Confinement plate for a substrate processing chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of a confinement plate for a substrate processing chamber, showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a front elevation view thereof;

FIG. 5 is a rear elevation view thereof;

FIG. 6 is a right side elevation view thereof;

FIG. 7 is a left side elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 of FIG. 2.

The dashed lines in FIGS. 1-8 represent unclaimed environment forming no part of the claimed design.

Claims

The ornamental design for a confinement plate for a substrate processing chamber, as shown and described.

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Patent History
Patent number: D986190
Type: Grant
Filed: Jan 24, 2022
Date of Patent: May 16, 2023
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventor: Joseph Perry (San Jose, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/824,387