Ring for protecting a chamber block of a plasma processing device

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Description

FIG. 1 is a front, bottom and right side perspective view of a ring for protecting a chamber block of a plasma processing device according to the design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of area 9 shown in FIG. 8.

The broken line box shown in FIG. 8 defines the enlarged portion view shown in FIG. 9 and forms no part of the claimed design.

Claims

The ornamental design for a ring for protecting a chamber block of a plasma processing device as shown and described.

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Patent History
Patent number: D1143090
Type: Grant
Filed: Jul 21, 2022
Date of Patent: Aug 18, 2026
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventors: Koji Nagai (Tokyo), Tadayoshi Kawaguchi (Tokyo), Kazuyuki Ikenaga (Tokyo), Kohei Sato (Tokyo)
Primary Examiner: Michael C Stout
Assistant Examiner: Eric Eldone Tormanen
Application Number: 29/847,106