Abstract: A memory device includes a bit line, a reading word line, a bit line contact, an electrode, a writing word line and a contact tip. The bit line is formed on a substrate. The reading word line is formed over the bit line. The bit line contact is disposed between adjacent reading word lines. The electrode extends substantially in parallel to the reading word line and includes a conductive material being bent in response to an applied voltage. The writing word line is formed over the electrode and is separated from the electrode. The contact tip is formed at an end portion of the electrode and is separated from the reading and the writing word lines. The contact tip protrudes toward the reading word line or writing word line.

Abstract: A memory may be implemented with a stable chalcogenide glass which is defined as a generally amorphous chalcogenide material that does not change to a generally crystalline phase when exposed to 200° C. for 30 minutes or less. Different states may be programmed by changing the threshold voltage of the material. The threshold voltage may be changed with pulses of different amplitude and/or different pulse fall times. Reading may be done using a reference level between the threshold voltages of the two different states. A separate access device is generally not needed.

Abstract: A sense amplifier includes a first transistor having a gate electrode electrically connected to a bit line and a first electrode electrically connected to a complementary bit line. A second transistor has a gate electrode electrically connected to the complementary bit line and a first electrode electrically connected to the bit line. An equalizing transistor is disposed between the gate electrode of the first transistor and the gate electrode of the second transistor. The first electrode of the first transistor and a first electrode of the equalizing transistor are electrically connected to each other, and the first electrode of the second transistor and a second electrode of the equalizing transistor are electrically connected to each other.

Abstract: A semiconductor memory device has a semiconductor substrate, first select transistors formed on the surface of said semiconductor substrate, first dummy transistors formed above said first select transistors, a plurality of memory cell transistors formed above said first dummy transistors so as to extend in a direction perpendicular to the surface of said semiconductor substrate, each of said memory cell transistor including an insulating layer having a charge-accumulating function, second dummy transistors formed above said memory cell transistors, and second select transistors formed above said second dummy transistors; wherein a first potential is provided to the gate electrodes of said first select transistors and the gate electrodes of said first dummy transistors and a second potential is provided to the gate electrodes of said second select transistors and the gate electrodes of said second dummy transistors at the time of write operation to write data to said memory cell transistors.

Abstract: A microelectronic programmable structure and methods of forming and programming the structure are disclosed. The programmable structure generally include an ion conductor and a plurality of electrodes. Electrical properties of the structure may be altered by applying a bias across the electrodes, and thus information may be stored using the structure.

Abstract: A dynamically-operating restoration circuit is used to apply a voltage or current restore pulse signal to thyristor-based memory cells and therein restore data in the cell using the internal positive feedback loop of the thyristor. In one example implementation, the internal positive feedback loop in the thyristor is used to restore the conducting state of a device after the thyristor current drops below the holding current. A pulse and/or periodic waveform are defined and applied to ensure that the thyristor is not released from its conducting state. The time average of the periodic restore current in the thyristor may be lower than the holding current threshold. While not necessarily limited to memory cells that are thyristor-based, various embodiments of the invention have been found to be the particularly useful for high-speed, low-power memory cells in which a thin capacitively-coupled thyristor is used to provide a bi-stable storage element.

Abstract: A device in accordance with embodiments of the present invention comprises a contact probe for high density data storage reading, writing, erasing, or rewriting. In one embodiment, the contact probe can include a silicon core having a conductive coating. Contact probes in accordance with the present invention can be applied to a phase change media, for example, to form an indicia in the phase change media by changing the electrical resistivity of a portion of the phase change media.

Abstract: A semiconductor device, such as a memory device or radiation detector, is disclosed, in which data storage cells are formed on a substrate. Each of the data storage cells includes a field effect transistor having a source, drain, and gate, and a body arranged between the source and drain for storing electrical charge generated in the body. The magnitude of the net electrical charge in the body can be adjusted by input signals applied to the transistor, and the adjustment of the net electrical charge by the input signals can be at least partially cancelled by applying electrical voltage signals between the gate and the drain and between the source and the drain.

Abstract: A reset method of a non-volatile memory is described. The non-volatile memory includes a plurality of cells on a substrate of a first conductivity type, each including a portion of the substrate, a control gate, a charge-storing layer between the portion of the substrate and the control gate, and two S/D regions of a second conductivity type in the portion of the substrate. The reset method utilizes a DSB-BTBTHH effect. A first voltage is applied to the substrate and a second voltage to both S/D regions of each cell, wherein the difference between the first and second voltages is sufficient to cause band-to-band tunneling hot holes. A voltage applied to the control gate and the period of applying the voltages are controlled such that the threshold voltages of all the cells converge in a tolerable range.

Abstract: A nonvolatile memory device includes a plurality of strings each of which is configured with a first select transistor, a second select transistor, and a plurality of memory cells connected in series between the first and second select transistors. A common source line is connected to a source of the second select transistor. A metal interconnection is electrically insulated from the common source line, and connected to the source of the second select transistor.

Abstract: To provide a memory device which operates with low power consumption, has high reliability of the stored data, and is small-size, light-weight and inexpensive, and a driving method thereof. In addition, to provide a semiconductor device which operates with low power consumption, has high reliability of the stored data and a long distance of radio frequency communication, and is small-size, light-weight and inexpensive, and a driving method thereof. The memory device includes a memory cell array in which at least memory elements are arranged in matrix, and a writing circuit. The memory element has a first conductive layer, a second conductive layer, and an organic compound layer formed therebetween, and the writing circuit includes a voltage generating circuit for generating a voltage in order to apply at plural times, and a timing controlling circuit for controlling output time of the voltage.

Abstract: A method for operating memory used for enabling the memory device to have a first threshold voltage or a second threshold voltage is provided. The method includes the following procedures. First, an operating voltage is applied to a gate of the memory device for a first time period, such that the memory device has the first threshold voltage. Next, the same operating voltage is applied to the gate of the memory for a second time period, such that the memory device has a second threshold voltage. The duration of the first time period is different from the duration of the second time period.

Abstract: Non-volatile and radiation-hard switching and memory devices using vertical nano-tubes and reversibly held in state by van der Waals' forces and methods of fabricating the devices. Means for sensing the state of the devices include measuring capacitance, and tunneling and field emission currents.

Abstract: According to the semiconductor memory device of the embodiment, in the sense amplifier for the FBC, a first node and a second node can be disconnected from each other by a first isolation transistor. A third node and a fourth node can be disconnected from each other by a second isolation transistor. The first node is connected to the first memory cell. The third node is connected to the second memory cell. A first amplification transistor and a second amplification transistor are connected between the first node and the third node. A third amplification transistor and a fourth amplification transistor are connected between the second node and the fourth node. This enables to parallelly execute read data transfer to the data lines and precharge to prepare for the next read operation.

Abstract: In a memory device having first and second electrodes and active and passive layers between the electrodes, or a memory device having first and second electrodes and an insulating layer between and in contact with electrodes, the device may be programmed in the ionic mode by applying electrical potential across the electrodes in one direction, and may be programmed in the electronic charge carrier mode by applying electrical potential across electrodes in the opposite direction

Abstract: A memory device, and associated methods of manufacture and operation are described. The memory device includes at least one memory unit comprising a substrate (120) supporting mobile charge carriers. Insulative features (130, 132, 134) formed on the substrate surface define first and second substrate areas (122, 124) on either side of the insulative features. The first and second substrate areas are connected by an elongate channel (140) defined by the insulative features. The memory unit is switchable between a first state in which the channel provides a first conductance between the first and second areas at a predetermined potential difference between said first and second areas, and a second state in which the channel provides a second, different conductance between the first and second areas at the predetermined potential difference.

Abstract: A memory device is provided which includes a substrate, a common P-well isolated from the substrate, a plurality of sectors, and a common sector selection transistor configured to select one of the sectors for erasure. Each of the sectors share the same common sector select transistor, and the common P-well. The selected sector is configured to be erased by applying appropriate voltages to the selected sector.

Abstract: Optically-coupled memory systems are disclosed. In one embodiment, a system memory includes a carrier substrate, and a controller attached to the carrier substrate and operable to transmit and receive optical signals, and first and second memory modules. The module substrate of the first memory module has an aperture formed therein, the aperture being operable to provide an optical path for optical signals between the controller and an optical transmitter/receiver unit of the second memory module. Thus, the system memory provides the advantages of “free space” optical connection in a compact arrangement of memory modules. In an alternate embodiment, the first memory module includes a beam splitter attached to the module substrate proximate the aperture. In another embodiment, the first and second memory modules are staged on the carrier substrate to provide an unobstructed path for optical signals.

Abstract: A semiconductor device comprising floating body memory cells performs read and write operations by selectively connecting bit lines and inverted bit lines to sense bit lines and inverted sense bit lines.

Abstract: A semiconductor memory device includes a memory cell array having first and second blocks, respectively including first and second memory cells with floating bodies. The first memory cell is connected between a first bit line and a source line, and the second memory cell is connected between a second bit line and the source line. A sense amplifier equalizes the sense bit line and the inverted sense bit line to be an equalization voltage during an equalization operation, pre-charges the sense bit line and the inverted sense bit line to first and second pre-charge voltages during a pre-charge operation, and amplifies a voltage difference between the sense bit line and the inverted sense bit line during read and write operations. The first pre-charge voltage is higher than the equalization voltage and the second pre-charge voltage is higher than the equalization voltage and lower than the first pre-charge voltage.

Abstract: A semiconductor nonvolatile storage circuit capable of stably storing and holding information by preventing pseudo-writing in storing/holding FETs is realized. The semiconductor nonvolatile circuit includes a first FET MNM1 forming a source-drain path between a ground potential GND and a bit line BL; a second FET MNM2 forming a source-drain path between the ground potential GND and a differential pair line BL_; a third FET MNM3 to open/close the connection between a drain terminal of the first FET MNM1 and the bit line BL; and a fourth FET MNM4 to open/close the connection between a drain terminal of the second FET MNM2 and the differential pair line BL_.

Abstract: A method of reading a dual-bit memory cell includes a controlling terminal, a first terminal, and a second terminal. The dual-bit memory cell has a first bit storage node and a second bit storage node near the first terminal and the second terminal respectively. First, a controlling voltage and a read voltage are applied to the controlling terminal and the first terminal respectively. The second terminal is grounded to measure a first output current value of the first terminal. Then, the controlling voltage and the read voltage are applied to the controlling terminal and the second terminal respectively. The first terminal is grounded to measure a second output current value of the second terminal. Afterward, the bit state of the first bit storage node and the bit state of the second bit storage node is read simultaneously according to the first output current value and the second output current value.

Abstract: Optically-coupled memory systems are disclosed. In one embodiment, a system memory includes a carrier substrate, and a controller attached to the carrier substrate and operable to transmit and receive optical signals, and first and second memory modules. The module substrate of the first memory module has an aperture formed therein, the aperture being operable to provide an optical path for optical signals between the controller and an optical transmitter/receiver unit of the second memory module. Thus, the system memory provides the advantages of “free space” optical connection in a compact arrangement of memory modules. In an alternate embodiment, the first memory module includes a beam splitter attached to the module substrate proximate the aperture. In another embodiment, the first and second memory modules are staged on the carrier substrate to provide an unobstructed path for optical signals.

Abstract: A device in accordance with embodiments of the present invention comprises a contact probe for high density data storage reading, writing, erasing, or rewriting. In one embodiment, the contact probe can include a silicon core having a conductive coating. Contact probes in accordance with the present invention can be applied to a phase change media, for example, to form an indicia in the phase change media by changing the electrical resistivity of a portion of the phase change media.

Abstract: A short circuit detection region includes an insulating film, plural first conductor traces and plural second conductor traces which are embedded in the insulating film with only their surfaces being exposed, and the first conductor trace is constructed by integrally forming a band-shaped portion and plural via portions which are electrically connected to a silicon semiconductor substrate.

Abstract: A semiconductor memory cell structure having 4 F2 dimensions and method for forming the same. The memory cell is formed on a surface of a substrate and includes an active region formed in the substrate, a semiconductor post formed on the surface of the substrate over the active region and a capacitor is formed on the semiconductor post. A vertical access transistor having a gate structure formed on the semiconductor post is configured to electrically couple the respective memory cell capacitor to the active region when accessed.

Abstract: A dual port SRAM cell includes at least one pair of cross-coupled inverters connected between a power line and complementary power line. A number of pass gate transistors connect the cross-coupled inverters to a first bit line, a first complementary bit line, a second bit line, and a second complementary bit line on a first metal layer in the memory device. A first word line is coupled to gates of the first and second pass gate transistors, located on a second metal layer in the memory device. A second word line is coupled to gates of the third and fourth pass gate transistors, located on a third metal layer in the memory device, wherein the first, second and third metal layers are at different levels.

Abstract: The invention relates to a dynamic multifunctional module and to an electronic communication device comprising a main body part, a sliding body part, said parts being connected together with sliding contact, and a dynamic multifunctional module, the dynamic multifunctional module being joint from one edge to the main body part with an articulation and in linked connection to sliding body part and the dynamic multifunctional module being in a first position when the said sliding body part is in closed position and turned by an angle around the articulation to a second position by the sliding body part when the sliding body part is moved to open position. The invention also includes a method for changing an image capturing direction of an electronic communication device.

Abstract: A switch contains a first semiconductor die, which is configured to receive signals on a plurality of input ports and to output the signals on a plurality of output ports. The first semiconductor die is further configured to selectively couple the signals between the input and output ports using a plurality of switching elements in accordance with a set of control signals, which correspond to a configuration of the switch. During this process, a plurality of proximity connectors, proximate to a surface of the semiconductor die, are configured to communicate the signals by capacitive coupling.

Abstract: A DAC having a memory mat including a plurality of first memory cells, and a plurality of output lines connected to the plurality of first memory cells. Each of the plurality of memory cells has a first memory portion including bipolar transistors and storing information in non-volatility based on whether a junction of the bipolar transistors is destroyed or not, and a second memory portion connected to the first memory portion and for outputting information to corresponding one of the plurality of output lines. The DAC has a first mode in which information is transferred from the first memory portions to the second memory portions when the information is written into the second memory portions, and a second mode in which the second memory portions are specified externally and information is written into the second memory portions.

Abstract: Disclosed are layered groupings and methods for constructing digital circuitry, such as memory known as Permanent Inexpensive Rugged Memory (PIRM) cross point arrays which can be produced on flexible substrates by patterning and curing through the use of a transparent embossing tool.

Abstract: Structures and methods of adding metal-to-metal capacitors to static memory cells to reduce susceptibility to SEUs. The addition of metal-to-metal capacitors is particularly suited to programmable logic devices (PLDs), because of the relatively large area required to implement an effective metal-to-metal capacitor, compared (for example) to the size of the static memory cell itself. The configuration memory cells of PLDs are typically placed next to other logic (e.g., the configurable elements controlled by the configuration memory cells) that can be overlain by the metal-to-metal capacitors. Therefore, metal-to-metal capacitors can be used in PLD configuration memory cells where they might be impractical in simple memory arrays. However, metal-to-metal capacitors can also be applied to integrated circuits other than PLDs.

Abstract: Disclosed are methods for deposition of improved memory element films for semiconductor devices. The methods involve providing a hard mask over an upper surface of a metal line of a semiconductor substrate where vias are to be placed, recess etching the mask substantially in all upper surfaces except where vias are to be placed, depositing a Ta-containing capping layer over substantially all the metal line surfaces except the surface where vias are to be placed, polishing the Ta-containing capping layer to produce a damascened Ta-containing cap while exposing the metal line at the via forming surface, depositing a dielectric layer, patterning the dielectric layer to form a via, and depositing memory element films. The improved Ta—Cu interface of the subject invention mitigates and/or eliminates lateral growth of memory element films and copper voiding under the dielectric layer at the top surface of the metal line, and thereby enhances reliability and performance of semiconductor devices.

Abstract: The invention provides a method of forming a charge electrode array for a binary continuous inkjet printer, the method including forming the charge electrodes and the driver circuitry for the charge electrodes using common process steps. The process steps are preferably those associated with polycrystalline silicon thin-film transistor technology. The invention further provides a charge electrode array for a binary continuous inkjet printer when formed according to the inventive method. Such an array may not only be formed integrally with the driver electronics, but also with a phase detector, a deflector, and a velocity detector.

Abstract: Optically-coupled memory systems are disclosed. In one embodiment, a system memory includes a carrier substrate, and a controller attached to the carrier substrate and operable to transmit and receive optical signals, and first and second memory modules. The module substrate of the first memory module has an aperture formed therein, the aperture being operable to provide an optical path for optical signals between the controller and an optical transmitter/receiver unit of the second memory module. Thus, the system memory provides the advantages of “free space” optical connection in a compact arrangement of memory modules. In an alternate embodiment, the first memory module includes a beam splitter attached to the module substrate proximate the aperture. In another embodiment, the first and second memory modules are staged on the carrier substrate to provide an unobstructed path for optical signals.

Abstract: A word line driver is provided for accessing a DRAM cell embedded in a conventional logic process. The DRAM cell includes a p-channel access transistor coupled to a cell capacitor. The word line driver includes an n-channel transistor located in a p-well, wherein the p-well is located in a deep n-well. The deep n-well is located in a p-type substrate. A word line couples the drain of the n-channel transistor to the gate of the p-channel access transistor. A negative boosted voltage supply applies a negative boosted voltage to the p-well and the source of the n-channel transistor. The negative boosted voltage is less than ground by an amount equal to or greater than the threshold voltage of the p-channel access transistor. The deep n-well and the p-type substrate are coupled to ground. The various polarities can be reversed in another embodiment.

Abstract: A semiconductor memory device includes a plurality of N and P channel MOS transistors. The plurality of MOS transistors are formed on an SOI (Silicon On Insulator) substrate. Each MOS transistor includes a source region, a drain region, and a body region located between the source region and the drain region. The body region of at least one N channel MOS transistor is electrically fixed. The body region of at least one P channel MOS transistor is rendered floating.

Abstract: A device in accordance with embodiments of the present invention comprises an atomic probe for high density data storage reading, writing, erasing, or rewriting. In one embodiment, the atomic probe can include a core having a conductive coating. The core can comprise an insulating or conducting material, and the coating can comprise one or more of titanium nitride, platinum, diamond-like carbon, tungsten carbide, tungsten, and tungsten oxide. Atomic probes in accordance with the present invention can be applied to a phase change media, for example to form an indicia in the phase change media by changing the structure of a portion of the media from one of a crystalline or amorphous structure to the other of the crystalline and amorphous structure.

Abstract: The preferred embodiments described herein provide a memory device and methods for use therewith. In one preferred embodiment, a method is presented for using a file system to dynamically respond to variability in an indicated minimum number of memory cells of first and second write-once memory devices. In another preferred embodiment, a method for overwriting data in a memory device is described in which an error code is disregarded after a destructive pattern is written. In yet another preferred embodiment, a method is presented in which, after a block of memory has been allocated for a file to be stored in a memory device, available lines in that block are determined. Another preferred embodiment relates to reserving at least one memory cell in a memory device for file structures or file system structures. A memory device is also provided in which file system structures of at least two file systems are stored in the same memory partition.

Abstract: A method of metal doping a chalcogenide material includes forming a metal over a substrate. A chalcogenide material is formed on the metal. Irradiating is conducted through the chalcogenide material to the metal effective to break a chalcogenide bond of the chalcogenide material at an interface of the metal and chalcogenide material and diffuse at least some of the metal outwardly into the chalcogenide material. A method of metal doping a chalcogenide material includes surrounding exposed outer surfaces of a projecting metal mass with chalcogenide material. Irradiating is conducted through the chalcogenide material to the projecting metal mass effective to break a chalcogenide bond of the chalcogenide material at an interface of the projecting metal mass outer surfaces and diffuse at least some of the projecting metal mass outwardly into the chalcogenide material. In certain aspects, the above implementations are incorporated in methods of forming non-volatile resistance variable devices.

Abstract: A memory array includes a sensing circuit for sensing bit line current while keeping the voltage of the selected bit line substantially unchanged. The word lines and bit lines are biased so that essentially no bias voltage is impressed across half-selected memory cells, which substantially eliminates leakage current through half-selected memory cells. The bit line current which is sensed arises largely from only the current through the selected memory cell. A noise detection line in the memory array reduces the effect of coupling from unselected word lines to the selected bit line. In a preferred embodiment, a three-dimensional memory array having a plurality of rail-stacks forming bit lines on more than one layer, includes at least one noise detection line associated with each layer of bit lines. A sensing circuit is connected to a selected bit line and to its associated noise detection line.

Abstract: The present invention provides an organic bistable device for use in non-volatile memories. The organic bistable device comprises a first and a second metal electrode sandwiching a first and a second organic layer with a metal-nanocluster layer positioned between the first and second organic layers. The device further comprises a first electron blocking layer positioned between the metal-nanocluster layer and one of the metal electrodes. This structure provides an organic bistable device with improved charge retention characteristics.

Abstract: A two-transistor SRAM cell includes a first FET. The first FET is an ultrathin FET of a first polarity type and includes a control electrode, a first load electrode and a second electrode. The first load electrode is coupled to a first control line. The SRAM cell also includes a second FET. The second FET is an ultrathin FET of a second polarity type and includes a gate, a source and a drain. The second FET source is coupled to the first FET gate. The second FET gate is coupled to the first FET drain and the second FET source is coupled to a first potential. The SRAM cell further includes a first load device that is coupled between a second potential and the first FET gate. The SRAM cell additionally includes a second load device coupled between the second FET gate and a second control line.

Abstract: A high density vertical single transistor gain cell is realized for DRAM operation. The gain cell includes a vertical transistor having a source region, a drain region, and a floating body region therebetween. A gate opposes the floating body region and is separated therefrom by a gate oxide on a first side of the vertical transistor. A floating body back gate opposes the floating body region on a second side of the vertical transistor and is separated therefrom by a dielectric to form a body capacitor.

Abstract: A semiconductor storage device according to one embodiment of the present invention, comprising: FBCs (Floating Body Cells) which store data by accumulating a majority carrier in a floating channel body; and sense amplifiers which perform control reading out data stored in said FBC, wherein each of said sense amplifier includes: a pair of sense nodes provided corresponding to a bit line pair to which said FBC is connected; a pair of load which flow currents through said pair of sense nodes; latch circuits which latch potentials of said pair of sense nodes when a potential difference between said pair of sense nodes reaches a predetermined value; and an output control circuit which outputs latched outputs of said latch circuits at a predetermined timing and feeds back the latched outputs to said bit line pair side to again write it into said FBC.

Abstract: A programmable sub-surface aggregating metallization structure (“PSAM”) includes an ion conductor such as a chalcogenide-glass which includes metal ions and at least two electrodes disposed at opposing surfaces of the ion conductor. Preferably, the ion conductor includes a chalcogenide material with Group IB or Group IIB metals. One of two electrodes is preferably configured as a cathode and the other as an anode. When a voltage is applied between the anode and cathode, a metal dendrite grows from the cathode through the ion conductor towards the anode. The growth rate of the dendrite may be stopped by removing the voltage or the dendrite may be retracted back towards the cathode by reversing the voltage polarity at the anode and cathode.

Abstract: A semiconductor memory device includes a plurality of N and P channel MOS transistors. The plurality of MOS transistors are formed on an SOI (Silicon On Insulator) substrate. Each MOS transistor includes a source region, a drain region, and a body region located between the source region and the drain region. The body region of at least one N channel MOS transistor is electrically fixed. The body region of at least one P channel MOS transistor is rendered floating.

Abstract: A circuit generally comprising a core circuit and a test access port circuit. The core circuit may be configurable among a plurality of functions in response to a signal. The test access port circuit may be configured to determine an identification value in response to the signal.

Abstract: The invention relates to interconnects for an integrated circuit memory device. Embodiments of the invention include processes to fabricate interconnects for memory devices in relatively few steps. Embodiments of the invention further include memory devices with metallization layers having unequal pitch dimensions in different areas of the chip, thereby permitting simultaneous fabrication of array electrodes and electrical interconnects in different areas of the chip. This reduces the number of fabrication steps used to make interconnects, thereby speeding up fabrication and reducing production costs.

Abstract: A negative differential resistance (NDR) field-effect transistor element is disclosed, formed on a silicon-based substrate using conventional MOS manufacturing operations. Methods for improving a variety of NDR characteristics for an NDR element, such as peak-to-valley ratio (PVR), NDR onset voltage (VNDR) and related parameters are also disclosed.