Abstract: Methods and apparatus for removing condensed metal from the surfaces of metal processing chambers, such as, vacuum induction melting (VIM) furnaces having, for example, condensed Mg or Ti, are disclosed. The methods and apparatus provide a robotic arm end positioned in the furnace having a nozzle operatively connected to a source of dry ice. The robotic arm end directs a stream of dry ice particles against the surface of the furnace to displace condensed metal. The displaced metal is collected for reuse or disposal. Aspects of the invention provide a safe and automated process for cleaning process chambers and recovering metal that can typically be dangerous when performed by conventional methods.

Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.

Abstract: A combined paint roller and paint roller cleaner quickly and efficiently removes paint from the paint roller cleaner while preventing fluids from splashing outwardly and away from the paint roller cleaner. The paint roller cleaner includes a main chamber having a first slot formed at an outer surface thereof, and an auxiliary chamber statically coupled to the main chamber. Such an auxiliary chamber protrudes outwardly from the outer surface of the main chamber and preferably has an outer surface provided with a second slot formed therein. Notably, the second slot may be offset from the first slot in such a manner that an external fluid stream, after passing through the first and second slots, is caused to enter the main chamber at a non-perpendicular angle relative to the outer surface of the main chamber and thereby rotate a portion of the paint roller located within the paint roller cleaner.

Abstract: A system including a shuttle movable along a shuttle path, the shuttle being operable to support a sheet; a pick-up assembly including a yoke and a detection plate located above the shuttle path, the detection plate being freely supported by the yoke and movable in a vertical direction relative to the yoke with an upper limit and a lower limit defined by the yoke, wherein the yoke is operable to pick and place the sheet, and wherein the detection plate is used to detect the presence of a piece of debris on a surface of the sheet or a surface of the shuttle; and a cleaning device located adjacent to the pick-up assembly and above the shuttle path, wherein the cleaning device is operable to remove the piece of debris located on the surface of the sheet or the surface of the shuttle.

Abstract: A substrate processing apparatus which holds and rotates a substrate substantially horizontally; having a control unit which controls a rinsing liquid supply mechanism for supplying a rinsing liquid onto the substrate; a gas knife mechanism that sprays gas onto the substrate to form a gas spraying zone and scans the entire substrate without rotating the substrate; a rinsing liquid mechanism for supplying a rinsing liquid onto the substrate at its area downstream from the gas spraying zone; and a drying unit for drying the substrate by rotating the substrate.

Abstract: A bottle cleaning machine and to a method for cleaning bottles with a bottle transporting device for transporting the bottles to be cleaned and with spraying nozzles. The bottle transporting device is configured such that the bottles are transported past the spraying nozzles along a substantially spiral transportation path, and preferably about a horizontal axis.

Abstract: A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.

Abstract: A protective chuck is magnetically levitated on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region of the substrate against a fluid layer covering the remaining of the substrate surface without contacting the substrate, reducing or eliminating potential damage to the substrate surface. The magnetically levitated protective chuck can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.

Abstract: A movable trash container cleaning system includes a vehicle with a spray booth and a movable access door for enclosing the spray booth. A manipulating arm is provided for engaging and lifting a container disposed outside a vehicle and inverting a container inside the spray booth. A sprayer is provided and disposed for spraying the fluid onto inside surfaces of the inverted container to clean the container and dislodge the solids. A stationary platform is provided for receiving the dislodge solids wash from the inverted container and the ram packer moves to dislodge the solids from the platform into a storage chamber in the vehicle.

Abstract: A sonication cleaning system is provided. The sonication cleaning system includes a cleaning tank configured to contain a liquid and a flow control system configured to cause a gradient cross flow of the liquid through the cleaning tank. The system further includes a sonication generator configured to agitate the liquid in the cleaning tank and a controller configured to vary a power applied to the sonication generator to agitate the liquid in the cleaning tank based on an oscillation position of a workpiece within the cleaning tank.

Abstract: A substrate processing system which enables a minute piece of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.

Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.

Abstract: The present invention relates to a method of producing a porous membrane, including a coagulation step of coagulating a membrane-forming raw material solution to form a porous membrane; a washing step of washing the porous membrane to remove material remaining in the porous membrane; a removal step of removing a hydrophilic polymer remaining in the porous membrane, in which the washing step includes transporting a porous membrane so as to contact with a falling washing solution. According to the present invention, it is possible to provide a method of producing a porous membrane capable of efficiently removing a solvent from a porous membrane within a short period of time at a low cost without large facilities; and a washing apparatus used for the production process.

Abstract: In one aspect, a substrate cleaning system is provided. The substrate cleaning system includes a plurality of cleaning modules; a conveyor for transporting a substrate between the cleaning modules; and a partition assembly that isolates the cleaning modules from the conveyor. Apparatus and methods for isolating CMP cleaning modules from a conveyor are provided, as are numerous other aspects.

Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.

Abstract: An apparatus used to supply a force onto a cleaning solution for processing a substrate for cleaning surface contaminants is disclosed. The apparatus includes a force applicator and a gate. The force applicator is configured to be adjusted to a first height off the surface of the substrate. The gate is positioned adjacent to a trailing point of the force applicator and is configured to be adjusted to a second height off of the surface of the substrate to enable planarization of the cleaning solution as the solution moves to the trailing point.

Abstract: Techniques and apparatus inhibit, limit, or remove biofouling and certain inorganic accumulations, to increase the longevity of accurate in-situ oceanographic and other underwater measurements and transducing processes. The invention deters formation of an initial bacterial layer and other precipitation, without harming the environment. The invention integrates an ultrasonic source into a sensor or other device, or its supporting structures. The ultrasonic source vibrates one or more critical surfaces of the device at a frequency and amplitude that dislodge early accumulations, thus preventing the so rest of the fouling sequence. The ultrasonic driver is activated for short periods and low duty cycles, and in some cases preferably while the device is not operating.

Abstract: The invention relates to a moistening system (1) for presses (100) for compressing material cakes (200) mixed with binding agents, preferably continuously operating presses (100), in particular for producing composite panels, preferably engineered wood boards, comprising a first moistening agent application device. The first moistening agent application device (3) comprises a first application roll (7), which can be set from above against the material cake (200) conveyed by a conveyor unit (300) of the press, at least one first dosing roll (9), which can be set against the first application roll (7), and a first moistening agent bath (11). The at least one first dosing roll (9) is immersed in the first moistening agent bath (11) for taking up moistening agent and comprises at least one wiper roll (13), which can be set against each first dosing roll (9) and by means of which the amount of moistening agent taken up by each first dosing roll (9) can be adjusted.

Abstract: Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.

Abstract: An apparatus for drying a workpiece comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member.

Abstract: In an embodiment of the present disclosure, a wind turbine blade treatment apparatus comprises a support having a frame with an edge follower configured to be positioned near an edge of a wind turbine blade. The support also includes a side member connected to the frame, configured to extend at least partially along a width of the wind turbine blade and to be positionable near the wind turbine blade. The wind turbine blade treatment apparatus further comprises a sprayer connected to the support, configured to spray fluid onto the wind turbine blade.

Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.

Abstract: A carrier for supporting a substrate during processing by a meniscus fowled by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided.

Abstract: A cleaning and drying-preventing method including: positioning a nozzle in a container such that a funnel-like inner circumferential surface of the container is located around a periphery of a distal end of the nozzle; sucking a liquid in the nozzle to retract a level of the liquid to a side of a supply passage; supplying a solvent into the container to form a swirl flow of the solvent turning around the distal end of the nozzle, and cleaning the nozzle by the swirl flow; supplying a solvent into the container to form a liquid pool of the solvent; and further retracting the level of the liquid in the nozzle to the side of the supply passage. A liquid layer, an air layer, and a solvent layer are formed in the nozzle in this order from the side of the supply passage, to prevent drying of the liquid in the nozzle.

Abstract: The endoscope reprocessor includes a basin for receiving an endoscope to be reprocessed, a rack which secures thereto a portion of the endoscope and moves vertically within the basin, a drive unit for vertically moving the rack, a positioning member for adjusting a rack stopping position when the endoscope is to be set on the rack and a drive control unit for controlling the drive unit based on computed results from the positioning member.

Abstract: A hands-free cleaning apparatus enabling a user to clean various roller pads and/or paintbrushes using a single apparatus. The apparatus includes a main housing and a lid. The housing has a bottom drain hole and legs. An attachment mechanism is provided to receive and retain a roller pad or paintbrush in a desired position within the apparatus. A spraying mechanism is provided within the housing having one or more spray nozzles arranged to spray water (or other cleaning solution) on the pad or brush in a desired spray pattern for spinning and cleaning the pad or brush. In one configuration, each spray nozzle has a spray direction that is slightly offset from other nozzles in relation to the surface of the roller pad or brush being cleaned, helping to force rotation. The spraying mechanism receives water from a hose through a hose attachment.

Abstract: A device for treating a disc-like article with a fluid, includes elements for dispensing a fluid onto the article and a chuck for holding and rotating the article around an axis perpendicular thereto. The chuck includes a base body, a drive ring, and gripping members for contacting the article at its edge. The gripping members are eccentrically movable with respect to the center of the article and driven by a drive ring rotatably mounted to the base body, so that the drive ring is rotatable against the base body around the axis. The relative rotational movement of the drive ring against the base body is carried out by either holding the base body and rotating the drive ring or by holding the drive ring and rotating the base body, whereby the to-be-held-part (drive ring or base body) is held without touching the respective to-be-held-part by magnetic force.

Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: A rapid and effective means for decontaminating fouled oil-control booms is provided. The process involves washing the boom with pressured washing fluid, reorienting the boom to facilitate full inspection, and drying the boom. This can be performed in an assembly-line manner, using one or more conveyors to transport the boom sequentially to a washing area, an inspection area, and a drying area. Consequently, contaminated oil-control booms can be cleaned and redeployed rapidly and inexpensively during an oil release accident.

Abstract: A treatment system for the surface treatment of workpieces, particularly vehicle bodies, includes a plurality of transport devices, on which at least one workpiece to be treated can be attached in a releasable manner. A conveying device moves the transport devices through the treatment system. At least one treatment bath is disposed in a first conveying plane of the treatment system and the transport devices with the workpieces arranged thereon are introduced into the treatment bath. At least one cleaning device, which is suitable and designed for cleaning the transport devices after the surface treatment of the workpieces, is disposed in a second conveying plane of the treatment system. The second conveying plane is offset in the vertical direction relative to the first conveying plane.

Abstract: The present invention relates to a device (1) for cleaning plastic chips, comprising a container (2) for the reception of the plastic chips and a stirring device (4) which is rotatably arranged about a rotational axis (400) in the container for stirring the plastic chips, wherein the stirring device (4) has a rotational body (5) which extends along the rotational axis (400), wherein the rotational body (5) has a cross section having a varying distance (a) from the rotational axis (400).

Abstract: A substrate cleaning apparatus includes a transport section that transports a substrate in a predetermined direction, and an ultrasonic oscillation section that can clean the front surface side of the substrate by applying ultrasonic waves to the back surface of the substrate which is transported in the predetermined direction by the transport section. The ultrasonic oscillation section includes a liquid supply section that brings liquid into contact with the back surface of the substrate by surface tension, and a vibrator that applies ultrasonic vibrations to the liquid.

Abstract: Inside a single apparatus main body (100), a surface treatment apparatus includes: a treatment cell (11); a vertical rotation shaft (12); an attachment/detachment device; a receiving tank (15); a cover body (16); a plurality of tanks (21); a plurality of surface treatment liquid supply devices (22); a cleaning water supply device; a drain device (3); and a first cleaning device. Upon operation of the surface treatment liquid supply device while the treatment cell (11) containing small objects is rotated by the vertical rotation shaft (12), a surface treatment is carried out on the small objects, upon operation of the cleaning water supply device, the small objects inside the treatment cell (11) are cleaned, and upon operation of the first cleaning device, the inner face of the cover body and the outer face of the treatment cell are cleaned, thus providing circulation use of surface treatment liquids in the tanks.

Abstract: Devices, including a wash ring assembly, and methods are provided for the removal of excess fluid or solids from the exterior or interior of a probe used to transfer fluids, for instance, in an automated assay device. Typically, a probe is used to aspirate and dispense a sample fluid material such as whole blood or a reagent. The devices and methods provided herein are useful for removing excess fluid from the exterior or interior of the probe so as to prevent dripping and cross-contamination between samples or reagents. It is also contemplated that, utilizing the devices and methods provided herein, washing and/or drying can be performed simultaneously as the probe is in motion, aspirating a sample and/or dispensing a sample.

Abstract: A vertical dish washing machine is disclosed to include a dish basket for carrying dishes for washing and a vertical loop conveyer system including a first transmission mechanism adapted to carry the dish basket vertically front a front top location to a front bottom location, a second transmission mechanism adapted to carry the dish basket horizontally from the front bottom location to a rear bottom location, a third transmission mechanism adapted to carry the dish basket vertically from the rear bottom location to a rear top location, and a fourth transmission mechanism adapted to carry the dish basket from the rear top location to the front top location.

Abstract: A conduit for a dishwashing appliance that is height adjustable to is provided that can accommodate different vertical positions of a rack assembly. One end of the conduit moves up and down with the rack assembly while maintaining a connection with e.g., a spray arm assembly suspended from the bottom of the rack assembly. The other end of the conduit remains in a relatively fixed vertical position during height adjustments so as to enable connection and reconnection at the fixed position of a main fluid supply conduit.

Abstract: A method and apparatus for wetting the surface of a workpiece is disclosed. The apparatus includes a chamber with a vacuum port and a fluid port and a workpiece holder including a body, a ring, and a port. The body includes a surface and defines a cavity extending from the surface. The ring is adapted to retain the workpiece on the surface of body over the cavity. The ring forms a fluid seal relative to the workpiece and to the workpiece holder. The port is defined in the body and in communication with the cavity. The port affects pressure in the cavity to minimize a pressure differential between the front and back surfaces of the workpiece. The fluid port is in communication with the chamber. The fluid port delivers a fluid (e.g., a substantially degassed fluid) to wet the front surface of the workpiece during operation of the chamber at a reduced pressure relative to atmosphere.

Abstract: A lead wire implanting apparatus is provided that can fabricate high-quality brushes that are without variations in implanting height and implanting strength and free from cracks and that can make the reproducibility of set values better and improve the workability in setup changing. The lead wire implanting apparatus has a tamping member and a storing cup for storing conductive metal powder, for implanting and fixing a lead wire to a brush main body by performing a tamping action of the tamping member a predetermined number of times. The apparatus has a linear-type servo motor serving as a drive source for driving the tamping member in vertical directions, a first position detector for detecting a shift position of the tamping member, and a controller device for controlling the linear-type servo motor based on detected information by the first position detector to cause the tamping member to perform a predetermined tamping action.

Abstract: A workpiece de-chucking device of a plasma reactor for dry-cleaning the inside of a reaction chamber and an ElectroStatic chuck (ESC) during workpiece de-chucking and a workpiece de-chucking method using the same are provided. The workpiece de-chucking device includes a lifting unit, an ICP source power unit, and a controller. The lifting unit lifts a workpiece mounted on a top surface of an ESC. The ICP source power unit forms a magnetic field in an inductive coil arranged outside a dielectric window. The controller outputs a source power control signal, a lift control signal, and a de-chucking control signal.

Abstract: An apparatus for cleaning substrates on a carrier, which has in the interior thereof a plurality of longitudinal passages, which run parallel to one another and are connected to the outside at the underside of the carrier via openings. There is provided a plurality of elongated pipes, which are arranged on a pipe holder and are connected in a fluid-conducting manner to a fluid supply. A centering template is provided, which encompasses the pipes and is displaceable in the longitudinal direction thereof between an attachment position in the end region of the pipes away from the pipe holder and a working position, which lies between the attachment position and the pipe holder. The centering template bears against the carrier, such that the pipes are then aligned exactly with the longitudinal passages.

Abstract: An apparatus is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the apparatus includes a removing station for lifting from the base a strip of the artificial turf extending in a longitudinal direction, a separating station for separating filling material from the strip and a winding station for winding the strip onto a shaft. A method is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the method includes lifting a strip of the artificial turf extending in a longitudinal direction from the base, separating infill material from the strip and winding the strip onto a shaft.

Abstract: A protruding portion (13), which has a central axis coincident with a rotational axis of a table (10), is formed at a center portion of a surface of the table (10). At the time of the surface processing, the table (10) is rotated under a state in which the processing target surface of the substrate (12) is supported horizontally at each of a plurality of parts on the table (10) spaced apart from a base end of the protruding portion (13) toward an outer peripheral end portion of the table (10) by a predetermined distance and at the same distance from a top end of the protruding portion (13). Then, a processing liquid is supplied toward the top end of the protruding portion (13). The processing liquid that has reached the processing target surface of each substrate (12) is then removed outside the table (10) by centrifugal force.

Abstract: A human-interface cleaning device for cleaning human-interface devices commonly used for the treatment sleep apnea. The cleaning device has a solvent-receiving end which connects to a solvent-delivery source such as a faucet or shower head. At the opposite end of the cleaning device is a funnel-like shaped solvent-discharge end which is tapered at its distal end and adapted to easily friction-fit into any receiving aperture of most human-interface devices. The inner chamber of the device has one or more fins each having an angled flap at their ends. As so connected to a solvent-delivery source and to a human-interface device, the cleaning device will enhance the force of the solvent being delivered through the cleaning device and more easily and effectively clean the human-interface device to which attached.

Abstract: An apparatus for cleaning cylinders (5) and/or rolls (5), e.g., working rolls (5) in a rolling stand, which are used for producing a rolled stock (1) such as strips or slabs, in which a liquid is sprayed onto the cylinders (5) at high pressure through several nozzles D1-Dn, a number of nozzles (D1-Dn) are stationary arranged in and/or on a nozzle beam (10), at least one on-off valve is associated with each nozzle (D1-Dn), and one or several nozzle(s) (D1-Dn) are sequentially switched on and off one after another starting from one end of the nozzle beam.

Abstract: A device for liquid treatment of a wafer-shaped article comprises a closed process chamber, and a ring chuck located within the closed process chamber. The ring chuck is adapted to be driven without physical contact through a magnetic bearing. A magnetic stator surrounds the closed process chamber. The closed process chamber has a cylindrical wall positioned between the ring chuck and the magnetic stator during liquid treatment of a wafer-shaped article. Various structures are provided to prevent upward ingress of processing liquid into a gap defined between the ring chuck and the cylindrical wall.

Abstract: A system, apparatus and method for processing flat articles with acoustical energy. The inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system and/or method for processing flat articles wherein a liquid is applied to both major surfaces of the flat article. A first transducer assembly is positioned adjacent to a first of the major surfaces of the flat article and a second member is positioned adjacent to a second of the major surfaces. The first transducer assembly generates and transmits acoustical energy to the first major surface of the flat article while the second member either: (1) reflects the acoustical energy generated by the first transducer assembly back to the second major surface of the flat article; and/or (2) generates and transmits acoustical energy to the second major surface of the flat article.

Abstract: Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic chuck or of a cleaning station and a surface of a substrate. The surface of the electrostatic chuck is etched with the reactive agent to remove debris. An apparatus for cleaning an electrostatic chuck is also provided, the apparatus comprising: a process chamber; an elongate arm having a reach disposed through a wall of the process chamber; an electrostatic chuck attached to the elongate arm; a cleaning station located within the reach of the elongate arm; and a reactive gas source that is operatively connected to the cleaning station.

Abstract: An apparatus for treating objects with a treatment gas comprises a treatment chamber, a chamber input through which objects enter the treatment chamber, and a chamber output (which may be the same as the chamber input) through which the objects leave the treatment chamber. The treatment chamber encloses the treatment gas, which can be steam. The chamber output and/or the chamber input include an intermediate medium, such as a liquid, through which the objects pass. The intermediate medium prevents escape of the treatment gas from the treatment chamber and the ingress of external gases into the treatment chamber, while facilitating input of the objects to the chamber, and output of the objects from the chamber.

Abstract: A washer, comprising a washing chamber defined by a pair of side walls, a top wall and a bottom wall, the washing chamber having an opened front face and an opened back face. A first shelf assembly is mounted within the washing chamber having at least one shelf section for receiving and supporting articles to be cleaned during a washing operation. A second shelf assembly is mounted within the washing chamber vertically above the first shelf. The second shelf assembly is mounted to the side walls having at least two shelf sections, at least one of the at least two shelf sections being selectively removable from the washing chamber so that additional space may be provided for larger articles on one side of the first shelf, and so that articles may be inserted into or removed from the washing chamber through the front face or back face of the washing chamber.