Abstract: A food holding device includes a holding bin and an optional heating component. The holding bin has a specified average surface roughness Ra on at least a portion of the surface intended to be contacted with food during storage of the food.

Abstract: A heater unit is adapted to determine if a humidification chamber thermally coupled to a hot plate of the heater unit is effectively dry based on determining a thermal response of a hot plate of the heater unit. Also, the activation period during which the hot plate is being heated is adjusted toward an optimum period by adjusting the energization or power level to the heater element thereof in relation to the duration of a prior activation period. Further, the air flow rate of gas through the humidification chamber may be estimated based on a temperature of the hot plate determined in predetermined relationship to the beginning of an activation period.

Abstract: A system of heating a sample on a microchip includes the steps of providing a microchannel flow channel in the microchip; positioning the sample within the microchannel flow channel, providing a laser that directs a laser beam onto the sample for heating the sample; providing the microchannel flow channel with a wall section that receives the laser beam and enables the laser beam to pass through wall section of the microchannel flow channel without being appreciably heated by the laser beam; and providing a carrier fluid in the microchannel flow channel that moves the sample in the microchannel flow channel wherein the carrier fluid is not appreciably heated by the laser beam.

Abstract: A micro heater includes a first electrode, a second electrode, a first carbon nanotube, and a second carbon nanotube. The first carbon nanotube extends from the first electrode. The second carbon nanotube branches from the second electrode. The first carbon nanotube and the second carbon nanotube intersect with each other to define a node therebetween.

Abstract: A heater plate is constructed with an embedded thermal diffusion layer of pyrolytic graphite to provide increased temperature uniformity in a critical heating surface. The heater has first and second metal plates with a heater element contained within the first plate and a core of the pyrolytic graphite diffusion layer sandwiched between the heater element and the second metal plate. The diffusion layer may be sputter metal coated to improve bonding of the layer to the plates.

Abstract: The invention relates to a combination of an electrical heating element and a heat dissipater to be heated thereby; the heating element comprises a substrate, an insulating layer located on the substrate and a thick film conductor located on the insulating layer, wherein the second side of the metallic substrate is in contact with the heat dissipater, comprising a layer of metallic material on its face towards the heater and wherein the substrate is brazed to the heat dissipater and the surface of the heating element over which the thick film conductor extends, is substantially equal to the surface of the heat dissipater. The brazing leads to a permanent contact between the heating element and the heat dissipater, so that the possible tendency for warping as caused by the heating and cooling cycles will be withstood.

Abstract: A connection assembly snap-interlocking first and second components is initiated with a first tab member provided on a first leg of the first component extending into a slot formed at an inner portion of the second component. The connection is then completed upon relatively rotating the first and second components about an axis defined by the first tab member, with a terminal bent portion of the first tab member engaging with the second component, another portion of the first tab member abutting a biasing arm extending from the second component, and a terminal portion of a second tab member, which extends from an outer edge portion of the second component, being snap-received and retained in an opening formed in a second leg of the first component.

Abstract: An apparatus for supporting a workpiece during heat-treating includes a support plate having a non-planar upper surface, and a support system. The support system is configured to support the workpiece above the support plate during heat-treating of the workpiece, such that a lower surface of an initial shape of the workpiece is supported at a non-uniform spacing above the non-planar upper surface of the support plate, said non-uniform spacing including an edge gap beneath an outer perimeter of the workpiece, and a central gap at a central axis of the workpiece.

Abstract: The hotplate for a workpiece comprises a heatable plate which on a first side comprises a support surface for the workpiece, several lifting elements for the lifting of the workpiece relative to the support surface, wherein each lifting element is moveably arranged in such a manner that the respective lifting element can be retracted with respect to the support surface and/or extended with respect to the support surface and means for heating the plate. The means for heating comprise at least one heating channel which extends on a second side of the plate located opposite the support surface and is filled with a heating fluid. The heating fluid is in contact with the plate. The lifting elements are loaded with the heating fluid in such a manner that the lifting elements are extendable through a predetermined change of the hydrostatic pressure of the heating fluid.

Abstract: Provided is a food-cooking surface for a culinary article or domestic electrical cooking appliance, consisting in depositing Zr and/or Nb and/or Ti on a substrate, the production process including a step of carburizing and/or nitriding at least one of the aforementioned elements, characterized in that the cooking surface also includes depositing Si so as to produce (Zr/Nb/Ti)—Si—(N/C) coatings. Also provided is a culinary article or domestic electrical or gas cooking appliance comprising such a cooking surface.

Abstract: A cooking apparatus is provided that comprises a housing structure, an internal heating source, an exit, a control panel, and a protective shield. The internal heating source is located within the housing structure. The exit is located at an exterior portion of the housing structure where the exit is configured to transport heat emissions from the internal heating source. The control panel is located above the exit. The protective shield is coupled to the housing structure where the protective shield is configured to deflect the heat emissions in a direction away from the control panel.

Abstract: A human skin mask heating/warming device includes a case and an electrical heating device. The case includes an upper casing and a lower casing. One end of the upper casing is pivotally connected with one end of the lower casing. The upper and lower casings can be opened/closed to enclose a mask (pack) in the case. Alternatively, the case is integrally formed with the upper and lower casings or the upper and lower casings are integrally assembled with each other to form the case. One side of the case is formed with a slot or slit. The mask (pack) can be guided into the case through the slot or slit. The electrical heating device includes an electrical unit and a heating unit. The electrical unit provides a current to the heating unit for generating heat. The heating unit is disposed on the case for providing heat to the mask (pack).

Abstract: A stage for a substrate temperature control apparatus having high reliability at low cost by preventing thermal deformation of a plate while employing a material other than ceramics as a material of the plate. The stage is used for mounting a substrate in the substrate temperature control apparatus for controlling a temperature of the substrate, and the stage includes: a plate having a first surface facing the substrate and a second surface opposite to the first surface; and a planar heater bonded to the second surface of the plate, wherein surface treatment is performed in a first thickness on the first surface of the plate, and the surface treatment is performed in a second thickness thinner than the first thickness or no surface treatment is performed on a predetermined area of the second surface of the plate.

Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Abstract: A ceramic hob includes a cooking surface for positioning a cooking pot, a housing, an electronic circuit carrier mounted in the housing beneath the cooking surface, and a positioning element on a lower side of the cooking element engaging a recess of the electronic circuit carrier.

Abstract: An operator control unit for operator control of a cooktop comprising at least two cooking zones, with at least one of the cooking zones having two heating rings that can be separately activated. The operator control unit comprises at least one selection element to select a cooking zone, at least one adjusting element, it being possible to adjust a heating power of a selected cooking zone by operating said adjusting element, and a control unit coupled to the at least one selection element and the at least one adjusting element, and which detects operation of the at least one selection element and the at least one adjusting element. The control unit can control at least one of the at least two heating rings of the selected cooking zone in the event of an operating duration in a second time period which differs from the first time period range.

Abstract: The transparent coating for one or more display areas of a glass or glass-ceramic plate is made by a process using a sol-gel paint containing alkyl silicates as binding agents. The transparent coating is provided on areas of the glass or glass-ceramic plate that have been left uncoated by a color-imparting opaque coating and is formed by applying the sol-gel paint to the areas left open and then thermally treating the sol-gel paint so as to cross-link reactive groups of the alkyl silicates. The coating has organic, non-hydrolyzable groups bound directly to silicon. A process for making the coating and the uses of the coated glass or glass-ceramic plate are part of the invention.

Abstract: Substrate transport systems, apparatus, and methods are described. In one aspect, the systems are disclosed having vertically stacked transfer chamber bodies. In one embodiment, a common robot apparatus services process chambers or load lock chambers coupled to upper and lower transfer chamber bodies. In another embodiment, separate robot apparatus service the process chambers and/or load lock chambers coupled to upper and lower transfer chamber bodies, and an elevator apparatus transfers the substrates between the various elevations. Degassing apparatus are described, as are numerous other aspects.

Abstract: A baking apparatus including a hot plate and a substrate rotation member is provided. The hot plate has a heating surface. The substrate rotation member includes a rotation ring and a plurality of support arms. The rotation ring is configured to surround the hot plate. The support arms are disposed over the heating surface of the hot plate. Each of the support arms includes a connection part and a support part, wherein the connection part is configured to connect the rotation ring and the support part, and a supporting surface of the support part for supporting the substrate is higher than the heating surface of the hot plate.

Abstract: A fluid warmer is disclosed. The fluid warmer includes a support surface, a heating element configured to selectively heat the support surface, and a switch assembly extending through the support surface. The switch assembly includes a switch, a movable switch plate, and a thermocouple. The switch has at least two states, one of which indicates the presence of an item on the support surface. The movable switch plate operably links to the switch to move the switch between the states and further includes a contact surface that contacts an item placed on the support surface. One or more thermocouples are embedded in the movable switch plate below the contact surface. The movable switch plate comprises a material having a thermal conductivity that permits the thermocouple(s) embedded in the switch plate to measure a temperature of an item placed on the support surface within a predetermined period of time.

Abstract: A far infrared ray ceramic flat plate heating module is provided. The far infrared ray ceramic flat plate heating module includes a ceramic heat-generating flat plate, an integrated terminal block for electrical distribution, a metal plate and a metal frame. The ceramic heat-generating flat plate includes a ceramic flat plate, a heat-generating film coated on a surface of the ceramic flat plate, silver paste electrodes configured on and coupled to two opposite sides of the heat-generating film, a first insulating layer coated on the heat-generating film and the silver paste electrodes, a temperature sensor configured by forming a temperature sensing paint layer on the first insulating layer, and a second insulating layer formed on the temperature sensor. The integrated terminal block is secured on the metal plate. The metal frame is disposed surrounding the periphery of the metal plate and the ceramic heat-generating flat plate.

Abstract: A substrate dividing method which can thin and divide a substrate while preventing chipping and cracking from occurring. This substrate dividing method comprises the steps of irradiating a semiconductor substrate 1 having a front face 3 formed with functional devices 19 with laser light while positioning a light-converging point within the substrate, so as to form a modified region including a molten processed region due to multiphoton absorption within the semiconductor substrate 1, and causing the modified region including the molten processed region to form a starting point region for cutting; and grinding a rear face 21 of the semiconductor substrate 1 after the step of forming the starting point region for cutting such that the semiconductor substrate 1 attains a predetermined thickness.

Abstract: A cooking appliance including a plurality of separately controlled cooking areas, a first heating element positioned below one of the plurality of separately controlled cooking areas, a second heating element positioned below the same separately controlled cooking area as the first heating element, and an infinite switch electrically coupled with the first heating element and operable to energize the first heating element to supply heat to the separately controlled cooking area when the infinite switch is located at a first position. The switch has an operational tolerance, and the first heating element is sized such that the separately controlled cooking area is maintained below a target cooking temperature when the infinite switch is located at the first position and is operating at an upper limit of the operational tolerance.

Abstract: A cooking appliance has a cooktop including a plurality of separately controlled cooking areas. A first heating element and a second heating element are positioned below one of the separately controlled cooking areas. A control switch is electrically coupled to the first heating element and the second heating element and is operable to selectively energize the first heating element with single-phase AC power and selectively energize the second heating element with two-phase AC power.

Abstract: A resistive heating element 30 has a higher molybdenum carbide content in a central portion 35 than in a peripheral portion 34. Since molybdenum carbides have a low temperature coefficient of resistance compared to molybdenum, the amount of heat generated in the central portion 35 of the resistive heating element 30 does not increase as much as in the peripheral portion 34 even when the temperature is increased, and the increase in difference in temperature between the peripheral portion 34 and the central portion 35 can be suppressed. In other words, generation of hot spots near the center can be suppressed and a good uniform heating property in a wide range of operation temperatures can be obtained.

Abstract: A heating device made of ceramics includes: a plate-like heating base having a heating surface; and a hollow cylindrical support member bonded to a back surface of the heating base. A concave surface portion that connects the back surface of the heating base and an outer surface of the support member smoothly to each other is formed in the vicinity of an outer end of a bonding interface between the heating base and the support member. On a cross section including an axis of the support member, the concave surface portion has a curved line of an arc of a ellipsoid in which a minor axis direction is parallel to an axis direction of the support member.

Abstract: A laser processing work table for processing a substrate by using a laser beam includes a base plate; a plurality of supporting blocks arranged on the base plate, each of which includes one or more penetration holes and on which the substrate is arranged; and an absorption member which is connected to the base plate and transmits an absorption force via the one or more penetration holes, such that the substrate and the plurality of supporting blocks are attached to each other.

Abstract: A cooktop includes a plurality of heaters that form a contiguous cooking zone, a power supply for the plurality of heaters with a differentiator that differentiates between a first positive heating power for a first of the plurality of heaters and a second positive heating power for a second of the plurality of heaters in a differentiated heating mode.

Abstract: Disclosed is the electric heater including a base, and a heating unit having a plurality of unit heating elements disposed on a plate surface of the base and at least one of heating connection portions configured to heat and conductively connecting the unit heating elements to each other and non-heating connection portions configured not to heat and conductively connecting the unit heating elements to each other, thereby preventing a thermal stress concentration, thus to prevent damage to the heating unit and to enhance its output.

Abstract: The invention relates to a hotplate, comprising a metal plate part and an electric heating element fixed on the lower side of the plate part. The hotplate furthermore comprises a ring. The ring is made of electrically insulating plastic, and the plate edge is accommodated in a watertight manner on the inside of the ring.

Abstract: Provided are atomic layer deposition apparatus and methods including a rotating wheel with a plurality of substrate carriers for continuous processing of substrates. The processing chamber may have a loading station on the front end which is configured with one or more robots to load and unload substrates from the substrate carriers without needing to stop the rotating wheel.

Abstract: A cooking appliance has a cooktop including a plurality of separately controlled cooking areas. A first heating element and a second heating element are positioned below one of the separately controlled cooking areas. A control switch is coupled to the first heating element and the second heating element and is operable to selectively energize the first heating element and the second heating element.

Abstract: A heater unit for a respiratory system is designed for natural convection cooling air to pass first through a transformer in the heater unit and then through a heat sink in the heater unit to which is mounted a power switch to conduct heat from the power switch to the cooling air passing through the heat sink. A thermal break may be provided between the heat sink and the transformer. The transformer may be a toroidal transformer with the air passing through an aperture thereof such as from a hollow projection of the heater unit extending into the aperture. One side of the transformer may be situated along a surface of the heater unit and the heat sink secured to the heater unit against the opposite side of the transformer to hold the transformer in place. A venting chamber may be associated with an air exhaust of the heater unit to provide a circuitous exit path for air exiting the heater unit. The venting chamber may extend in generally surrounding relationship with the heater of the heater unit.

Abstract: There is provided a cooking device that prevents an electricity conduction setting to a heating source from fluctuating when a user is not intending to operate a touch key. The cooking device includes a heating source for heating an object to be heated; a top plate provided on an upper surface of the device; a touch key that is provided on the top plate and is operable to input a control command by being touched with a finger; a cancel electrode provided at a periphery of the touch key; and a control unit for controlling an electricity conduction to the heating source based on the control command. When detecting that a portion of the top plate near the cancel electrode is touched with the finger, the control unit maintains a condition of electricity conduction to the heating source in time of the detection, and limits an operation based on the control command input to the touch key while detecting that the portion of the top plate near the cancel electrode is being touched with the finger.

Abstract: A method of securing a terminal to a ceramic heater is provided by the present disclosure. The ceramic heater includes a ceramic substrate and a resistive heating element, and the method includes exposing a portion of the resistive heating element, forming an intermediate layer on at least one of the portion of the resistive heating element and the ceramic substrate proximate the portion of the resistive heating element, the intermediate layer being selected from a group consisting of Mo/AlN and W/AlN, and bonding the terminal to the intermediate layer.

Abstract: A substrate mounting mechanism on which a target substrate is placed is provided. The substrate mounting mechanism includes a heater plate, which has a substrate mounting surface on which the target substrate is placed and has a heater embedded therein to heat the substrate to a deposition temperature at which a film is deposited. The substrate mounting mechanism also includes a temperature control jacket, which is formed to cover at least a surface of the heater plate other than the substrate mounting surface and adjusts the temperature to a non-deposition temperature below the deposition temperature.

Abstract: A power supply device having function of heating includes a body, a circuit board, and a heating plate. An accommodation space is defined in the body. The circuit board is disposed in the accommodation space. An input connector and an output connector are disposed on the circuit board. The circuit board receives an external power via the input connector, selectively transforms the external power into a first output power or a second output power, and outputs the first output power via the output connector. The heating plate is disposed on a bottom side of the body and electrically connected to the circuit board to receive the second output power to generate heat for increasing the temperature thereof. The thermal insulator is disposed between the circuit board and the heating plate for isolating heat transferred from the heating plate to the circuit board.

Abstract: A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.

Abstract: Methods and devices for securing the bottom of an item of cookware to the burner of a stove top by use of magnetism. The magnet(s) may be permanent magnets or electromagnets. The cookware may comprise a permanent magnet disposed on or in the base of the cookware. The burner comprises a magnetic material such as steel or iron. The magnetic material may be in the grate of the cook top, in the electric coil of an electric burner, in the surface of a vitroceramic or smooth-top stove top, or other component of the cook top in close proximity to the bottom of the cookware when it is on the cooking surface. The magnetic source prevents the cookware from being accidentally knocked off the cook top.

Abstract: To provide a substrate supporting/transferring tray, which can be placed on a substrate supporting part arranged in a treatment chamber in which the heat treatment is performed to a substrate, especially on a substrate supporting part having a built-in heating means for heating the substrate, and on an upper side of which, the substrate is placed. At the time of heat-treating the substrate, the substrate can be more uniformly heated, and when the heat treatment is completed, the tray can be easily removed from the substrate supporting part without waiting for the temperature of the substrate to be reduced, and can transfer the substrate to other parts from the treatment chamber in which the heat treatment is performed.

Abstract: A substrate support comprising a top ceramic plate providing a substrate support surface for supporting a substrate during substrate processing, a substrate pedestal having coolant channels formed therein and a thermoelectric deck sandwiched between the top ceramic plate and substrate pedestal. The thermoelectric deck includes a plurality of embedded thermoelectric elements that can either heat or cool the substrate support surface.

Abstract: A rapid temperature change (RTC) system includes a bake plate assembly including a heat spreader; a heater substrate coupled to the heat spreader; and a heater layer coupled to the heater substrate. The RTC system also includes a passive chill structure positioned adjacent the bake plate assembly. The passive chill structure is moveable to make physical contact with the heater layer. The passive chill structure includes a chill plate and a thermal pad coupled to the chill plate. The RTC system further includes an active chill structure positioned adjacent the passive chill structure. The passive chill structure is moveable to make physical contact with the active chill structure.

Abstract: In a plate for adjusting a temperature of a substrate, a body of the plate supports the substrate. A first channel and a second channel are disposed within the body of the plate. The first channel has a first inlet and a first outlet and passes therethrough a first fluid to adjust the temperature of the substrate. The second channel has a second inlet adjacent to the first outlet and a second outlet adjacent to the first inlet and passes therethrough a second fluid to adjust the temperature of the substrate. Further, the first and second channels are disposed side by side. Thus, the temperature of the substrate may be adjusted uniformly as a whole.

Abstract: There is provided a cooking device capable of preventing heating operations from being unintentionally turned on and off and the setting of heating operations from being changed even when water droplets are scattered around touch switches or the vicinity of the touch switches is wiped with a damp cloth or the like. Left and right cancel electrodes (5a, 5b) are provided near the key electrodes between the positions of left and right heating coils (3a, 3b) and the positions of the key electrodes (4a1, 4a2, 4a3, 4b1, 4b2, 4b3). A control unit (6) changes over between validity and invalidity of inputting through the key electrodes based on whether or not a change of capacitances of the left and right cancel electrodes (5a, 5b) is equal to or more than a predetermined amount.

Abstract: In a heating cooker, an object to be heated is placed on a top plate and is heated by a heating unit located below the top plate. The top plate is translucent and a fluorescent display tube is located below the top plate. The top plate is configured to have spectral transmission characteristics in a visible light range such that the spectral transmission at a wavelength of approximately 500 nm corresponding to blue or green is substantially one third of a spectral transmission at a wavelength of approximately 700 nm corresponding to red such that the spectral transmission is gradually rendered larger as the wavelength is increased from approximately 500 nm to approximately 700 nm.

Abstract: A planar heater 1 in which a power supply terminal unit 108 which supplies an electric power is arranged on a central portion on a lower surface of a silica glass plate-like member 102. The power supply terminal unit includes small-diameter silica glass tubes 105a and 106a, which contain a connection line which supplies an electric power to a carbon heat generator and a large-diameter silica glass tube 2 which contains the small-diameter silica glass tubes 105a and 106a. A flange portion 2a is formed on a lower end of the large-diameter silica glass tube 2, and a bent portion 2b having different diameters is formed between an upper end of the large-diameter silica glass and the flange portion 2a, and the first heat shielding plates 19, 20 and 21 configured by metal plates or opaque silica glass plates are contained in the large-diameter silica glass tube below the bent portion.

Abstract: A cooking appliance including a plurality of separately controlled cooking areas, a first heating element positioned below one of the plurality of separately controlled cooking areas, a second heating element positioned below the same separately controlled cooking area as the first heating element, and an infinite switch electrically coupled with the first heating element and operable to energize the first heating element to supply heat to the separately controlled cooking area when the infinite switch is located at a first position. The switch has an operational tolerance, and the first heating element is sized such that the separately controlled cooking area is maintained below a target cooking temperature when the infinite switch is located at the first position and is operating at an upper limit of the operational tolerance.

Abstract: A pellet warming system includes a charging unit capable of warming a plurality of pellets contemporaneously. Each of the plurality of pellets comprise an internal heating element which resistively heats the body of the pellet from a regulated electrical current that is provided from the charging unit. The charging unit also comprises a controller board with means to control the duration of electric current supplied to each of the pellets as well as means for cycling electrical current to each of the pellets in order to maintain the resistively generated heat. Once heated, each pellet may have comestible goods disposed indirectly thereon through a plate, the pellet maintaining the comestible goods at an elevated temperature for an extended period of time. The charging unit further comprises means for a user to connect their PC to the controller board in order to alter its internal programming and view its operational history.

Abstract: A cooking appliance and method of operating the same is disclosed. The method includes energizing each of a first heating element, a second heating element, and a third heating element to a maximum power level to supply heat to a separately controlled cooking area, maintaining the second heating element at the maximum power level after a predetermined time interval has elapsed, and selectively energizing the first heating element and the third heating element to the maximum power level after the predetermined time interval has elapsed.

Abstract: Methods and apparatuses that decouple wafer temperature from pre-heat station residence time, thereby improving wafer-to-wafer temperature uniformity, are provided. The methods involve maintaining a desired temperature by varying the distance between the wafer and a heater. In certain embodiments, the methods involve rapidly approaching a predetermined initial distance and then obtaining and maintaining a desired final temperature using closed loop temperature control. In certain embodiments, a heated pedestal supplies the heat. The wafer-pedestal gap may be modulated may be varied by moving the heated pedestal and/or moving the wafer, e.g., via a movable wafer support. Also in certain embodiments, the closed loop control system includes a real time wafer temperature sensor and a servo controlled linear motor for moving the pedestal or wafer support.