Confinement liner for a substrate processing chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of a confinement liner for a substrate processing chamber showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a front elevation view thereof;

FIG. 5 is a rear elevation view thereof;

FIG. 6 is a left elevation view thereof;

FIG. 7 is a right elevation view thereof; and,

FIG. 8 is an enlarged cross-sectional view taken along line 8-8 of FIG. 2.

The broken lines shown in the drawings represent portions of a confinement liner for a substrate processing chamber that form no part of the claimed design.

Claims

The ornamental design for a confinement liner for a substrate processing chamber, as shown and described.

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Patent History
Patent number: D1051867
Type: Grant
Filed: Jan 17, 2023
Date of Patent: Nov 19, 2024
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventor: Joseph Perry (San Jose, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/882,671