Abstract: Provided is a substrate processing equipment having a blocking part capable of partially blocking heat transfer to the central region of a reaction space of a chamber to uniformly heat the reaction space. The equipment includes: a chamber; a substrate holding part disposed in the reaction space to hold and rotate a substrate; a first heating part disposed at a lower central region of the chamber to heat the central region of the reaction space; a second heating part disposed at a lower peripheral region of the chamber to heat a peripheral region of the reaction space; and a blocking part. The blocking part is disposed between the first and second heating parts, and a top portion thereof is extended toward the above of the second heating part to block transfer of heat generated by the second heating part to the central region of the reaction space.

Abstract: Embodiments of the invention include a load lock chamber, a processing system having a load lock chamber and a method for transferring substrates between atmospheric and vacuum environments. In one embodiment, the method includes maintaining a processed substrate within a transfer cavity formed in a chamber body for two venting cycles. In another embodiment, the method includes transferring a substrate from a transfer cavity to a heating cavity formed in the chamber body, and heating the substrate in the heating cavity. In another embodiment, a load lock chamber includes a chamber body having substrate support disposed in a transfer cavity. The substrate support is movable between a first elevation and a second elevation. A plurality of grooves are formed in at least one of a ceiling or floor of the transfer cavity and configured to receive at least a portion of the substrate support when located in the second elevation.

Abstract: The invention relates to a dental furnace wherein a firing chamber is heated up in a first heating-up period at a first heating-up rate of more than 50° K/min, in particular more than 100° K/min, which heats the furnace to at least 1000° C., in particular to 1100-1250° C. The first heating-up period is followed by an intermediate heating period, which is at least five minutes long, in particular at least ten minutes long, the gradient or heating-up rate of which is adapted to the material to be sintered in the dental furnace (10), and wherein this is followed by an end heating-up period (44) during which heating up is effected at a heating-up rate of more than 30° K/min, in particular approximately 50° K/min, and wherein during this the furnace temperature is held for at least five minutes, in particular for at least 25 minutes, above the temperature toward the end of the first heating-up period, and wherein forced cooling of the furnace (10) is performed after this.

Abstract: A dryer having a gas heater includes: a mixing pipe for mixing gas with air; and a flame holder installed on the mixing pipe, wherein the flame holder has a body placed opposite to a discharge port of the mixing pipe and formed with a through hole part, and a support extended from the body to be mounted to the mixing pipe; the support has a mounting part fastened to the mixing pipe and a fixing part connecting the mounting part and the body; and a width of the fixing part is narrower than a width of the mounting part.

Abstract: A display device for an appliance is shown. The display device comprises a touch screen interface and a multi-level menu having reconfigurable virtual buttons.

Abstract: The suction ports of a hot air blowing heater are arranged in a zigzag shape crossing the direction of travel of a printed circuit board, and hot air discharge nozzles project from inside or alongside the suction ports. Accordingly, in the reflow furnace according to the present invention, hot air discharged from the hot air discharge nozzles does not collide with hot air sucked into the suction ports, and turbulence does not take place.

Abstract: To provide a long-life refractory capable of maintaining durability under severe conditions. The castable refractory comprises a mixture containing at least one of 2 to 10 mass % of silicon carbide and 3 to 10 mass % of chamotte, as an auxiliary raw material, and a binder material, with the remaining balance being one or more main raw materials selected from corundum, mullite, bauxite, chamotte, talc and silica, and is used in an environment exposed to an alkali component-containing hot gas atmosphere. In an alkali component-containing gas atmosphere at a high temperature (750° C. or more), silicon carbide and/or chamotte are vitrified to a thickness of 1 mm or less in the surface layer of the refractory to prevent the alkali component-containing gas from intruding inside of the refractory.

Abstract: A portable kiln has a set of wheels, a handle and a platform base. The wheels and the handle are attached on a first side of the kiln so that the kiln can be tilted and rolled on the wheels using the handle. The platform base provides a spaced distance between the wheels and the floor when the kiln is sitting upright in an operational position. The kiln may also include a metal outer shell wrapped about an oven portion. The outer shell has a shell sidewall radially spaced from the oven portion sidewall, which forms an annular air channel between the outer shell sidewall and the oven portion. The outer shell has a C-shaped cross-section and it has upper and lower vent openings for the air channel. A hinge assembly allows a lid of the kiln to rest in an open position.

Abstract: The present invention provides a heating system, a heating method and a program, which can readily control processing temperature. A temperature calculating computer 4 of the heating system includes a device DB 42. The device DB 42 stores therein a temperature correcting table indicative of a relationship between an accumulated film thickness of extraneous matter attached to the interior of each heating apparatus and a temperature correcting amount, with respect to each heating apparatus, for each temperature (processing temperature) in the heating apparatus. Thus, the temperature correcting amount can be specified based on the temperature correcting table, the processing temperature and the accumulated film thickness, so that an optimized value can be calculated from the specified temperature correcting amount.

Abstract: The present application relates to an apparatus and method for non-contact collapsing of a porous material on a nonporous substrate.

Abstract: An oven for bonding adhesives to the back surface of a textile article includes a housing with a transport frame for passing the textile article through a curing chamber within the housing. The oven also has an air source and a duct system that delivers an airflow into a cool zone on the opposite, pile surface side of the textile article. The airflow has a lower temperature than the elevated temperature of the curing chamber and is supplied to the cool zone in sufficient amounts such that the pressure in the cool zone exceeds the ambient pressure in the curing chamber.

Abstract: A sintering apparatus for silver clay wherein a silver clay composition can be readily and easily sintered by exposing a silver clay composition obtained by molding to a flame of a solid alcohol fuel.

Abstract: A thermal processing apparatus for thermally processing a substrate in a processing chamber includes a heating plate for mounting and thermally processing the substrate thereon, and a lid body covering the heating plate from above to constitute a portion of the processing chamber. The lid body has a ceiling plate and a peripheral side portion vertically provided at a peripheral end portion of the ceiling plate. The ceiling plate is provided with a supply port for supplying a gas into the processing chamber, and a side portion of the ceiling plate is provided with a plurality of exhaust ports for exhausting the gas in the processing chamber. An exhaust pipe communicating with the exhaust ports and having an outlet at a point at equal distances from the exhaust ports is provided to be attachable and detachable to/from the lid body.

Abstract: An apparatus for subjecting a rare earth alloy block to a hydrogenation process includes a casing, gas inlet and outlet ports, a member arranged to produce a gaseous flow, and a windbreak plate. The casing defines an inner space for receiving a container. The container includes an upper opening and stores the rare earth alloy block therein. A hydrogen gas and an inert gas are introduced into the inner space through the gas inlet port, and are exhausted from the inner space through the gas outlet port. The gaseous flow is produced by a fan, for example, in the inner space. The windbreak plate is disposed upstream with respect to the gaseous flow that has been produced inside the inner space. Also, the windbreak plate reduces a flow rate of the gaseous flow that has been produced near the upper opening of the container.

Abstract: A high temperature resistive coating composition includes a pigmenting component, a binder component, and a hardening agent. The pigmenting component includes a spinel of the formula AB2O4, in which A is selected from the group consisting of Mg, Fe, Zn, Mn, Cu and Ni, or a combination thereof, and B is selected from the group consisting of Al, Fe and Cr, or a combination thereof. The binder component of the high temperature resistive coating is preferably a polysiloxane material, such as a silicon resin. Moreover, the hardening agent of the high temperature resistive coating includes a finely powdered material selected from the group consisting of diamond powder, BN, WC, SiC, Al2O3, AlN and SiO2. The resistive coating may be advantageously used for coating the interior of a self-cleaning oven, an oven rack, burner grates, and the like, particularly due to its ability to withstand high temperatures.

Abstract: A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

Abstract: The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which has been pressure-reduced to a predetermined degree of vacuum and the interior of which is heated to a predetermined process temperature, and a process gas is supplied into the reaction vessel via a gas feed passage to process the object.

Abstract: This is an electrically heated ceramic kiln and a method for varying the size of the kiln chamber by moveable top and/or bottom walls which can be moved vertically within the kiln chamber, together with a new method of insulating the kiln and providing captive air chambers about the kiln.

Abstract: A control device and method provides control of at least one operating feature of a cooking device in response to measured smoke and/or gas produced by item(s) being cooked. The device and method may control the temperature and cooking time of the device, and may also shut off the device or provide a fire alarm.

Abstract: A portable kiln has a set of wheels, a handle and a platform base. The wheels and the handle are attached on a first side of the kiln so that the kiln can be tilted and rolled on the wheels using the handle. The platform base provides a spaced distance between the wheels and the floor when the kiln is sitting upright in an operational position. The kiln may also include a metal outer shell wrapped about an oven portion. The outer shell has a shell sidewall radially spaced from the oven portion sidewall, which forms an annular air channel between the outer shell sidewall and the oven portion. The outer shell has a C-shaped cross-section and it has upper and lower vent openings for the air channel. A hinge assembly allows a lid of the kiln to rest in an open position.

Abstract: Process tubes of a fired process heaters are provided with a more equal heat flux distribution about an exterior circumferential surface region thereof. More specifically, according to the present invention, there is provided on at least one circumferential segment of the exterior circumferential surface region of the process tube, a coating of a material having a selected thermal emissivity and/or thermal conductivity which is different from the thermal emissivity and/or thermal conductivity of another circumferential segment of the exterior circumferential surface of the process tube. In such a manner, a more equal heat flux distribution about an entirety of the exterior circumferential surface region of the process tube is established as compared to the heat flux distribution thereabout in the absence of the coating.

Abstract: A kiln has a control box pivotably coupled to an oven portion via a hinge at a lower end of the control box so that the control box can pivot about the hinge from a closed position adjacent the oven portion to an open position where an upper end of the control box is separated from the oven portion. The control box houses electronic controller components. A chimney portion is attached to the oven portion and is separated from the upper end of the control box when the control box is in the open position. The control box pivots about the hinge along a generally horizontal axis. A linkage is coupled between the control box and the oven portion to limit the pivotal movement range of the control box at the open position.

Abstract: The quantity of supply heat of heated gas is controlled so that a supply heat quantity of the heated gas when no heat treatment of solder or the like is needed is made smaller than a supply heat quantity of the heated gas when heat treatment of solder or the like is needed, reducing consumption power when no heat treatment is needed for a board.

Abstract: An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while substrates in the stacked cell structures are being heated.

Abstract: Provided is a soaking apparatus to treat materials which require higher accuracy in soaking and improved cleanliness. The soaking apparatus to soak a material 12 to be treated is provided with a heat treatment apparatus 14 having walls, a ceiling and a floor, each of the walls, the ceiling and the floor of the heat treatment apparatus 14 being divided into a plurality of sections, a heater block mounted on each of the sections, a thermal sensor 11 mounted to the heater block, and a thermal controller 13 to control heating of the heater block based on a temperature measured by the thermal sensor 11.

Abstract: A heating oven for use in dynamo-electric machine component manufacture is provided. The oven uses forced air heating to raise the temperature of in-process component subassemblies to suitable process temperatures. The heating oven includes a rotating drum mounted in a cabinet. A number of open-ended tubular cradles are disposed in circular arrays between the drum faces. Batches of component subassemblies may be individually loaded into the cradles for heat treatment. Air flow channels are set up in the oven cabinet to evenly distribute heated air through individual cradles. Heated air after passing over the individual in-process subassemblies, exits the cradles through side slots in the cradle walls into the interior of the drum. The exiting air is reheated and recirculated through the heating oven.

Abstract: An improved self-cleaning oven (10) is provided having an assembly (12) to control the cleaning cycle time of the oven (10) depending upon the degree of oven contamination and soil present therein. The assembly (12) includes a measuring chamber (16) as well as a passageway (18) communicating the interior (14) of the oven (10) and the chamber (16). A smoke detector (32) (preferably an infrared smoke detector) is associated with the chamber (16) and is coupled with a controller (20) so as to measure a parameter of smoke passing through the chamber during at least a portion of the cleaning cycle. This parameter is then used to determine the proper duration of the cleaning cycle. In preferred forms, measuring chamber (16a) is equipped with an ambient air inlet (52) and outlet (54) so as to draw an ambient air stream through the chamber (16a) between the smoke detector (32) and the oven gas stream.

Abstract: This apparatus is a furnace for heating molten material which employs oxygen-fuel burner assemblies. Preferably, the assemblies are submerged in the molten material. They are water cooled top down units with burner nozzles being off-set from the supply column. The apparatus utilizes one or more burners for each top down supply column. The supply column and attached burners can be rotated or moved in a manner to avoid the open chimney effect seen with fixed air-fuel burners of the prior art. These burners with an off-set nozzle like the letter L are rotated at high speed or oscillated to distribute the combustion in the form of gas bubbles or a gas curtain. In another embodiment, the oxy-fuel burners are not submerged. The nozzles are aimed at unmelted batch or the upper surface of the molten material for controlled splashing.

Abstract: A control device and method provides control of at least one operating feature of a cooking device in response to measured smoke and/or gas produced by item(s) being cooked. The device and method may control the temperature and cooking time of the device, and may also shut off the device or provide a fire alarm.

Abstract: An improved self-cleaning oven (10) is provided having an assembly (12) to control the cleaning cycle time of the oven (10) depending upon the degree of oven contamination and soil present therein. The assembly (12) includes a measuring chamber (16) as well as a passageway (18) communicating the interior (14) of the oven (10) and the chamber (16). A smoke detector (32) (preferably an infrared smoke detector) is associated with the chamber (16) and is coupled with a controller (20) so as to measure a parameter of smoke passing through the chamber during at least a portion of the cleaning cycle. This parameter is then used to determine the proper duration of the cleaning cycle. In preferred forms, measuring chamber (16a) is equipped with an ambient air inlet (52) and outlet (54) so as to draw an ambient air stream through the chamber (16a) between the smoke detector (32) and the oven gas stream.

Abstract: The invention relates to a device (1) for producing bakery products (2). It has an oven (4) closed off by a door (5) and a heating device (7) which heats the oven (4). A delivery device (10, 31) is also provided for a fluid (11), along with a discharge element (12) arranged in the oven (4), a storage container (22) and a conveyor device (20) for the fluid (11). A sensor (8, 9) is arranged in the oven (4) for detecting at least one actual value for a temperature in the oven (4) and which is connected to a control device (16). The latter is also connected to the heating device (7), the delivery device (10, 31) for the fluid (11) and an energy source (21). At least one other sensor (8, 9) is provided in the oven (4) for detecting an actual value of the humidity and is connected, along with a clock timer (30), to the control device (16).

Abstract: A method is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The method includes loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock.

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E′ center as measured by means of an electron spin resonance analysis is 3×1019 cm−3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E′ center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

Abstract: A block assembly for a lehr includes a plurality of blocks extending longitudinally, each of the blocks having a seal surface for mating and overlapping with an adjacent one of the blocks.

Abstract: An improved self-cleaning oven (10) is provided having an assembly (12) to control the cleaning cycle time of the oven (10) depending upon the degree of oven contamination and soil present therein. The assembly (12) includes a measuring chamber (16) as well as a passageway (18) communicating the interior (14) of the oven (10) and the chamber (16). A smoke detector (32) (preferably an infrared smoke detector) is associated with the chamber (16) and is coupled with a controller (20) so as to measure a parameter of smoke passing through the chamber during at least a portion of the cleaning cycle. This parameter is then used to determine the proper duration of the cleaning cycle. In preferred forms, measuring chamber (16a) is equipped with an ambient air inlet (52) and outlet (54) so as to draw an ambient air stream through the chamber (16a) between the smoke detector (32) and the oven gas stream.

Abstract: A micromachined fluid handling device having improved properties. The valve is made of reinforced parylene. A heater heats a fluid to expand the fluid. The heater is formed on unsupported silicon nitride to reduce the power. The device can be used to form a valve or a pump. Another embodiment forms a composite silicone/parylene membrane. Another feature uses a valve seat that has concentric grooves for better sealing operation.

Abstract: A combustor system provides high temperature, high-dwell combustion of emission products, as from charcoal kilns, with inner and outer combustion chambers. Multiple inlets receive emission products from multiple heat exchangers omnidirectionally extending for continuous heat exchange connection between the combustor and emission sources. Hot products of combustion are delivered to each heat exchanger, each with multiple ducts in mutual heat exchange relationship including at least a hot products of combustion duct for receiving at the proximal end hot products of combustion from an outlet of the outer chamber, and conveying the hot products of combustion to the distal end at a respective emission source, an emissions inlet duct for receiving emission products at the distal end from the emission source, and a return products of combustion duct for receiving at the distal end the hot products of combustion and returning them to the combustor.

Abstract: The invention relates to a movable tunnel kiln for clay product manufacture and a production process system employing a tunnel kiln. Provided a kiln bottom of the tunnel kiln is fixed and takes a circular shape, the kiln body is circular and movable, road wheels moving on a circular railway are installed on both sides of the kiln body. A circular raw material aging pit concentric with kiln bottom is installed at the site inside the circular kiln bottom, and a complete brickmaking equipment is installed at the central part of the site. An operation mode of stationary bricks stack with movable kiln body is adopted in the invention, which changes the conventional operation of loading and unloading for the brick, and a plurality of cars with auxiliary facilities are cancelled, thereby greatly reduces the kiln construction cost.

Abstract: A method and apparatus for selectively providing convective heat to an object with a dual mode convection oven that is alternatively operable in either a running mode or a bypass mode. Convective heat is channelled into a supply hood through a supply duct. Convective heat is also channelled out of a suction hood through a return duct. An operating mode for the convection oven is selected. If the selected operating mode is the running mode, then convective heat is applied to the object by channelling the convective heat from the supply hood through a heat application zone and into the suction hood, the heat application zone being positioned between the supply hood and the suction hood.

Abstract: This apparatus is a furnace for heating molten material which employs oxygen-fuel burner assemblies. Preferably, the assemblies are submerged in the molten material. They are water cooled top down units with burner nozzles being off-set from the supply column. The apparatus utilizes one or more burners for each top down supply column. The supply column and attached burners can be rotated or moved in a manner to avoid the open chimney effect seen with fixed air-fuel burners of the prior art. These burners with an off-set nozzle like the letter L are rotated at high speed or oscillated to distribute the combustion in the form of gas bubbles or a gas curtain. In another embodiment, the oxy-fuel burners are not submerged. The nozzles are aimed at unmelted batch or the upper surface of the molten material for controlled splashing.

Abstract: An electrically heated furnace wherein electrical heating elements are mounted and supported so that they face the inner furnace walls and are isolated from direct communication with articles being treated within the furnace such that clean air flows over the heating elements providing oxygen to create an aluminum oxide coating on the heating elements and maintains a clean atmosphere about the heating elements. Air circulation from exterior the furnace is through ports in the furnace walls and over the electrical heating elements; exhaust from the furnace is through ports in the furnace walls into a plenum and out through a flue creating pressure differentials with the pressure in the furnace area where articles are being subjected to heat is lower than the atmosphere and the area in which the heating elements are located.

Abstract: In the heat treating method and the heat treatment apparatus of the object, the object is heat treated while it is being floated by gas expelled toward the object from a position below the object in the heating chamber.

Abstract: A semiconductor substrate processing system and method using a stable heating source with a large thermal mass relative to conventional lamp heated systems. The system dimensions and processing parameters are selected to provide a substantial heat flux to the wafer while minimizing heat loss to the surrounding environment (particularly from the edges of the heat source and wafer). The heat source provides a wafer temperature uniformity profile that has a low variance across temperature ranges at low pressures. A resistively heated block is substantially enclosed within an insulated vacuum cavity used to heat the wafer. Insulating walls comprising a reflective material, such as polished tungsten, encapsulated within an inert insulating material, such as quartz, may be used to provide insulation. The isothermal nature of the processing region may be enhanced by using multiple layers of insulating walls, actively heated insulating walls or a conductive gas to enhance heat transfer to the semiconductor substrate.

Abstract: Described is a heating apparatus which in case of need guarantees nonproblematic access to the objects to be heated, without incurring heat losses. Used in conjunction with lip rolling apparatuses, the heating apparatus features at least two movably arranged heating boxes (1) and (2), which via parallelogram linkages connected in swingable fashion to a stationary support element (13), such that in their inoperative position they are away from the object to be heated and have assumed closed position as well.

Abstract: A heat transfer method in a glass bending furnace, which has a top array of of successive heating sections (2) and under it a bottom array of successive cooling sections (3), and in which method glass sheets are conveyed on bending molds in mold carrying wagons on the top conveyor track from one heating section (2) to the next and on the bottom conveyor track from one section (3) to the next and the air heated by the bent hot glasses is sucked from cooling section (3) and blasted to the non-bent colder glasses in the heating sections (2). In order to intensify heat transfer, air sucked from the cooling section (3) is blasted as such, against the travel direction of the mold carrying wagons through the heating sections (2) to non-bent colder glass sheets in one of the heating sections (2) preceding the heating section (2) directly above the cooling section (3) from which the heated air is drawn as viewed in a direction of travel of the mold carrying wagons through the heating sections (2).

Abstract: A Si/SiC-based sintered material containing Si and SiC as constituents, which has a SiO.sub.2 content of 0.5% by weight or less and an oxygen content of 0.25% by weight or less and which is corrosion-resistant in a high-temperature atmosphere containing an element having a high ionic-bond formability. A kiln furniture made of the sintered material. The sintered material and the kiln furniture have high corrosion resistance in a high-temperature environment containing, as a corrosion source, an element having a high ionic-bond formability and can withstand long-term use.

Abstract: A portable oven for simultaneous preparation of multiple floor tiles, providing an efficient means to heat the tiles so they are soft and can be cut to fit the area to be tiled, and preferably providing means to measure and cut the heated tiles.

Abstract: A combustion system for use in the steckel mill provides for the controlled mixing of combustible fluids to each furnace incorporated in the steckel mill while also harnessing at least a portion of the heat developed during the operation of the mill to increase the overall operation efficiency of the steckel mill. The invention also contemplates enhancing the manner in which combustion products are drawn from the furnaces which also aids in recovering heat developed during the operation of the steckel mill as well as improving the operation of the overall combustion system. These features are obtained by providing a supply system for the air or other combustible gas delivered to each of the steckel mill coil furnaces and to direct at least a portion of the flow of this combustion gas through at least one recuperator that is in-line with an exhaust duct associated with the steckel mill.

Abstract: A ceramic heater composed of a ceramic substrate and a resistant heating element embedded within the ceramic substrate along a predetermined planar pattern is obtained by holding a convolution of a spiral-coiled high melting metallic filament in the above predetermined planar pattern and heat-treating the convolution at a temperature not higher than a primary recrystallization commencement temperature of the high melting metal under a non-oxidative atmosphere to provide the resistant heating element, embedding the resulting resistant heating element within a ceramic shaped body, and then, sintering the ceramic shaped body.

Abstract: The present invention relates to a smoke and heat source recycling device for a tunnel kiln in order to prevent smoke pollution. It has an exhaust fan in the preheating zone, the exhaust fan absorbing heat from the preheating zone and delivering such heat to a heat energy adjustment zone and waste gas treatment system for treating pollutants such as coal dust. Heat in the dry zone is delivered into the exhaust duct through an exhaust collector. A and pollution controller detects the pollution and enters signal into an electronic control to control gates for exhaust gas to enter either a gas treatment system or to be emitted into the air through the chimney.