Abstract: A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid salt. In another embodiment, the process uses a composition free of nitric acid and chromic acid and comprising an oxidant, at least one mineral acid salt, and a complexing agent which is a salt of an organic acid. Due at least in part to the absence of nitric and chromic acids, and in particular, strong mineral acids, the cleaning processes of the present invention remove smut residues from aluminum surfaces without significant etching of the aluminum.

Abstract: An aqueous tire wheel cleaner composition useful for cleaning automobile tires are provided. The aqueous tire wheel cleaner composition contains an alkali and/or alkaline earth metal hydroxycarboxilic acid or a quaternary amine ethoxylate; a salt of an aryl sulfonate, and as surfactants ethanol amine and an ethoxylate phosphate ester.

Abstract: Aqueous dispersions of silicone oils are prepared without the need for surfactants, solvents, hydrotropes or emulsifiers by employing water soluble and/or water dispersible polymers providing inventive compositions which exhibit a rheological Critical Strain value greater than zero and less than about 0.5. Disclosed according to the present invention are compositions and methods of use of the aqueous dispersions of silicone fluids for cleaning, preserving, protecting, and otherwise treating a variety of surfaces, including household surfaces, such as floors, counter tops, furniture, walls, and automotive surfaces, such as tires, rubber, vinyl, upholstery, fabric, plastic and general elastomer surfaces.

Abstract: A CMP slurry comprising polishing abrasives containing mixture abrasives of silica and alumina is used. In CMP using the slurry comprising mixture abrasives of silica and alumina as polishing abrasives, a down force-dependency of a polishing rate is high and an increase in dishing can be effectively suppressed.

Abstract: A cleaning composition including a metal bisulfate and metal inorganic salt acid package, and at least one surfactant. The cleaning composition can be a one-step wheel cleaner/brightener. The composition preferably contains no HF, no bifluoride, no oxalic acid, or other poisonous and highly toxic materials commonly found in both industrial and consumer wheel cleaners. Further, the wheel cleaner/brightener composition matches or exceeds the performance of those hazardous formulations and does not damage aluminum wheels even when applied to hot metal. The composition can be a foam composition, provided in a foam dispenser. The foam dispenser includes a container and a mechanical foaming head. The container includes a cleaning composition containing a metal bisulfate and metal sulfate acid package, and at least one surfactant, water, and a foam-boosting solvent.

Abstract: The present invention relates generally to compositions, methods of use and kits for vehicular cleaning employing a cleaning concentrate containing at least one surfactant and at least one rheology modifier, optionally a solvent and/or optionally an alkalinity source, that exhibits a Vertical Cling parameter of between 1 and about 7 at a temperature of about 25° C. on soiled surfaces to which the compositions are applied.

Abstract: The present disclosure provides a non-corrosive cleaning composition that is useful for removing residues from a semiconductor substrate. The composition can comprise water, at least one hydrazinocarboxylic acid ester, at least one water soluble carboxylic acid, optionally, at least one fluoride-containing compound, and, optionally, at least one corrosion inhibitor not containing a carboxyl group. The present disclosure also provides a method of cleaning residues from a semiconductor substrate using the non-corrosive cleaning composition.

Abstract: An oil-in-water emulsion composition remover is disclosed. The compositions comprise a solvent, water and a surfactant. The removers are useful in removing non-aqueous and aqueous coatings, waxes, greases, and the like, from substrates to which the coatings, waxes, greases, and the like, have been applied.

Abstract: A prepackaged, peroxide-based, cleaning composition is described which is suitable for on-site dilution, and for cleaning substrates such as air conditioner coils.

Abstract: Prepackaged cleaning compositions are described which are suitable for on-site dilution, and for cleaning substrates such as air conditioner coils.

Abstract: The present invention relates to associative complexes of water soluble and/or water dispersible polymers and polymeric fluorosurfactants, compositions and methods for modifying substrates to provide treated articles with surface protective properties including easier cleaning, increased stain and/or soil repellency, and increased resistance to bio-fouling and environmental contamination.

Abstract: A sanitizing applicator for applying a liquid sanitizer to a surface. The sanitizer may be a quaternary ammonium compound (QAC)-based or chlorine-based sanitizer containing positively charged ions at an effective concentration level for killing a predefined percentage of microbes present on the surface. The applicator includes a breakable internal reservoir for retaining a quantity of the sanitizer, and a positively charged nonwoven fabric covering the reservoir. The fabric is constructed using a positively charged binder to bind together the strands of the fabric, and is optionally treated with a positively or neutrally charged surfactant. The positive charge of the fabric prevents the fabric from neutralizing the positively charged ions in the sanitizer when the breakable internal reservoir is broken and the sanitizer is applied to the fabric.

Abstract: Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises H2O as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation. wherein R, x, y, z, a and b are as defined in the specification.

Abstract: Degreasing compositions that may be used, for example, to degrease substrates such as contaminated surfaces of automobile engines are disclosed. The degreasing compositions comprise a builder, an amphoteric surfactant, and an alkoxylated acetylenic diol having the structure of formula (I) or (II): where: R1 and R4 are, independently, alkyl radicals containing from 3 to 10 carbon atoms; R2 and R3 are, independently, selected from the group consisting of methyl and ethyl; and (x+y)=2 to 50; ?where: r and t are each, independently, 1 or 2; (n+m)=1 to 30; and (p+q)=1 to 30. Certain embodiments of the degreasing composition are non-caustic, low VOC and may be low phosphate or phosphate-free.

Abstract: A method of treating the surfaces of medical instruments which are contaminated with prions includes contacting the surface with a composition containing a source of peroxide ions, such as hydrogen peroxide, at a molar concentration of at least 1.5M peroxide (equivalent to approximately 5% hydrogen peroxide) and preferably, about 2M peroxide (approximately 7% hydrogen peroxide). The composition is optionally in the form of a gel. The composition is retained in contact with the surfaces for about 1–2 hours until all or substantially all prion contamination is removed.

Abstract: The invention relates to compounds of the formula (1) in which A is C2- to C4-alkylene, B is C1- to C4-alkylene, x is a number from 1 to 3, and y is a number from 1 to 100.

Abstract: A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.

Abstract: Improved hard surface cleaning compositions having an acidic pH provide good removal of soap scum stains. Compositions of the present invention comprise an acidic constituent which comprises either citric acid alone or citric acid in combination with an acid selected from the group consisting of sorbic acid, acetic acid, boric acid, formic acid, maleic acid, adipic acid, lactic acid, malic acid, malonic acid, glycolic acid, and mixtures thereof; at least one anionic surfactant; at least one thickener; at least one scrubbing agent; one or more optional constituents; and the balance water; wherein the aqueous hard surface cleaning composition exhibits a pH of 6.0 or less.

Abstract: Recently, use is made of copper wiring as the wiring material for semiconductor devices, and of low dielectric constant films as the insulating film between the lines of wiring. In this connection, a photoresist stripper is in need which can inhibit corrosion or damage on the copper wiring or the Low-k film, and which has excellent property of removing ashed photoresist residues. The invention provides a photoresist stripper (hereinafter, referred to as the stripper of the invention) characterized in containing a tertiary amine compound, an alkaline compound, a fluoro compound, and an anionic surfactant; and a process for preparation of semiconductor devices using the stripper of the invention.

Abstract: Surfactant combinations containing: (a) one or more alkyl ether sulfates; (b) at least one quaternary ammonium compound corresponding to formula I: in which EO is ethylene oxide, R and R? are the same or different and represent alkyl groups, n1 is 0–30 n2 is 0–30, and A is a counterion; (c) 0 to 50% of one or more alkyl and/or aryl sulfonates; (d) 0 to 15% of one or more alkyl sulfates; and (e) 0 to 20% of one or more amphoteric surfactants, and water-based cleaning composition containing such surfactant combinations.

Abstract: A composition and method for cleaning surfaces having deposits, such as drink water tanks, supply water wells, water filter systems, and distributor water lines. The composition contains in combination a cleaning solution and a disinfectant, such as hydrogen peroxide or peracidic acid. The cleaning solution can includes hydrochloric acid and/or phosphoric acid in combination with inhibitors, dyes and water. The composition is applied to deposits which have formed on these surfaces.

Abstract: This invention relates to solutions of dithionic acid and/or dithionate salts which use in metal finishing processes such those used for the cleaning, activating, electroplating, electroless plating, conversion coating and/or other pre-treatment or post-treatment of a metallic surface. In particular the solutions are a useful electrolyte for the electroplating of metallic coatings, especially, Sn, Cu, Ni, Zn and precious metals, onto metal or plastic substrates and/or other surfaces.

Abstract: A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of the cut section is achieved. An oxidized film with a thickness of several micrometers is formed when a cut and punched steel is quenched and tempered at high temperature. Due to high strength and hardness of the steel, the oxidized film and edge burs are difficult to be removed by mechanical grinding. Therefore, a suitable electrolyte composes of only a little chemical reagent and oxidizer in deionized water is used to remove the oxidized film and punched bur simultaneously using chemical etching method.

Abstract: The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.

Abstract: A solution containing approximately 40–60% by weight phosphoric acid, approximately 1–6% by weight a surfactant, approximately 0.5–5% by weight an inhibitor, and the remaining percentage by weight made up of water for removing magnesium chloride from certain materials, namely aluminum, aluminum alloys, steel, rebar, chrome, plastics, ceramics, rubber, including insulation on electrical wiring, and painted surfaces including those previously mentioned. The solution may be applied in various ways, including through a low-pressure sprayer or similar device used in car and truck washing service areas. Alternatively, the solution may be applied as a mask or coating, and after a period of time rinsed away from the contaminated surface.

Abstract: The present invention relates to an aqueous based, solvent free degreaser composition, comprising a blend of two nonionic surfactants selected from, alcohol alkoxylate with a fatty alcohol moiety, alkoxylated fatty alcohol, fatty alcohol having oxyethylate moieties, polyoxyalkylene block copolymers, and alkyl phenol alkoxylate.

Abstract: The cleaning composition of the present invention is characterized by containing N-hydroxyformamide. The cleaning composition is capable of easily removing patterned photoresist masks or resist residues remaining on substrates after the etching process or removing resist residues remaining after the etching process and the subsequent ashing process within a short period of time without causing the corrosion of wiring materials and insulating films, thereby ensuring the fine processing to provide high-precision wiring circuits.

Abstract: A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Abstract: The invention relates to the use of a composition for cleaning the outside of a means of transport. The composition contains component a) at least one tertiary amino oxide of formula R1 R2 R3 NO, whereby R1 represents an alkylamidoalkyl, alkenylamidoalkyl, alkoxypropylamidoalkyl or alkenylamidoalkyl group having between 8–18 carbon atoms, R2 and R3 represent, independently from each other, low molecular alkyl radicals or hydroxyethyl radicals or hydroxypropyl radicals, and component b) at least one alkali metal salt of polyasparaginic acid having a molecular weight of between 5,000 g/mol–50,000 g/mol, or a polyglutaminic acid having a molecular weight of between 5,000 g/mol–50,000 g/mol, or a mixture of both substances, whereby the weight ratio of the components a:b is between 10:1 and 3000:1. The cleaner of the present invention effectively removes dirt and comprises environmentally friendly corrosion inhibitors.

Abstract: The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: wherein R1 to R3 are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7: wherein R2 to R5 and n are as defined in the specification, is a novel compound.

Abstract: A cleaning composition for treating and removing residue containing hydrocarbons and other flammable substances uses a mixture of one or more cleaning members containing quaternary salts, a chelator and a dispersant, mixed with water. The preferred cleaning members are tetradecyltrimethylammonium bromide, tetrasodium ethylenediaminetetraacetic acid, benzethonium hydrochloride and 2-butoxyethanol. The chelator is tetrasodium salt ethylenediamine of tetraacetic acid, and the dispersant is polyvinyl alcohol. Optionally, the cleaner contains ethanol and isopropyl alcohol.

Abstract: The inventive aqueous pickling agent on the basis of sulfuric acid or phosphoric acid and hydrogen fluoride for stainless steels, which pickling agent is free of wetting and emulsifying agents, contains (each as 100 wt-% substance) 1.5 to 16 wt-% sulfuric acid or 2.0 to 30 wt-% phosphoric acid as well as 0.5 to 14 wt-% hydrogen fluoride and 0.5 to 15.5 wt-% acid-soluble aromatic nitro compound. An iron(III) compound is not supplied to said pickling agent. Merely in the starting phase, an oxidizing agent can be supplied, which oxidizes iron(II) to form iron(III). As acid-soluble aromatic nitro compound m-nitrobenzene sulfonate and/or 3-nitrophthalate are particularly advantageous. The inventive pickling agent can be used as bath pickle and —when adding 2.5 to 5.5 wt-% magnesium and/or magnesium compound (calculated as Mg)—also as spraying pickle or brush pickle.

Abstract: An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal salt. The aqueous material can be used to treat the surfaces of such articles for the purpose of removing tarnish. Such tarnish is removed by the composition and the composition treats the metal surface to retard the re-appearance of tarnish contaminants.

Abstract: A cleaning product comprising about 1% to 5% by weight cornstarch; about 17% to 27% by weight of an acid with a pH of about 2.5–3.5; about 52% to 62% by weight of a surfactant; about 7% to 17% by weight NaCl, wherein said cornstarch, said acid, said surfactant, and said NaCl are added together and heated to a slow bubbling boil and said cleaning composition appears smooth and milk-like in appearance and then heat reduced; and about 4% to 8% by weight oxalic acid dehydrate wherein said oxalic acid dehydrate is provided from the source manufactured under the tradename Barkeeper's Friend by SerVaas Laboratories of Indianapolis, Ind. and further wherein said compound is added after heat is reduced. The cleaning composition is useful for cleaning various types of metals.

Abstract: The cleaning composition of this invention comprises, as effective components, a compound (A) represented by the formula (1) and a nonionic surfactant (B): wherein R1 represents a hydrogen atom or a straight-chain or branched-chain alkyl group having 1 to 5 carbon atoms and R2 represents a hydrogen atom or a straight-chain or branched-chain alkyl group having 1 to 5 carbon atoms. The cleaning composition of the invention is excellent in detergency and is satisfactory in respect of environmental protection properties, odor and flammability. An article to be cleaned can be cleaned by coming into contact with this cleaning composition.

Abstract: A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R1 and R3 are each independently selected from H, OH, CO2H, halogen, C1–C3 alkyl, C1–C3 alkoxy or (CH2)nOH wherein n is 1, 2 or 3; and R2 is selected from C9–C16 alkyl, or C9–C16 alkoxy

Abstract: A cured resin dissolving composition comprising a cellulosic gelling agent prepared in n,n-dimethylacetamide, known for its high penetration and solvency to polar resins, with a glycol-ether co-solvent, 1,8-diazabicyclo(5.4.0)undec-7-ene as a soluble amine, and a surfactant. The mixture of components form a gel-form composition while maintaining high dissolution character for cured polysulfide resins. The optimum thickness of the gel form is dependent upon the amount of the cellulose gelling agent present in the mixture. The product may be used to remove coatings and sealants present on vertical and horizontal surfaces and hard to reach areas commonly encountered when performing maintenance on aviation fuel tanks and similar equipment. Once the system has been in contact with the resin and dissolution has been allowed for a period of time, the reacted material may be wiped away or can be easily rinsed with water, an alcohol, or another hydrophilic rinse.

Abstract: The present invention relates to blooming type cleaning compositions comprising natural oil. More particularly, the present invention relates environmentally acceptable, blooming natural oil cleaning compositions which achieve product stability and clarity with essentially one natural oil, such as orange oil, without the addition of a blooming agent such as pine oil, amine oxides, amphoteric surfactants or phenolic solvents.

Abstract: The present invention encompasses a composition, suitable for cleaning hard surfaces, comprising a bleaching agent and a silicone glycol.

Abstract: A composition for removing paraffin, wax, or asphaltine deposits from the surface of a crude oil transmission system, such as a downhole tubular, a pipeline, or a surface tank, includes an aqueous sodium hydroxide solution containing from 18% to 25% by weight sodium hydroxide. The composition further includes an acetic acid solution containing from 30% to 55% by weight acetic acid compared to the sodium hydroxide, and a liquid aromatic hydrocarbon having from 6 to 10 carbon atoms and from 15% to 40% by weight compared to the sodium hydroxide. According to the method of the invention, the aqueous sodium hydroxide solution may be metered in a downhole tubular or a pipeline separate from the acetic acid solution, such that heat generated by the mixed composition is generated within the downhole tubular or the pipeline.

Abstract: An aqueous detergent composition is provided containing phosphoric acid or salt thereof, an organic phosphate surfactant, a nonionic surfactant, and water. The aqueous detergent composition may be employed to improved the adhesion of a coating to a substrate. Also provided is a method of improving the adhesion of a coating to a substrate.

Abstract: A cleaning composition is provided according to the invention. The cleaning composition includes a product of mixing an acid component, a source of phosphoric acid component, and an oxidant component. The molar ratio of oxidant component to phosphoric acid component is preferably between about 2:1 and about 1:2, and the molar ratio of oxidant component to acid component is preferably between about 1:3 and about 1:5. A method of cleaning an aluminum surface is provided. The method includes a step of applying the cleaning composition to an aluminum surface, and rinsing the cleaning composition from the aluminum surface.

Abstract: A water soluble tablet comprising a cleaning composition which contains a surfactant coated bleach.

Abstract: A solution for washing away residue, comprising an aqueous solution of a water-soluble high molecular compound in which is dissolved at least one kind of dissolving agent selected from an amine and a fluoride. The washing solution is capable of effectively washing away the residue formed during the production of electronic circuits, is very lowly corrosive to the insulating films, low-dielectric interlayer insulating films and wirings, and offers an advantage of little generating foam.

Abstract: The invention relates to the use of a surface-active agent and to the use of cleaning agents obtained by dilution of said surface-active agent for removing silicone-containing deposits from surfaces.

Abstract: Compositions of the invention include: (a) a solvent having a hydrophilic-lipophilic balance (HLB) value of 5 to 7; and (b) a solubilizing agent having the formula: where R is aryl, cycloaryl, heteroaryl or hetercyclyl; R1 is a bond, (C1-C7)alkyl, substituted (C1-C7)alkyl, (C1-C7)alkoxy, substituted (C1-C7)alkoxy, (C2-C7)alkenyl or substituted (C2-C7)alkenyl; and Z+ is hydrogen, Na, K, NR?4 where R? is defined herein. Further compositions include: (a) a solvent having a (HLB) value of 5 to 7; and (b) a solubilizing agent having the formula: where R2 is a bond, (C1-C7)alkyl, substituted (C1-C7)alkyl, (C1-C7)alkoxy, substituted (C1-C7)alkoxy, (C2-C7)alkenyl or substituted (C2-C7)alkenyl; and Z+ is hydrogen, Na, K, NR?4 where R? is defined herein. The compositions are useful in providing stable single phase aqueous solutions when combined with water.

Abstract: A restaurant cleaning towel made from a substrate such as a woven, nonwoven, or knit fabric. A sanitizer release polymer composition comprising at least one cationic (or alternatively, nonionic) surfactant is bound to the surface of the towel. Preferably, the cationic surfactant is present in the sanitizer release polymer composition in an amount of about 1 to about 10 weight percent, based on a total weight of the composition. The composition may also include at least one nonionic co-surfactant in combination with the cationic surfactant. The towel also includes a color label on its surface to identify the area of the restaurant in which the cleaning towel is to be utilized. The towel may optionally include an international icon, a tactile label, and/or a label in a plurality of languages identifying the area where the towel is to be utilized.

Abstract: A hydrocarbon composition prepared by combining methane, ethane, isopentane, normal pentane, hexane and heptane at an appropriate compounding ratio contains 75% or more by volume of propane, isobutane and normal butane, to have ignition temperature of 800° C. and above. This composition is safe and economical in using as a refrigerant for use in air conditioners and refrigerators or a detergent for cleansing precision components such as semiconductor chips. The composition can be used independently without being combined with a conventional refrigerant such as CFC and HFC and does not destroy ozone, thus to contribute to the protection of the environment.

Abstract: An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal salt. The aqueous material can be used to treat the surfaces of such articles for the purpose of removing tarnish. Such tarnish is removed by the composition and the composition treats the metal surface to retard the re-appearance of tarnish contaminants.

Abstract: A solvent composition that comprises a C1-C4 lactate ester and an odor-reducing amount of a tertiary amine having a boiling point at one atmosphere of about 80° C. to about 160° C. is disclosed. The composition (a) is substantially free of odor due to the tertiary amine, (b) exhibits a reduced amount of odor due to the lactate ester as compared to the same composition without the tertiary amine, and (c) is a homogeneous liquid or gel at zero degrees Celsius. A method of reducing the odor of a lactate ester-based solvent is also disclosed.