Lower shield for a substrate processing chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of a lower shield for a substrate processing chamber, according to the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation view thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a right side elevation view thereof.

FIG. 7 is a left side elevation view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.

The broken lines show portions of a lower shield for a substrate processing chamber that form no part of the claimed design.

Claims

The ornamental design for a lower shield for a substrate processing chamber, as shown and described.

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Patent History
Patent number: D971167
Type: Grant
Filed: Apr 10, 2021
Date of Patent: Nov 29, 2022
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Sarath Babu (Singapore), Ananthkrishna Jupudi (Singapore), Yueh Sheng Ow (Singapore), Junqi Wei (Singapore), Kelvin Boh (Singapore), Yuichi Wada (Chiba), Kang Zhang (Singapore)
Primary Examiner: Michael C Stout
Assistant Examiner: Fritzgerald L Butac
Application Number: 29/778,108