Target profile for a physical vapor deposition chamber target

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a right side elevation view thereof.

FIG. 5 is a left side elevation view thereof.

FIG. 6 is a front elevation thereof.

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is an enlarged partial right side elevation view showing portions of the design in greater detail.

The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.

The long dash sort dash broken lines in FIG. 4 and FIG. 8 represent the region of enlargement taken from FIG. 4 as shown on FIG. 8 and form no part of the claimed design.

Claims

We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

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Patent History
Patent number: D940765
Type: Grant
Filed: Dec 2, 2020
Date of Patent: Jan 11, 2022
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: David Gunther (Santa Clara, CA), Jiao Song (Singapore), Kirankumar Neelasandra Savandaiah (Bangalore), Madan Kumar Shimoga Mylarappa (Bengaluru)
Primary Examiner: Calvin E Vansant
Assistant Examiner: Mark T. Philipps
Application Number: 29/760,578