Target profile for a physical vapor deposition chamber target

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a front elevation view thereof;

FIG. 7 is a back elevation view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2.

The dashed lines in FIGS. 1-8 represent disclaimed matter that forms no part of the claimed design.

Claims

The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

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Patent History
Patent number: D836572
Type: Grant
Filed: Sep 30, 2016
Date of Patent: Dec 25, 2018
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Martin Lee Riker (Milpitas, CA), Fuhong Zhang (Cupertino, CA), Xiaodong Wang (San Jose, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/579,470