Abstract: A semiconductor device includes active strips. Active strip stack selection structures electrically couple to the active strip stacks at positions between the first and second ends, and select particular ones of the active strip stacks for operations. In one embodiment, different pads coupled to opposite pads have a higher voltage, depending on the memory cell selected for read. The same active strip stack selection structure can act as a pair of side gates for opposite sides of a first active strip stack, and as one side gate for each of the adjacent active strip stacks. Each active strip stack can have: a first structure from a first set acting as first and second side gates on a first side of word lines; and a second structure and a third structure from a second set respectively acting as third and fourth side gates on the second side of word lines.

Abstract: A memory device includes a memory cell array and a column decoder. The memory cell array includes a plurality of even local bit lines and a plurality of odd local bit lines. The column decoder includes a plurality of even pass transistors and a plurality of odd pass transistors. Each of the even pass transistors has a, control terminal coupled to a respective one of a plurality of even selection lines, a first terminal coupled to a respective one of the even local bit lines, and a second terminal coupled to an even global bit line. Each of the odd pass transistors has a control terminal coupled to a respective one of a plurality of odd selection lines, a first terminal coupled to a respective one of the odd local bit lines, and a second terminal coupled to an odd global bit line.

Abstract: A nonvolatile memory device includes a channel vertically extending from a substrate, a plurality of memory cells stacked along the channel; a source region connected to a first end portion of the channel, and a bit line connected to a second end portion of the channel, wherein the first end portion of the channel that adjoins the source region is formed as an undoped semiconductor layer or a semiconductor layer doped with P-type impurities.

Abstract: A vertical memory device includes a channel, a ground selection line (GSL), word lines, a string selection line (SSL), and a contact. The channel includes a vertical portion and a horizontal portion. The vertical portion extends in a first direction substantially perpendicular to a top surface of a substrate, and the horizontal portion is connected to the vertical portion and parallel to the top surface of the substrate. The GSL, the word lines and the SSL are formed on a sidewall of the vertical portion of the channel sequentially in the first direction, and are spaced apart from each other. The contact is on the substrate and electrically connected to the horizontal portion of the channel.

Abstract: Disclosed is a 2-transistor flash memory that includes a memory cell array, a row driver, a read/write circuit, a charge pump generating a high voltage, and control logic configured to transfer the high voltage to the row driver, the read/write circuit, and the memory cell array. If programming, the row driver and the read/write circuit apply voltages such that a control gate of a cell transistor in an unselected memory cell on a different row from a selected memory cell is floated.

Abstract: Apparatus and methods configure a serial flash memory device. A value in a configuration register configures the number of dummy clock cycles to provide prior providing data in response to a read command. The value in the configuration register is read, and the number of dummy clock cycles to provide based at least partly on the dummy clock cycle value.

Abstract: A method includes, in a memory device, receiving a command that specifies a peak power consumption that is not to be exceeded by the memory device. A memory of the memory device is configured in accordance with the peak power consumption specified in the command. A data storage operation in the configured memory is performed, while complying with the specified peak power consumption.

Abstract: A nonvolatile memory device includes: a channel layer extending in a vertical direction from a substrate; a plurality of interlayer dielectric layers and word lines alternately stacked along the channel layer over the substrate; a bit line formed under plurality of interlayer dielectric layers and word lines, coupled to the channel layer, and extending in a direction crossing the word lines; and a common source layer coupled to the channel layer and formed over the plurality of interlayer dielectric layers and word lines.

Abstract: An integrated circuit including a link or string of semiconductor memory cells, wherein each memory cell includes a floating body region for storing data. The link or string includes at least one contact configured to electrically connect the memory cells to at least one control line, and the number of contacts in the string or link is the same as or less than the number of memory cells in the string or link.

Abstract: A semiconductor device including multiple subarrays arrayed in a matrix in the row and column directions, and respectively containing multiple memory cells, bit lines coupled to the memory cells, and precharge circuits (to charge the bit lines; column select signal lines extending in the column direction for selecting subarray columns; main word lines for selecting subarray rows; and precharge signal lines for supplying precharge signals to the precharge circuits; and at least two of the subarrays formed in the row direction or the column direction are controlled by the same logic according to the precharge signal.

Abstract: A nonvolatile memory (“NVM”) bitcell includes a capacitor, an asymmetrically doped transistor, and a gated diode device. The capacitor, transistor, and gated diode device are each electrically coupled to different active regions and metal contacts. The three devices are coupled by a floating gate that traverses the three active regions. The gated diode device allows for erasure of an entire NVM memory more efficiently and using less substrate space than a similar device that uses a transistor. The asymmetric transistor, in conjunction with the capacitor, is used to both program and read the logical state of the floating gate. The capacitor and floating gate are capacitively coupled together, removing the need for a separate selection device to perform read and write operations.

Abstract: According to one embodiment, a semiconductor memory device includes memory units each includes a first transistor, memory cell transistors, and a second transistor serially coupled between first and second ends. A memory cell transistor of each memory unit has its gate electrode coupled to each other. A bit line is coupled to the first ends. First and second drivers output voltage applied to selected and unselected first transistors, respectively. Third and fourth drivers output voltage applied to selected and unselected second transistors, respectively. A selector couples the gate electrode of the first transistor of each memory unit to the first or second driver, and that of the second transistor of each memory unit to the third or fourth driver.

Abstract: A sector of an electrically programmable non-volatile memory includes memory cells connected to word lines and to bit lines, each cell including at least one transistor having a gate connected to a word line, a drain connected to a bit line and a source connected to a source line. The sector includes at least two distinct wells insulated from one another, each including a number of cells of the sector, being able to take different potentials, and in that the sector has at least one bit line electrically linked to the drain of at least two cells mounted on two distinct wells.

Abstract: A memory includes an array of memory cells with each memory cell coupled to an associated pair of bit lines. Read control circuitry is configured to activate a number of addressed memory cells in order to couple each addressed memory cell to its associated pair of bit lines. Sense amplifier circuitry is then coupled to the bit lines to determine the data value stored in each addressed memory. In a speculative read mode of operation, the sense amplifier circuitry evaluates the differential signals. Error detection circuitry is then used to capture the differential signals on the associated pair of bit lines for each addressed memory cell, and to apply an error detection operation to determine if the differential signals as evaluated by the sense amplifier circuitry had not developed to the necessary degree and, in that event, an error signal is asserted.

Abstract: A semiconductor memory cell and arrays of memory cells are provided In at least one embodiment, a memory cell includes a substrate having a top surface, the substrate having a first conductivity type selected from a p-type conductivity type and an n-type conductivity type; a first region having a second conductivity type selected from the p-type and n-type conductivity types, the second conductivity type being different from the first conductivity type, the first region being formed in the substrate and exposed at the top surface; a second region having the second conductivity type, the second region being formed in the substrate, spaced apart from the first region and exposed at the top surface; a buried layer in the substrate below the first and second regions, spaced apart from the first and second regions and having the second conductivity type; a body region formed between the first and second regions and the buried layer, the body region having the first conductivity type; a gate positioned between the

Abstract: In a programming operation of a 3D stacked non-volatile memory device, the channel of an inhibited NAND string is pre-charged by gate-induced drain leakage (GIDL) to achieve a high level of boosting which prevents program disturb in inhibited storage elements. In a program-verify iteration, prior to applying a program pulse, the drain-side select gate transistor is reverse biased to generate GIDL, causing the channel to be boosted to a pre-charge level such as 1.5V. Subsequently, when the program pulse is applied to a selected word line and pass voltages are applied to unselected word lines, the channel is boosted higher from the pre-charge level due to capacitive coupling. The pre-charge is effective even for a NAND string that is partially programmed because it does not rely on directly driving the channel from the bit line end.

Abstract: A semiconductor memory device and a method of operating a semiconductor memory device includes connecting selected even bit lines to selected even cell strings, programming memory cells in the selected even cell strings by using a second program permission voltage higher than a first program permission voltage, connecting selected odd bit lines to selected odd cell strings when programming of the memory cells is finished, and programming memory cells in the selected odd cell strings by using the first program permission voltage.

Abstract: Techniques for providing a direct injection semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a direct injection semiconductor memory device including a first region connected to a bit line extending in a first orientation and a second region connected to a source line extending in a second orientation. The direct injection semiconductor memory device may also include a body region spaced apart from and capacitively coupled to a word line extending in the second orientation, wherein the body region is electrically floating and disposed between the first region and the second region. The direct injection semiconductor memory device may further include a third region connected to a carrier injection line extending in the second orientation, wherein the first region, the second region, the body region, and the third region are disposed in sequential contiguous relationship.

Abstract: A non-volatile memory device comprising a plurality of strings each including a drain select transistor, drain-side memory cells, a pipe transistor, source-side memory cells, and a source select transistor coupled in series, wherein the plurality of strings are arranged in a first direction and a second direction, and the strings arranged in the second direction form each of string columns; a plurality of bit lines extended in the second direction and coupled to the drain select transistors of the strings included in each string column; and a plurality of source lines extended in the first direction and in common coupled to the source select transistors of strings adjacent to each other in the second direction, wherein strings included in one of the string columns are staggered in the first direction and each of the string columns are coupled to at least two of the bit lines.

Abstract: A memory device includes a block of memory cells having a plurality of levels. Each level includes strips of memory cells extending in a first direction between first and second ends of the block. A first bit line structure, at each level at the first end, is coupled to a first string of memory cells extending from the first end. A second bit line structure, at each level at the second end, is coupled to a second string of memory cells extending from said second end. Bit line pairs extend in the first direction with each including odd and even bit lines. Odd and even bit line connectors connect the odd and even bit lines to the second and first bit line structures, respectively. Each bit line for a series of bit line pairs are separated by a bit line of an adjacent pair of bit lines.

Abstract: Upon programming a semiconductor memory device including a first and a second n-wells, a first and a second p-channel memory transistors respectively formed in the first and the second n-wells, and a bit line connected to a drain of the first p-channel transistor and a drain of the second p-channel memory transistor, a first voltage is applied to the first bit line, a second voltage is applied to the first n-well, and a third voltage lower than the second voltage is applied to the second n-well.

Abstract: Techniques are provided for programming and erasing of select gate transistors in connection with the programming or erasing of a set of memory cells. In response to a program command to program memory cells, the select gate transistors are read to determine whether their Vth is below an acceptable range, in which case the select gate transistors are programmed before the memory cells. Or, a decision can be made to program the select gate transistors based on a count of program-erase cycles, whether a specified time period has elapsed and/or a temperature history of the non-volatile storage device. When an erase command is made to erase memory cells, the select gate transistors are read to determine whether their Vth is above an acceptable range. If their Vth is above the acceptable range, the select gate transistors can be erased concurrently with the erasing of the memory cells.

Abstract: According to an embodiment, a semiconductor device includes an IO terminal unit, an first IO line, and a second IO line. The IO terminal unit includes first and second IO terminals. The first IO line is electrically connected to one of both the first IO terminal and the second IO terminal. The second IO line is electrically connected to the other of both the first IO terminal and the second IO terminal. When the semiconductor device receives a first signal, the first IO terminal is electrically connected to the first IO line and the second IO terminal is electrically connected to the second IO line. When the semiconductor device receives a second signal, the first IO terminal is electrically connected to the second IO line and the second IO terminal is electrically connected to the first IO line. The second signal is different from the first signal.

Abstract: N-channel multi-time programmable memory devices having an N-conductivity type substrate, first and second P-conductivity type wells in the N-conductivity type substrate, N-conductivity type source and drain regions formed in the first P-conductivity type well, the source and drain regions being separated by a channel region, an oxide layer over the N-conductivity type substrate; and a floating gate extending over the channel region and over the second P-conductivity type well in the N-conductivity type substrate, the multi-time programmable memory cell being programmable by hot electron injection and erasable by hot hole injection.

Abstract: According to example embodiments, a nonvolatile memory device includes a first and a second NAND string. The first NAND string includes a first string selection transistor, a first local ground and a first global ground selection transistor, and first memory cells stacked in a direction perpendicular to a substrate. The second NAND string includes a second string selection transistor, a second local ground and a second global ground selection transistor, and second memory cells stacked in the direction perpendicular to the substrate. The device includes a selection line driver including path transistors configured to select and provide at least one operation voltage to the first and second string selection transistors, the first and second local and global ground selection transistors. The first and second string selection transistors are electrically isolated from each other, and the first and second global ground selection transistors are electrically connected.

Abstract: The operating method of a data storage device includes storing data in a buffer memory according to an external request, and determining whether the data stored in the buffer memory is data accompanying a buffer program operation of a memory cell array. When the data stored in the buffer memory is data accompanying the buffer program operation, the method further includes determining whether a main program operation on the memory cell array is required, and when a main program operation on the memory cell array is required, determining a program pattern of the main program operation on the memory cell array. The method further includes issuing a set of commands for the main program operation on the memory cell array to a multi-bit memory device based on the determined program pattern.

Abstract: In an embodiment, a memory device includes a stack of tiers of memory cells, a tier of local devices at a level above the stack of tiers of memory cells, and a tier of global devices at substantially a same level as the tier of local devices. A local device may provide selective access to a data line. A global device may provide selective access to a global access line. A tier of memory cells may be selectively coupled to a global access line by the global device of the tier of global devices.

Abstract: According to one embodiment, a memory cell string stacked body includes first memory cell transistors above a semiconductor substrate, and second memory cell transistors below a first channel semiconductor film, and one of the first memory cell transistors and one of the second memory cell transistors share with a control gate electrode. The control gate electrodes of the first memory cell transistors cover an upper surface of a first charge storage layer and at least a part of a side surface in a second direction via a first insulating film in the one of the first memory cell transistors. The control gate electrodes of the second memory cell transistors cover only a lower surface of a second charge storage layer via a second insulating film in one of the second memory cell transistors.

Abstract: Method of programming a multi-level memory cell may include transferring one or more values between an auxiliary latch of the multi-level memory cell and a most significant bit (MSB) latch of the multi-level memory cell and/or between the auxiliary latch and a least significant bit (LSB) latch of the multi-level memory cell while programming the multi-level memory cell.

Abstract: A circuit includes a first plurality of memory cells coupled with a first data line and a first data transfer circuit coupled with the first data line and a second data line. In a first operation mode of the circuit, the first data line is left floating and is caused to have a first logical value by a current in at least one memory cell of the first plurality of memory cells. In a second operation mode of the circuit, the first data line is configured to reflect data stored in a memory cell of the plurality of memory cells, and the second data line is configured to reflect the data on the first data line through the first data transfer circuit.

Abstract: The present invention provides a nonvolatile memory cell string and a memory array using the same. According to the present invention, a wall type semiconductor separated into twin fins and a memory cell string formed with memory cells having a gated diode structure along each fin are enabled to increase the degree of integration and basically prevent the interferences between adjacent cells. And a first semiconductor layer and a depletion region of a PN junction wrapped up by a gate electrode are enabled to remove GSL and CSL by GIDL memory operation and significantly increase the degree of integration for applying to a neuromorphic technology.

Abstract: In a 3D stacked non-volatile memory device, multiple smaller drain-end selected gate (SGD) transistors replace one larger SGD transistor. The SGD transistors have different work functions in their control gates so that, during a programming operation, a discontinuous channel potential is created in an inhibited NAND string. The SGD transistor closest to the bit line has a higher work function so that the channel potential under it is lower, and the next SGD transistor has a lower work function so that the channel potential under it is higher. The different work functions can be provided by using different control gate materials for the SGD transistors. One option uses p+ polysilicon and n+ polysilicon to provide higher and lower work functions, respectively. Metal or metal silicide can also be used. A single SGD transistor with different control gate materials could also be used.

Abstract: A number (Nwl) of programmed word lines in a block of NAND strings is determined by measuring a reference combined current (Iref) in the block when all of the memory cells are in a conductive state. Subsequently, to determine if a word line is a programmed word line, an additional combined current (Iadd) in the block is measured with a demarcation voltage applied to the selected word line. The selected word line is determined to be programmed word lines if Idd is less than Iref by at least a margin. Nwl can be used to adjust an erase-verify test of an erase operation by making the erase-verify test relatively hard to pass when the number is relatively small and relatively easy to pass when the number is relatively large. Or, Nwl can be used to identify a next word line to program in the block.

Abstract: A reconfigurable integrated circuit device includes a memory unit for storing configuration information. The memory unit has a nonvolatile memory transistor having a gate connected to a first wire, a first terminal connected to a second wire, and a second terminal connected to a third wire. The memory unit also includes a switch circuit connected to the third wire. The switch circuit alters the configuration of the integrated circuit device by, for example, opening and closing to make wiring connections or disconnections. The integrated circuit device additionally includes a data supply circuit for supplying bit data and a first power supply circuit for supplying voltages to the first wire for storing bit data in the first nonvolatile memory transistor and for storing bit data as a charge level on the third wire.

Abstract: Systems, methods, and apparatus are disclosed for implementing memory cells having common source lines. The methods may include receiving a first voltage at a first transistor. The first transistor may be coupled to a second transistor and included in a first memory cell. The methods include receiving a second voltage at a third transistor. The third transistor may be coupled to a fourth transistor and included in a second memory cell. The first and second memory cells may be coupled to a common source line. The methods include receiving a third voltage at a gate of the second transistor and a gate of the fourth transistor that may cause them to operate in cutoff mode. The methods may include receiving a fourth voltage at a gate of the first transistor. The fourth voltage may cause, via Fowler-Nordheim tunneling, a change in a charge storage layer included in the first transistor.

Abstract: A semiconductor memory device includes a memory block including memory strings formed between bit lines and a source line, wherein the bit lines and the source line are formed on a substrate, each of the memory strings includes a superordinate cell string connected between the bit line and pipe transistors formed on the substrate and a subordinate cell string connected between the source line and the pipe transistors, and an operation circuit configured to apply operation voltages to the memory strings to perform a program operation and apply different voltages to the pipe transistors of the memory strings connected to the same bit line in the memory block.

Abstract: According to one embodiment, a semiconductor memory device reads data in units of page. The device includes: a memory cell array; a plurality of latch circuits; and an arithmetic operation circuit. The memory cell array holds data multiplexed in at least three pages. The latch circuits read and hold the multiplexed data at a startup. The arithmetic operation circuit performs operations by use of the multiplexed data.

Abstract: A data storage device includes a memory die including a plurality of storage elements arranged in a three dimensional (3D) memory configuration and a controller die coupled to the memory die via a bus including a plurality of electrical contacts between adjacent surfaces of the memory die and the controller die. A method performed at the data storage device includes receiving, at the controller die, data to be stored at the memory die and generating a codeword representing the data. The codeword includes a particular number of bits. The method also includes sending signals from the controller die to the memory die via the plurality of electrical contacts. The plurality of electrical contacts includes at least as many electrical contacts as the particular number of bits of the codeword, and the signals representing the codeword are sent from the controller die to the memory die in parallel.

Abstract: According to one embodiment, a nonvolatile semiconductor memory apparatus includes a memory cell array, a row decoder, a controller. The memory cell array includes a plurality of memory strings. The memory strings include a first select transistor and a second select transistor, and are connected to each of a plurality of bit lines. The row decoder applies a voltage to the first and second select transistors. The controller detects a defect of the bit lines based on data read from the memory cells.

Abstract: A memory card includes a control chip, a buffer, a NAND gate, and an inverter. The memory card has a first surface and a second surface opposite to the first surface. A first group of conductive pins is located on the first surface, and connected to the buffer through a first channel. A second group of conductive pins is located on the second surface, and connected to the buffer through a second channel. An order of pins of the first group of conductive pins located on the first surface from left to right is the same as an order of pins of the second group of conductive pins located on the second. The buffer is electrically connected to the control chip. Data can be transmitted between the first group of conductive pins or the second group of conductive pins and the control chip through the buffer.

Abstract: A 3D memory device includes a plurality of ridge-shaped stacks, in the form of multiple strips of conductive material separated by insulating material, arranged as strings which can be coupled through decoding circuits to sense amplifiers. Diodes are connected to the bit line structures at either the string select of common source select ends of the strings. The strips of conductive material have side surfaces on the sides of the ridge-shaped stacks. A plurality of conductive lines arranged as word lines which can be coupled to row decoders, extends orthogonally over the plurality of ridge-shaped stacks. Memory elements lie in a multi-layer array of interface regions at cross-points between side surfaces of the conductive strips on the stacks and the conductive lines.

Abstract: A method of adjusting a threshold voltage of a ground selection transistor in a nonvolatile memory device includes providing a first voltage to a gate of a first ground selection transistor in a read operation and providing a second voltage to a gate of a second ground selection transistor in the read operation. The nonvolatile memory device includes at least one string, the string having string selection transistors, memory cells and the first and second ground selection transistors connected in series and stacked on a substrate.

Abstract: A non-volatile memory device includes first and second vertical channel layers generally protruding upwardly from a semiconductor substrate substantially in parallel; a first gate group configured to include a plurality of memory cell gates which are stacked substantially along the first vertical channel layer and are isolated from each other with an interlayer insulating layer interposed substantially between the memory cell gates; a second gate group configured to include a plurality of memory cell gates which are stacked substantially along the second vertical channel layer and are isolated from each other with the interlayer insulating layer interposed substantially between the memory cell gates; a pipe channel layer configured to couple the first and the second vertical channel layers; and a channel layer extension part generally extended from the pipe channel layer to the semiconductor substrate and configured to couple the pipe channel layer and the semiconductor substrate.

Abstract: This nonvolatile semiconductor memory device comprises: a memory cell array configured having a plurality of blocks arranged therein, each of the blocks configured as an arrangement of NAND cell units, each of the NAND cell units configured having a plurality of electrically rewritable memory cells and a select transistor connected in series; and a row decoder configured to select anyone of the blocks of the memory cell array and supply to any one of said blocks a voltage required in various kinds of operations. The row decoder comprises: a plurality of first transfer transistors each disposed in a first region and connected to any one of the memory cells; and a plurality of second transfer transistors each disposed in a second region and connected to the select transistor, the second region being a residual region of the first region.

Abstract: A method includes selectively creating a first breakdown condition and a second breakdown condition at a semiconductor transistor structure. The first breakdown condition is between a source overlap region of the semiconductor transistor structure and a gate of the semiconductor transistor structure. The second breakdown condition is between ad rain overlap region of the semiconductor transistor structure and the gate.

Abstract: To maintain stability of memory array operations, a current source supplies a common source line of a memory. The magnitude of the regulation current from the source is dynamically determined based on the amount of current from the array itself through use of a feedback control signal provided by a current comparator circuit. The current comparison circuit can use either a digital or an analog implementation.

Abstract: Method and apparatus for managing data in a memory, such as a flash memory array. In accordance with some embodiments, data are written to a set of solid-state non-volatile memory cells so that each memory cell in the set is written to an associated initial programmed state. Drift in the programmed state of a selected memory cell in the set is detected, and the selected memory cell is partially reprogrammed to return the selected memory cell to the associated initial programmed state.

Abstract: Methods of maintaining a state of a memory cell without interrupting access to the memory cell are provided, including applying a back bias to the cell to offset charge leakage out of a floating body of the cell, wherein a charge level of the floating body indicates a state of the memory cell; and accessing the cell.

Abstract: To provide a memory element where a desired potential can be stored as data without an increase in the number of power source potentials. The memory element stores data in a node which is brought into a floating state by turning off a transistor a channel of which is formed in an oxide semiconductor layer. The potential of a gate of the transistor can be increased by capacitive coupling between the gate and a source of the transistor. With the structure, a desired potential can be stored as data without an increase in the number of power source potentials.

Abstract: Multi-port semiconductor memory cells including a common floating body region configured to be charged to a level indicative of a memory state of the memory cell. The multi-port semiconductor memory cells include a plurality of gates and conductive regions interfacing with said floating body region. Arrays of memory cells and method of operating said memory arrays are disclosed for making a memory device.