Abstract: A plurality of semiconductor memory devices on a multi-chip package is disclosed. Each semiconductor device may include a plurality of through vias and a plurality of capacitance enhanced through vias. The through vias may provide an electrical connection for signals that may transition between logic states. The capacitance enhanced through vias may provide an electrical connection from a first side to a second side of the respective semiconductor device for transmission signals that remain substantially stable such as reference voltages, power supply voltages or the like. In this way, noise may be reduced and a reservoir of charge for circuits that provide a load for reference voltages and/or power supply voltages may be provided.

Abstract: A memory structure is provided including an array of non-volatile memory (NVM) cells arranged in rows and columns, each cell including a NVM transistor having a body bias terminal coupled to body bias supply. The memory structure further includes a control system to control the body bias supply to adjust a body bias voltage coupled to the body bias terminals during read operations of the memory structure to compensate for shifts in threshold voltages (VTH) of the NVM transistors to maintain a read current window (IRCW) between a cell in which the NVM transistor is ON and a sum of leakage current through cells in which the NVM transistor is OFF. Methods of operating the memory structure are also described.

Abstract: A semiconductor memory device includes a plurality of first stacked structures including a plurality of first material layers at ends of which first contact regions are defined, a plurality of second stacked structures including a plurality of second material layers, wherein second contact regions are defined at ends of the second material layers and arranged between the first stacked structures so that the first contact regions and the second contact regions overlap each other, and a plurality of lines coupled in common to the first contact regions and the second contact regions.

Abstract: An asymmetric non-volatile memory bitcell is described. The bitcell comprises source and drain regions comprising carriers of the same conductivity type. A floating gate rests on top of the well, and extends over a channel region, and at least a portion of the source and drain regions. The drain region comprises additional carriers of a second conductivity type, allowing band to band tunneling. The source region comprises additional carriers of a first conductivity type, thereby increasing source-gate capacitance. Thus, the bitcell incorporates a select device, thereby decreasing the overall size of the bitcell. The bitcell may be created without any additional CMOS process steps, or through the addition of a single extra mask step.

Abstract: The present invention provides an OTP memory having higher confidentiality. A memory cell has a memory transistor forming a current path between first and second nodes, a selection transistor forming a current path between third and fourth nodes, the third node being coupled to the gate of the memory transistor via a line, and a capacitor coupled to the first node. By applying high voltage which does not break but deteriorates a gate oxide film and increases gate leak current to a memory transistor, data is written. Data can be read by the presence/absence of leak of charges accumulated in the capacitor. Since the position of deterioration in the gate oxide film cannot be discriminated by a physical analysis, confidentiality is high.

Abstract: A non-volatile semiconductor storage device includes an memory cell array including first and second blocks, each of which includes a plurality of memory strings each having n (n: natural number) memory cells, and a optionally a peripheral circuit for controlling the memory cell array. In this non-volatile semiconductor storage device, n signal lines are arranged in the first block, and m (n>m, m: natural number) signal lines are arranged in the second block, such that the second block size is smaller than the first block size.

Abstract: The inventive concept relates to a nonvolatile memory device and methods for operating the same. The nonvolatile memory device comprises a plurality of strings arranged in rows and columns on a substrate, each string including at least one ground select transistor, a plurality of memory cells and at least one string select transistor sequentially stacked on the substrate. The method comprises erasing first memory cells corresponding to an erasure failed row and inhibiting erasure of second memory cells corresponding to an erasure passed row, and performing an erasure verification by a unit of each row with respect to the first memory cells.

Abstract: A memory includes a three-dimensional array including a plurality of levels is described. Each level includes a bit line pad, a source line pad, and a plurality of strips of semiconductor material extending between the bit line pad and the source line pad. The source line pad includes at least one n-type region and at least one p-type region. The memory includes word lines coupled to the plurality of strips in the plurality of levels. The memory includes data storage elements between the word lines and the strips of semiconductor material, whereby memory cells are disposed at cross-points of the strips and the word lines. The memory also includes circuitry coupled to the n-type region and the p-type region of the source line pad, configured to selectively enable current flow in the strips extending from the source line pad and one of the n-type region and the p-type region.

Abstract: A vertical type semiconductor device includes first and second word line structures that include first and second word lines. The word lines surround a plurality of pillar structures, which are provided to connect the word lines to corresponding string select lines. Connecting patterns electrically connect pairs of adjacent first and second word lines in a same plane. The device may be a nonvolatile memory device or a different type of device.

Abstract: One package contains a plurality of memory chips. Each memory chip has an I/O terminal which generates a busy signal. The busy signal enables a busy state when a power supply voltage value reaches a specified and guaranteed range after a power-on sequence. The busy signal maintains the busy state until completion of initialization operations for the plurality of memory chips. The busy signal releases the busy state after completion of all initialization operations for the plurality of memory chips.

Abstract: A low-density parity-check decoder in a system with multi-level cells identifies zones of reliability where write errors or stuck cells are identifiable. The system uses assumedly successfully decoded pages associated with bits in a cell to identify candidate write errors or stuck cells and erases a corresponding log-likelihood ratio even where such log-likelihood ratio is saturated, thereby breaking a potential trapping set without post-processing.

Abstract: A junction-less transistor having an reverse polarity structure includes a substrate, a semiconductor body, a gate and a gate insulation layer. The substrate has a first polarity. The semiconductor body is disposed on the substrate, and includes a drain, a source and a channel section connected between the drain and the source. The gate covers one side of the channel section away from the substrate. The semiconductor body has a second polarity opposite to the first polarity. With the semiconductor body and the substrate respectively having the opposite second polarity and first polarity, a leakage current can be reduced while also lowering element production costs.

Abstract: A non-volatile semiconductor memory device has a semiconductor substrate, an element isolation region disposed in a surface of the semiconductor substrate, a well region disposed along one principal surface of the semiconductor substrate, source and drain regions arranged in the well region, a gate oxide film arranged on the surface of the semiconductor substrate between the source region and the drain region, a floating gate disposed on the gate oxide film, and an insulating film disposed on a surface of the floating gate. A control gate is capacitively coupled to the floating gate disposed through intermediation of the insulating film. A resistive element is serially connected to the control gate. Write characteristics of the non-volatile semiconductor memory device are improved as a result of a delay effect of the resistive element serially connected to the control gate.

Abstract: A semiconductor device and a method of manufacturing the same are provided. The device includes insulating patterns and conductive patterns stacked alternately, a channel layer formed through the insulating patterns and the conductive patterns, a tunnel insulating layer formed to surround sidewalls of the channel layer, and a charge storage layer formed to surround the tunnel insulating layer. An interfacial surface of the tunnel insulating layer in contact with the charge storage layer includes a thermal oxide layer.

Abstract: A circuit on an end column of a divided memory array is formed by a block selection transistor having the same shape as that of a memory cell transistor. As the pattern of the connecting section between the main bit line and the sub-bit line is made in the same shape as that of the memory cell, it is possible to realize a pattern uniformity and to eliminate the need for using memory array dummy patterns.

Abstract: Provided are a semiconductor memory device and an operating method thereof. The semiconductor memory device includes a memory cell array including a plurality of strings, wherein each of the plurality of strings includes a first memory cell group, and a second memory cell group and peripheral circuits configured to generate a first precharge voltage applied to the first memory cell group and a second precharge voltage applied to the second memory cell group when a channel precharge operation is performed during a program operation, and generate a program voltage to apply the program voltage to the memory cell array when a program voltage application is performed.

Abstract: In a nonvolatile memory array in which a NAND string includes a back gate that has a charge storage element, the threshold voltage of the back gate is monitored, and if the threshold voltage deviates from a desired threshold voltage range, charge is added to, or removed from the charge storage element to return the threshold voltage to the desired threshold voltage range.

Abstract: A multilevel device includes: at least one device region and at least one contact region having a stack of alternating plurality of continuous electrically conductive layers and plurality of electrically insulating layers located over a base. Each electrically conductive layer in the stack is electrically insulated from the other electrically conductive layers in the stack. The base may include a raised portion and a plurality of recesses in the raised portion, each recess in the plurality of recesses having a different lateral size from the other recesses in the plurality of recesses. The electrically conductive layers in the stack may be substantially conformal to the plurality of recesses in the base and expose one or more top surfaces of the raised portion of the base. A first electrically conductive layer in the stack may be a topmost layer in a laterally central portion of a first one of the plurality of recesses.

Abstract: According to one embodiment, a semiconductor memory device includes a first NAND string and a second NAND string are connected to a bit line. One of the first and second NAND strings is selected by first to fourth select memory cells. At the write time, data is written in a first memory cell of the first NAND string selected by of the first to fourth select memory cells, then data is written in a second memory cell of the second NAND string selected at the same time as the first memory cell, data is written in a third memory cell adjacent to the first memory cell of the first NAND string and finally data is written in a fourth memory cell of the second NAND string selected at the same time as the third memory cell.

Abstract: A memory cell structure is provided. A first doping region is formed in a substrate. A second doping region is formed in the substrate. A first gate is formed on the substrate. The first and second doping regions and the first gate constitute a first transistor. A first word line is electrically connected to the first gate. The first word line firstly extends along a first direction and then along a second direction which is different from the first direction. A resistive layer is electrically connected to the first doping region. A conductive layer comprises a first source line and a bit line. The first source line is electrically connected to the second doping region, and the bit line is electrically connected to the resistive layer. The first and second doping regions extend along a third direction which is different from the first and second directions.

Abstract: Methods for reducing power consumption of a non-volatile storage system and reducing first read latency are described. The non-volatile storage system may include a cross-point memory array. In some embodiments, during a standby mode, the memory array may be biased such that both word lines and bit lines are set to ground. During transition of the memory array from the standby mode to a read mode, a selected word line comb may be set to a read voltage while the unselected word lines and the bit lines remain at ground. During the read mode, memory cells connected to the selected bit lines and the selected word line comb may be sensed while the selected bit lines are biased to a selected bit line voltage equal to or close to ground and the unselected bit lines are left floating after initially being set to ground.

Abstract: A sensing method for a flash memory to improve read time of separate sensing in each bit line pair is introduced herein. The sensing method improves read time of even/odd BL separate sensing by, for example, charge time saving for sensing each of the bit lines during reading. In the method, both of the even bit line and the odd bit line are charged to a charge level. The voltage level of the odd bit line is maintained at the charge level and memory cells associated with the even bit line are sensed for reading data stored in the memory cells. The voltage level of the even bit line is discharged to ground, and the voltage level of the odd bit line is maintained at the charge level and sensed for reading data stored in the memory cells associated with the odd bit line.

Abstract: A flash controller for managing at least one MLC non-volatile memory module and at least one SLC non-volatile memory module. The flash controller is adapted to determine if a range of addresses listed by an entry and mapped to said at least one MLC non-volatile memory module fails a data integrity test. In the event of such a failure, the controller remaps said entry to an equivalent range of addresses of said at least one SLC non-volatile memory module, The flash controller is farther adapted to determine which of the blocks in the MLC and SLC non-volatile memory modules are accessed most frequently and allocating those blocks that receive frequent writes to the SLC non-volatile memory module and those blocks that receive infrequent writes to the MLC non-volatile memory module.

Abstract: In a memory cell including first to third transistors, the potential of a bit line is set to VDD or GND when data is written through the first transistor. In a standby period, the potential of the bit line is set to GND. In reading operation, the bit line is brought into a floating state at GND, and a source line is set to a potential VDD??, consequently, the third transistor is turned on. Then, the potential of the source line is output according to the potential of a gate of the second transistor. Note that ? is set so that the second transistor is surely off even when the potential of the gate of the second transistor becomes lower from VDD by ?V in the standby period. That is, Vth+?V<? is satisfied where Vth is the threshold value of the second transistor.

Abstract: A first ReRAM unit having a resistance change layer is provided between a first access transistor configuring the SRAM and a first bit line, and a second ReRAM unit having a resistance change layer is provided between a second access transistor and a second bit line. When a low potential (L=0V) is held at a first storage node and a high potential (H=1.5V) is held at a second storage node at the end of a normal operation period of the SRAM, the first ReRAM unit is set to ON state (ON), and the second ReRAM unit is set to OFF state (OFF); accordingly, the retained data of the SRAM is written in to the ReRAM units. When the SRAM returns to the normal operation again, data corresponding to the storage nodes are written back and the ReRAM units are both set to ON state (reset).

Abstract: A method of shaping data includes receiving data represented as a first set of bits, where each bit of the first set of bits corresponds to a logical value. A first write current to write a first logical value to a storage element is less than a second write current to write a second logical value to the storage element. The method also includes applying a shaping operation to generate a second set of bits, where a proportion of bits having the first logical value is larger for the second set of bits than for the first set of bits. The method also includes writing the second set of bits to the memory.

Abstract: According to one embodiment, a non-volatile semiconductor memory device includes a memory cell array and a row decoder. The memory cell array has NAND strings as a physical block, and word lines respectively connected to memory cells included in the NAND strings. The row decoder includes latch circuits and a drive circuit. When a failure exists within a corresponding first logical block, the latch circuits store a flag indicating the failure. The drive circuit inhibits driving of the word lines belonging to the first logical block when the flag is stored in the latch circuit corresponding to the first logical block to which the selected word lines belong, and allows the driving of the word lines belonging to the physical block including the first logical block when the flag is not stored in the latch circuit corresponding to the first logical block to which the selected word lines belong.

Abstract: A method for calibrating read levels in a flash memory device is provided. The method includes receiving read information from flash memory in response to a read command, assigning soft information to the received read information, determining an error signal based on the assigned soft information, determining a read level offset based on the error signal, and adjusting a read level in the flash memory by the determined read level offset.

Abstract: A NAND flash memory unit is described, including a string of memory cells connected in series, S/D regions coupled to two terminals of the string, at least one select transistor couple between a terminal of the string and an S/D region, and at least one erase transistor couple between the at least one select transistor and an S/D region. The select transistor is for selecting the string of memory cells. The erase transistor is for reducing Vt-shift of the select transistor.

Abstract: In a 3D stacked non-volatile memory device, multiple smaller drain-end selected gate (SGD) transistors replace one larger SGD transistor. The SGD transistors have different control gate overdrive voltages so that, during a programming operation, a discontinuous channel potential is created in an inhibited NAND string. The SGD transistor closest to the bit line has a lower control gate overdrive voltage so that the channel potential under it is lower, and the next SGD transistor has a higher control gate overdrive voltage so that the channel potential under it is higher. The different control gate overdrive voltages can be provided by programming different threshold voltages, or by providing different control gates voltages, for the SGD transistors. Undesirable reductions in a Vsgd window due to drain-induced barrier lowering can be avoided.

Abstract: A signal processing device is provided. In a programmable switch in which one of a source and a drain of a first transistor is connected to a gate of a second transistor to control continuity between a source and a drain of the second transistor, a capacitance connected to the gate of the second transistor (which is indicated by CS and includes a parasitic capacitance) is less than twice a capacitance represented by the following formula: C gs + C gd ? C C gd + C , where C is a load capacitance, Cgs is a capacitance between the source and gate of the second transistor, and Cgd is a capacitance between the drain and gate of the second transistor.

Abstract: A cost-efficient SONOS (CEONOS) non-volatile memory (NVM) cell for use in a CMOS IC, where the CEONOS NVM cell requires two or three additional masks, but is otherwise substantially formed using the same standard CMOS flow processes used to form NMOS transistors. The cell is similar to an NMOS cell but includes an oxide-nitride-oxide (ONO) layer that replaces the standard NMOS gate oxide and serves to store NVM data. The cells utilize special source/drain engineering to include pocket implants and lightly-doped drain extensions, which facilitate program/erase of the CEONOS NVM cells using low voltages (e.g., 5V). The polysilicon gate, source/drain contacts and metallization are formed using corresponding NMOS processes. The CEONOS NVM cells are arranged in a space-efficient X-array pattern such that each group of four cells share a drain diffusion and three bit lines. Programming involves standard CHE injection or pulse agitated interface substrate hot electron injection (PAISHEI).

Abstract: A non-volatile memory cell formed using damascene techniques includes a floating gate electrode that includes a recess lined with a control gate dielectric and filled with the control gate electrode material. The control gate material is a composite ONO, oxide-nitride-oxide sandwich dielectric in one embodiment. The floating gate transistors of the non-volatile memory cell include a high gate coupling ratio due to the increased area between the floating gate electrode and the control gate electrode.

Abstract: Methods and apparatus are provided for soft data generation for memory devices based on a performance factor adjustment. At least one soft data value is generated for a memory device, such as a flash memory device, by obtaining at least one read value; and generating the soft data value based on the obtained at least one read value and an adjustment based on one or more performance factors of the memory device. The read values may be soft data or hard data. Possible performance factors include endurance, number of read cycles, retention time, temperature, process corner, inter-cell interference impact, location and a pattern of aggressor cells. One or more pattern-dependent and/or location-specific performance factors may also be considered. The generated soft data value may be a soft read value used to generate one or more log likelihood ratios or may be the log likelihood ratios themselves.

Abstract: An integrated circuit and methods for manufacturing and operating the same are provided. The integrated circuit comprises a fork architecture and a first conductive structure. The fork architecture comprises a handle portion and prong portions extending from the handle portion. The fork architecture comprises a stacked structure and a dielectric layer. The dielectric layer is between the first conductive structure and the handle portion of the stacked structure.

Abstract: Provided are nonvolatile memory devices and methods of forming the same. The nonvolatile memory device includes a plurality of word lines, a ground select line, string select line, and a dummy word line. Each of distances between the dummy word line and the ground select line and between the dummy word line and the word line is greater than a distance between a pair of the word lines adjacent to each other.

Abstract: Methods for reducing power consumption of a non-volatile storage system and reducing first read latency are described. The non-volatile storage system may include a cross-point memory array. In some embodiments, during a standby mode, the memory array may be biased such that both word lines and bit lines are set to ground. During transition of the memory array from the standby mode to a read mode, a selected word line comb may be set to a read voltage while the unselected word lines and the bit lines remain at ground. During the read mode, memory cells connected to the selected bit lines and the selected word line comb may be sensed while the selected bit lines are biased to a selected bit line voltage equal to or close to ground and the unselected bit lines are left floating after initially being set to ground.

Abstract: An integrated circuit includes at least one memory array and at least one capacitor array over a substrate. The at least one capacitor array includes a plurality of capacitor cell structures. The capacitor cell structures of the plurality of cell structures comprise a first capacitor electrode over the substrate. A second capacitor electrode is over the first capacitor electrode. A third capacitor electrode is adjacent to first sidewalls of the first and second capacitor electrodes. A fourth capacitor electrode is adjacent to second sidewalls of the first and second capacitor electrodes. A fifth capacitor electrode is over the substrate and adjacent to the fourth capacitor electrode.

Abstract: A non-volatile semiconductor device includes first and second selecting transistors; multiple memory cells that are stacked above the substrate; multiple word lines that are connected to control gates of the multiple memory cells; selecting gate lines that are each connected to a gate of one of the selecting transistors; a bit line connected to the first selecting transistor; a source line connected to the second selecting transistor; and a control circuit configured to execute an erasing loop that includes an erase operation and a verifying operation. The control circuit increases an erasing voltage in accordance with the number of times the erasing loop is repeated.

Abstract: Nonvolatile memory device, operating methods thereof, and memory systems including the same. In the operating method, a ground select line of a first string connected to a bit line may be floated. An erase prohibition voltage may be applied to a ground select line of a second string connected to the bit line. An erase operation voltage may be applied to the first and second strings.

Abstract: A memory includes a cell string including a plurality of memory cells connected in series, a bit line connected to the cell string, a voltage transfer unit configured to electrically connect the bit line and a sensing node in response to a control signal, and a page buffer configured to sense a voltage of the bit line through the sensing node in a sensing period, wherein the page buffer decides a voltage level of the control signal based on a threshold voltage of the target memory cell, which corresponds to a verification target among the plurality of memory cells in the sensing period.

Abstract: A nonvolatile semiconductor memory device according to an aspect includes a semiconductor substrate, a memory cell array, memory strings, drain side selection transistors, source side selection transistors, word lines, bit lines, a source line, a drain side selection gate line, a source side selection gate line, and a control circuit. The control circuit applies a first voltage to a selected bit line, thereby executing an erase operation on a selected memory string connected to the selected bit line, and the control circuit applies a second voltage to a non-selected bit line, thereby prohibiting the erase operation for the selected memory string connected to the non-selected bit line. The first voltage is more than the second voltage.

Abstract: A semiconductor memory device includes a string of memory cell transistors that are connected to each other in series. A selection transistor is connected between one end of the string of the memory cell transistors and one of a source line and a bit line. A line is selectively connected to a gate electrode of the selection transistor, a driver, or a node that supplies an unselected voltage, or is set to be in a floating state.

Abstract: Methods of maintaining a state of a memory cell without interrupting access to the memory cell are provided, including applying a back bias to the cell to offset charge leakage out of a floating body of the cell, wherein a charge level of the floating body indicates a state of the memory cell; and accessing the cell.

Abstract: A non-volatile memory system that has junctionless transistors is provided that uses suppression of the formation of an inversion-layer source and drain in the junctionless transistors to cause a discontinuous channel in at least one string. The system may include NAND flash memory cells composed of junctionless transistors, and has a set of wordlines. During program operation, a selected wordline of the set of wordlines is biased at a program voltage, and wordline voltage low enough to suppress the formation of source/drains is applied on at least one word line on a source side of the selected wordline such that a channel isolation occurs thereby causing the discontinuous channel in the at least string.

Abstract: A method is provided for programming a nonvolatile memory device, which includes multiple memory cells connected in series in a direction substantially perpendicular to a substrate. The method includes programming a first memory cell of the multiple memory cells, and programming a second memory cell of the multiple memory cells after the first memory cell is programmed, the second memory cell being closer to the substrate than the first memory cell. A diameter of a channel hole of the first memory cell is larger than a diameter of a channel hole of the second memory cell.

Abstract: A semiconductor device includes active strips. Active strip stack selection structures electrically couple to the active strip stacks at positions between the first and second ends, and select particular ones of the active strip stacks for operations. In one embodiment, different pads coupled to opposite pads have a higher voltage, depending on the memory cell selected for read. The same active strip stack selection structure can act as a pair of side gates for opposite sides of a first active strip stack, and as one side gate for each of the adjacent active strip stacks. Each active strip stack can have: a first structure from a first set acting as first and second side gates on a first side of word lines; and a second structure and a third structure from a second set respectively acting as third and fourth side gates on the second side of word lines.

Abstract: A memory includes an array of memory cells including a plurality of memory cells with a common source, wherein each of the plurality of memory cells with a common source includes two sub-memory cells, each of the sub-memory cells corresponds to a bit line, and the respective bits are electrically independent. Each of the sub-memory cells in the memory according to the disclosure corresponds to a bit line, and the respective bit lines are electrically independent, thereby effectively avoiding interference to other memory cells which will not be programmed during a program operation.

Abstract: This nonvolatile semiconductor memory device comprises a transistor string formed on a substrate and including a plurality of first transistors connected in series with each other. A first bit line is connected to a first end of the transistor string. A source line is connected to a second end of the transistor string. A memory string extends in a direction perpendicular to the substrate and comprises a plurality of nonvolatile memory transistors and a select transistor connected in series. Moreover, a part of the memory string is connected to a gate of the first transistor.

Abstract: Techniques are disclosed herein for programming memory arrays to achieve high program/erase cycle endurance. In some aspects, only selected word lines (WL) are programmed with other WLs remaining unprogrammed. As an example, only the even word lines are programmed with the odd WLs left unprogrammed. After all of the even word lines are programmed and the data block is to be programmed with new data, the block is erased. Later, only the odd word lines are programmed. The data may be transferred to a block that stores multiple bit per memory cell prior to the erase. In one aspect, the data is programmed in a checkerboard pattern with some memory cells programmed and others left unprogrammed. Later, after erasing the data, the previously unprogrammed part of the checkerboard pattern is programmed with remaining cells unprogrammed.