Compositions To Be Polymerized Or Modified By Wave Energy Wherein Said Composition Contains At Least One Specified Rate-affecting Material; Or Processes Of Preparing Or Treating A Solid Polymer Utilizing Wave Energy In The Presence Of At Least One Specified Rate-affecting Material; E.g., Nitrogen Containing Photosensitizer, Oxygen Containing Photoinitiator, Etc. Wave Energy In Order To Prepare A Cellular Product Patents (Class 522/6)
- At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring (Class 522/8)
- Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer (Class 522/11)
- Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer (Class 522/12)
- Specified rate-affecting material is a peroxide or azo compound (Class 522/13)
- Specified rate-affecting material is an amide or tertiary amine (Class 522/14)
- Specified rate-affecting material contains onium group (Class 522/15)
- Specified rate-affecting material is heterocyclic (Class 522/16)
- Specified rate-affecting material contains sulfur (Class 522/17)
- Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom (Class 522/18)
- Specified rate-affecting material is an aldehyde or aldehyde derivative (Class 522/19)
- Specified rate-affecting material is a carboxylic acid or derivative (Class 522/20)
- Specified rate-affecting material contains C-OH or C-O-C group (Class 522/21)
- Specified rate-affecting material contains an inorganic compound (Class 522/22)
- Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom (Class 522/23)
- Specified rate-affecting material is a peroxide (Class 522/24)
- Specified rate-affecting material contains onium group (Class 522/25)
- Specified rate-affecting material is heterocyclic (Class 522/26)
- Specified rate-affecting material contains sulfur (Class 522/27)
- Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen (Class 522/28)
- Specified rate-affecting material is a metal-containing organic compound (Class 522/29)
- Specified rate-affecting material is organic (Class 522/30)
- Containing ethylenic unsaturation (Class 522/34)
- Contained in polymeric rate-affecting material, e.g., synthetic resin, etc. (Class 522/35)
- Containing two or more ketone groups (Class 522/36)
- Containing phosphorous (Class 522/38)
- Containing nitrogen (Class 522/39)
- Containing C-CO-CHOH, e.g., benzoin, etc. (Class 522/40)
- Containing C-CO-C(R)(OH) wherein R is organic (Class 522/42)
- Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc. (Class 522/43)
- Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethoxyacetophenone, etc. (Class 522/44)
- Containing halogen, e.g., chloroacetone, etc. (Class 522/45)
- At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc. (Class 522/46)
- Hetero nitrogen ring (Class 522/50)
- Hetero sulfur ring (Class 522/53)
- C-(S)*-C wherein * is at least two (Class 522/54)
- Sulfide (Class 522/55)
- Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc. (Class 522/56)
- Nitrogen containing compound (Class 522/57)
- Sulfenate, e.g., R-O-S-R, etc. (Class 522/58)
- (O=S=O), e.g., sulfuryl or sulfonyl containing, etc. (Class 522/59)