Electrode cover for a plasma processing apparatus

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Description

FIG. 1 is a front, top and right side perspective view of an electrode cover for a plasma processing apparatus, showing our new design;

FIG. 2 is a rear, bottom and left side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a rear elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3;

FIG. 10 is an enlarged portion view shown in a dot-dash line box labeled, “FIG. 10,” in “FIG. 9”;

FIG. 11 is an enlarged portion view shown in a dot-dash line box labeled, “FIG. 11,” in “FIG. 1”; and,

FIG. 12 is an enlarged portion view shown in a dot-dash line box labeled, “FIG. 12,” in “FIG. 7”.

The dot-dash line boxes shown in FIGS. 1, 7 and 9 define the enlarged portions shown in FIGS. 10-12, and form no part of the claimed design.

Claims

The ornamental design for an electrode cover for a plasma processing apparatus as shown and described.

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Other references
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Patent History
Patent number: D1108380
Type: Grant
Filed: Mar 28, 2024
Date of Patent: Jan 6, 2026
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventors: Kazuyuki Hirozane (Tokyo), Tomohiro Shiraki (Tokyo)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/934,856