Abstract: An array of programmable non-volatile devices, such as a nominal OTP cell, is operated such that a Vt representing a particular binary logic state is changed over time. This allows for re-programming and emulating a few times or multi-time programmable device.

Abstract: A nonvolatile memory device includes a tunneling region and an erase region formed over a substrate, a selection gate formed over the substrate to overlap with the tunneling region, a floating gate formed over the substrate to be disposed adjacent to the selection gate with a gap therebetween and to overlap with the tunneling region and the erase region, and a charge blocking layer filling the gap.

Abstract: A graphene electronic device includes a graphene channel layer on a substrate, a source electrode on an end portion of the graphene channel layer and a drain electrode on another end portion of the graphene channel layer, a gate oxide on the graphene channel layer and between the source electrode and the drain electrode, and a gate electrode on the gate oxide. The gate oxide has substantially the same shape as the graphene channel layer between the source electrode and the drain electrode.

Abstract: A semiconductor storage device according to the present embodiment includes a plurality of bit lines, a plurality of word lines, and a plurality of memory cells corresponding to intersections between the bit lines and the word lines, respectively, and including magnetic tunnel junction elements capable of storing data. A plurality of sense amplifiers respectively correspond to the bit lines and are configured to detect data stored in the memory cells via a bit line selected from among the corresponding bit lines. A plurality of read latch parts correspond to the sense amplifiers, respectively, and are configured to latch data detected by the corresponding sense amplifiers. A plurality of read global data buses are connected to the read latch parts, respectively, and are configured to consecutively transmit data latched by the read latch parts at a time of a data read operation.

Abstract: A Dynamic Random Access Memory (DRAM) cell and a semiconductor Non-Volatile Memory (NVM) cell are incorporated into a single Non-Volatile Dynamic Random Access Memory (NVDRAM) cell. The NVDRAM cell is operated as the conventional DRAM cell for read, write, and refreshment on dynamic memory applications. Meanwhile the datum in the NVM cells can be directly loaded into the correspondent DRAM cells in the NVDRAM cell array without applying intermediate data amplification and buffering leading to high speed non-volatile data access. The datum in DRAM cells can be also stored back to the correspondent semiconductor NVM cells in the NVDRAM cells for the datum required for non-volatile data storage. The NVDRAM of the invention can provide both fast read/write function for dynamic memory and non-volatile memory storage in one unit memory cell.

Abstract: An integrated circuit including a link or string of semiconductor memory cells, wherein each memory cell includes a floating body region for storing data. The link or string includes at least one contact configured to electrically connect the memory cells to at least one control line, and the number of contacts in the string or link is the same as or less than the number of memory cells in the string or link.

Abstract: The invention relates to a method for producing a graphene sheet on a platinum silicide, wherein the platinum silicide is in the form of a layer or a plurality of pins. This method comprises: a) producing a stack by (i) depositing a layer C1 of a diffusion barrier material on a substrate; (ii) depositing, on the layer C1, a layer C2 of a carbon-containing material, wherein said carbon-containing material optionally comprises silicon; (iii) depositing, on the layer C2, a layer C3 of platinum; (iv) depositing a layer C4 of a material of formula SiaCbHc on the layer C3 if the carbon-containing material of the layer C2 is free from silicon; and b) heat-treating the stack obtained at step a). It also relates to structures obtained using this method and the uses of these structures. Applications: manufacture of micro- and nanoelectronic devices, micro- and nanoelectromechanical devices, etc.

Abstract: A mechanism for facilitating improved refresh schemes for memory devices is described. In one embodiment, an apparatus includes a memory device having refresh logic and memory cells, the memory cells including data cells and supplemental cells, the supplemental cells to be observed. The supplemental cells emulate a decay characteristic of the data cells performing regular refresh operations according to an existing refresh policy. The apparatus may further include the refresh logic to receive, from the supplemental cells, observation data relating to decaying of the supplemental cells, and correlate the observation data to data cell performance. The refresh logic to generate a policy recommendation based on the observation data collected by the supplemental cells.

Abstract: To provide a semiconductor memory device including an oxide semiconductor that can deal with instability of a threshold characteristic, in which writing is possible by a simple method. The semiconductor memory device functions by utilizing a characteristic that a threshold shifts when a thin film transistor including an oxide semiconductor is irradiated with ultraviolet light. Readout can be performed by setting a readout voltage between the threshold before the ultraviolet light irradiation and the threshold after irradiation. The threshold characteristic of an initial characteristic can be controlled by providing a back gate or by using two thin film transistors.

Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.

Abstract: According to one embodiment, a first well of the first conductivity type which is formed in a substrate. a second well of a second conductivity type which is formed in the first well. The plurality of memory cells, the plurality of first bit line select transistors, and the plurality of second bit line select transistors are formed in the second well, and the plurality of first bit line select transistors and the plurality of second bit line select transistors are arranged on a side of the sense amplifier with respect to the plurality of memory cells of the plurality of bit lines.

Abstract: A thin film transistor array panel includes: a substrate; a gate electrode disposed on the substrate; a semiconductor layer disposed on the substrate and overlapping the gate electrode; a plurality of nano particles disposed on or in the semiconductor layer; a source electrode disposed on the substrate; and a drain electrode disposed on the substrate, where the source electrode and the drain electrode are spaced apart from each other, and the semiconductor layer is disposed between the source electrode and the drain electrode, in which a diameter of each of the nano particles is in a range of about 2 nm to about 5 nm, or a ratio of a plane area of the nano particles per unit area of the semiconductor layer is in a range of about 5% to about 80%.

Abstract: A method for correcting data bit of at least a cell of a flash memory includes: determining a contributing factor of level distribution corresponding to an electric level of a first cell to generate a first determination result; and, correcting/modifying the data bit corresponding to the electric potential of the first cell according to the first determination result.

Abstract: A semiconductor device includes a bit line, a first cell string and a second cell string. The first cell string includes a first selecting transistor connected to the bit line in series and having a threshold voltage greater than a first reference voltage, a second selecting transistor having a threshold voltage smaller than a second reference voltage, cell transistors and a ground selecting transistor. The second cell string includes a third selecting transistor connected to the bit line in series and having a threshold voltage smaller than the first reference voltage, a fourth selecting transistor having a threshold voltage greater than the second reference voltage, cell transistors and a ground selecting transistor. A channel region of the first selecting transistor has an enhancement mode and a first conductive type. A channel region of the third selecting transistor has a depletion mode and a second conductive type.

Abstract: A first input of a sense amplifier is connected to a first bitline, a second input of the sense amplifier is connected to a second bitline, a third input of the sense amplifier is coupled to a third bitline. The sense amplifier provides at an output an indicator of a storage state of a memory cell connected to the first bitline based upon information provided to the sense amplifier via the first, second, and third bitlines.

Abstract: A method and apparatus for use in improving linearity sensitivity of MOSFET devices having an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to address degradation in second- and third-order intermodulation harmonic distortion at a desired range of operating voltage in devices employing an accumulated charge sink.

Abstract: Strings of memory cells having a string select gate configured to selectively couple ends of a string to a data line and a source line concurrently, memory devices incorporating such strings and methods for accessing and forming such strings are provided. For example, non-volatile memory devices are disclosed that utilize vertical structure NAND strings of serially-connected non-volatile memory cells. One such string including two or more serially-connected non-volatile memory cells where each end of the string shares a string select gate with the other end of the string is disclosed.

Abstract: Methods and devices for mitigating sensing variations that may arise from simultaneous multi-threshold (SMT) sensing are provided. During SMT sensing, two or more different bias conditions may be used to simultaneously sense two different threshold voltages. However, there may be variances in the threshold voltage shift of memory cells when read with a different bias condition than was used to verify. In one embodiment each programmed state is read using both (or all) bias conditions that were used during SMT verify. In other words, two (or more) different sense operations are used to read each memory cell. The data from these different sense operations may be used to compute initialization values (e.g., LLRs, LRs, probabilities) for an ECC decoder. In one embodiment, this technique is only performed when a normal read fails.

Abstract: A non-volatile memory system that has junctionless transistors is provided that uses suppression of the formation of an inversion-layer source and drain in the junctionless transistors to cause a discontinuous channel in at least one string. The system may include NAND flash memory cells composed of junctionless transistors, and has a set of wordlines. During program operation, a selected wordline of the set of wordlines is biased at a program voltage, and wordline voltage low enough to suppress the formation of source/drains is applied on at least one word line on a source side of the selected wordline such that a channel isolation occurs thereby causing the discontinuous channel in the at least string.

Abstract: A three-dimensional (3D) semiconductor memory device comprises memory cell strings each comprising at least one selection transistor and at least one memory cell, a first pass transistor group sharing a first well region and comprising a first selection line pass transistor connected to the selection transistor and a first world line pass transistor connected to the memory cell, a second pass transistor group sharing a second well region and comprising a second selection line pass transistor connected to the selection transistor, and a controller that controls the first pass transistor group and the second pass transistor group. The controller applies selected voltages to the first and second well regions during read operation.

Abstract: According to one embodiment, a non-volatile programmable switch according to this embodiment includes first and second non-volatile memory transistors, and a common node that is connected to the output side terminals of the first and second non-volatile memory transistors, and a logic transistor unit that is connected to the common node. A length of a gate electrode of the first and second non-volatile memory transistors in a channel longitudinal direction is shorter than a length of the charge storage film in the channel longitudinal direction.

Abstract: Provided is an OTP memory cell including a first antifuse unit, a second antifuse unit, a select transistor, and a well region. The first and the second antifuse unit respectively include an antifuse layer and an antifuse gate disposed on a substrate in sequence. The select transistor includes a select gate, a gate dielectric layer, a first doped region, and a second doped region. The select gate is disposed on the substrate. The gate dielectric layer is disposed between the select gate and the substrate. The first and the second doped region are respectively disposed in the substrate at two sides of the select gate, wherein the second doped region is disposed in the substrate at the periphery of the first and the second antifuse unit. The well region is disposed in the substrate below the first and the second antifuse unit and is connected to the second doped region.

Abstract: A device for one-time-programmable (OTP) memory may include a capacitor formed by a conductive layer, an oxide layer, and a semiconductor well, and a diode that is formed after programing the device. The device may be programmable by applying a voltage between the conductive layer and the semiconductor well. The applied voltage may be capable of rupturing the oxide layer at one or more points. The conductive layer, the oxide layer, and the semiconductor well may be native CMOS process formations.

Abstract: A non-volatile memory apparatus includes a memory cell array, a power supply configured to generate an operation voltage according to an operation mode and provide the memory cell array with the operation voltage, and a controller configured to provide the memory cell array with a first verification voltage and a second verification voltage in a program verification operation, detect a high speed program cell by the first verification voltage and the second verification voltage from selected memory cells to be programmed and set the high speed program cell to be in a program inhibition state, and detect a low speed program cell by the second verification voltage.

Abstract: A memory device comprises memory elements that are arranged in an array. The array includes rows associated with wordlines and columns associated with bitlines. The memory elements in a row share a wordline and memory elements in a column share a bitline. For each wordline, a wordline driver circuit is associated with the wordline. The memory device comprises a boost circuit that has an output coupled to the wordline driver circuits. The boost circuit is configured to provide a negative voltage to the wordlines during a read operation of the memory device such that unselected wordlines are held at a negative voltage below a ground potential while a selected wordline is held at a supply voltage during the read operation.

Abstract: This invention discloses a 2T-string NOR-based CAM logic cell comprising two physical NAND cells connected in series with two horizontal WLs and one vertical BL and one vertical SL. Additionally, a sector of NOR-based CAM logic cell array is configured with N vertical cell strings each including M 2T-string NOR-based CAM logic cells connected in parallel sharing a local vertical SL and one dedicated vertical ML as an Operand word vertical page. Each 2T-string NOR-based CAM logic cell can be either a binary or ternary CAM cell associated with two or three physical states assigned to NAND cells' Vt levels for defining CAM logic states. Logic match of M-logic-bit inputs is found for at least one vertical page if the corresponding M 2T-string NOR-based CAM logic cells are in non-conduction state, providing M times faster Compare performance over the NAND-based CAM and 2 time faster than SRAM-based CAM.

Abstract: Innovative Non-Volatile Look-Up-Table (NV-LUT) has been constructed by Single Gate Logic Non-Volatile Memory (SGLNVM) devices processed with the standard CMOS logic process. One of a pair of complementary SGLNVM devices is always programmed to the high threshold voltage state and the other remains in the low threshold voltage state. By applying digital voltage rail (VDD and VSS) to the input nodes of the pair of complementary SGLNVM devices, the output node of the pair of complementary SGLNVM devices outputs digital signals according to its configuration. The NV-LUT outputs digital signals from a plurality of pairs of complementary SGLNVM devices through a digital switching multiplexer. The NV-LUT is a good substitution for SRAM based LUT commonly used in Field Programmable Gate Array (FPGA).

Abstract: A non-volatile variable capacitive device includes a capacitor defined over a substrate, the capacitor having an upper electrode and a resistive memory cell having a first electrode, a second electrode, and a switching layer provided between the first and second electrodes. The resistive memory cell is configured to be placed in a plurality of resistive states according to an electrical signal received. The upper electrode of the capacitive device is coupled to the second electrode of the resistive memory cell. The resistive memory cell is a two-terminal device.

Abstract: Techniques are provided for programming and erasing of select gate transistors in connection with the programming or erasing of a set of memory cells. In response to a program command to program memory cells, the select gate transistors are read to determine whether their Vth is below an acceptable range, in which case the select gate transistors are programmed before the memory cells. Or, a decision can be made to program the select gate transistors based on a count of program-erase cycles, whether a specified time period has elapsed and/or a temperature history of the non-volatile storage device. When an erase command is made to erase memory cells, the select gate transistors are read to determine whether their Vth is above an acceptable range. If their Vth is above the acceptable range, the select gate transistors can be erased concurrently with the erasing of the memory cells.

Abstract: Techniques for providing a direct injection semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a direct injection semiconductor memory device including a first region connected to a bit line extending in a first orientation and a second region connected to a source line extending in a second orientation. The direct injection semiconductor memory device may also include a body region spaced apart from and capacitively coupled to a word line extending in the second orientation, wherein the body region is electrically floating and disposed between the first region and the second region. The direct injection semiconductor memory device may further include a third region connected to a carrier injection line extending in the second orientation, wherein the first region, the second region, the body region, and the third region are disposed in sequential contiguous relationship.

Abstract: A method includes minimizing current leaking through a virtual ground pipe during access of NROM memory cells. The minimizing includes operating two neighboring memory cells generally together, which includes connecting an operation voltage to a shared local bit line of the two neighboring memory cells and connecting the external local bit lines of two neighboring memory cells to a receiving unit, such as a ground supply or two sense amplifiers. Also included is an array performing the method.

Abstract: According to one embodiment, a semiconductor memory device includes a memory cell and a control circuit. The memory cell is such that a ferroelectric film is provided as a gate dielectric film. When data is stored in the memory cell, the control circuit applies a first voltage to the gate dielectric film and thereafter applies a second voltage, whose amplitude is smaller than that of the first voltage and whose polarity is opposite to that of the first voltage.

Abstract: The technology relates to a damascene word line for a three dimensional array of nonvolatile memory cells. Conductive lines such as silicon are formed over stacked nonvolatile memory structures. Word line trenches separate neighboring ones of the silicon lines. The silicon lines separated by the word line trenches are oxidized, making insulating surfaces in the word line trenches. Word lines are made in the word line trenches.

Abstract: A reconfigurable integrated circuit device includes a memory unit for storing configuration information. The memory unit has a nonvolatile memory transistor having a gate connected to a first wire, a first terminal connected to a second wire, and a second terminal connected to a third wire. The memory unit also includes a switch circuit connected to the third wire. The switch circuit alters the configuration of the integrated circuit device by, for example, opening and closing to make wiring connections or disconnections. The integrated circuit device additionally includes a data supply circuit for supplying bit data and a first power supply circuit for supplying voltages to the first wire for storing bit data in the first nonvolatile memory transistor and for storing bit data as a charge level on the third wire.

Abstract: Provided is a one-transistor (1T) floating-body DRAM cell device including a substrate; a gate stack which is formed on the substrate; a control electrode which is disposed on the substrate and of which some or entire portion is surrounded by the gate stack; a semiconductor layer which is formed on the gate stack; a source and a drain which are formed in the surface of the semiconductor layer and of which lower surfaces are not in contact with the gate stack; a gate insulating layer which is formed on the semiconductor layer; and a gate electrode which is formed on the gate insulating layer, wherein the remaining portion of the semiconductor layer excluding the source and the drain is configured as a floating body. The miniaturization characteristic and performance of a MOS-based DRAM cell device can be improved, and a memory capacity can be increased.

Abstract: Apparatus and method for managing an array of multi-level cell (MLC) memory cells. In accordance with various embodiments, a non-sequential encoding scheme is selected that assigns a different multi-bit logical value to each of a plurality of available physical states of a selected MLC memory cell in relation to write effort associated with each of said plurality of physical states. Data are thereafter written to the selected MLC memory cell in relation to the selected non-sequential encoding scheme. In some embodiments, the MLC memory cell comprises a spin-torque transfer random access memory (STRAM) memory cell. In other embodiments, the MLC memory cell comprises an MLC flash memory cell.

Abstract: Providing for extended data retention of flash memory devices by program state rewrite is disclosed herein. By way of example, a memory cell or group of memory cells can be evaluated to determine a program state of the cell(s). If the cell(s) is in a program state, as opposed to a natural or non-programmed state, a charge level, voltage level and/or the like can be rewritten to a default level associated with the program state, without erasing the cell(s) first. Accordingly, conventional mechanisms for refreshing cell program state that require rewriting and erasing, typically degrading storage capacity of the memory cell, can be avoided. As a result, data stored in flash memory can be refreshed in a manner that mitigates loss of memory integrity, providing substantial benefits over conventional mechanisms that can degrade memory integrity at a relatively high rate.

Abstract: One or more embodiments of 8T NVSRAM cell are provided for improving NVSRAM memory architecture with reduced cell size as opposed to the prior art of 12T NVSRAM cell. This novel 8T NVSRAM cell uses one step Write operation under either a FN-channel write scheme to increase a paired flash transistor Vt values in positive direction with a desired ?Vt12 ?1V or a FN-edge write scheme to decrease the Vt values in negative direction with a similar desired ?Vt12?1V to write the ?Vt12 into the paired flash transistors within 1-10 ms without requiring a pre-erase step. There is no need of Program-Inhibit Voltage (SBPI) to inhibit non-select flash transistor from programming. In addition, this 8T NVSRAM cell uses DRAM-like charge-sensing scheme to detect the ?V on Q and QB nodes of SRAM in which is coupled and generated from the ?Vt12 stored in MC1 and MC2 flash transistors.

Abstract: Provided is a semiconductor memory circuit excellent in long-term reliability and reading characteristics and having low current consumption. The semiconductor memory circuit includes: a first inverter; a first non-volatile memory, which is electrically writable; a second inverter; and a second non-volatile memory, the first inverter having an output connected to a source of the first non-volatile memory, the first non-volatile memory having a drain connected to an input of the second inverter, the second inverter having an output connected to a source of the second non-volatile memory, the second non-volatile memory having a drain connected to an input of the first inverter, the drain of the second non-volatile memory serving as an output of the semiconductor memory circuit.

Abstract: Memory devices and methods are disclosed, such as those facilitating data line shielding by way of capacitive coupling with data lines coupled to a memory string source line. For example, alternating data lines are sensed while adjacent data lines are coupled to a common source line of the data lines being sensed. Data line shielding methods and apparatus disclosed can reduce effects of source line bounce occurring during a sense operation of a memory device.

Abstract: According to one embodiment, a nonvolatile semiconductor memory device includes a memory cell array includes blocks, each of the blocks includes NAND strings that each comprise memory cells serially connected in a first direction, word lines respectively connected to memory cell groups arranged in a second direction in the block, and a controller configured to perform a process (A) of verifying one of states in which all of the memory cells included in the block are turned on (pass) and at least one memory cell is turned off (fail) by use of a first read voltage applied to unselected word lines in a data read time, and to perform a process (B) of reading data from the fail block by use of a second read voltage that is higher than the first read voltage and applied to the unselected word lines.

Abstract: A method of erasing a nonvolatile memory device, which includes a plurality of memory blocks each formed of a plurality of strings, includes applying an erase voltage to a well of a selected memory block of the memory blocks, each memory block including at least two dummy cells located between a string or ground selection transistor and memory cells; and applying or inducing different levels of voltages to respective gates of the at least two dummy cells.

Abstract: Techniques are disclosed herein for erasing non-volatile storage elements. A sequence of increasing erase voltages may be applied to a substrate. The select line may be floated and many of the word lines may be held at a low voltage (e.g., close to 0V). However, the voltage applied to an edge word may be increased in magnitude relative to a previous voltage applied to the edge word line for at least a portion of the sequence of erase voltages. The edge word line could be the word line that is immediately adjacent to the select line. The increasing voltage applied to the edge word line may prevent or reduce damage to oxides between the select line and edge word line. It may also help to regulate the e-field across a tunnel oxide of memory cells on the edge word line.

Abstract: A non-volatile storage system includes memory cells with floating gates that comprises three layers separated by two dielectric layers (an upper dielectric layer and lower dielectric layer). The dielectric layers may be an oxide layers, nitride layers, combinations of oxide and nitride, or some other suitable dielectric material. The lower dielectric layer is close to the bottom of the floating gate (near interface between floating gate and tunnel dielectric), while the upper dielectric layer is close to top of the floating gate (near interface between floating gate and inter-gate dielectric).

Abstract: A non-volatile memory including a substrate of a first conductivity type with first and second spaced apart regions formed therein of a second conductivity type with a channel region therebetween. A polysilicon metal gate word line is positioned over a first portion of the channel region and spaced apart therefrom by a high K dielectric layer. The metal portion of the word line is immediately adjacent to the high K dielectric layer. A polysilicon floating gate is immediately adjacent to and spaced apart from the word line, and positioned over and insulated from another portion of the channel region. A polysilicon coupling gate is positioned over and insulated from the floating gate. A polysilicon erase gate is positioned on another side of and insulated from the floating gate, positioned over and insulated from the second region, and immediately adjacent to but spaced apart from another side of the coupling gate.

Abstract: Techniques are provided for programming and erasing of select gate transistors in connection with the programming or erasing of a set of memory cells. In response to a program command to program memory cells, the select gate transistors are read to determine whether their Vth is below an acceptable range, in which case the select gate transistors are programmed before the memory cells. Or, a decision can be made to program the select gate transistors based on a count of program-erase cycles, whether a specified time period has elapsed and/or a temperature history of the non-volatile storage device. When an erase command is made to erase memory cells, the select gate transistors are read to determine whether their Vth is above an acceptable range. If their Vth is above the acceptable range, the select gate transistors can be erased concurrently with the erasing of the memory cells.

Abstract: This invention discloses circuit and methods of a NAND-based 2T-string NOR flash cell structure as a building block for a fast random-read NOR flash memory. The key concept of this new set of bias conditions in cell array improves over the critical concern of punch-through issue when cell is migrating to the more advanced technology node of next generation. The invention adopts a novel preferable symmetrical 2T-string NOR flash cell. Each NAND or NAND like cell of this 2T-string NOR cell is to store 2 bits and is preferable to be made of N-channel device. The cell is preferable to use Fowler-Nordheim Tunneling scheme for both erase and program operations. The invention is to provide a novel 2T-string NOR flash cell structure made of N-channel device offering most flexible erase sizes in unit of byte, page, sector, block and chip with the least program and erase disturbances.

Abstract: According to one embodiment, a method for operating a nonvolatile semiconductor memory device, the device includes a memory unit having a memory string, and a control unit. The memory string includes a plurality of transistors and has a first group being part of the transistors, a adjusting transistor connected next to the first group, and a second group including transistors connected to a side opposite the first group with respect to the adjusting transistor. The method includes rewriting the threshold values of the transistors of the first group, and then performing control so as to set a first threshold value for adjustment to the adjusting transistor to adjust an amount corresponding to relative variations in the threshold values of the transistors of the second group, the relative variations being caused by the rewrite of the threshold values of the transistors of the first group.

Abstract: Techniques for providing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus including a first region and a second region. The apparatus may also include a body region disposed between the first region and the second region and capacitively coupled to a plurality of word lines, wherein each of the plurality of word lines is capacitively coupled to different portions of the body region.

Abstract: The invention provides a nonvolatile memory apparatus. The nonvolatile memory apparatus comprises a plurality of memory cells and a signal generator. The memory cells are arranged in an array, and each of the memory cells has a control gate terminal, a floating gate, a source line terminal, a bit-line terminal, a selected gate terminal and a word-line terminal. The signal generator is coupled to the memory cells. When the nonvolatile memory apparatus executes a programming operation, the signal generator provides a programming signal to the control gate terminals of a plurality of inhibited memory cells among the memory cells. Wherein, the programming signal is a pulse signal with a direct-current (DC) offset voltage.