Abstract: A method for operating a memory (20) includes storing analog values in an array of analog memory cells (22), so that each of the analog memory cells holds an analog value corresponding to at least first and second respective bits. A first indication of the analog value stored in a given analog memory cell is obtained using a first set of sampling parameters. A second indication of the analog value stored in the given analog memory cell is obtained using a second set of sampling parameters, which is dependent upon the first indication. The first and second respective bits are read out from the given analog memory cell responsively to the first and second indications.

Abstract: Disclosed is a semiconductor storage device comprising a semiconductor substrate, a first and a second impurity diffusion layer formed in the semiconductor substrate, a gate insulating film formed on the semiconductor substrate, and a first gate electrode formed on the semiconductor substrate via the gate insulating film. The gate insulating film has a nitrogen-containing silicon oxide film inside, and a silicon oxide film is so arranged on both sides of the nitrogen-containing silicon oxide film as to sandwich the nitrogen-containing silicon oxide film. In addition, the nitrogen composition in the nitrogen-containing silicon oxide film is increased from the semiconductor substrate side to the first gate electrode side.

Abstract: A flash memory device which includes a memory cell array which stores data and trim information, and control logic which controls programming, erasing, and reading modes of the memory cell array. The control logic is operative to receive the trim information from the memory cell array in a power-up mode, and to optimize operational time periods of the programming, erasing, and reading modes in accordance with the trim information.

Abstract: A semiconductor device includes a reset sequence circuit, a latch circuit, and a reset control circuit. The reset sequence circuit is activated by receiving an externally input signal when a reset operation is started and outputs a first trigger signal. The latch circuit is capable of holding selection information on circuits capable of being reset. The selection information is externally input. The reset control circuit outputs a reset signal on the basis of the selection information held in the latch circuit in response to a power-on reset signal and the first trigger signal output from the reset sequence circuit.

Abstract: This disclosure concerns a semiconductor memory device comprising memory cells including floating bodies and storing therein logic data; bit lines and word lines connected to the memory cells; sense amplifiers connected to the bit lines; a refresh controller instructing a refresh operation for restoring deteriorated storage states of the memory cells; and a refresh interval timer setting a refresh interval between one refresh operation and a next refresh operation to a first interval in a data read mode or a data write mode, and setting the refresh interval to a second interval longer than the first interval in a data retention mode, the data read mode being a mode in which the data stored in the selected memory cell is read to an outside of the device, the data write mode being a mode in which data from the outside is written to the selected memory cell.

Abstract: For recording or replaying in real-time digital high bandwidth video signals, e.g. HDTV, HD progressive or HD film capture signals, very fast memories are required. For storage of streaming HD video data NAND FLASH memory based systems could be used. Flash memory devices are physically accessed in a page oriented mode. According to the invention, the input data are written in a multiplexed fashion into a matrix of multiple flash devices. A list processing is performed that is as simple and fast as possible, and defect pages of flash blocks of single flash devices are addressed within the matrix architecture. When writing in a sequential manner, the data content for the current flash device page of all flash devices of the matrix is copied to a corresponding storage area in an additional memory buffer. After the current series of pages has been written without error into the flash devices, the corresponding storage area in an additional memory buffer is enabled for overwriting with following page data.

Abstract: NAND arrays of memory cells are described, as well as methods of forming and using them. Memory cell charge storage devices, such as conductive floating gates, are oriented vertically in trenches, with control gates positioned both in the trenches between charge storage elements and over a horizontal surface between the trenches. Individual charge storage devices are therefore field coupled with two control gates, one on either side.

Abstract: Data stored in non-volatile storage is read using sense operations and associated pre-conditioning waveforms. The pre-conditioning waveform provides a short term history for a non-volatile element which is analogous to the conditions experienced during programming when a programming pulse is applied prior to a verify operation. The pre-conditioning waveform can cause electrons to enter and exit trap sites, for instance, so that the accuracy of a probabilistic decoding process is improved. In one approach, multiple read operations are performed, some with pre-conditioning waveforms and some without. Pre-conditioning waveforms with different characteristics, such as amplitude, shape, duration and time before the associated read pulse, can also be used. For probabilistic decoding, initial reliability metrics can be developed based on multiple reads. Tables which store the reliability metrics can then be prepared for use in subsequent decoding.

Abstract: A group of memory cells is programmed respectively to their target states in parallel using a multiple-pass programming method in which the programming voltages in the multiple passes are correlated. Each programming pass employs a programming voltage in the form of a staircase pulse train with a common step size, and each successive pass has the staircase pulse train offset from that of the previous pass by a predetermined offset level. The predetermined offset level is less than the common step size and may be less than or equal to the predetermined offset level of the previous pass. Thus, the same programming resolution can be achieved over multiple passes using fewer programming pulses than conventional method where each successive pass uses a programming staircase pulse train with a finer step size. The multiple pass programming serves to tighten the distribution of the programmed thresholds while reducing the overall number of programming pulses.

Abstract: A multi-programmable non-volatile device is operated with a floating gate that functions as a FET gate that overlaps a portion of a source/drain region and allows for variable coupling through geometry and/or biasing conditions. This allows a programming voltage for the device to be imparted to the floating gate through variable capacitive coupling, thus changing the state of the device. The invention can be used in environments such as data encryption, reference trimming, manufacturing ID, security ID, and many other applications.

Abstract: A non-volatile semiconductor storage device includes a substrate, a first insulating layer formed on the substrate, a semiconductor layer formed of polysilicon on the first insulating layer, a pair of conductor regions formed on the first insulating layer to pass through the semiconductor layer and to sandwich a part of the semiconductor layer, and formed of a metal or a silicide, a tunnel layer formed on the part of the semiconductor layer sandwiched between the pair of conductor regions, a charge storage layer formed on the tunnel layer, a second insulating layer formed on the charge storage layer, and a control gate formed on the second insulating layer.

Abstract: A manufacturing method of a charge-trapping memory device is provided. This method includes forming a stacked structure having at least a charge-trapping medium. An annealing process in a hydrogen gas is then performed on the stacked structure subsequent to the device fabrication process. The annealing process is conducted at a temperature of about 350° C. to 450° C. and with the concentration of the hydrogen gas greater than 0.5 mole percent.

Abstract: A memory array has memory elements of identical topology or footprint arranged in rows and columns. Some of the memory elements are EEPROM cells and other memory elements are read only memory cells but all are made using a mask set having the same length and width dimensions. In the mask set for EEPROMs a principal mask is used for formation of a depletion implant. In the case of one type of read-only memory element, this mask is mainly blocked, leading to formation of a transistor with a non-conductive channel between source and drain. In the case of another read only memory element, the same mask is unblocked, leading to formation of a transistor with a highly conductive or almost shorted channel between source and drain. These two read only memory elements are designated as logic one and logic zero. By having rows of read-only memory elements with rows of EEPROMs on the same chip, a more versatile memory array chip may be built without sacrificing chip space.

Abstract: High density semiconductor devices and methods of fabricating the same are provided. Spacer fabrication techniques are utilized to form circuit elements having reduced feature sizes, which in some instances are smaller than the smallest lithographically resolvable element size of the process being used. Spacers are formed that serve as a mask for etching one or more layers beneath the spacers. An etch stop pad layer having a material composition substantially similar to the spacer material is provided between a dielectric layer and an insulating sacrificial layer such as silicon nitride. When etching the sacrificial layer, the matched pad layer provides an etch stop to avoid damaging and reducing the size of the dielectric layer. The matched material compositions further provide improved adhesion for the spacers, thereby improving the rigidity and integrity of the spacers.

Abstract: A method of identifying logical information in a cell, particularly in a programming by hot hole injection nitride electron storage (PHINES) cell by one-side reading scheme is disclosed. The method comprise steps of: erasing the first region and the second region of PHINES cell by increasing a local threshold voltage (Vt) to a certain value; programming at least one of the first region and the second region of the PHINES cell by hot hole injection; and reading a logical state of the PHINES cell by measuring an output current of one of the first region and the second region; wherein different quantity of the output current is caused by interaction between different quantity of the hot hole stored in the first region and the second region, so as to determine the logical state of the PHINES cell by one-side reading scheme.

Abstract: A plurality of integrated circuit features are provided in the context of an array of memory cells including a plurality of word lines and a plurality of bit lines. Each memory cell includes a floating body or is volatile memory. The aforementioned features may include, among others, an option whereby the foregoing bit lines may be situated below a channel region of corresponding memory cells, etc.

Abstract: A plurality of non-volatile storage elements on a common active layer are offset from neighbor non-volatile storage elements. This offsetting of non-volatile storage elements helps reduce interference from neighbor non-volatile storage elements. A method of manufacture is also described for fabricating the offset non-volatile storage elements.

Abstract: In a nonvolatile semiconductor memory device storing data by accumulating charges in a floating gate, memory units, each of which includes a first MOS transistor as a read device, a bit cell composed of a first capacitor as a capacitance coupling device and a second capacitor as an erase device, and a decode device including a second MOS transistor and a third MOS transistor, are arranged in array. This attains nonvolatile memory capable of bit by bit selective erase arranged in array to thus reduce the core area remarkably.

Abstract: A carrier storage node such as a floating gate is formed on a moving electrode with a control gate to form a suspended gate non-volatile memory, reducing floating gate to floating gate coupling and leakage current, and increasing data retention.

Abstract: A memory transistor including a substrate, a tunnel insulating pattern on the substrate, a charge storage pattern on the tunnel insulating pattern, a blocking insulating pattern on the charge storage pattern, and a gate electrode on the blocking insulating pattern, the blocking insulating pattern surrounding the gate electrode and methods of operating and fabricating the same. A nonvolatile memory may further include a plurality of memory transistors in series and a plurality of auxiliary structures between each of the plurality of unit transistors in series. Each of the plurality of auxiliary structures may be a dummy mask pattern or an assistant gate structure.

Abstract: In some embodiments, a gate structure with a spacer on its side may be used as a mask to form self-aligned trenches in a microelectronic memory, such as a flash memory. A first portion of the gate structure may be used to form the mask, together with sidewall spacers, in some embodiments. Then, after forming the shallow trench isolations, a second portion of the gate structure may be added to form a mushroom shaped gate structure.

Abstract: The present invention discloses a metal oxide semiconductor (MOS) device and a method for operating an array structure comprising the same devices. The MOS device of the present invention comprises a device layer; an ion-implanted layer formed on the device layer and providing the source, the drain and the channel; and a gate structure formed on the ion-implanted layer. Via applying a bias voltage to the gate, the carrier density in the channel region is different from that in the source region or the drain region; thereby, the MOS device of the present invention can undertake programming, erasing and reading activities. The present invention can simplify the MOS device fabrication process, reduce the operating voltage, and promote the integration density of a 2-dimensional or 3-dimensional MOS device array.

Abstract: A method produces a vertical field-effect transistor having a semiconductor layer, in which a doped channel region is arranged along a depression. A “buried” terminal region leads as far as a surface of the semiconductor layer. The field-effect transistor also has a doped terminal region near an opening of the depression as well as the doped terminal region remote from the opening, a control region arranged in the depression, and an electrical insulating region between the control region and the channel region. The terminal region remote from the opening leads as far as a surface containing the opening or is electrically conductively connected to an electrically conductive connection leading to the surface. The control region is arranged in only one depression. The field-effect transistor is a drive transistor at a word line or at a bit line of a memory cell array.

Abstract: According to an aspect of the invention, a nonvolatile semiconductor memory comprises: a semiconductor substrate; a trench formed in the semiconductor substrate; a first insulating film being formed on a wall surface of the trench; a floating gate electrode formed on the first insulating film inside the trench; a source region formed in the semiconductor substrate; a drain region formed in the semiconductor substrate; a channel region formed between the source region and the drain region in the semiconductor substrate, a second insulating film formed on a surface of the semiconductor substrate; and a control gate electrode formed on the channel region and a surface of the second insulating film. The channel region is adjacent to the trench. A storage state of the nonvolatile semiconductor memory is formed by injecting or drawing charge into or from the floating gate electrode when a tunnel current flows through the first insulating film.

Abstract: Disclosed is to enable high speed reading from a storage node when a read is executed. A main cell array is constituted from main cell division units 20a. Each main cell division unit 20a includes select gates SG that extend in a vertical direction, common sources CS that extend in a horizontal direction below the select gates SG outside a cell region, word lines W0 to W15 that extend above the select gates SG in the horizontal direction within the cell region, a plurality of storage nodes disposed in the vicinity of intersecting portions between the word lines W0 to W15 and the select gates SG, respectively, below the word lines W0 to W15, and a bit line MGB for transmitting to a sense amplifier 11 information on one of the storage nodes through a selection switch 21. In the main cell division unit 20a, an inversion layer is formed below each of the select gates SG within the cell region by applying a positive voltage to each of the select gates SG.

Abstract: A semiconductor device includes a semiconductor substrate having a cell region and a peripheral region. A cell array is defined within the cell region, the cell array having first, second, third, and fourth sides. A first decoder is defined within the peripheral region and provided adjacent to the first side of the cell array. A first isolation structure is formed at a first boundary region provided between the first side of the cell array and the peripheral region. A first dummy active region is formed at a second boundary region that is provided between the second side of the cell array and the peripheral region. The first isolation structure has a first portion that has a first depth and a second portion that has a second depth.

Abstract: The present invention relates to a flash memory device and a fabrication method thereof. A trench may be formed within a junction region between word lines by etching a semiconductor substrate between not only a word line and a select line, but also between adjacent word lines. Accordingly, the occurrence of a program disturbance phenomenon can be prevented as the injection of hot carriers into a program-inhibited cell is minimized in a program operation.

Abstract: The invention relates to a nonvolatile two-transistor semiconductor memory cell and an associated fabrication method, source and drain regions (2) for a selection transistor (AT) and a memory transistor (ST) being formed in a substrate (1). The memory transistor (ST) has a first insulation layer (3), a charge storage layer (4), a second insulation layer (5) and a memory transistor control layer (6), while the selection transistor (AT) has a first insulation layer (3?) and a selection transistor control layer (4*). By using different materials for the charge storage layer (4) and the selection transistor control layer (4*), it is possible to significantly improve the charge retention properties of the memory cell by adapting the substrate doping with electrical properties remaining the same.

Abstract: A semiconductor device according to the present invention comprises a first non-volatile memory, a second non-volatile memory in which initial data is stored, and an initialization controller for initializing the first non-volatile memory, wherein the second non-volatile memory has anti-stress properties higher than those of the first non-volatile memory, and the initialization controller reads the initial data from the second non-volatile memory when the first non-volatile memory is initialized and copies the read initial data in the first non-volatile memory to thereby initialize the first non-volatile memory.

Abstract: A flash memory including a substrate having a recess, a buried bit line, a word line, a single side insulating layer, a floating gate, a tunneling dielectric layer, a control gate, and an inter-gate dielectric layer is provided. The buried bit line extends below the recess of the substrate along a first direction. The word line is on the substrate, and extends above the recess along a second direction. The single side insulating layer is on a first sidewall of the recess. The floating gate is on a second sidewall of the recess to be opposite to the single side insulating layer. The tunneling dielectric layer is sandwiched by the floating gate and the substrate to contact the buried bit line. The control gate fills the recess and contacts the word line. The inter-gate dielectric layer is sandwiched by the control gate and the floating gate.

Abstract: The invention relates to systems and methods that support object oriented access to information at multiple levels in a control architecture, for example. Such data access can be facilitated as a layer adjacent to or part of an MES system or as a white box cooperating to encapsulate data such as in the controller or the MES layer, for example. In addition, such object oriented data access can be built into a controller as a standard behavior of controller data types and tags of those data types. In this manner, data can be encapsulated as a data object to expose properties and/or methods related to the data utilizing a common interface with each data consumer. Thus, the data consumer can employ object oriented concepts, such as properties, methods, scope qualifiers, access qualifiers (private, protected, public enterprise), polymorphism, inheritance and the like directly with their automation system components.

Abstract: A split-gate memory cell, includes an n-channel split-gate non-volatile memory transistor having a source, a drain, a select gate over a thin oxide, and a control gate over a non-volatile gate material and separated from the select gate by a gap. A p-channel pull-up transistor has a drain coupled to the drain of the split-gate non-volatile memory transistor, a source coupled to a bit line, and a gate. A switch transistor has first and second source/drain diffusions, and a gate coupled to the drains of the split-gate non-volatile memory transistor and the p-channel pull-up transistor. An inverter has an input coupled to the second source/drain diffusion of the switch transistor, and an output. A p-channel level-restoring transistor has a source coupled to a supply potential, a drain coupled to the first source/drain diffusion of the switch transistor and a gate coupled to the output of the inverter.

Abstract: A method is provided for programming a memory cell. The memory cell is fabricated on a substrate and comprises a source region, a drain region, a floating gate, and a control gate. The memory cell has a threshold voltage selectively configurable into one of at least three programming states. The method includes generating a drain current between the drain region and the source region by applying a drain-to-source bias voltage between the drain region and the source region. The method further includes injecting hot electrons from the drain current to the floating gate by applying a gate voltage to the control gate. A selected threshold voltage for the memory cell corresponding to a selected one of the programming states is generated by applying a different selected gate voltage.

Abstract: A system and method, including computer software, is used to write to a flash memory device that includes multiple memory cells. One or more of the memory cells are written at a first resolution corresponding to a first number of bits of data. A signal to write at a second resolution corresponding to a second number of bits of data is received. One or more of the memory cells are written at the second resolution.

Abstract: An intergrated circuit having a drive circuit is disclosed. One embodiment provides an intergrated memory circuit arrangement with a drive circuit for an EEPROM. In one embodiment, the drive circuit contains tunnel field effect transistors and can be produced in particular on a small chip area.

Abstract: Provided are methods for programming in a non-volatile memory device, using incremental step pulses as a program voltage that is applied to a selected wordline. Methods may include applying a precharge voltage to an even bitline and an odd bitline such that the even bitline and the odd bitline are alternately charged with the precharge voltage and a boosted voltage that is higher than the precharge voltage. Methods may further include applying a bitline voltage corresponding to program data to a selected bitline of the even bitline and the odd bitline.

Abstract: A memory integrated circuit has memory arrays that are vertically layered. These memory arrays include word lines and bit lines. Intersections between the word lines and the bit lines include a diode and a memory state storage element. The diode and the memory storage element are connected in between a word line and a bit line. The diode at the intersections includes a first diode node and a second diode node. Various aspects of the memory integrated circuit are electrically interconnected in various ways, such as corresponding word lines, corresponding first diode nodes, or corresponding second diode nodes of different memory arrays being electrically interconnected. Various aspects of the memory integrated circuit are isolated in various ways, such as word lines, first diode nodes, or second diode nodes of different memory arrays being isolated.

Abstract: A non-volatile memory device and a method of fabricating the same are disclosed. The method includes the steps of: providing a semiconductor substrate having isolation layers in an isolation region, a tunnel insulating layer formed between the isolation layers, and first electron charge layers formed between the isolation layers, wherein the isolation layers comprise projections extending higher than the semiconductor substrate; etching the first electron charge layers, thereby reducing the thickness of the first electron charge layers and exposing sidewalls of the isolation layers; performing a first etch process to reduce the width of the projections; forming second electron charge layers between the projections on the first electron charge layers; and performing a second etch process to remove the projections between the second electron charge layers.

Abstract: The invention provides circuits, systems, and methods for monitoring a non-volatile memory (NVM) cell, or an array of NVM cells. The monitor is capable of switching from a normal operating state to an evaluation state, monitoring for one or more particular characteristics, and returning to the normal operating state. Alternative embodiments of the invention are disclosed using various triggers and producing outputs capable of reporting or feeding back to influence the operation of the monitoring systems and methods, the NVM circuitry, or an external system. The invention includes an energy conservation feature, in that no power is consumed in the normal operating state, and low power in the evaluation state.

Abstract: Systems and methods, including computer software products, can be used to update or modify data stored in a memory. One or more variables are represented with one or more cell values in a memory. Each variable is associated with one or more of the cell values. Multiple states of the one or more variables are defined, and each defined state of the one or more variables includes a current store value for each variable and at least one previous store value for the variable. One or more single cell values influence the current store value and previous store value of at least one variable.

Abstract: In a data program/erase device of a nonvolatile memory cell, data are re-written by means of an FN tunnel current of an entire channel surface. In a buried n-well of a semiconductor substrate in a flash memory formation region, p wells are placed in the form isolated from each other. In each of the p wells, a capacitor portion, a capacitor portion for programming/erasing data and an MIS•FET for reading data are placed. In the capacitor portion for programming/erasing data, rewriting (programming and erasing) of data is performed by means of an FN tunnel current of an entire channel surface.

Abstract: An ASIC includes a first-wire extended in a first-direction and a second-wire extended in a parallel direction to the first-wire and both are placed on a first-wire layer; and a third-wire placed on a second-wire layer above the first-wire layer and is extended above the wire and above the second-wire in a second-direction which intersects the first-direction and passing through a first via-hole is connected to the first-wire, and a fourth-wire separated from the third-wire extended in a parallel direction above the first-wire and above the second-wire and a fifth-wire separated from both the third-wire and the fourth-wire and extended in a parallel direction in a smallest space and passing through a second via-hole is connected to the second-wire, wherein, one end of the fifth-wire is extended to the center between the second-wire and the first-wire from above the second-wire.

Abstract: A semiconductor device with multiple strap-contact configurations for a memory cell array. An array with memory cells interconnected with bit-lines, control-gate lines, erase gate lines, common-source lines, and word-lines is provided. In one aspect of an illustrative embodiment, a strap-contact corridor is spaced at n bit-line intervals (n>1) across the array. The strap-contact corridor comprises strap-contact cells, which provide electrical interconnection between control-gate lines, erase gate lines, common-source lines, and word-lines and their respective straps.

Abstract: A nonvolatile memory integrated circuit arrayed in rows and columns is disclosed. Parallel lines of implant N-type regions are formed in a P-well of a semiconductor substrate, with lines of oxide material isolating each pair of the lines. Columns of memory cells straddle respective pairs of the implant region lines, with one line of the pair forming the source region and one line of the pair forming the drain region of each memory cell of the column. Each memory cell has a floating polysilicon storage gate. One of plural wordlines overlies each row of the memory cells. The portion of the wordline overlying each memory cells forms the control gate of the memory cell. Programming and erase operations occur by Fowler-Nordheim tunneling of electrons through a tunnel oxide layer between the floating gate and the source of the cell.

Abstract: The invention relates to a ROM memory cell comprising a first terminal connected to a word line, comprising a second terminal and comprising a third terminal, the second terminal being connected to a bit line and/or the third terminal being connected to a supply line for precharging the third terminal. The ROM memory cell according to the invention is distinguished by the fact that the same reference potential is in each case applied to the first terminal, the second terminal and/or the third terminal in a standby operating mode. The invention furthermore relates to a ROM memory component comprising such ROM memory cells, and to a method for reading from the ROM memory cell.

Abstract: Non-volatile memory devices and arrays are described that utilize reverse mode non-volatile memory cells that have band engineered gate-stacks and nano-crystal charge trapping in EEPROM and block erasable memory devices, such as Flash memory devices. Embodiments of the present invention allow a reverse mode gate-insulator stack memory cell that utilizes the control gate for programming and erasure through a band engineered crested tunnel barrier. Charge retention is enhanced by utilization of high work function nano-crystals in a non-conductive trapping layer and a high K dielectric charge blocking layer. The band-gap engineered gate-stack with symmetric or asymmetric crested barrier tunnel layers of the non-volatile memory cells of embodiments of the present invention allow for low voltage tunneling programming and erase with electrons and holes, while maintaining high charge blocking barriers and deep carrier trapping sites for good charge retention.

Abstract: A nonvolatile semiconductor memory device for storing data by accumulating charge in a floating gate includes a plurality of MOS transistors sharing the floating gate. In the device, a PMOS is used for coupling during writing and an n-type depletion MOS (DMOS) is used for coupling during erasure. Coupling of channel inversion capacitance by the PMOS is used for writing and coupling of depletion capacitance by the n-type DMOS is used for erasure, thereby increasing the erase speed without increase of area, as compared to a conventional three-transistor nonvolatile memory element.

Abstract: p-type wells are provided within an n-type embedded well of a semiconductor substrate lying in an area for forming a flash memory, in a state of being isolated from one another. A capacitance section, a data write/erase charge injection/discharge section and a data read MIS•FET are disposed in each of the p-type wells. The capacitance section is disposed between the data write/erase charge injection/discharge section and the data read MIS•FET. In the data write/erase charge injection/discharge section, writing and erasing of data by an FN tunnel current at a channel entire surface are performed.

Abstract: Embodiments of the invention relate to apparatus, system and method for use of a memory cell having improved power consumption characteristics, using a low-bandgap material quantum well structure together with a floating body cell.

Abstract: A nonvolatile memory array is arranged as a plurality of rows and columns of memory cell transistors. The sources of the memory cell transistors in each row of the array are electrically coupled together. The control gates of the memory cell transistors associated with a row in the array are coupled to a wordline associated with that row. The drains of the memory cell transistors in a column of the array are coupled to a bitline associated with that column. A source transistor is associated with each row and has its source coupled to a common source line, its drain coupled to the sources of all memory cell transistors in that row, and a gate coupled to the wordline. An array of split-gate nonvolatile memory cells is also disclosed.