Abstract: Heat activated method for developing and improving the definition of a patterned heat-photoresist layer as applied to a substrate surface of different material, such as a semiconductor slice, in the fabrication of an electronic structure or photomask, through the use of a reactive species of oxygen including monatomic oxygen or ozone in an oxygen-containing gas. A layer of photoresist material upon being selectively exposed to an energy source, such as ultraviolet radiation, X-ray, or E-beam radiation acquires a predetermined patterned definition therein because of chemical changes in the photoresist material which is photosensitive. After such selective exposure, the photoresist layer is characterized by a differential reactivity which is heightened by a chemical or a physical change occurring in either one of the exposed or unexposed portions of the layer of photoresist material enabling the selective removal thereof.

Abstract: An integral three-dimensional object is formed from a photohardenable liquid composition containing radiation deflecting matter.

Abstract: A three-dimensional object formed from a photohardenable composition containing deflecting matter of core-shell polymers. A preferred material for the polymeric core is crosslinked to an extent to be nonswellable and insoluble in solvent for noncrosslinked polymer material while the shell polymer has no pendant acid groups.

Abstract: The projection of a planar distorted pattern onto a three dimensional surface provides a true or undistorted pattern on that surface. Complex patterns are applied to an irregular or curved surface by a method which includes the formation of a graphics display of the body on a computer graphics display and conversion to a two dimensional CADAM data base containing a planar projection of the pattern intended for application to the curved surface. This pattern information is translated into other forms, such as the form of a numerically controlled milling machine tape or photo mask, which is then used by ancillary method apparatus to form the desired pattern as a part of the method. The process describes the construction of a dichroic parabolic RF reflector.

Abstract: A light-sensitive transfer material is disclosed, comprising a substantially transparent support having provided on one side thereof, in order from the support, a stripping layer, and a lamination of a colorant layer containing a dye or a pigment and a photoresist layer or a photoresist layer containing a dye or a pigment, and having provided on the other side thereof a physical development nuclei-containing layer adapted for diffusion transfer processing using a silver halide emulsion.

Abstract: A photographic contact printing process is disclosed having application in the mass production of replicate video discs from a master disc, and other applications wherein it is desired to replicate micro-detail over a relatively large area. A problem with conventional contact printing from a mask to a photographic medium is one of maintaining intimate contact over a relatively large area since dust, dirt, etc., are almost impossible to completely eliminate in any practical manner. In accordance with the present invention, a contact printing process is provided wherein intimate contact is not necessary for making high quality contact prints. The present invention recognizes that in contact printing information from a master disc to a replicate disc, the contact printing process is significantly less sensitive to imperfect contact between the master disc and the replicate disc if one employs a replicate disc comprising a photosensitive material having a certain optical properties.

Abstract: Radiation detecting solid elements consisting of conductive polymers and radiation sensitive materials which are capable of generating radiation induced substances composing the dopant of the conductive polymers. The elements are monolayer sheets obtained by impregnating or compounding the conductive polymers, such as, polythiophene and polyselenophene, with radiation sensitive materials, such as, diphenyliodonium chloride and triphenylsulfonium hexafluoroarsenate(V). The elements are also laminated sheets consisting of conductive polymer films and radiation sensitive material containing films. As radiation exposure causes variation in electrical conductivity and absorption spectrum of the elements, radiation can be detected by the variation of these properties.

Abstract: A developer for PS plates requiring no dampening water which comprise a substrate provided thereon with a primer layer, photopolymerizable light-sensitive layer and a silicone rubber layer in this order, comprises: (i) an organic solvent which can dissolve or swell non-exposed portions of the photopolymerizable light-sensitive layer and whose solubility in water at ordinary temperature is not more than 20% by weight; (ii) a surfactant; and (iii) water. The developer is excellent in developing properties and dot reproduction, shows high stability and does not cause scratches on the silicone rubber layer during development.

Abstract: A photosensitive ceramic coating composition which is fireable in a substantially nonoxidizing atmosphere comprising an admixture of:(a) finely divided particles of ceramic solids,(b) finely divided particles of an inorganic binder dispersed in an organic medium comprising(c) an organic polymeric binder, and(d) a photoinitiation system, dissolved in(e) photohardenable monomer, and(f) an organic mediumwherein the improvement comprises an organic polymeric binder containing a copolymer or interpolymer of a C.sub.1 -C.sub.10 alkyl acrylate, C.sub.1 -C.sub.10 methacrylate, styrene, and an ethylenically unsaturated carboxylic acid, wherein a moiety in the binder derived from the unsaturated carboxylic acid comprises from 5 to less than 15 weight percent of the polymer and wherein the binder has a molecular weight not greater than 100,000 and wherein the composition upon imagewise exposure to actinic radiation is developable in an organic solvent-water mixture.

Abstract: A positively working, tonable, photohardenable mixture, as well as image-forming material prepared therefrom are described, which as essential components, contains a binder or mixture of binders, a photohardenable compound, a photoinitiator or an initiator system and a multivalent metal compound to improve the toning properties of the material.

Abstract: An improved stereolithographic process is provided in which the formation of a thin walled three-dimensional object in a reservoir of liquid ultraviolet-curable ethylenically unsaturated material using a support is positioned immediately beneath the upper surface of the liquid reservoir with that upper surface being exposed to ultraviolet light in a pattern to solidify the liquid at and near the upper surface in a series of cross-sections of the desired three-dimensional object, one atop the other. In this way there is formed a series of superposed layers which adhere to one another to build the desired three-dimensional object within the liquid reservoir. The improvement comprises, stopping the exposure at any portion of the surface in the formation of said layers and then repeating the exposure at least once again in the production of each surface layer so that the strength and solvent resistance of the formed object are increased and its distortion is minimized.

Abstract: A photosensitive ceramic coating composition which is fireable in a substantially nonoxidizing atmosphere comprising an admixture of:(a) finely divided particles of ceramic solids having a surface area-to-weight ration of no more than 10 m.sup.2 /g and at least 80 wt. % of the particles having a size of 1-10 .mu.m, and(b) finely divided particles of an inorganic biner having a glass transition temperature in the range from of 550.degree. to 825.degree. C., a surface area-to-weight ration of no more than 10 m.sup.2 /g and at least 90 wt. % of the particles having a size of 1-10 .mu.m, the weight ratio of (b) to (a) being in a range from 0.6 to 2, dispersed in an organic medium comprising(c) an organic polymeric binder, and(d) a photoinitiation system, dissolved in(e) photohardenable monomer, and(f) an organic mediumwherein the improvement comprises an organic polymeric binder containing a copolymer or interpolymer of a C.sub.1 -C.sub.10 alkyl acrylate, C.sub.1 -C.sub.

Abstract: A photosensitive ceramic coating composition which is fireable in a substantially nonoxidizing atmosphere comprising an admixture of:(a) finely divided particles of ceramic solids,(b) finely divided particles of an inorganic binder dispersed in an organic medium comprising(c) an organic polymeric binder, and(d) a photoinitiation system, dissolved in(e) photohardenable monomer, and(f) an organic mediumwherein the improvement comprises an organic polymeric binder containing a copolymer or interpolymer of a C.sub.1 -C.sub.10 alkyl acrylate, C.sub.1 -C.sub.10 methacrylate, styrene, and an ethylenically unsaturated carboxylic acid, wherein a moiety in the binder derived from the unsaturated carboxylic acid comprises from 5 to less than 15 weight percent of the polymer and wherein the binder has a molecular weight not greater than 100,000 and wherein the composition upon imagewise exposure to actinic radiation is developable in an organic solvent-water mixture.

Abstract: The invention relates to a process for producing supports intended for the optical recording and reading of information. A layer containing a diazo compound is deposited onto a metallized substrate. Recording is obtained by exposing the support to light through a mask, the exposed zones of the layer of diazo compound being decomposed. Dry development in ammonia vapors shows up transparent zones and opaque zones corresponding to the information.

Abstract: This invention relates to poly(acetylene) films having localized zones of a material other than poly(acetylene) with modified optical and electrical properties. The films are formed by selectively irradiating discrete areas of a film of a precursor polymer followed by heating of the irradiated precursor polymer to transform the non-irradiated areas into poly(acetylene). The resultant product has localized zones of modified electrical and optical properties which are useful in the semiconductor industries and in optical devices.

Abstract: A method for recording a photographic image on an image-recording material is provided, wherein an image-recording material formed by coating at least a photographic silver halide, a polymerizable vinyl monomer, and a hydrazine derivative represented by formula (I) ##STR1## wherein X represents a hydrogen atom, an alkyl group, or a group represented by ##STR2## positioned in an ortho-, meta-, or para-position on the benzene ring; Y represents ##STR3## or --SO.sub.2 --; R.sub.1, R.sub.2, R.sub.3, and R.sub.4 each represents a hydrogen atom, an unsubstituted alkyl group, or a substituted alkyl group, provided that R.sub.1 represents a hydrogen atom only when Y represents ##STR4## on a support is imagewise exposed to form a latent image in said photographic silver halide and then heated so as to polymerize said polymerizable vinyl monomer in the part having said latent image to form a polymer image therein.

Abstract: Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.

Abstract: A mask structure for lithography has a mask material holding thin film and a holding substrate for holding the peripheral portion of said mask material holding thin film, said mask material holding thin film comprising a film comprising aluminum, nitrogen and oxygen.

Abstract: The exposure component (10) of a photo-etching system for a semiconductor wafer (28) includes a laser (12) that shines coherent light through an expansion lens (14) and then a contraction lens (16) to supply a spherically convergent beam of light through a lensless-Fourier-transform hologram (22) and onto the semiconductor wafer (28). The wafer (28) is located tangent to a hemisphere centered on the hologram (22) that has the focal point (26) of the convergent spherical beam at the middle of its curved surface. This forms a reduced version of the source image from which the hologram (22) was formed and achieves feature sizes significantly smaller than those attainable with conventional mask-type systems employing light of the same wavelength.

Abstract: Process of photoetching of superficial coatings based on polymeric material comprising the irradiation of the coated surface with localized excimer laser beams having wavelengths equal to or lower than 193 nm.

Abstract: Manufacturing method for integrated circuit chip carrier or similar devices comprises the steps of producing the substrate as a discrete part by pressing ceramic powder in a precision mold and sintering the pressed part. The discrete substrates are then placed in a work holder in which a plurality of substrates are precisely located with both surfaces of each substrate exposed. The manufacturing steps of metallizing the substrates, imaging, plating, resist removal, etching, and so on, can then be carried out on all of the substrates in the work holder simultaneously. The processes can be applied to both surfaces of each substrate simultaneously and in addition, further steps such as assembly of an IC chip to each substrate and wire bonding can be carried out while the substrates are in the work holder. The process greatly reduces the cost of manufacturing chip carriers, particularly the type having terminal pads on both surfaces of the substrate and conductors extending between the major surfaces.

Abstract: This invention relates to poly(acetylene) films having localized zones of a material other than poly(acetylene) with modified optical and electrical properties. The films are formed by selectively irradiating discrete areas of a film of a precursor polymer followed by heating of the irradiated precursor polymer to transform the non-irradiated areas into poly(acetylene). The resultant product has localized zones of modified electrical and optical properties which are useful in the semiconductor industries and in optical devices.

Abstract: Disclosed herein is an optical recording medium permitting recording and reading-out of signals without any reflective layer. The optical recording medium comprises a transparent substrate and an optical recording layer provided directly on the substrate. The recording layer contains at least 80 wt. % of a naphthalocyanine dye represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 may be either the same or different and mean individually a straight-chain or branched alkyl group having 5-12 carbon atoms and M denotes a metal or a metal oxide or halide.

Abstract: Polysilane polymers in which the Si backbone is interrupted by atoms such as O, Ge, Sn, P, etc., are useful photoresists especially in the solvent development mode.

Abstract: An optical recording method which comprises providing a recording layer containing a recording susbstance that has an absorption maximum in the visible and near infrared wavelength region of 600 to 1,200 nm and loses or diminishes its power to absorb visible or near infrared radiation in the aforesaid wavelength region upon exposure to ultraviolet radiation, X-rays, an electron beam or an ion beam, and irradiating desired locations of the recording layer with ultraviolet radiation, X-rays, an electron beam or ion beam to form a pattern based on the presence or absence, or variation in strength, of the power to absorb visible or near infrared radiation in the aforesaid wavelength region so as to record information in the recording layer; a method for reading optically recorded information which comprises illuminating a pattern formed as described above with laser light having a wavelength in the aforesaid visible and near infrared region and detecting the presence or absence, or variation in intensity, of abso

Abstract: In the fabrication of integrated circuits, a polymethyl methacrylate film containing a selected dye and exhibiting a strong dependence on light intensity is photobleached to provide an optical mask to pattern an underlying photoresist layer. While the film is photobleached, the underlying photoresist layer is made to be substantially unaffected by the photobleaching process. When the optical mask is realized, it is used to mask the light-sensitive photoresist layer when the photoresist layer is exposed to light. However, the photobleached layer, which is also sensitive to light, is now in turn made to be substantially unaffected by the exposure process. In this manner, the integrity of the optical mask resolution is maintained at its optimum, and densely integrated circuits can be processed and fabricated.

Abstract: In order to be able, in a simple manner, to erase, by heating, data recorded on bodies with reversible, temperature-variable light extinctions, and then to be able to use the body anew for the recording of data, these bodies consists of at least one polymer material and/or resin matrix material (A) and at least one organic low-molecular substance (B), which is insoluble, at least partially, in the latter and which is contained therein as a dispersed second phase, whereby the pair of materials (A/B) possess variable light extinctions below a specific temperature (T.sub.0) in dependence on a previous heating above T.sub.0 and are so constituted that, upon being heated above a conversion temperature (T.sub.2) which lies above T.sub.0, and being cooled off subsequently to below T.sub.0, yields maximum light extinction; and, upon being heated in the state of maximum light extinction to a temperature (T.sub.1) which lies above T.sub.0 and below T.sub.2, and subsequent cooling off to below T.sub.

Abstract: New transition and inner transition metal chelate polymers and method for nthesizing thereof. Such polymers are used as positive or negative resists of high sensitivity for lithographic purposes in integrated circuit chip fabrication requiring submicron resolution. The polymers when irradiated undergo scission or crosslinking events which affects their solubility in developer solvents. They are synthesized either in non-aqueous solution with subsequent removal of excess solvent or interfacially with almost instantaneous precipitation of the polymer at the interface.

Abstract: An enhanced optically sensitive medium is disclosed which uses an organic charge transfer complex as the switching material. The organic charge transfer complex includes at least one moiety in an oxidized state. An enhancement mechanism is taught which provides a secondary source of neutral molecules of said at least one constituent moiety in the neutral or altered oxidation state. For example, with CuTCNQ used as the switching material, the erasing characteristics can be improved by using a covering dispersion having a matrix polymer interspersed with neutral molecules of TCNQ.degree..

Abstract: A process for making at least a single-faced, write and/or read optical disk having a sub-layer with a smooth or high-resolution featured surface and the opaque, substantially flat substrate includes the steps of interjecting between the opaque, substantially flat substrate and a transparent, highly polished or featured master mold, a thin layer of viscous composition which is radiation-curable to a solid plastic without undergoing significant shrinkage. The layer of viscous composition is irradiated through the transparent mold to cure the composition to a solid plastic sub-layer having the desired smooth or high-resolution featured surface. After irradiation of the composition, the master mold is removed, leaving the cured plastic sub-layer adhered to the substrate. The substrate is preferably metal, such as aluminum, and the master is preferably glass with an etched featured surface thereon.

Abstract: A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.

Abstract: New polysilane copolymers comprise recurring units of --Si(X)(Y)-- and Si(A)(B)--, Si(X)(Y) being different from Si(A)(B), whereinX and Y together have 1-13 carbon atoms, and X and Y each independently is hydrogen, alkyl, cycloalkyl, phenyl, alkylphenyl, or phenylalkyl, with the proviso that only one of X and Y contains a phenyl moiety, or together X and Y are an alkylene group forming a ring with the adjoining Si atom, and whereinA and B together have 3-13 carbon atoms, and A and B each independently is alkyl or cycloalkyl, with the proviso (a) that when one of A and B is ethyl, the other is not methyl or ethyl, and (b) that when one of A ad B is n-propyl and the other is methyl, X and Y are not both methyl.Corresponding homopolysilanes are also provided.Upon ultraviolet irradiation, they photodepolymerize to form volatile products. As a result, they represent a new class of photoresists which enable direct formation of a positive image eliminating the heretofore required development step.

Abstract: In a method of forming very minute real window patterns to a negative photoresist film that are required in the manufacture of highly packed semiconductor devices, false unexposed patterns are formed in the proximity of the minute real unexposed patterns. The false patterns have a width that, upon a single exposure of the negative photoresist film to ultraviolet light or other energy beam, the photoresist film portion immediately below the false patterns are unexposed but a photoresist portion under the unexposed portion is exposed to light by reason of light diffraction or light circling around under the false pattern. As a result, the false patterns in the photoresist film substantially disappear after development of the photoresist. The partially removed false patterns serve to negate swelling of the photoresist at the time of development and prevent obliteration of the real window patterns or formation of burr-like parts where the real window patterns are to be formed.

Abstract: Photographic and Photolithographic systems are provided which utilize diacetylenic materials as components thereof. Such materials, which include at least two acetylenic bonds in conjugation with one another, provide a combination of both high sensitivity and high resolving power, thus resulting in superior photographic and photolithographic properties.In accordance with a preferred embodiment of the invention, a substrate is coated with at least one layer of a polymerizable composition comprising a diacetylenic species, said layer being organized into a plurality of domains having a substantially regular array of the diacetylenic species. In other embodiments, covalent bonding of the diacetylenic layer to the substrate is accomplished through the use of suitably constituted silane species, thus to provide a highly beneficial adhesion of substrate and photo- or photolithographic layer.

Abstract: Photosensitive element for forming a lithographic negative which comprises a support bearing a dry photosensitive layer consisting essentially of an intimate mixture of colloidal metal particles, e.g., silver, etc., colloid binder, free radical producing compound, and mercaptan compound, e.g., 2-mercaptobenzoxazole. A two layer photosensitive element embodiment comprises on a support a lower dry colloidal layer having dispersed colloidal metal particles and an upper dry layer consisting essentially of free-radical producing compound and a mercaptan compound. The elements are exposed imagewise, bleached, rinsed, and optionally fixed.

Abstract: An optical disc including a medium having both a continuous phase and a non-continuous phase yields excellent contrast and stability for optical recording purposes. Exemplary of materials that form the desired multi-phase system are those produced by sputtering metals such as indium in an oxygen environment.

Abstract: A system for generating three-dimensional objects by creating a cross-sectional pattern of the object to be formed at a selected surface of a fluid medium capable of altering its physical state in response to appropriate synergistic stimulation by impinging radiation, particle bombardment or chemical reaction, successive adjacent laminae, representing corresponding successive adjacent cross-sections of the object, being automatically formed and integrated together to provide a step-wise laminar buildup of the desired object, whereby a three-dimensional object is formed and drawn from a substantially planar surface of the fluid medium during the forming process.

Abstract: This invention relates to a light-sensitive copying material comprising a layer support and a positive-working light-sensitive layer thereon having a rough surface and a content of finely divided particles, wherein the smallest dimension of the particles corresponds at least to the thickness of the layer.

Abstract: The invention provides an improved method for the so-called dry-film process for forming a pattern-wise photoresist layer on the substrate surface in which a substrate is overlaid and laminated with a preformed film of a photosensitive composition called a dry film and photolithographically processed. In the inventive method, different from conventional dry-film processes, the substrate plate is first provided with a protecting layer of a photosensitive composition containing a halation inhibitor and the lamination with a dry film is performed without removing the protecting layer. After pattern-wise exposure to light, development of the photosensitive layer is undertaken by use of a developer solvent capable of dissolving both of the protecting layer and the pattern-forming layer. Despite the intervention of the protecting layer, the resolving power and image reproducibility are excellent.

Abstract: A microform article useful for producing composite images has an image-forming layer separate from a photosensitive layer and allows for the subsequent addition, when needed, just prior to imaging, of a second photosensitive, resist layer for an add-on image. The unique construction and method therefor provide a positive or negative first image, with the possibility of either positive or negative additional images, the images not necessarily being in the same phase.

Abstract: A photographic material capable of receiving and retaining an aqueous ink or other similar materials on the back surface, which is able to serve as a post card, is disclosed. The photographic material comprises a water-proof support comprising a paper sheet coated with a polyolefin resin on both surfaces thereof, and a photographic emulsion layer provided onto one of the surfaces of the support, in which another surface of the support is provided with a gelatin layer containing an inorganic pigment and one or more of specific gelatin hardening agents.

Abstract: A silver halide sensor type polymerizable light-sensitive material is disclosed. The material is comprised of a support having a silver halide photographic emulsion layer and a polymerizing layer adjacent to the emulsion layer. The polymerizing layer contains a nongaseous ethylenically unsaturated compound capable of undergoing addition polymerization upon reduction of the silver halide with a reducing compound. The material is capable of producing printing plates having good inking property and good printing durability. The material maintains the sensitivity and high resolving power of a silver halide photographic light-sensitive material.

Abstract: A photographic material comprises acid esters of cellulose or copolymers of acid esters of cellulose and synthetic comonomers.The invention may be used in the photographic industry for producing line and half-tone images on paper, films and cloth. Moreover, the proposed photographic material may be used for direct recording of ultraviolet radiation.

Abstract: A process for the rapid curing of polyurethanes comprising the steps of (a) mixing together a diisocyanate compound, a diol, a polyol, and a diazonium salt and thereafter (b) exposing the resulting mixture to ultraviolet light in the wavelength range of about 2000 to about 4000 Angstroms for a period of about 0.1 second to about 20 minutes at a temperature in the range of about 0.degree. F. to about 180.degree. F.

Abstract: Disclosed is an ablative infrared sensitive optical recording composition containing as a component thereof a dispersion of a resinous binder and an absorbing infrared sensitive tertiary butyl substituted vanadyl phthalocyanine obtained by the vapor treatment of a non-infrared sensitive tertiary butyl substituted vanadyl phthalocyanine of the following formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are tertiary butyl groups, or hydrogen, and M is vanadium oxide, subject to the provision that the average number of tertiary butyl groups present is from about 1 to 2.5, and at least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is tertiary butyl.

Abstract: A composition obtained by incorporating a benzenedithiol nickel complex in a liquid formulation containing a solvent and, as a binder, an organic polymer or containing a solvent, organic color-producing substance, acidic substance and binder suitable for producing a laser beam recording/reading means having an absorption band in the region of 800-950 nm.

Abstract: A process is described for preparing relief images, in which a light-sensitive material composed of a support and a light-sensitive layer which contains as essential constituents(a) a compound which has at least one C-O-C bond which is cleavable by acid,(b) a compound which forms a strong acid on irradiation and(c) a binder which is insoluble in water and soluble in aqueous-alkaline solutions is imagewise irradiated, warmed to an elevated temperature, cooled down and then irradiated over its entire area, whereafter those parts of the layer which have not been imagewise irradiated are then washed out by developing. The process makes it possible to prepare positive or negative copies by means of the same light-sensitive material in a simple way.

Abstract: Disclosed is an ablative infrared-sensitive optical recording composition containing as a component thereof a dispersion of a resinous binder and a soluble naphthalocyanine of the following formula: ##STR1## wherein R.sub.5 and R.sub.6 are independently selected from hydrogen and alkyl groups containing from about 4 carbon atoms to about 8 carbon atoms, and M is two hydrogen atoms, a divalent, trivalent, or tetravalent metal complex.

Abstract: Negative working resists, prepared from poly(vinylpyridine) polymers which exhibit good sensitivities to 20 keV electron beam radiation, are disclosed. The poly(vinylpyridine) polymers of this invention may contain alkyl substituents on the pyridine rings in ortho, meta or para positions with respect to the nitrogen atom within said ring.

Abstract: The actinic radiation-exposed or unexposed areas, whichever are relatively low in abrasion resistance, formed in a photosensitive composition layer superimposed on a substrate are selectively removed by blowing an abrasive material against the layer, thereby to obtain a desired image in the layer. By utilizing an article body intended for engraving a pattern as the substrate and by further blowing an abrasive material against the article body until the article body comes to have a pattern of desired depth, a pattern-engraved article can be advantageously produced. The above processes are extremely advantageous over the prior art because any solvent is not needed for the development so that the treatment of the waste solvent and the drying step can be eliminated and because a pattern-engraved article can be produced by the dry process in which the number of necessary steps is reduced.