Abstract: Bisacylphosphine sulfides of formula I ##STR1## wherein R.sub.1 is unsubstituted C.sub.1 -C.sub.18 or C.sub.1 -C.sub.8 alkyl which is substituted by phenyl, --CN, C.sub.1 -C.sub.12 alkoxy or halogen, C.sub.2 -C.sub.18 alkenyl, unsubstituted C.sub.5 -C.sub.8 cycloalkyl or C.sub.5 -C.sub.8 cycloalkyl which is substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy or halogen, unsubstituted C.sub.6 -C.sub.12 aryl or C.sub.6 -C.sub.12 aryl which is substituted by halogen, C.sub.1 -C.sub.12 alkyl or C.sub.1 -C.sub.12 alkoxy, or a 5- or 6-membered aromatic heterocyclic radical which contains oxygen, sulfur and/or nitrogen and is unsubstituted or substituted by halogen, C.sub.1 -C.sub.4 alkyl or C.sub.1 -C.sub.4 alkoxy, andR.sub.2 and R.sub.3 are each independently of the other unsubstituted C.sub.1 -C.sub.18 alkyl or C.sub.1 -C.sub.8 alkyl which is substituted by phenyl, halogen or C.sub.1 -C.sub.12 alkoxy, C.sub.2 -C.sub.6 alkenyl, unsubstituted C.sub.5 -C.sub.8 cycloalkyl or C.sub.5 -C.sub.

Abstract: Uncured emulsion is effectively washed from a stencil in the production of photomasks by mounting a drum rotatable about a horizontal axis within a portable cabinet. The drum is driven by a small (e.g. variable speed 1/16 HP) electric motor and spins at about 50-100 rpm. Water is sprayed onto the stencil mounted on the drum at about 80 psi by 4-10 V-jet nozzles. Liquid running off the stencil is collected by a catch basin mounted just below the drum, and passes through a drain pipe with strainer into a heat insulated holding tank with an electric resistance heating element, and is recirculated from the tank to the spray nozzles-by a high pressure pump. The pump and motor are controlled by a timer, and after completion of the washing cycle the stencil is removed from the cabinet.

Abstract: A method is provided for exposing a semiconductor device pattern onto a semiconductor substrate by repeatedly exposing an adjoining arrangement of a plurality of unit patterns. The device pattern is first divided into a plurality of unit patterns. Then, a stencil mask is provided with transmitting openings having shapes conforming to the respective unit patterns. Pattern lines on the stencil mask of the unit patterns which are to be connected with each other have at least one connecting end provided with at least one protrusion having a width less than that of the corresponding pattern lines. The protrusion on the connecting end reduces errors such as interruptions or excessive broadening in an exposed pattern line due to misalignment. Also disclosed is a stencil mask for carrying out the present inventive method.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chips and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern, or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: An exposure mask for lithography, a method of manufacturing the same, and an exposure method using the same are disclosed. A light-transmitting opening of the exposure mask has a main light-transmitting region located in the middle of the opening and having a first optical path length, and phase shift regions adjacent to a light-shielding layer and having a second optical path length, different from the first optical path length. Light transmitted through each phase shift region interferes with light transmitted through the main light-transmitting region at the edges of the light-transmitting opening, thus enabling a sharp photo-intensity distribution of total transmitted light to be obtained. As a result, the resolution of the exposure mask is improved.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: A projection exposure apparatus has an effective source, a mask, a projection lens and an optical filter. The mask is illuminated with the light from the effective source having a substantially annular illumination distribution. The optical filter is disposed in the approximate position of the pupil plane of the projection lens. On the pupil plane, the transmittance of a first region is made lower than that of a second region, the first region being inside of the periphery of an annular region substantially conjugate with the effective source having the annular illumination distribution, the second region being outside of the periphery. Built in this manner, the apparatus forms fine patterns whose unit size is at least as small as the wavelength of the light used while maintaining high values of contrast and deep levels of focal length.

Abstract: Acid can be generated by exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor and heating the superacid in admixture with a squaric acid derivative in which there is bonded to the squaric acid ring, via an oxygen atom, an alkyl or alkylene group, a partially hydrogenated aryl or arylene group, or an aralkyl group. The superacid catalyzes decomposition of the squaric acid derivative, thus increasing the quantity of strong acid present in the medium. The resultant acid can be used to effect a color change in an acid-sensitive material, so providing an imaging process.

Abstract: A process of forming a single color, dye ablation image having an improved D-min comprising imagewise-heating by means of a laser, a dye-ablative recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder having an infrared-absorbing material associated therewith, the laser exposure taking place through the dye side of the element, and removing the ablated image dye material to obtain an image in the dye-ablative recording element, wherein the polymeric binder has a polystyrene equivalent molecular weight of at least 100,000 as measured by size exclusion chromatography.

Abstract: A method of printing an image on a substrate by applying to the substrate a film which is chemically activated by heat, and scanning the film by a beam of radiation according to the image to be printed, to chemically activate the film by heat and thereby to produce a pattern in the film according to the image scanned. The film includes a reagent capable of undergoing a redox reaction when heated in the presence of another reagent present with the film when scanned by the beam, to produce the redox reaction between the two reagents.

Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.

Abstract: A novel method of pattern formation and a projection exposure apparatus use the pupil of a projection lens of the projection exposure apparatus for forming an LSI pattern or the like, and mount at the pupil an optical filter having a complex amplitude transmittance distribution expressed substantially as T(r)=cos (2.pi..beta.r.sup.2 -.theta./2) as a function of a radial coordinate r normalized by the maximum radius of the pupil. Alternatively, the Fourier transform of a layout pattern drawn on the LSI is obtained, the obtained Fourier transform data are multiplied by cos (2.pi..beta.f.sup.2 -.theta./2) (where f is a spatial frequency, and .beta., .theta. appropriate real numbers), the inverse Fourier transform of the resulting product is taken to produce a pattern, and this pattern or an approximate solution thereof is used as a mask pattern thereby to produce an LSI by exposure.

Abstract: Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.

Abstract: The optical recording medium of the present invention comprises a substrate, a recording layer, and a protective substrate laminated to said recording layer interposing an adhesive layer, wherein said adhesive layer contains at least one copolymer selected from the group consisting of an ethylene-acrylic acid copolymer, an ethylene-acrylate copolymer, an ethylene-methacrylic acid copolymer and an ethylene-methacrylate copolymer, and has a Vicat softening point of from 65.degree. C. to 95.degree. C.The process for producing it is also provided.

Abstract: A lithographic method using double exposures, physical mask shifting, and light phase shifting is used to form masking features on a substrate masking layer. A first phase shifting mask (11) is placed in a first position adjacent a substrate (10). The substrate (10) is covered by the masking layer. The masking layer is exposed to light, or an equivalent energy source, through the first mask (11) to form a first plurality of unexposed regions of the masking layer. Either a second mask or the first mask (11) is placed adjacent the substrate (10) in a second position which is displaced from the first position in an X direction, a Y direction, and/or a rotational direction. A second exposure is used to form a second plurality of unexposed regions of the masking layer. The first and second pluralities of unexposed regions have common unexposed regions which are used to form the masking features.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: Acid can be generated by exposing a mixture of a superacid precursor and a dye to actinic radiation of a first wavelength which does not, in the absence of the dye, cause decomposition of the superacid precursor to form the corresponding superacid, thereby causing absorption of the actinic radiation and decomposition of part of the superacid precursor, with formation of a protonated product derived from the dye, then irradiating the mixture with actinic radiation of a second wavelength, thereby causing decomposition of part of the remaining superacid precursor, with formation of free superacid. Preferably, following these irradiations, the imaging medium is heated while the superacid is admixed with a secondary acid generator capable of being thermally decomposed to form a second acid, the thermal decomposition of the secondary acid generator being catalyzed by the presence of the superacid.

Abstract: A method is provided for fabricating a phase-shift mask (10, 30). A mask plate (11, 31) is provided. A semitransparent layer (12, 32) is deposited onto the mask plate (11,31). The semitransparent layer (12, 32) is then patterned into a predetermined geometric pattern. The patterning of the semitransparent layer (12, 32) is then continued into the mask plate (11, 31) for a predetermined distance (38), thus providing a phase-shift mask (10, 30).

Abstract: A carrier of light-transmissive material has a mask pattern of light-absorbent material arranged thereon. The carrier comprises first regions and second regions that are not covered by the absorbent material. An optical thickness of the carrier in the first regions differs from an optical thickness in the second regions such that a phase difference of 180.degree.+/-60.degree. exists between light that has traversed the first regions and light that has traversed the second regions. For manufacturing the phase mask, the first regions are produced by isotropic etching of the light-absorbent material and the second regions are produced by anisotropic etching into the carrier.

Abstract: The invention discloses a method and an apparatus for creating optical disc recordings by forming pits having ideal shapes. These ideally shaped pits are improvements in the technology of disc mastering, due to the manufacturing and data playback advantages that are inherent in the ideally shaped pits. A disc substrate has a very thin partially reflective layer applied to the surface of the optical disc upon which data will be recorded. The substance used to make the partially reflective layer is normally considered opaque in more commonly occurring thicknesses. However, the partially reflective layer, is created to be so extremely thin that it becomes partially optically transparent. The partially reflective layer then has spin coated, thereon, an optically active lamina to enable the recording of data on the disc by laser means in the form of pits.

Abstract: It has been found that for a SCALPEL lithographic system thermal effects dictate that the acceleration voltage for the exposing electrons be maintained within a specific range. This range depends on a variety of factors but is generally in the 50 to 150 KeV region. Additionally, thermal considerations also dictate the method of scanning the mask to print an entire wafer.

Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.

Abstract: Certain squaric acid derivatives are useful for the thermochemical generation of acid. The squaric acid derivatives may be used in imaging media in conjunction with acid-sensitive materials which undergo a color change when contacted by the acid generated from the squaric acid derivatives. Preferably, the acid-sensitive materials undergo an irreversible color change, so that the image can be fixed by neutralizing all the acid generated with excess base, thereby preventing further color change in the image during long term storage.

Abstract: A method is provided for forming a right angle (30) on a chromeless phase-shift mask (31). A first phase-shift element (32) and a second phase-shift element (33) are positioned at a ninety degree angle, on the chromeless phase-shift mask (31), wherein there is a predetermined space (34) between the first and second phase-shift elements (32,33). The space between the phase-shift elements eliminates hot spot formation that causes unintentional exposure of the semiconductor substrate.

Abstract: A method for manufacture of such a phase shifting mask comprises the steps of forming a light shielding layer on a substrate; forming a photoresist on the light shielding layer; patterning the photoresist to form a resist pattern; providing an opening in the light shielding layer by the use of the resist pattern as a mask, thereby forming a light shielding pattern; etching the substrate anisotropically to form a phase shifting segment; side etching the light shielding pattern to form a light shielding region; and removing the resist pattern.

Abstract: Processes for producing stable, radiation hard, highly conductive polymers by a combination of chemical doping and ion irradiation and microelectronics are described. The highly conductive polymers formed by these processes may contain regions of different kinds of conductivity on the same polymer. Resist coatings and masks are used in conjunction with chemical doping and ion irradiation to create specific predetermined n and p conductivity patterns and insulation areas on polymeric films of selected thicknesses for electronic circuitry applications. The resulting circuitry, besides having a conductivity approaching that of metal, is extremely light in weight, flexible, and conductively stable. Several different configurations of microelectronic junction devices fabricated from single type or multiple type conductivity polymer films used either alone or with a polymer of opposite conductivity and a suitable metal or metals are disclosed.

Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.

Abstract: A method of fabricating a chromeless phase shift reticle. The method includes the steps of: depositing a layer of material on a transparent substrate to a thickness of "t"; patterning and anisotropically etching the material to form a pattern of openings to the substrate; depositing a phase shifter material over the layer of material and into the openings; polishing by chemical mechanical planarization (CMP) the phase shifter material; and selectively wet etching the initially deposited layer of material. This process forms a chromeless phase shift reticle having a pattern of phase shifters of a thickness of "t" with a pattern of light transmissive areas on the substrate therebetween. The thickness "t" and a phase shifter material index of refraction may be selected to achieve a 180.degree. phase shift between light transmitted through a phase shifter relative to light transmitted through a light transmissive area on the substrate.

Abstract: An apparatus and method for fabricating integral three-dimensional objects from contiguous layers of a photosensitive composition in an imagewise manner, with an additional photogelled portion or photohardened wall, or both, surrounding the three-dimensional object.

Abstract: A process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in pattern metal films of lithographic masks has been found. The process requires that the heat evolved during the radiation-induced reactions be carefully limited to produce the desired uniformity.

Abstract: Amphoteric polymers prepared by polymerization of (a) acrylic acid, (b) N,N-dimethyl- or N,N-diethylaminoethyl methacrylate and, optionally, (c) esters of methacrylic or acrylic acid prepared by (i) emulsion polymerization of (b), (c) and the methyl ester of (a), followed by basic hydrolysis, or (ii) polymerization of (a), (b) and (c) in the presence of a strong acid, and photographic emulsions comprised of said polymers in which the molar ratio of (a) to (b) is at least 2 to 1 and a silver halide.

Abstract: Fabrication of integrated circuits--electronic, photonic or hydrid--permits attainment of higher device density. Pattern delineation with smaller design rules than previously associated with delineating radiation of given wavelength is the consequence of use of phase masks. Compared with earlier used, binary valued phase masks, the multiple values of those on which this fabrication depends permits improved effectiveness in lessening of edge-smearing radiation of consequence (of diffraction-scattered delineating radiation at feature edges). Phase masking may provide, as well, for feature generation by interference, and for reduced intensity of unwanted image hot spots by diffraction.

Abstract: A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque film such as chromium is first deposited on a transparent substrate. The opaque film is then patterned with openings by a first photolithographic step. A phase shifter material such as (SiO.sub.2) is then deposited into the openings to form phase shifter sections. The phase shifter sections are then polished by chemical mechanical planarization (CMP) to a thickness "T" which is selected to produce a 180.degree. phase shift. A pattern of light apertures is then formed by a second photolithographic process in the opaque film such that a reticle having a repetitive phase shifting pattern is formed.

Abstract: A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque material is deposited onto a quartz substrate to a predetermined thickness. The opaque material is then patterned with openings to form a pattern of opaque light blockers and light transmission openings on the substrate. A phase shifter material is then deposited over the opaque light blockers and into the light transmission openings. This forms a pattern of rim phase shifters on the sidewalls of each light blocker with a light transmission opening between adjacent light blockers. In use, in photopatterning a semiconductor wafer, phase canceling produced by light diffracted through the rim phase shifters and by the opaque light blockers enhances the edge contrast of a pattern produced by the opaque light blockers.

Abstract: A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque film such as chromium is first deposited on a transparent substrate. The opaque film is then patterned with openings by a first photolithographic process. A phase shifter material such as (SiO.sub.2) is then blanket deposited into the openings and over the opaque film. The phase shifter material is then polished by chemical mechanical planarization (CMP) to a thickness "T" which is selected to produce a 180.degree. phase shift. The phase shifter material is then photopatterned and selectively etched by a second photolithographic process to remove all of the phase shifter material except in every other opening formed in the opaque film. This forms a repetitive pattern of alternating phase shifters and light transmission openings through the opaque film.

Abstract: A reflection type photomask includes a substrate, and a reflecting surface formed on the substrate and including a first region and a second region which have a relative height difference. Due to the concavo-convex structure of the reflecting surface, a light reflected from the first region and a light reflected from the second region have a predetermined phase difference which may be used effectively to form a pattern on a photoresist layer.

Abstract: An imaging method and apparatus produces a film of photohardened composition by exposing a layer of photohardenable composition to actinic radiation through a surface of a barrier transparent to the radiation and in contact with the composition at an interface therewith. An inhibition layer is created within the photohardenable composition in contact with the interface that inhibits photohardening of the composition within the inhibition layer during exposure, thereby precluding adhesion of any photohardened composition to the barrier.

Abstract: An apparatus and method for fabricating integral three-dimensional objects from successive layers of deformable and photoformable compositions by exposing the layers of the composition through a tensioned, elastomeric transparent film, in a way that the weak bonds between the film and each newly solidified layer are broken by changing the tension on the film, thus allowing a new layer of deformable composition to be introduced between the film and the solidified layer.

Abstract: Layer transfer process for image production wherein predetermined areas of the surface of an image carrier (21) are prepared to accept a color layer, the image carrier (21) and a color carrier (22) of layer transfer material are brought into mutual contact under pressure, and the color carrier is removed from the image carrier, so that color remains on the predetermined areas of the image carrier. A high uniformity of colorant application can be achieved over the entire surface of the image carrier. The process is performed by an apparatus with at least one roll nip (31) formed by two hard rolls (11, 12), preferably with different diameters, in which the two rolls are mutually offset relative to the feed direction (30) of the image carrier (21).

Abstract: An apparatus and method for fabricating integral three-dimensional objects from successive layers of photoformable compositions by exposing the layers of the composition through a detachable flexible transparent film, one side of the film being in contact with the composition and the other side of the film with a rigid transparent plate, which guides and supports the film.

Abstract: Method of forming an integral three-dimensional object from a photohardenable liquid composition with low shrinkage containing a linear polymer which is soluble in the liquid but separates into a separate phase upon photohardening.

Abstract: An apparatus and method for fabricating integral three-dimensional objects from successive layers of photoformable compositions by exposing the layers of the composition through a semi-permeable film that allows creation of release coatings on the side of said film facing said composition.

Abstract: An imaging method and apparatus produces an integral three-dimensional object from a multiplicity of cross sectional portions of the object. The cross sectional portions correspond to photohardened portions of contiguous photoformed precursor sheets of a photohardenable liquid composition.

Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.

Abstract: An optical recording medium comprising a substrate and a thin organic film containing at least one kind of dye selected from polymethine family dyes, perylium family dyes, and cyanine family dyes, and a recording process comprising scanning the optical recording medium with a high intensity light beam such as a laser beam to form optically detectable pits on the recording medium.

Abstract: A resin composition for laser-marking which comprises at least one inorganic compound selected from the group consisting of anhydrous metal borate salt, an anhydrous metal phosphate salt, a phosphoric acid-containing glass, basic zinc carbonate and basic magnesium carbonate, and a resin; and a method for laser-marking the surface of an object composed of the said resin composition by applying laser beams onto the surface.

Abstract: An integral three dimensional object is formed from a photohardenable liquid composition containing radiation deflecting matter which is a thermal insulator and having a different index of refraction from the liquid.

Abstract: Information stored in a thin polymer layer is read out in a process wherein information introduced into a thin polymer layer on a metallic or semiconductor layer by electromagnetic or particle rays which produce a permanent change in the properties of the polymer layer in the irradiated areas is read out using surface plasmons.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chips and to the improvement of a mask used in its manufacturing process. In other words, the phase of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: Printing plates having a photosensitive layer coated on a support wherein said photosensitive layer contains a powdered solid adhered to the surface of said plate by means of powdering followed by the application of heat or solvent before exposure. Said powders are capable of being removed from said surface during the developing process.