Inner shield for a substrate processing chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of the first embodiment for an inner shield for a substrate processing chamber, according to the new design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation view thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a right side elevation view thereof.

FIG. 7 is a left side elevation view thereof.

FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.

FIG. 9 is a top isometric view of the second embodiment for an inner shield for a substrate processing chamber, according to the new design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a front elevation view thereof.

FIG. 13 is a back elevation view thereof.

FIG. 14 is a right side elevation view thereof.

FIG. 15 is a left side elevation view thereof; and,

FIG. 16 is a cross-sectional view taken along line 16-16 in FIG. 10.

The broken lines in FIGS. 1-16 show portions of an inner shield for a substrate processing chamber which form no part of the claimed design.

Claims

The ornamental design for an inner shield for a substrate processing chamber, as shown and described.

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Patent History
Patent number: D913979
Type: Grant
Filed: Aug 28, 2019
Date of Patent: Mar 23, 2021
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Sarath Babu (Singapore), Ananthkrishna Jupudi (Singapore), Yueh Sheng Ow (Singapore), Junqi Wei (Singapore), Kelvin Boh (Singapore), Yuichi Wada (Chiba), Kang Zhang (Singapore)
Primary Examiner: Michael C Stout
Assistant Examiner: Fritzgerald L Butac
Application Number: 29/703,655