Baffle for anti-rotation process kit for substrate processing chamber

Description

FIG. 1 is a top, front, right side isometric view of a first embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.

FIG. 2 is a bottom, left side, back isometric view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a front elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a left side elevation view thereof.

FIG. 8 is a right side elevation view thereof.

FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.

FIG. 10 is a top, front, right side isometric view of a second embodiment of a baffle for anti-rotation process kit for substrate processing chamber showing our new design.

FIG. 11 is a bottom, left side, back isometric view thereof.

FIG. 12 is a top plan view thereof.

FIG. 13 is a bottom plan view thereof.

FIG. 14 is a front elevation view thereof.

FIG. 15 is a back elevation view thereof.

FIG. 16 is a left side elevation view thereof.

FIG. 17 is a right side elevation view thereof; and,

FIG. 18 is an enlarged cross sectional view taken along line 18-18 in FIG. 12.

The dashed lines in FIGS. 1-13 represent unclaimed environment and form no part of the claimed design.

Claims

The ornamental design for a baffle for anti-rotation process kit for substrate processing chamber, as shown and described.