Abstract: A photosensitive element is provided by an actinic radiation-transmissive film-forming polymeric material which contains photolabile blocked surfactant capable upon exposure to actinic radiation of releasing a detectable quantity of surfactant in actinic radiation exposed areas in areas not exposed to actinic radiation and unblocked surfactant in an image-wise pattern in the actinic radiation exposed areas. An imaging process is also provided comprising providing the actinic radiation-sensitive element and exposing the actinic radiation-sensitive element to actinic radiation in an image-wise pattern at an intensity and for a time sufficient to release an image-wise pattern of released surfactant in the exposed area.

Abstract: Plasma etch durability of polymeric resists used in electron beam lithography is improved by vapor phase impregnation with an aromatic compound after development of an image. The aromatic compound should possess a polarity similar to the polymeric resist and should be relatively volatile to facilitate vapor phase diffusion.

Abstract: Polymers having excellent adherence to film supports such as cellulose acetate are disclosed. The polymers comprise random recurring units having the structure--A).sub.w, --B).sub.x, --C).sub.y and --D).sub.zwherein;A represents polymerized vinyl acetate;B represents a polymerized acrylate or methacrylate monomer capable of copolymerization with vinyl acetate;C represents a polymerized monomer selected from the group consisting of methacrylic acid, itaconic acid and vinylbenzoic acid;D represents a polymerized cationically charged copolymerizable monomer;w represents from 20 to 85 weight percent;x represents from 5 to 65 weight percent;y represents from 5 to 50 weight percent and;z represents from 0 to 15 weight percent.

Abstract: A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method, has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.

Abstract: In a photopolymerizable composition comprising, as essential components, (A) a compound having at least one ethylenically unsaturated double bond capable of undergoing addition polymerization and (B) a photopolymerization initiator, the improvement which comprises that the photopolymerization initiator comprising a combination of (a) a 5-[(arenooxazol-2-ylidene)ethylidene]-2-thiohydantoin compound represented by the general formula (I) (a 5-[(substituted benzoxazol-2'-ylidene)ethylidene]-2-thiohydantoin compound) or (II) (a 5-[substituted naphthol(1,2-D)oxazol-2-ylidene)ethylidene]-2-thiohydantoin compound) and (b) a 2,4,6-substituted-1,3,5-triazine compound represented by the formula (III): ##STR1## wherein X represents a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxy group, an aryl group, a substituted aryl group, an aryloxy group, an aralkyl group or a halogen atom; R.sup.1, R.sup.2 and R.sup.

Abstract: A high pressure mercury arc lamp such as the light source in a projection aligner is utilized in a photo resist calibrating process. The light source is utilized with narrow band interference filters centered on the mercury emission lines to isolate exposures to one narrow band of wave length at a time. The assumption is made (incorrectly) that the energy in each band of wave lengths from the high pressure mercury arc lamp is equal. Exposure to a narrow strip of photo resist--preferably in the form of a bar graph--on a semi-conductor wafer is made. A single wave length band is exposed for each bar of the graph. As each bar of the graph is scanned, exposure is varied in known ways (eg. linearly variable neutral density filters, changing apertures size, and/or varying exposure from changing wafer motion). The wafer is then developed and examined to determine the ratio of sensitivity for each wave length. A light meter is then placed in and exposed to the same high pressure mercury arc lamp.

Abstract: A method of fabricating a negative electron resist pattern for microcircuit is disclosed which combines electron beam resist exposure with dry plasma etch developing. The technique utilizes a coating of a barrier polymer over the negative electron resist film prior to exposure to the electron beam film to prevent vacuum sublimation of the constituents of the negative electron resist film.

Abstract: In a photolithographic method for the manufacture of integrated circuits a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Abstract: Lithographic printing plates are made by exposing to actinic light a lithographic plate having a water soluble light sensitive layer thereon and a coating of a solvent soluble, UV curable material thereover to form an image in the light sensitive layer and adhere said layer to the overlying UV curable material. The plate is developed with water to remove light sensitive layer and overlying UV curable material in the non-image areas, and the plate is exposed to UV source having an intensity greater than the imaging light to form a press-ready plate having a durable, reinforced cured image thereon.

Abstract: Photosensitive compositions containing nitrate ester chain polymers, such as nitrocellulose, molecularly intimately admixed with at least one compound having a free basic amine group, preferably a primary amine group, directly attached to an aromatic ring carbon. On suitable exposure to ultraviolet light, such compositions will print out a useful image directly, or, should a much lesser light exposure be preferred, they can be developed and fixed to an image intensified to useful strength by either heat alone, for amines that are sufficiently volatile at ingredient reaction temperatures, or by solvent selective removal of ingredients from unexposed areas, and subsequently intensified either by heat or overall ultraviolet exposure. Exposed areas of such compositions are more resistant both to volatilization of the amines and to solvent removal than the non-exposed areas. High optical density is attainable using very thin coatings, permitting high resolution grainless images.

Abstract: The production of polymeric bodies having included, isolated areas of fine metal or metal oxide particles dispersed therein by mixing a metal compound with a polymer, converting the resulting mixture to a desired shape and irradiating selected areas of the shape with laser light to decompose the metal compound in the irradiated areas.

Abstract: A method of recording images on a radiation sensitive material comprising forming a layer of a radiation sensitive material comprised of a heterogeneous mixture of substances. At least one of the substances of the heterogeneous mixture serves as a binder capable of converting its states of aggregation in the mixture under the action of the intrinsic or reflected radiation obtainable from the object being recorded. Another substance of the heterogeneous mixture, in the form of particles, is capable of interacting with a force field. The layer is introduced in a force field and an image of the object being recorded is projeced on that layer. The produced image is fixed by converting the state of aggregation of the heterogeneous mixture. The proposed method makes it possible to record images in any spectral range of the intrinsic and reflected radiation of the object. Images of any objects can be recorded on that layer containing no silver halides.

Abstract: Photoactive, thermally coalescible resin plastisol dispersions comprising a polyvinyl chloride polymer having attached to the polymer backbone photopolymerizable or photocrosslinkable groups dispersed in a liquid plasticizer medium, and a photoinitiator which is either a separate component or a photoactive substituent present on the polymer backbone. The photoactive plastisols, in element form, can be used in an image formation process that is a positive working washout or negative toned imaging system.

Abstract: The present invention relates to a photoimaging process whereby a polymeric film containing sulfide functionality is selectively exposed to incident radiation in the presence of oxygen and a photosensitizer so that the sulfur functionality is photooxidized to produce a latent image which may then be developed. Polymeric films containing photooxidizable organic sulfide functionality and preferably additional carbon-carbon double bond unsaturation, which are capable of being used in the foregoing process are also included within the scope of the present invention.

Abstract: The present invention relates to a photoimaging process whereby a polymeric film containing sulfide functionality is selectively exposed to incident radiation in the presence of oxygen and a photosensitizer so that the sulfur functionality is photooxidized to produce a latent image which may then be developed. Polymeric films containing photooxidizable organic sulfide functionality and preferably additional carbon-carbon double bond unsaturation, which are capable of being used in the foregoing process are also included within the scope of the present invention.

Abstract: This invention relates to a process for forming photo-polymerized images in light sensitive layers containing an activated component, a light sensitive resin and a colorable or decolorable component. Upon exposure to activating radiation the colored component is decolored or the decolorable component is colored and the energy involved is transferred to the light sensitive resin for polymerization.

Abstract: An original pattern plate obtained by the use of a photo-sensitive resin composition comprising:(A) an unsaturated polyester having an acid value of from 10 to 40 and having not less than 50% by mole of unsaturated acids in the acid component,(B) a photo-polymerizable, ethylenically unsaturated compound which essentially contains a compound having a photo-polymerizable, ethylenically unsaturated linkage and at least one hydroxyl group,(C) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6)(CH.sub.2 OH).sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m+n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4,(D) a photo-polymerization initiator, and(E) a thermal polymerization inhibitor,the weight proportion of the components (A), (B) and (C) satisfying the relationships of the following equations: 1/5.ltoreq.B/(A+B).ltoreq.3/5 and 1/50.ltoreq.C/(A+B+C).ltoreq.

Abstract: A novel dispersion imaging material comprising a substrate, a sublayer thereon comprising at least 70% by weight of a member selected from palladium, gold, germanium and combinations thereof and having a thickness of 5 A to 200 A, and a main imaging layer on said sublayer comprising at least 50% by weight of tin, and optionally as the outermost layer a protective layer comprising an organic polymer. The sublayer modifies the layer structure of the tin-based main imaging layer. The imaging material has a high safety in respect of toxicity as well as an excellent gradation and a high sensitivity. The imaging material can form thereon an image by a dry process even in a light room without the conventional development and fixation steps.

Abstract: A dry process high sensitivity imaging film includes a solid, high optical density and substantially opaque film of dispersion imaging material deposited on a substrate. The film of dispersion imaging material comprises a plurality of separate layers of different and substantially mutually insoluble metal components having relatively high melting points and relatively low melting point eutectics, and interfaces between said layers having relatively low melting points.

Abstract: After exposure to radiation photoresist may be developed by a dry process using a gas plasma, preferably an oxygen plasma. The process can be used for chemical milling, photolithography, printed circuit board and photomask manufacture and it is particularly advantageous in the manufacture of semiconductors. The plasma development process can be followed by plasma etch and strip processes without requiring removal of the work piece from the plasma reactor.

Abstract: Certain polyacetylenes exhibit reversible color changes at transition temperatures in the range -180.degree. to 220.degree. C., wherein the thermochromic cycles can be repeated many times with no apparent degradation and little change in spectroscopic properties.These thermochromic polyacetylenes are useful in temperature-indicator and indicia-display device applications.A process for laser-beam recording of images is described employing a thermochromic polyacetylene, in which the hysteresis properties of the polyacetylene can be suitably altered allowing for selectively storing or erasing the formed image.

Abstract: Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.