Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance, (2) energybeam sensitive cation polimerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.

Abstract: A liquid, radiation-curable composition which in addition to a liquid, free-radically polymerizable component comprises at least the following additional components: (A) from 40 to 80 percent by weight of a liquid difunctional or more highly functional epoxy resin or of a liquid mixture consisting of difunctional or more highly functional epoxy resins; (B) from 0.1 to 10 percent by weight of a cationic photoinitiator or of a mixture of cationic photoinitiators; and (C) from 0.

Abstract: The quantity of the matting agent which is applied on a portion of the moving web of continuous photosensitive printing plate to be wound in an inner half of a roll is between 1.1 and 2.0 times as much as the quantity of the matting agent which is applied on a portion of the web to be wound in an outer half of the roll. Thereby, the mat layer is formed thick on the portion of the web to be wound in the inner part of the roll. Thus, the mat layer can withstand the pressure which is generated at the inner part, and it is possible to prevent the mat layer from being flattened during the winding.

Abstract: Irradiating, with ultraviolet light, surfaces which contain thiol groups, epoxy groups, or vicinal diol groups, results in surfaces which exhibit a reduced adsorption of biomolecules. In the case of surfaces having thiol groups such irradiation also results in a reduced capacity for the bonding of heterobifunctional crosslinking reagents. Such irradiation may be carried out in a patternwise fashion to obtain patterned surfaces.

Abstract: The present invention is for an image processing apparatus (10) for a method of exposing imagesetter recording film (42) on a color-proofing apparatus. The method comprises the steps of loading a sheet of dye collection support (45) on a vacuum imaging drum (300) and loading a first sheet of imagesetter recording film in registration with the dye collection support. The first sheet of imagesetter recording film is loaded dye side down. An intended image is formed on the first sheet of imagesetter recording film by removing dye from the first sheet of imagesetter recording film which is collected on the dye collection support. Additional sheets of imagesetter recording film and other embodiments are prepared in a similar manner. In a further embodiment, the dye collection support is removed from the vacuum imaging drum as each sheet of imagesetter recording film is removed to provide a blue line image.

Abstract: The present invention relates to the field of optical recording materials, in particular, fluorescent compounds and matrices suitable for use in optical memory systems, including three dimensional optical memory systems for READ ONLY MEMORY (ROM). More particularly, nonfluorescent peri-phenoxiderivatives of polycyclic quinones are transformed into fluorescent aminoderivatives of anaquinones.

Abstract: A method of producing a three-dimensional object having selected elements which are colored differently than other elements of the object comprising the steps of:(a) providing a film of a photohardenable composition containing a photoresponsive agent,(b) radiating the film in a cross-sectional pattern of the object to be formed,(c) selectively irradiating one or more portions of the cross-sectional pattern corresponding to the selected elements which are desired to be colored differently with radiation which activates the photoresponsive agent, the photoresponsive agent thereby producing color in or removing color from the selected irradiated portions of the cross-sectional pattern,(d) repeating steps a, b, and c to form successive adjacent cross-sectional pattern of the object, and(e) integrating the cross-sectional patterns together to provide the three-dimensional object, wherein the curing and coloring steps are conducted using actinic radiation.

Abstract: Photocurable resin compositions capable of producing plastic molds with improved durability by stereolithography in the presence of a photoinitiator includes unsaturated urethane of a specified kind, vinyl monomer of a specified kind, a filler and salt of phosphoric acid ester of specified kinds at a specified ratio.

Abstract: A process for obtaining a lift-off imaging profile which comprises the steps of:a) providing a first layer of plasma etchable material wherein said material has a film thickness less than about 0.5 .mu.m (micrometer);b) providing a second layer comprising a photoimageable material on top of the first layer;c) forming a pattern in said second layer which comprises the steps of selectively exposing and developing the second layer;d) reacting the second layer with an organosilicon material; ande) etching the first layer isotropically in an oxygen atmosphere.

Abstract: An optical recording medium comprising a substrate having a pre-groove for focusing and tracking servo operation, and a recording film formed on the substrate, the recording film having optical properties which change in response to the application of at least one of a light beam or heat to a portion of the recording film.

Abstract: The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

Abstract: A process for the preparation of a radiation-curable acrylate composition, wherein to compounds A containing at least 2 acrylic groups there are added benzophenone derivatives which are not copolymerizable by free-radical copolymerization and which contain at least one primary or secondary amino group or a hydroxyl group or a mercapto group.

Abstract: According to the present invention, a method for producing a chemically adsorbed film is provided. The method includes the steps of: irradiating a surface of a polymer substrate with ultraviolet laser light so as to produce a hydrophilic group on the surface of the polymer substrate; and contacting a chemical adsorption solution containing a chlorosilane-based chemical adsorbent and a nonaqueous solvent and the polymer substrate on which the hydrophilic group is produced; and reacting the hydrophilic group of the polymer substrate with a chlorosilyl group of the chlorosilane-based chemical adsorbent for forming a covalent bond, thereby forming a chemically adsorbed film on the surface of the polymer substrate.

Abstract: A lithography process which utilizes metastable atoms for resist exposure is disclosed. Metastable rare gas atoms, instead of photons, electrons or ions, are directed at the surface of a lithographic resist. On impact, the metastable atoms release up to 20 eV of energy per atom in the form of secondary electrons. These secondary electrons alter chemical bonds in the resist, causing it to become either soluble or insoluble in an appropriate developer solution. The metastable rare gas atoms can further be manipulated with the new techniques of atom optics to focus them, improve their collimation and intensity, or modulate them.

Abstract: A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: An irradiation method of applying a light spot or a light pattern to an object with high resolution is performed by disposing, in close vicinity to the object, a light-absorbing contrast-increasing layer whose transmittance or reflectivity with respect to an incident light thereto increases as the intensity of the incident light or the exposure thereof to the incident light increases; and applying light to the object through the light-absorbing contrast-increasing layer. This method is applied to an optical information recording and reproducing method using an optical information recording medium including an optical information recording layer and an auxiliary layer whose transmittance or reflectance increases in a real time manner correspondingly to the energy of an incident light thereto.

Abstract: Storage, retrieval and erasure of optical information in bacteriorhodopsin (bR) films by alteration of the bR's absorption spectrum by photo-induction and by application and switching of an electrical field.

Abstract: The invention relates to a process for stabilizing a liquid radiation-curable composition comprising a cationically polymerizable compound and a photoinitiator for cationic polymerization against premature commencement of the polymerization, in which a basic ion exchanger is brought into contact with the composition, at least for a certain time. The ion exchanger is preferably removed before commencement of the radiation curing, at least from the part of the radiation-sensitive composition which comes into contact with the radiation. The process is particularly suitable for stabilizing stereolithography baths in extended use against an undesired increase in viscosity.

Abstract: The invention relates to compounds having at least one vinyl ether group which also contain in the molecule at least one further functional group selected from acrylate, methacrylate, epoxy, alkenyl, cycloalkenyl and vinylaryl groups, to compositions, especially for stereolithography, comprising those vinyl ether compounds, and to a method of producing three-dimensional objects using those compositions.

Abstract: An ablative recording element comprising a support having thereon, in order, a barrier layer and a colorant layer comprising a colorant dispersed in a polymeric binder, the colorant layer having an infrared-absorbing material associated therewith, and wherein the barrier layer contains polymeric beads.

Abstract: Mask patterns and their exposure times are stored in a memory within a controller. The controller transfers the mask pattern to a memory in the liquid crystal controller. The mask pattern stored in the memory is displayed on the matrix liquid crystal display element. The controller transfers the next mask pattern to memory after the elapse of exposure time. By this exposure apparatus, a plurality of mask patterns is exposed on a photosensitive material. The exposure time of each portion of the photosensitive material is adjusted in three or more grades by exposing a plurality of mask patterns sequentially. If the photosensitive material is positive, the film thickness becomes low in a portion which has a long exposure time and high in a portion which has a short exposure time. A combination of a plurality of mask patterns enables the section of the photosensitive material to be formed into a desired shape.

Abstract: A laser-exposed thermal recording element comprising a support having thereon a pigment layer comprising a pigment dispersed in a polymeric binder, the pigment absorbing at the wavelength of a laser used to expose the element, wherein the pigment comprises the formula:M.sub.x A.sub.y Q.sub.zwherein:M is at least one metal atom,A is at least one alkali metal,Q is at least one of oxygen or sulfur,x is an integer between 1 and 3,y is between 0 and about 2, andz is between about 1 and about 4.

Abstract: A photohardenable composition especially suitable for use in solid imaging. The compositions are characterized by their improved photospeed in combined with excellent initial green strength. The compositions allows for the production of articles by solid imaging processing techniques that show little or no distortion, high accuracy, excellent clarity. The compositions are low in toxicity and have low sensitivity to water.

Abstract: The invention relates to compounds having at least one vinyl ether group which also contain in the molecule at least one further functional group selected from acrylate, methacrylate, epoxy, alkenyl, cycloalkenyl and vinylaryl groups, to compositions, especially for stereolithography, comprising those vinyl ether compounds, and to a method of producing three-dimensional objects using those compositions.

Abstract: A photosensitive recording material comprising a solvent-soluble, thermosetting epoxy oligomer capable of cationic polymerization, an aliphatic monomer having at least one ethylenically unsaturated bond, the monomer being liquid at normal temperature and pressure, having a boiling point of 100.degree. C. or above at normal pressure and being capable of radical polymerization, a photoinitiator selected from the group consisting of i) a first photoinitiator capable of simultaneously generating a radical species that activates radical polymerization and a Br.o slashed.nsted acid or Lewis acid that activates cationic polymerization, upon exposure to actinic radiation, and ii) a second photoinitiator comprised of a radical polymerization photoinitiator capable of generating a radical species that activates radical polymerization upon exposure to actinic radiation and a cationic polymerization photoinitiator capable of generating a Br.o slashed.

Abstract: A data storage process which includes an erasable high speed, high density, storage medium having a transition metal oxide layer where said oxide layer is capable of undergoing an optically readable chemical change when simultaneously exposed to heat and to light of a selected wavelength. An optically readable image is formed in selected regions of the oxide layer under ambient conditions which include O.sub.2 by simultaneously exposing said layer to heat and to radiation in the blue-green or shorter wavelength spectrum. The image is erased by heating the entire medium using a furnace or by heating selected portions with IR radiation.

Abstract: A method for producing a three-dimensional object having selected elements which are colored differently than other elements of the object comprising the steps of: (a) providing a film of a photohardenable composition containing a photoresponsive agent; (b) irradiating the film in a cross-sectional pattern of the object to be formed; (c) selectively irradiating one or more portions of the cross-sectional pattern corresponding to the selected elements which are desired to be colored differently with radiation which activates the photoresponsive agent, the photoresponsive agent thereby producing color in or removing color from the selected irradiated portions of the cross-sectional pattern; (d) repeating the steps a, b and c to form successive adjacent cross-sectional patterns of the object; and (e) integrating the cross-sectional patterns together to provide the object.

Abstract: A lithographic printing plate is comprised of a support having a porous hydrophilic surface, such as grained and anodized aluminum, and an oleophilic imaging layer overlying the porous hydrophilic surface. The imaging layer is comprised of an oleophilic, radiation-absorbing, heat-sensitive, film-forming composition which is readily removable from the porous hydrophilic surface prior to imagewise exposure and which is adapted to form a lithographic printing surface as a result of imagewise exposure to absorbable electromagnetic radiation and subsequent removal of the non-exposed areas to reveal the underlying porous hydrophilic surface. Examples of suitable techniques for removing the non-exposed areas include contact with printing ink on the press, removal by lamination and peel development steps and removal by use of an integral stripping layer.

Abstract: A radiation-curable prepolymer of a polyurethane endtipped with an hydroxy (acrylate or methacrylate) is disclosed. The polyurethane is derived from the reaction of a polyfunctional isocyanate with a hydrolyzable oligomer of an anhydrous cyclic ester of an hydroxy acid. Crosslinked polymers prepared by irradiating the prepolymers are also disclosed. The crosslinked polymers are bioabsorbable and biocompatible with bodily tissue, yet still maintain the outstanding mechanical properties one would expect from a polyurethane. The prepolymers and crosslinked polymers are especially well-suited for the fabrication of surgical devices, particularly wound closure devices such as surgical staples and clips, in a stereolithography apparatus.

Abstract: The present invention discloses stabilizers for formulations containing photoacid precursors and cationically polymerizable materials. The stabilizers have a limited solubility in the formulations and are in solubility equilibrium in the formulation. The stabilizers being present as a solid phase in the formulation in excess of their solubility limit, the concentration of the stabilizers is continuously replenished as the stabilizer reacts with undesired free acid.

Abstract: Simple and cost-effective methods for forming tall, high-aspect ratio structures in a material layer comprising a first layer of a image-reversal-type photo-sensitive material and a second layer of a positive-type photo-sensitive material is disclosed. The layers are formed, exposed to actinic radiation, and developed such that the formation, exposure, and development of the second layer does not substantially modify or destroy the patterns formed in the first layer. In one embodiment, the first layer is exposed to actinic radiation through a first mask comprising the complimentary image, or negative, of a desired high-aspect ratio structure. The image in the first layer is then reversed by heating to an elevated temperature and subsequently blank flood exposure of actinic radiation. A second layer of a positive type photo-sensitive material chemically compatible with the IRP layer is then formed over the first layer.

Abstract: A three-dimensional object is constituted by successive solid layers each formed by selectively exposing an unexposed layer of a photohardenable composition to actinic radiation. The unexposed layer of the photohardenable composition is formed on the flexible sheet belt. The flexible sheet belt is brought into close and parallel relationship with a flat support surface of a base plate member facing downwardly, thereby laminating the unexposed layer of the photohardenable composition to the flat support surface of the base plate member of the solid layer previously formed. A positioning plate member is positioned in such a manner that the positioning plate member faces the base plate member through the flexible sheet belt and is brought into contact with the flexible sheet belt, so that the unexposed layer of the photohardenable composition is supported and positioned by the positioning plate member through the flexible sheet belt.

Abstract: A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: A process for producing an image uses an imaging medium comprising an acid-generating layer or phase comprising a mixture of a superacid precursor, a sensitizing dye and a secondary acid generator, and a color-change layer comprising an image dye. The sensitizing dye has first and second forms, the first form having substantially greater substantial absorption in a first wavelength range than the second form. The superacid precursor is capable of being decomposed to produce superacid by radiation in a second wavelength range, but is not, in the absence of the sensitizing dye, capable of being decomposed by radiation in the first wavelength range. The secondary acid generator is capable of acid-catalyzed thermal decomposition by unbuffered superacid to form a secondary acid.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains radically polymerizable groups, and at least one photoinitiator suitable for the polymerization, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulae ##STR1## wherein: R.sup.1 is a hydrogen atom or a C.sub.1 -C.sub.8 alkyl group;R.sup.2 is a methyl or phenyl group;[T] is a polysiloxane group [PS] terminated as described in the specification in more detail;[PS] is the group of formula ##STR2## and [Alk] is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.

Abstract: In a method and apparatus for forming a resin article by forming a film of photosetting resin liquid on a surface of a workpiece, the workpiece is held in a direction to keep its axis approximately in a horizontal posture. The workpiece is rotated about the axis to thereby form the film of the resin liquid on the surface of the workpiece. The laser beam supplied from above the workpiece is emitted toward the film. At least one of the workpiece and the laser beam is relatively moved continuously or intermittently along the axis.

Abstract: Novel (cyclo)aliphatic epoxy compounds that contain at least one acrylate group in the molecule and at least one cycloaliphatic epoxy group can be used for the production of coating formulations, adhesives, photoresists or in stereolithography. As they contain a cohesive homogeneous network, the three-dimensional objects produced have very good green strength and very good strength properties.

Abstract: A molecularly imprinted substrate and sensors employing the imprinted substrate for detecting the presence or absence of analytes are described. One embodiment of the invention comprises first forming a solution comprising a solvent and (a) a polymeric material capable of undergoing an addition reaction with a nitrene, (b) a crosslinking agent (c) a functionalizing monomer and (d) an imprinting molecule. A silicon wafer is spincoated with the solution. The solvent is evaporated to form a film on the silicon wafer. The film is exposed to an energy source to crosslink the substrate, and the imprinting molecule is then extracted from the film. The invention can be used to detect an analyte by forming films which are then exposed to a reaction energy to form a crosslinked substrate. The imprinting molecules are extracted from the crosslinked substrate. The film is exposed to one or more of the imprinting molecules for a period of time sufficient to couple the imprinting molecules to the film.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains a 2-hydroxybenzophenone UV-absorbing dye.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains a benzotriazole UV-absorbing dye.

Abstract: A laser recording element comprising a base having thereon a dye layer comprising an image dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith, the base comprising a composite film laminated to at least one side of a support, the dye layer being on the composite film side of the base, and the composite film comprising a microvoided thermoplastic core layer and at least one substantially void-free thermoplastic surface layer.

Abstract: A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.

Abstract: Acid can be generated by exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor and heating the superacid in admixture with a secondary acid generator capable of undergoing thermal decomposition to produce a secondary acid. The superacid catalyzes decomposition of the secondary acid generator, thus increasing the quantity of strong acid present in the medium. The resultant secondary acid can be used to effect a color change in an acid-sensitive material, so providing an imaging process.

Abstract: A laser dye-ablative recording element comprising a support having on one side thereof a dye layer comprising an image dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith to absorb at a given wavelength of the laser used to expose the element, the image dye being substantially transparent in the infrared region of the electromagnetic spectrum and absorbing in the region of from about 300 to about 700 nm and not having substantial absorption at the wavelength of the laser used to expose the element, and the other side of the support having thereon a conductive backing layer of resistivity <5.times.10.sup.12 .OMEGA./.quadrature..

Abstract: Disclosed is a method for developing a silver halide photographic light-sensitive material with a developer having a pH within the range of 9.5 to 10.7 through an automatic processor, wherein said silver halide photographic light-sensitive material comprises a support and thereon, at least one silver halide emulsion layer comprising silver halide grains containing at least 60 mol % of silver chloride, comprising the steps of:replenishing a first developer replenishing-solution having lower activity than a starter for a developer; andreplenishing a second developer replenishing-solution having the substantially same activity as said starter for a developer.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains an oxalanilide UV-absorbing dye.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chips and to the improvement of a mask used in its manufacturing process. In other words, the phase of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern, or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.