Making Mask On Semicond Uctor Body For Further Photolithographic Processing (epo) Patents (Class 257/E21.023)
E Subclasses
- For lift-off process (EPO) (Class 257/E21.034)
- Characterized by their composition, e.g., multilayer masks, materials (EPO) (Class 257/E21.035)
- Characterized by their size, orientation, disposition, behavior, shape, in horizontal or vertical plane (EPO) (Class 257/E21.036)
- Characterized by their behavior during process, e.g., soluble mask, re-deposited mask (EPO) (Class 257/E21.037)
- Characterized by process involved to create mask, e.g., lift-off mask, sidewalls, or to modify mask, such as pre-treatment, post-treatment (EPO) (Class 257/E21.038)
- Process specially adapted to improve the resolution of the mask (EPO) (Class 257/E21.039)