Susceptor for a crossflow chemical vapor deposition reactor

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Description

FIG. 1 is a front perspective view of a susceptor for a crossflow chemical vapor deposition reactor showing our new design;

FIG. 2 is a rear perspective view thereof;

FIG. 3 a front view thereof;

FIG. 4 is a rear view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a top view thereof; and,

FIG. 8 is a bottom view thereof.

The broken lines define portions of the susceptor for a crossflow chemical vapor deposition reactor that form no part of the claimed design.

Claims

The ornamental design for a susceptor for a crossflow chemical vapor deposition reactor as shown and described.

Referenced Cited
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Patent History
Patent number: D1154542
Type: Grant
Filed: Apr 29, 2025
Date of Patent: Oct 20, 2026
Assignee: ASM IP Holding B.V. (Almere)
Inventors: Qichao Hu (Tempe, AZ), Ion Hong Chao (Gilbert, AZ), Fan Gao (Chandler, AZ), Han Ye (Phoenix, AZ), Junwei Su (Chandler, AZ), Wentao Wang (Chandler, AZ)
Primary Examiner: Catherine S Posthauer
Assistant Examiner: Mary Claire Nemeth
Application Number: 30/001,588