Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product Patents (Class 430/269)
  • Patent number: 6350403
    Abstract: The present invention relates to a process for the production of three-dimensional articles by stereolithography using a radiation-curable composition comprising a mixture of at least one cationically polymerizable compound and/or at least one free radical polymerizable compound, at least one filler material and at least one photoinitiator for cationic and/or radical polymerization. An organic viscosity stabilizer material may be brought into contact with the composition to substantially delay or prevent undesirable viscosity increase and subsequently premature polymerization. A filler material is optionally added to the composition in an effective amount to at least delay or prevent a significant increase in viscosity and polymerization. The process is particularly suitable for stabilizing resins in stereolithography baths.
    Type: Grant
    Filed: May 31, 2000
    Date of Patent: February 26, 2002
    Assignee: Vantico Inc.
    Inventors: Anastasios P. Melisaris, Stephen D. Hanna, Thomas H. Pang
  • Publication number: 20020018959
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles.
    Type: Application
    Filed: March 31, 2000
    Publication date: February 14, 2002
    Inventors: John A. Lawton, Chandler P. Chawla
  • Patent number: 6342541
    Abstract: A manufacturing method comprising the steps of forming at first solidified wax layer of a desired shape, depositing onto the first solidified wax layer at least one layer of a liquid resin formulation, solidifying the layer of liquid resin formulation, depositing a second wax layer on to the combination of the first solidified wax layer and the layer of solidified resin formulation, solidifying the second wax layer, and separating the solidified resin formulation from first and second wax layers. Preferably, the resin formulation comprises at least one monofunctional water soluble vinyl or acrylic monomer in combination with a low molecular weight aliphatic polymer having acrylic or methacrylic acid functionality. The solidified wax and resin formulation layers can be machined as may be desired to form mold of a given shape comprising wax layers when the layer of formulation is separated from the wax layers.
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: January 29, 2002
    Assignee: Advanced Ceramics Research, Inc.
    Inventors: John Lang Lombardi, Gregory John Artz
  • Patent number: 6338776
    Abstract: The present invention is directed to allowing a work piece to stabilize in regard to temperature and humidity/water content prior to precision operations so as to minimize any problems resulting from dimensional changes.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: January 15, 2002
    Assignee: Honeywell International Inc.
    Inventor: Richard J. Pommer
  • Publication number: 20020003918
    Abstract: The present invention provides a novel technique based on gray scale mask patterning (110), which requires only a single lithography and etching step (110, 120) to produce different thickness of SiO2 implantation mask (13) in selected regions followed by a one step IID (130) to achieve selective area intermixing. This novel, low cost, and simple technique can be applied for the fabrication of PICs in general, and WDM sources in particular. By applying a gray scale mask technique in IID in accordance with the present invention, the bandgap energy of a QW material can be tuned to different degrees across a wafer (14). This enables not only the integration of monolithic multiple-wavelength lasers but further extends to integrate with modulators and couplers on a single chip. This technique can also be applied to ease the fabrication and design process of superluminescent diodes (SLDs) by expanding the gain spectrum to a maximum after epitaxial growth.
    Type: Application
    Filed: March 8, 2001
    Publication date: January 10, 2002
    Inventors: Boon Siew Ooi, Yee Loy Lam, Yuen Chuen Chan, Yan Zhou, Siu Chung Tam
  • Patent number: 6333780
    Abstract: The pattern of a spatial frequency filter including a liquid crystal element (1031-103n) is controlled without removing the filter from a projection lens system. Specifically, a spatial frequency filter (103) is disposed at the pupil surface in a projection lens system (10). A means for controlling the spatial frequency filter (103) includes a liquid crystal element controller (15b) and a filter information storage (16b). A pattern required for the spatial frequency filter (103) is transferred from the filter information storage (16b) to the liquid crystal controller (15b). The transmittance and phase shift of the spatial frequency filter (103) are previously designed by simulation, for example. Based on these data, an aspect of applying a voltage to the liquid crystal element (1031-103n) is stored in the filter information storage (16b).
    Type: Grant
    Filed: June 21, 2000
    Date of Patent: December 25, 2001
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Eiji Tsukuda
  • Publication number: 20010053495
    Abstract: A method for forming microstructures in substrates simultaneously and altering their chemical character. The method involves exposing a surface portion of a substrate to laser light, which is strong enough to cause ablation of the substrate. The ablation of the substrate is controlled to form microstructures therein, such as channels. The ablation is conducted under a chemical atmosphere, which causes a change in the chemical functionality of the microstructures. The chemical atmosphere can be a gas, liquid or solid that is provided on the substrate surface. The method can be used to fabricate or modify microfluidic systems.
    Type: Application
    Filed: July 13, 2001
    Publication date: December 20, 2001
    Inventors: Emanuel A. Waddell, Timothy J. Johnson, Gary W. Kramer, Laurie E. Locascio
  • Publication number: 20010051689
    Abstract: A polymeric film composition, which can readily be applied to a sheet-configured substrate and which resists creep at room temperature, even when the sheet/film combination is stored as a roll, is disclosed.
    Type: Application
    Filed: June 26, 2001
    Publication date: December 13, 2001
    Inventors: Thomas Kevin Foreman, Mark Robert McKeever
  • Patent number: 6326124
    Abstract: An edge-covering material and a process for preventing undesirable ridges from exposure of laser-processible, photopolymerizable printing plates premounted on sleeves or cylinders is disclosed. The edge-covering material containing at least one soluble, film-forming polymer, at least one UV absorber, and a solvent or a solvent mixture is applied on the edges of the photo-polymerizable printing plate before imagewise exposure of the photopolymerizable printing plate.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: December 4, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Wolfgang Alince, Dietmar Dudek
  • Publication number: 20010046642
    Abstract: The present invention relates to a liquid, radiation-curable composition containing a cationically activated component, a cationic photoinitiator or a mixture of cationic photoinitiators, at least an effective amount of a compound having at least one terminal and/or pendant unsaturated group and at least one hydroxyl group in its molecule. The composition is free of free radical initiator. The compositions described herein are particularly useful in stereolithography process systems for producing three-dimensional articles.
    Type: Application
    Filed: February 5, 2001
    Publication date: November 29, 2001
    Inventors: David L. Johnson, Richard Leyden, Ranjana C. Patel
  • Publication number: 20010045417
    Abstract: A system and methodology for laser mass customization of integrated circuits including a mask exposure subsystem operative to configure at least one conductive layer forming part of an integrated circuit and a laser customization subsystem operative to individually customize the at least one conductive layer.
    Type: Application
    Filed: February 21, 2001
    Publication date: November 29, 2001
    Inventor: Alon M. Kapel
  • Patent number: 6292460
    Abstract: A re-usable information recording medium provided with a sensitive layer which comprises a plurality of particles having a magnetically responsive position, and a retaining material embedding the particles and having a temperature dependent viscosity, the particles and the retaining material exhibiting light absorption spectra which are different one from the other.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: September 18, 2001
    Assignee: Camena Est
    Inventor: Yury Popov
  • Patent number: 6287748
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polyethylene articles.
    Type: Grant
    Filed: July 10, 1998
    Date of Patent: September 11, 2001
    Assignee: DSM N.V.
    Inventor: John Alan Lawton
  • Patent number: 6287745
    Abstract: The present invention relates to a photocurable liquid resin composition comprising: (A) a cationically polymerizable organic compound; (B) a cationic photopolymerization initiator; (C) an ethylenically unsaturated monomer; (D) a radical photopolymerization initiator; (E) a polyether polyol compound having one or more hydroxyl groups in one molecule; and, optionally, includes elastomer particles having a specific particle diameter and/or an epoxy-branched alicyclic compound.
    Type: Grant
    Filed: February 18, 1999
    Date of Patent: September 11, 2001
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co.,
    Inventors: Tetsuya Yamamura, Akira Takeuchi, Tsuyoshi Watanabe, Takashi Ukachi
  • Publication number: 20010012596
    Abstract: Compounds of the formulae I, II, III, IV and V 1
    Type: Application
    Filed: December 12, 2000
    Publication date: August 9, 2001
    Inventors: Kazuhiko Kunimoto, Hidetaka Oka, Masaki Ohwa, Junichi Tanabe, Hisatoshi Kura, Jean-Luc Birbaum
  • Patent number: 6251557
    Abstract: The invention relates to a photosensitive resin composition for rapid prototyping comprising: a. about 30 wt. % to about 70 wt. % of at least two epoxy resins, at least one of these resins is solid at room temperature and comprises aromatic groups, and at least one of these resins is liquid, having a viscosity at 25° C. lower than about 1,000 Pa.s, b. about 15 wt. % to about 50 wt. % of at least one multifunctional acrylate compound c. about 5 wt. % to about 30 wt. % of a hydroxyfunctional compound d. about 1 wt. % to about 6 wt. % cationic photoinitiator e. about 1 wt. % to about 6 wt. % free radical photoinitiator. The invention further relates to a process for the manufacturing of 3-dimensional objects, known as rapid prototyping, wherein the photosensitive resin composition is used.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: June 26, 2001
    Assignee: DSM N.V.
    Inventors: Stephen C. Lapin, Michael G. Sullivan
  • Publication number: 20010003031
    Abstract: There is provided a photocurable resin composition comprising (A) an urethane acrylate having three or four acrylate groups in the molecule, (B) a radical polymerizable compound different from the above urethane acrylate; and (C) a photopolymerization initiator, the weight ratio of the urethane acrylate (A) to the radical polymerizable compound (B) being 80:20 to 10:90; and a production process thereof. The said photocurable resin composition can provide moldings and stereolithographed objects having excellent dimensional accuracy with a small volume shrinkage factor at the time of photo-curing and excellent heat resistance with a high thermal deformation temperature as well as excellent transparency and mechanical properties such as tensile strength.
    Type: Application
    Filed: December 15, 2000
    Publication date: June 7, 2001
    Applicant: TEIJIN SEIKI CO., LTD
    Inventors: Yorikazu Tamura, Tsuneo Hagiwara
  • Patent number: 6224708
    Abstract: A process for producing a printing form on a form cylinder, which process operates reliably even in the case of large form cylinders and high laser powers, contains the process steps of drawing a blown film tube onto the form cylinder, transferring surface elements of the tubular film, in accordance with an image, as a result of heating by a laser beam, and removing the blown film tube from the form cylinder.
    Type: Grant
    Filed: November 30, 1998
    Date of Patent: May 1, 2001
    Assignee: MAN Roland Druckmaschinen AG
    Inventors: Josef Göttling, Josef Schneider
  • Patent number: 6218071
    Abstract: A laser dye-ablative recording element comprising a support having thereon, in order, a dye layer comprising an image dye dispersed in a polymeric binder and a polymeric overcoat which contains spacer beads but which does not contain any image dye, the dye layer having an infrared-absorbing material associated therewith to absorb at a given wavelength of the laser used to expose the element, the image dye absorbing in the region of the electromagnetic spectrum of from about 300 to about 700 nm and not having substantial absorption at the wavelength of the laser used to expose the element.
    Type: Grant
    Filed: August 24, 1994
    Date of Patent: April 17, 2001
    Assignee: Eastman Kodak Company
    Inventors: Lee William Tutt, Sharon Wheten Weber
  • Patent number: 6214439
    Abstract: A composite thermoplastic continuous laminate for cladding flat or shaped panels of wooden material, said laminate having a through-colored lower layer, an intermediate layer of transparent material, and a through-colored upper layer of different color from that of said lower layer.
    Type: Grant
    Filed: October 8, 1999
    Date of Patent: April 10, 2001
    Assignee: 3B S.p.A.
    Inventors: Dino Meneghin, Stefano Lorenzon
  • Patent number: 6207341
    Abstract: According to the present invention, a method for producing a chemically adsorbed film is provided. The method includes the steps of: irradiating a surface of a polymer substrate with ultraviolet laser light so as to produce a hydrophilic group on the surface of the polymer substrate; and contacting a chemical adsorption solution containing a chlorosilane-based chemical adsorbent and a nonaqueous solvent and the polymer substrate on which the hydrophilic group is produced; and reacting the hydrophilic group of the polymer substrate with a chlorosilyl group of the chlorosilane-based chemical adsorbent for forming a covalent bond, thereby forming a chemically adsorbed film on the surface of the polymer substrate.
    Type: Grant
    Filed: June 8, 1998
    Date of Patent: March 27, 2001
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shigeo Ikuta, Kazufumi Ogawa, Mamoru Soga
  • Patent number: 6203966
    Abstract: A resin composition for forming a three-dimensional object by optical stereolithography, which contains 5 to 65 vol % of aluminum oxide fine particles having an average particle diameter of 3 to 70 &mgr;m and 5 to 30 vol % of whiskers having a diameter of 0.3 to 1 &mgr;m, a length of 10 to 70 &mgr;m and an aspect ratio of 10 to 100, the total content of the aluminum oxide fine particles and the whiskers being 10 to 70 vol %. According to the resin composition for forming a three-dimensional object by optical stereolithography, a high-quality three-dimensional object by optical stereolithography that has high heat resistance with a high heat distortion temperature and high rigidity with a high flexural modulus and that is free from a dimensional change on account of a low linear thermal expansion coefficient even when temperature varies can be obtained by optical stereolithography with high dimensional accuracy.
    Type: Grant
    Filed: October 2, 1998
    Date of Patent: March 20, 2001
    Assignee: Teijin Seiki Co., Ltd.
    Inventors: Yorikazu Tamura, Tsuneo Hagiwara
  • Patent number: 6197843
    Abstract: A process for preparation of ceramic objects which comprises: (a) applying a layer of a high-solids photocurable ceramic composition, to a substrate, the composition comprising: (1) at least 10 percent by volume of water; (2) at least 0.05 percent by weight of photocurable compounds which are soluble or dispersible in water; and (3) at least 45 volume percent dispersed ceramic particles; and (b) subjecting the composition to sufficient ultraviolet radiation to react the compounds or polymers sufficiently to form a layer of the photocurable compounds or polymers, which is water-insoluble and non-dispersible in water, having the ceramic particles dispersed therein.
    Type: Grant
    Filed: April 30, 1997
    Date of Patent: March 6, 2001
    Assignees: The Dow Chemical Company, Princeton University
    Inventors: Gene D Rose, Robert K Prud'homme, Gordon D McCann, Donald L Schmidt, Iihan A Aksay, Rajeev Garg
  • Patent number: 6162576
    Abstract: A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: December 19, 2000
    Assignee: Teijin Seiki Co., Ltd.
    Inventors: Tsuneo Hagiwara, Yorikazu Tamura
  • Patent number: 6149856
    Abstract: In making thermoset and photo-set polymer-matrix composite parts, curing is the key process step that transforms the molecular structure of the composite material, stabilizing it in the desired shape. This curing system applies carefully controlled ultraviolet (UV) radiation dosages, appropriately distributed over the entire surface of the composite part, thereby rapidly curing the material while enabling direct monitoring and control of the curing energy. Previous photo-curing methods have applied generalized radiation to a part with conventional UV lamps. We provide great benefits in cure depth, speed and process control by precisely controlling all parameters of UV dosage, by computed control, by markings on the part, or by dynamic feedback control from embedded sensors or non-contact sensors. This system can apply greater radiation dose to areas of increased quantities of resin, such as support ribs, and lesser radiation dose to areas of decreased quantities of resin.
    Type: Grant
    Filed: November 13, 1998
    Date of Patent: November 21, 2000
    Assignee: Anvik Corporation
    Inventors: Marc I. Zemel, Thomas J. Dunn
  • Patent number: 6136497
    Abstract: The present invention relates to stereolithographic compositions containing an actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, and at least one cationic reactive modifier containing at least two reactive groups per molecule or at least one polyether polyol or mixtures thereof. The cationic reactive modifier has at least one chain extension segment with a molecular weight of at least about 100 and not more than about 2,000. The polyether polyol has a molecular weight greater than or equal to about 4,000. The use of the cationically reactive modifiers and polyether polyol modifiers substantially increases the flexibility and toughness of the cured articles without compromising photospeed, accuracy and wetting-recoatability of the compositions. The present invention further relates to a method of producing a cured product, particularly three-dimensional shaped articles by treating the composition described above with actinic radiation.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: October 24, 2000
    Assignee: Vantico, Inc.
    Inventors: Anastasios P. Melisaris, Wang Renyi, Thomas H Pang
  • Patent number: 6130025
    Abstract: The stereolithographic resin composition comprising,(1)a catinically polymerizing organic compound, (2)an energy beam sensitive cationic polymerization initiator, and (3)a thermoplastic polymer compound which uniformly dissolves in said resin composition was provided. Therefore, the process for optical solid molding, which enabled the production of highly precise solid shape, was provided using said resin composition.
    Type: Grant
    Filed: November 12, 1997
    Date of Patent: October 10, 2000
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Satoyuki Chikaoka, Kazuo Ohkawa
  • Patent number: 6127092
    Abstract: Curable reaction resin mixtures which are suitable for stereolithography have the following composition:a cationically curable monomer and/or oligomer,an initiator with the following structure: ##STR1## where the following applies: R.sup.1 and R.sup.2 are alkyl or cycloalkyl, or together with the S atom they form a heterocyclic ring,R.sup.3 is H or alkyl,R.sup.4, R.sup.5, R.sup.6 and R.sup.7 are H, alkyl or alkoxy,X.sup.- is a non-nucleophilic anion,and optionally a filler, pigment and/or additive.
    Type: Grant
    Filed: June 26, 1998
    Date of Patent: October 3, 2000
    Assignee: Siemens AG
    Inventors: Lothar Schon, Wolfgang Rogler, Volker Muhrer, Manfred Fedtke, Andreas Palinsky
  • Patent number: 6124371
    Abstract: The invention relates to a composition comprising polymerizable material and an anionic photocatalyst. The photocatalyst is a photolabile compound able to liberate a strong base having a pK.sub.a .gtoreq.12. The catalyst can be illustrated by the structural formula Z-A wherein Z is a photolabile group and A is a strong base, for example, a nitrogen containing compound such as, a secondary amine, a guanidine or amidine and Z is covalently bound to A.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: September 26, 2000
    Assignee: DSM N.V.
    Inventors: Dirk A. W. Stanssens, Johan F. G. A. Jansen
  • Patent number: 6117612
    Abstract: Photocurable ceramic resins having solids loadings in excess of 40 volume percent and a viscosity of less than 3000 mPa.multidot.s are suitable for multi-layer fabrication of green ceramic parts by stereolithography and similar techniques. The green ceramic parts, which may be of traditional ceramic materials, sinterable metals, or combinations thereof, exhibit low shrinkage upon firing or sintering, and may be used for such applications as rapid prototyping, biocompatible ceramic parts, ceramic cores for investment casting, ceramic molds for metal casting, and the like.
    Type: Grant
    Filed: October 8, 1997
    Date of Patent: September 12, 2000
    Assignee: Regents of the University of Michigan
    Inventors: John W. Halloran, Michelle Griffith, Tien-Min Chu
  • Patent number: 6100007
    Abstract: The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof.
    Type: Grant
    Filed: April 6, 1998
    Date of Patent: August 8, 2000
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Thomas H. Pang, Anastasios P. Melisaris, Wang Renyi, John W. Fong
  • Patent number: 6096796
    Abstract: A photo-curable resin composition capable of providing a three-dimensional object having excellent mechanical strength and high dimensional accuracy when used in a photo-fabrication process. The resin composition is also capable of providing a three-dimensional object with excellent stability in shape and properties in a photo-fabrication process. The photo-curable composition includes:(A) a compound represented by the formula (1) ##STR1## wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom or a methyl group;(B) a compound having a cyclohexene oxide structure;(C) a cationic photo-initiator;(D) an ethylenically unsaturated monomer;(E) a radical photo-initiator; and(F) a polyol having three or more hydroxyl groups.
    Type: Grant
    Filed: December 10, 1997
    Date of Patent: August 1, 2000
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Tsuyoshi Watanabe, Tetsuya Yamamura, Akira Takeuchi, Takashi Ukachi
  • Patent number: 6096794
    Abstract: Dye compounds of the formula ##STR1## wherein X is for example CH, C--CH.sub.3 or .sup.+ NOR L.sup.- ; R is inter alia C.sub.1 -C.sub.6 alkyl; R.sub.1 is for example C.sub.1 -C.sub.8 alkoxy or C.sub.1 -C.sub.12 alkyl; s is 0 to 4; R.sub.2 is for example hydrogen; Ar is for example a group ##STR2## Y inter alia is C.sub.1 -C.sub.6 alkyl or C.sub.1 -C.sub.6 alkoxy; r in the formula (A) is 0 to 5, in the formulae (B) and (E) is 0 to 9 and in the formula (D) is 0 to 7; and L is an anion;in combination with an electron donor compound, especially a borate compound, are suitable as photoinitiators for the photopolymerization of radically polymerizable compositions.
    Type: Grant
    Filed: October 26, 1998
    Date of Patent: August 1, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Allan Francis Cunningham, Martin Kunz
  • Patent number: 6090865
    Abstract: Compounds of formula (I), ##STR1## wherein X is CH, C--CH.sub.3, C--Cl, C--O--C.sub.1 -C.sub.8 alkyl or N; R is C.sub.1 -C.sub.6 alkyl, benzyl, CH.sub.2 COOR.sub.3 or a group (a); R.sub.1 is C.sub.1 -C.sub.8 alkoxy, C.sub.1 -C.sub.12 alkyl, halogen, NO.sub.2, benzyloxy or phenyloxy, wherein the phenyl ring in the benzyloxy or phenyloxy group is unsubstituted or substituted by C.sub.1 -C.sub.6 alkoxy, C.sub.1 -C.sub.12 alkyl, halogen or CF.sub.3 ; R.sub.2 is C.sub.1 -C.sub.8 alkoxy, C.sub.1 -C.sub.12 alkyl, benzyloxy or phenyloxy, wherein the phenyl ring in the benzyloxy or phenyloxy group is unsubstituted or substituted by C.sub.1 -C.sub.6 alkoxy, C.sub.1 -C.sub.12 alkyl, halogen or CF.sub.3 ; R.sub.3 is hydrogen, C.sub.1 -C.sub.12 alkyl or benzyl; Y is unsubstituted or C.sub.1 -C.sub.6 alkoxy-substituted C.sub.1 -C.sub.6 alkyl, or Y is C.sub.1 -C.sub.6 alkoxy, halogen, CF.sub.3, NO.sub.2, benzyloxy or phenyloxy, wherein the phenyl ring in the benzyloxy or phenyloxy group is unsubstituted or substituted by C.
    Type: Grant
    Filed: October 26, 1998
    Date of Patent: July 18, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Christopher Curtis Dudman, Allan Francis Cunningham, Martin Kunz
  • Patent number: 6083697
    Abstract: Radiation-activated catalysts (RACs), autocatalytic reactions, and protective groups are employed to achieve a highly sensitive, high resolution, radiation directed combinatorial synthesis of pattern arrays of diverse polymers. When irradiated, RACs produce catalysts that can react with enhancers, such as those involved in autocatalytic reactions. The autocatalytic reactions produce at least one product that removes protecting groups from synthesis intermediates. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: July 4, 2000
    Assignee: Affymetrix, Inc.
    Inventors: Jody E. Beecher, Martin J. Goldberg, Glenn H. McGall
  • Patent number: 6069684
    Abstract: Numerous largely unpredictable criticalities of operating parameters arise in electron beam projection lithography systems to maintain throughput comparable to optical projection lithography systems as minimum feature size is reduced below one-half micron and resolution requirements are increased. Using an electron beam projection lithography system having a high emittance electron source, variable axis lenses, curvilinear beam trajectory and constant reticle and/or target motion in a dual scanning mode wherein the target and/or wafer is constantly moved orthogonally to the direction of beam scan, high throughput is obtained consistent with 0.1 .mu.m feature size ground rules utilizing a column length of greater than 400 mm, a beam current of between about 4 and 35 .mu.A, a beam energy of between about 75 and 175 kV, a sub-field size between about 0.1 and 0.
    Type: Grant
    Filed: February 4, 1998
    Date of Patent: May 30, 2000
    Assignee: International Business Machines Corporation
    Inventors: Steven D. Golladay, Paul F. Petric, Hans C. Pfeiffer, Werner Stickel
  • Patent number: 6068921
    Abstract: Carbon fluoride particles in which a number-average particle size is 0.01 to 50 .mu.m, a content of particles having such a diameter that the particles size distribution falls with in range of the number-average particle size .+-.20% amounts to at least 50% of the whole, a true specific gravity is 1.7 to 2.5, a F/C as a whole is 0.001 to 0.5, and a F/C at the surface is always larger than the F/C as a whole and is 0.1 to 2. 0. These carbon fluoride partilces are obtainable by reacting carbon particles with fluorine at 350.degree. to 600.degree. C. for one minute to six hours.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: May 30, 2000
    Assignee: Daikin Industries, Ltd.
    Inventors: Masayuki Yamana, Takahiro Kitahara, Tomohiro Isogai
  • Patent number: 6057078
    Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.
    Type: Grant
    Filed: July 23, 1998
    Date of Patent: May 2, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Allan Francis Cunningham, Martin Kunz, Hisatoshi Kura
  • Patent number: 6036910
    Abstract: A resin composition for three-dimensional object by optical stereolithography containing a colorant, such as carbon black, in an amount of 0.05 to 0.5% by weight can provide a colored three-dimensional object which has excellent physical and mechanical properties such as dimensional accuracy, shape stability, hardness and tensile strength and elastic modulus in tension, as well as light-shielding properties, gives a massive impression and is colorful at a high optical shaping speed and in a good productivity.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: March 14, 2000
    Assignee: Teijin Seiki Co., Ltd.
    Inventors: Yorikazu Tamura, Tsuneo Hagiwara
  • Patent number: 6030712
    Abstract: A printing plate material producing prints with inhibited background staining is provided by formation of a photosensitive layer comprising nitrocellulose, a black coloring agent, e.g. carbon black, and an organic binder and having (1) a surface roughness of not greater than Rmax. 2.0 .mu.m or (2) a surface tension equivalent to a wettability index of not greater than 36 dyn/cm on a support. The nitrocellulose has a nitrogen content of 11 to 12.5% and a solution viscosity of about 1 to 1/8 second. The organic binder includes polyester resins such as solvent-soluble, noncrystal-line, linear, oil-free aromatic polyesters. Based on 100 parts by weight of the organic binder, the amount of nitrocellulose is about 5 to 300 parts by weight and that of the black coloring agent is about 0.5 to 50 parts by weight. The photosensitive layer may contain a crosslinking agent, e.g. melamine resin, and/or a water repellent, e.g. a silicone compound or a fluorine-containing compound.
    Type: Grant
    Filed: April 12, 1995
    Date of Patent: February 29, 2000
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Kazuo Notsu, Yoshinori Funaki
  • Patent number: 6030745
    Abstract: An optical recording medium comprising: a substrate having pre-groove for forcing and tracking servo operation; and a recording film formed on the substrate, the recording film having optical properties being changed by applying at least one of a light beam a heating onto a portion of the recording film.
    Type: Grant
    Filed: October 23, 1998
    Date of Patent: February 29, 2000
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Hironori Goto, Hideo Kobayashi
  • Patent number: 6025114
    Abstract: 1. This invention relates to a liquid composition comprising:a) 2 to 20 parts of a monomeric poly(meth)acrylate having a functionality of at least 3 and a MW of at least 650;b) 20 to 60 parts of a urethane(meth)acrylate having a functionality of 2 to 4 and a MW of 400 to 10,000;c) 20 to 80 parts of a monomeric or oligomeric di(meth)acrylate based on bisphenol A or bisphenol F; andd) 0.1 to 10 parts of a photoinitiator;wherein all parts are by weight and the total number of parts of a)+b)+c)+d) add up to 100.The compositions are suitable for the stereolithographic production of three-dimensional articles such as models of mechanical and body parts and are particularly notable for their low curl & shrinkage coupled with fast rate of cure.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: February 15, 2000
    Assignee: Zeneca Limited
    Inventors: Ajay Haridas Popat, John Robert Lawson
  • Patent number: 6025110
    Abstract: A three-dimensional object is generated according to a stored, digital representation through layer-by-layer transfer of material onto a receiver, each layer corresponding to a layer of the three-dimensional representation. Each deposited layer is applied through selective irradiation of an ablation-transfer carrier. The carrier includes a transfer material that is ejected in response to irradiation, and which solidifies on the receiver or on a previously applied layer of transfer material. Thus, irradiation of the carrier in an area pattern corresponding to a layer results in deposition of the transfer material in accordance with the pattern. Sequential irradiations of fresh ablation-transfer carrier material, each according to a two-dimensional pattern corresponding to one of the contiguous layers of the three-dimensional object, result in depositions that gradually build up into the three-dimensional object.
    Type: Grant
    Filed: January 27, 1999
    Date of Patent: February 15, 2000
    Inventor: Michael T. Nowak
  • Patent number: 6022906
    Abstract: Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.
    Type: Grant
    Filed: December 1, 1997
    Date of Patent: February 8, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Masaki Ohwa, Hitoshi Yamoto, Jean-Luc Birbaum, Hiroko Nakashima, Akira Matsumoto, Hidetaka Oka
  • Patent number: 6017973
    Abstract: A photocurable resin composition comprising (A) at least one urethane di- or triacrylate, which is a novel compound, (B) a radical polymeriable compound, and (C) a photopolymerization initiator, the weight ratio of the urethane acrylate (A) to the radical polymerizable compound (B) being 65/35 to 25/75; a method of producing a photo-cured object by photo-curing the above composition; a vacuum casting mold obtained by the above method; and a vacuum casting method using the above mold.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: January 25, 2000
    Assignee: Teijin Seiki Company, Ltd.
    Inventors: Yorikazu Tamura, Tsuneo Hagiwara, Yasushi Ishihama, Minoru Kayanoki, Takakuni Ueno
  • Patent number: 6010828
    Abstract: The present invention provides a method of and a device for planarizing a photosensitive material, such as a photoresist, located over an irregular surface of a semiconductor wafer. In one embodiment, the method comprises the steps of passing radiation through a first medium and a second medium wherein the first medium is interfaced with the second medium. The method further comprises the steps of passing the radiation from the second medium into the photosensitive material that is interfaced with the second medium to expose the photosensitive material. The first and second mediums and the photosensitive material have radiation absorption coefficients such that the radiation terminates substantially within a plane of the photosensitive material. The method further includes the step of etching the exposed photosensitive material to the plane.
    Type: Grant
    Filed: February 19, 1998
    Date of Patent: January 4, 2000
    Assignee: Lucent Technologies Inc.
    Inventor: Maxwell W. Lippitt
  • Patent number: 6007962
    Abstract: An ablative recording element comprising a support having thereon a dye layer comprising a dye dispersed in a polymeric binder and solvent, the dye layer having an infrared-absorbing material associated therewith, and wherein the dye layer also contains dye-absorbing beads which can be:a) polymeric beads which are swellable in the solvent and which are covalently crosslinked to an extent which does not exceed 1.times.10.sup.-4 mole of crosslink per gram of polymer; orb) beads which have a porosity of at least 150 m.sup.2 /gram.
    Type: Grant
    Filed: June 15, 1998
    Date of Patent: December 28, 1999
    Assignee: Eastman Kodak Company
    Inventors: Glenn T. Pearce, Paul E. Woodgate
  • Patent number: 5998088
    Abstract: A laser ablative recording element comprising a support having thereon a recording layer comprising a pigment dispersed in a polymeric binder, the polymeric binder having an infrared-absorbing material dissolved therein, and wherein the polymeric binder is obtained from an aqueous latex dispersion of a polycyanoacrylate copolymer having the formula: ##STR1## wherein: R is a substituted or unsubstituted alkyl group having from 1 to about 20 carbon atoms;VA is a repeating unit resulting from the polymerization of a vinyl-containing monomer with a pendant ionizable group; and the weight ratios of x:y range from about 97:3 to about 70:30.
    Type: Grant
    Filed: August 3, 1998
    Date of Patent: December 7, 1999
    Assignee: Eastman Kodak Company
    Inventors: Douglas R. Robello, Michael T. Swanson
  • Patent number: 5989780
    Abstract: Printing plates are formed from a layer of photo polymerizable resin by a process and assembly which includes a negative of the image or images to be formed in the printing plate. The negative is placed on a lower glass support plate and a bank of lights is disposed below the lower glass support plate. A cover film is laid down on the negative, and a very thin layer of resin, called a cap resin, is deposited on the cover film. A layer of the resin to be cross-linked is deposited on the cap resin layer, and the cross-linked resin layer is covered with a polyester sheet, on the top of which an upper glass plate is lowered. The cap resin layer and the cross-linked resin layer are both laid down on the lower glass plate assembly by meas of a carriage assembly that traverses over the lower glass plate assembly, and which carries the cross-linking resin and cap resin reservoir. The thickness of the cross-linked resin layer varies widely, while the thickness of the cap resin layer is narrowly confined.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: November 23, 1999
    Assignee: MacDermid Imaging Technology Incorporated
    Inventor: Kenneth M. Strong
  • Patent number: 5989772
    Abstract: A laser-exposed thermal recording element comprising a support having thereon a dye layer comprising a dye dispersed in a polymeric binder, the dye comprising a laser light-absorbing dye absorbing at the wavelength of a laser used to expose the element, wherein the dye layer also contains a stabilizing IR-absorbing dye with an absorption wavelength maximum approximately equal to or longer than that of the laser light-absorbing dye.
    Type: Grant
    Filed: November 8, 1996
    Date of Patent: November 23, 1999
    Assignee: Eastman Kodak Company
    Inventors: Lee W. Tutt, Mitchell S. Burberry, Gary M. Underwood