together to thereby improve the spatial resolution in measurement that has been limited by the detection unit in the detector.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: November 2, 2004
    Assignees: Japan Synchrotron Radiation Research Institute, Rigaku Corporation, Riken
    Inventors: Masaki Takata, Eiji Nishibori, Makoto Sakata, Jimpei Harada
  • Publication number: 20040208284
    Abstract: An X-ray optical system for combinatorial screening comprising a plurality of samples which are disposed on a flat plate (8;23) as a sample library (3;22), with an X-ray source (1) from which X-ray radiation (2) is guided to a sample under investigation, and an X-ray detector (7) for receiving radiation (6) diffracted or scattered on the sample, wherein a sample carrier is provided for displacing the flat plate (8;23) in its xy-plane and perpendicular thereto along a z-direction, is characterized in that the sample carrier is designed such that it can rotate the flat plate (8;23) about a first axis (9) parallel to the z-direction and also about a second axis (10) which extends through the xy-plane. This permits rapid sequential measurement of the samples of a sample library, wherein a large variety of X-ray analyses can be applied to the samples.
    Type: Application
    Filed: March 29, 2004
    Publication date: October 21, 2004
    Applicant: Bruker AXS GmbH
    Inventors: Lutz Brugemann, Arnt Kern
  • Publication number: 20040208283
    Abstract: An X-ray optical system comprising an X-ray source (1), from which X-ray radiation (2) is guided to a sample (4) under investigation, and an X-ray detector (7) for receiving radiation (5) diffracted or scattered from the sample (4), wherein a beam-guiding X-ray optical element (3, 6), such as e.g. a collimator, a mono- or polycapillary, an X-ray mirror or a monochromator, is disposed between the source (1) and the sample (4) and/or between the sample (4) and the detector (7), is characterized in that a wobble means is provided for moving the X-ray optical element (3, 6) in an oscillating fashion during the measurement. The inventive X-ray optical system obtains averaged X-ray analysis information from objects under investigation having large mass which consist of macrocrystalline material without destroying or accelerating the object under investigation.
    Type: Application
    Filed: March 29, 2004
    Publication date: October 21, 2004
    Applicant: Bruker AXS GmbH
    Inventors: Kurt Helming, Lutz Brugemann
  • Publication number: 20040206908
    Abstract: An X-ray or neutron-optical system comprising an X-ray or neutron source (1) from which corresponding radiation is guided as a primary beam (2) to a sample (4) under investigation, with an X-ray or neutron detector (6) for receiving radiation diffracted or scattered from the sample (4), wherein the source (1), the sample and the detector are disposed substantially on one line (=z-axis) and wherein a beam stop (5; 31; 41) is provided between the sample and the detector whose cross-sectional shape is adjusted to the cross-section of the primary beam is characterized in that the beam stop is disposed to be displaceable along the z-direction for optimum adjustment of the amounts of useful and interfering radiation impinging on the detector. This protects the detector from the influence of the primary beam while allowing a maximum amount of diffracted or scattered radiation to reach the detector, wherein the beam stop can be easily adjusted to temporally changing properties of the beam optics.
    Type: Application
    Filed: March 29, 2004
    Publication date: October 21, 2004
    Applicant: Bruker AXS GmbH
    Inventors: Joachim Lange, Rolf-Dieter Schipper
  • Patent number: 6806093
    Abstract: An apparatus and process for forming an array of powder samples arranged in predefined locations where all samples have a flat surface in a common plane has been developed. A monolithic block having a main support section having at least N perforations from a first surface of the main support through a second surface of the main support in predefined locations, where N is the number of samples in the array is provided. The monolithic block also has a flat support section covering the perforations of the main support section. All N samples are loaded simultaneously with sample X in perforation X of the main support where X is an integer from 1 to N. A flat surface of each sample where the flat surfaces are a common plane is formed by forcing the samples within the perforations against the flat support.
    Type: Grant
    Filed: October 3, 2001
    Date of Patent: October 19, 2004
    Assignee: UOP LLC
    Inventors: Rune Wendelbo, Duncan E. Akporiaye, Ivar M. Dahl, Arne Karlsson, Gregory J. Lewis, David S. Bem, Andrzej Z. Ringwelski, Richard C. Murray, Jr., Cheryl M. Surman
  • Publication number: 20040184580
    Abstract: An open beam x-ray diffraction system and method are provided including modular x-ray heads for being detachably connected to a base unit having a common drive assembly that shifts the heads in an arcuate path during an x-ray diffraction measurement operation. The heads can be tailored to different performance criteria depending on the needs of the measurement operation that is to take place. To this end, one of the heads can be a microhead that is adapted to take measurements from otherwise difficult to access surfaces, such as on the inside of tubular parts. Enhancements to the drive assembly for improved accuracy and speed are also disclosed.
    Type: Application
    Filed: March 17, 2003
    Publication date: September 23, 2004
    Applicant: Proto Manufacturing Ltd.
    Inventor: Michael Brauss
  • Patent number: 6782074
    Abstract: A method for evaluating an optical member for photolithography composed of a fluoride crystal comprises a step of measuring a crystal plane orientation of the optical member, and a step of specifying a twin region on the basis of a result of the measurement. The twin region in an effective region of an optical element is specified as a total area of a region obtained by projection onto a plane perpendicular to an optical axis of the optical element. It is judged that the optical member is usable when the total area is not more than 10% of an effective diametric area or a partial diametric area of the optical element. The obtained optical element has satisfactory image formation characteristics because of less birefringence.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: August 24, 2004
    Assignee: Nikon Corporation
    Inventor: Shigeru Sakuma
  • Publication number: 20040156474
    Abstract: Apparatus for inspection of a sample includes a radiation source and an array of detector elements arranged to receive radiation from the surface due to irradiation of an area of the surface by the radiation source. The array has a first operative configuration for resolving the received radiation along a first axis perpendicular to the surface, and a second operative configuration for resolving the received radiation along a second axis parallel to the surface. A signal processor processes the signal from the detector array in the two configurations so as to determine a reflectance of the surface as a function of elevation angle relative to the surface and a scattering profile of the surface as a function of azimuthal angle in a plane of the surface.
    Type: Application
    Filed: February 12, 2003
    Publication date: August 12, 2004
    Applicant: JORDAN VALLEY APPLIED RADIATION LTD.
    Inventors: Boris Yokhin, Alexander Dikopoltsev, Tzachi Rafaeli, Amos Gvirtzman
  • Patent number: 6771735
    Abstract: Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. An oblong x-ray beam can be produced by shaping the electron beam in an x-ray microfocus tube, or by creating a target with a metal strip having the desired beam cross section. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.
    Type: Grant
    Filed: November 7, 2001
    Date of Patent: August 3, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Gary Janik, Jeffrey Moore
  • Patent number: 6768785
    Abstract: The present invention relates to the calibration and alignment of an X-ray reflectometry (“XRR”) system for measuring thin films. An aspect of the present invention describes a method for accurately determining C0 for each sample placement and for finding the incident X-ray intensity corresponding to each pixel of a detector array and thus permitting an amplitude calibration of the reflectometer system. Another aspect of the present invention relates to a method for aligning an angle-resolved X-ray reflectometer that uses a focusing optic, which may preferably be a Johansson crystal. Another aspect of the present invention is to validate the focusing optic. Another aspect of the present invention relates to the alignment of the focusing optic with the X-ray source. Another aspect of the present invention concerns the correction of measurements errors caused by the tilt or slope of the sample.
    Type: Grant
    Filed: August 19, 2003
    Date of Patent: July 27, 2004
    Assignee: Therma-Wave, Inc.
    Inventors: Louis N. Koppel, Craig E. Uhrich, Jon Opsal
  • Publication number: 20040131152
    Abstract: An apparatus and method for determining a parameter of a constituent of a sample employ a radiation source, focusing means for focusing emitted radiation at a first position on the sample, detecting means for detecting the radiation reflected from or transmitted through the sample and adapted to generate a signal representative of the detected radiation, processing means for receiving the signal and determining a parameter of a constituent of the sample corresponding to the signal, and translational repositioning means adapted to translate the focused radiation to a second position on the sample.
    Type: Application
    Filed: November 7, 2003
    Publication date: July 8, 2004
    Applicant: Bede plc
    Inventors: Simon Bates, Kevin Matney, David K. Bowen
  • Publication number: 20040131151
    Abstract: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.
    Type: Application
    Filed: October 20, 2003
    Publication date: July 8, 2004
    Inventors: David Berman, Alex Dikopoltsev
  • Patent number: 6760403
    Abstract: The method and apparatus of the present invention permit indirect identification of a target plane, such as the plane identified by an alignment feature, based upon the identification of a reference plane which is offset by a predetermined angle from the target plane. In addition, in order to permit alignment features to be defined at non-standard angles with respect to the axial orientation of an ingot, an apparatus is provided that includes a frame having at least two members. The first member abuts a bar extending outwardly from the stage of an x-ray diffractometer, while the second member carries an engagement member for engaging a non-standard alignment feature. The second member may be movable relative to the first member to permit the frame to be mounted upon ingots having different non-standard alignment features.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: July 6, 2004
    Assignee: SEH America, Inc.
    Inventors: Richard M. Aydelott, Mark E. Secrest
  • Patent number: 6748345
    Abstract: A method of analyzing crystalline texture from data defining the orientation of crystals in a sample of polycrystalline material including, for each crystal, determining the orientation of a first direction in the sample, with respect to a common reference frame fixed to the crystal structure of each crystal. A number of crystals sharing a similar orientation of the first direction with respect to the reference frame is selected and for each, the orientation is determined of a second direction in the sample with respect to the reference frame. A number of crystals sharing a similar orientation of the second direction with respect to the reference frame is selected and a crystal texture corresponding to the orientation of the selected crystals with respect to the first and second directions within the sample is determined and/or represented.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: June 8, 2004
    Assignee: Oxford Instruments Analytical Limited
    Inventors: Cheng Tsien Chou, Keith Graham Dicks, Pierre Rolland
  • Patent number: 6744850
    Abstract: An x-ray reflectometry system for measuring thin film samples. The system includes an adjustable x-ray source, such that characteristics of an x-ray probe beam output by the x-ray source can be adjusted to improve the resolution of the measurement system. The x-ray probe beam can also be modified to increase the speed of evaluating the thin film sample, for situations where some degree of resolution can be sacrificed. In addition, or alternatively, the system can also provide an adjustable detector position device which allows the position of the detector to be adjusted to increase the resolution of the system, or to reduce the time it takes to evaluate the thin film material.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: June 1, 2004
    Assignee: Therma-Wave, Inc.
    Inventors: Jeffrey T. Fanton, Craig Uhrich, Louis N. Koppel
  • Publication number: 20040096034
    Abstract: A reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.
    Type: Application
    Filed: October 29, 2003
    Publication date: May 20, 2004
    Applicant: INCOATEC GmbH
    Inventors: Carsten Michaelsen, Michael Dahms
  • Patent number: 6718007
    Abstract: A method for detecting the presence of a gene responsible for a pathological state; or the pathological state itself in a patient comprising exposing at least one hair from the patient to fibre X-ray diffraction and detecting changes in the ultrastructure of the hair. An instrument (1) for detecting the presence of a gene responsible for a pathological state; or de pathological state itself, using a hair sample, comprising: an X-ray source (2) producing a beam of X-ray radiation; a sample stage for positioning said hair (3) sample within said beam; a detector to detect the scanering of said X-ray beam caused by said hair sample; and a display means (9) associated with said detector for displaying the output thereof (9a, 9b, 9c and 9d); whereby patterns of output related to the presence of said gene or said pathological state are displayed for interpretation.
    Type: Grant
    Filed: September 6, 2001
    Date of Patent: April 6, 2004
    Assignee: Fiberscan PTY Ltd.
    Inventor: Veronica Jean James
  • Publication number: 20040062350
    Abstract: In an arrangement for determining the spectral reflectivity of a measurement object, the object of the invention is to provide a simpler and more compact measuring arrangement, to eliminate the removal of elements from the beam path for detecting the reference beam, which was formally necessary, and to avoid complex translational and rotational movements. Different beam areas proceeding from the radiation source serve as measurement beam and reference beam which are directed simultaneously to different spectrally dispersing areas of at least one dispersive element and to different receiver areas of at least one receiver in a spectrograph. Preferred measurement objects are surfaces which reflect in a spectrally-dependent manner for radiation in the extreme ultraviolet range (EUV), but application of the arrangement is not limited to this spectral region.
    Type: Application
    Filed: September 26, 2003
    Publication date: April 1, 2004
    Applicant: JENOPTIK Mikrotechnik GmbH
    Inventors: Max Christian Schuermann, Thomas Missalla, Bernd Seher
  • Patent number: 6711232
    Abstract: An apparatus adapted for sensing characteristics of a layer disposed substantially within a plane, without making physical contact with the layer. An x-ray source produces x-rays, where the x-ray source has an axis disposed substantially perpendicular to the plane of the layer. An x-ray reflector has an axis disposed substantially perpendicular to the plane of the layer. The x-ray reflector receives the x-rays from the x-ray source and directs the x-rays received to a target spot on the layer at angles whereby the x-rays reflect off of the layer as reflected x-rays at a reflection angle. The reflected x-rays have properties that are indicative of the characteristics of the layer. A first x-ray blocking barrier is disposed substantially perpendicular to the plane of the layer, above the target spot. The first x-ray blocking barrier blocks at least a portion of the x-rays director toward and reflected off of the layer.
    Type: Grant
    Filed: April 16, 2003
    Date of Patent: March 23, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventor: Gary R. Janik
  • Patent number: 6696479
    Abstract: Novel crystalline forms of Fluvastatin sodium hydrates were found, referred to hereinafter as polymorphic Forms C, D, E and F. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms, a process for the preparation of highly crystalline Fluvastatin sodium Form A, and pharmaceutical compositions comprising the crystalline forms.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: February 24, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Paul Adriaan Van Der Schaaf, Claudia Marcolli, Martin Szelagiewicz, Andreas Burkhard, Heinz Wolleb, Annemarie Wolleb
  • Patent number: 6693988
    Abstract: A baggage inspection device based on coherent x-ray scatter has an x-ray source on one side of the scanning area and detectors on the other side of the scanning area. The detectors measure the energy of the scattered x-ray quanta. A primary ray collimator is arranged between scanning area and x-ray source. A secondary ray collimator for scattered rays is arranged between scanning area and detectors. The detectors are positioned on a Z axis forming an axis of symmetry for the secondary ray collimator. A point 0 on the Z axis forms the origin of a Cartesian coordinate system. The primary ray collimator allows passage only of x-ray beams impinging on the point 0. The x-ray source has an extended anode with a focus position controlled electronically about the anode length. Primary ray collimator and x-ray source extend cylindrically symmetrically about the symmetry axis or parallel to the Y axis in the X-Y plane.
    Type: Grant
    Filed: March 14, 2002
    Date of Patent: February 17, 2004
    Assignee: Yxlon International X-Ray GmbH
    Inventor: Geoffrey Harding
  • Publication number: 20040028186
    Abstract: Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.
    Type: Application
    Filed: August 6, 2003
    Publication date: February 12, 2004
    Inventors: Boris Yokhin, Alexander Dikopoltsev, Isaac Mazor, David Berman