Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

Abstract: A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.

Abstract: Phenylurethane compounds formed by the reaction between a phenolic coupler compound and an organic isocyanate compound are utilized to form phenolic coupler compounds in situ in order to react with chromogenic compounds present in the sensitive layer of recording or reproducing materials.The phenolic coupler compounds can also be stabilized by blocking the phenolic hydroxyl with carbonate, an alkyl ether, organosilylated ether or organophosphoric acid ester, some of which are novel compounds. These stabilized derivatives of the stabilized phenolic coupler compound will decompose by application to sufficient thermal energy or suitable liquid or gaseous fluid to form the phenolic coupler compound in situ. The phenolic coupler compound is formed in situ by applying thermal energy to the sensitive layer or by applying to the sensitive layer a liquid or gaseous fluid which is able to decompose the stabilized phenolic coupler compound and release the phenolic coupler compound.

Abstract: A light-sensitive silver halide photographic material comprising a combination of a salt of tetrazolium containing only a non-metallic anion and a salt of tetrazolium containing a metallic anion.

Abstract: A two-component type diazo copying material according to this invention, which comprises a support and a photosensitive layer formed thereon, said layer consisting essentially of a diazo compound expressed by the following general formula I and a coupler mixture consisting of a compound expressed by the following formula II, a compound expressed by the following general formula III and a compound expressed by the following general formula IV, can form a genuine black-color image and is especially optimum for preparing a secondary original used in electrophotographic copying machines. General formula I ##STR1## (wherein R represents alkyl radical having 1 to 5 carbon atoms; R.sub.1 and R.sub.2 represent substituted or non-substituted alkyl radical, aralkyl radical or cycloalkyl radical, or R.sub.1 and R.sub.2 may form a heterocyclic ring together with the nitrogen atom to which they bond; and X represents anion.) ##STR2## (wherein X is of no account or represents O, S, SO or SO.sub.2.) ##STR3## [wherein R.sub.

Abstract: Imaging means, such as a tetrazolium salt, capable of reduction to form a visible image is present in a radiation-sensitive layer in combination with a photoreductant incorporating one or more labile hydrogen atoms and capable of producing a reducing agent precursor in radiation-struck areas of the layer. An image is produced in the layer by processing the layer after imagewise exposure to actinic radiation.

Abstract: A photosensitive composition containing the 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound represented by the following general formula: ##STR1## wherein X represents a chlorine atom or a bromine atom and A represents a phenyl group, a naphthyl group or a phenyl or naphthyl group substituted by a halogen atom, an alkyl group, an alkoxy group, a nitro group, a cyano group or a methylenedioxy group.

Abstract: A photochemical color-printing process for textile articles wherein a photosensitive triazene and azo dye coupling agent are applied to surface of textile article, the coated textile is exposed to light with a negative image, unreacted chemical products are removed by washing and rinsing the coated textile article after imaging, and then the coated textile article is dried.

Abstract: A positive-acting light-sensitive composition having excellent utility as a photoresist, comprising: (a) a crosslinked urethane resin formed by a catalyzed crosslinking of a non-heat reactive novalac phenolic resin and a polyisocyanate compound; (b) an epoxy resin having an epoxide equivalent weight of less than about 400 and a curing agent therefor; and (c) a positive-acting photosensitizer.Upon applying to a substrate and drying, the epoxy resin cures, resulting in a film useful as a photoresist or in the formation of lithographic printing plates.

Abstract: An image-forming element is disclosed comprised of a support and a coating thereon containing a cobalt(III)complex and a compound containing a conjugated .pi. bonding system capable of forming at least a bidentate chelate with cobalt(III). The coating is predominantly free of anions which will form conjugate acids by deprotonation of a cobalt(II)complex containing the chelating compound. In one preferred form the image-forming element is radiation-sensitive. In this form the image-forming element can contain a photoactivator capable of initiating reduction of the cobalt(III)complex. An imaging process is disclosed in which the coating is exposed to actinic radiation to produce an image. Images can be recorded directly within the image-forming coating or in a separate image-recording element or layer by use of the residual cobalt(III)complex or by use of one or more of the reaction products produced by exposure.

Abstract: Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds represented by the following general formula (I): ##STR1## wherein W represents a substituted or unsubstituted aryl group, X represents a hydrogen atom, an alkyl group or an aryl group, Y represents a fluorine atom, a chlorine atom or a bromine atom, and n represents an integer of 1 to 3.

Abstract: Novel azo(hydrazo)-anthraquinone compounds and their preparation are provided.These compounds are of the general formula ##STR1## where R is hydrogen or at least one substituent, T.sub.1 is hydrogen, an hydroxy or alkoxy group or an amino or substituted amino group, R.sub.1 is hydrogen or halogen, an alkoxy, an amino or substituted amino group, an aryl or substituted aryl group, or a group conferring solubility in water and R.sub.2 is a group which comprises an azo linkage and a ballasting group or is a group which completes the hydrazo link and which comprises a ballasting group. The new compounds are useful in the photographic field, especially in the photographic dye diffusion transfer process for the production of photographic images.

Abstract: Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.