Abstract: A method for simultaneously detecting and separating a target analyte such as a protein or other macromolecule that includes providing a porous silicon matrix on the silicon substrate, exposing the porous silicon matrix to an environment suspect of containing the target analyte, observing optical reflectivity of the porous silicon matrix; and correlating the changes in the silicon substrate to the target analyte.

Abstract: According to the invention an electrochemical deposition or polishing clamber including: a support for a substrate, the support having an in-use position; a housing having an interior surface and a fluid outlet pathway for removing an electrolyte from the chamber, wherein the fluid outlet pathway includes one or more slots which extend into the housing from at least one slotted opening formed in the interior surface; a seal for sealing the housing to a peripheral portion of a surface of a substrate position on the support in its in-use position; and a tilting mechanism for tilting the chamber in order to assist in removing electrolyte from the housing through the fluid outlet pathway.

Abstract: A copper foil for producing graphene having a ratio (Ra1/Ra2) between an arithmetic mean roughness Ra1 in a rolling direction and an arithmetic mean roughness Ra2 in a direction transverse to rolling direction of 0.7 <=(Ra1/Ra2) <=1.3.

Abstract: Systems and methods for separating components of a multilayer stack of electronic components are disclosed herein. The multilayer stack may include an electronic assembly, a substrate, and a sacrificial anode portion that is located between the electronic assembly and the substrate and that operatively attaches the electronic assembly to the substrate. The methods may include locating the multilayer stack within an electrically conductive fluid to form an electrochemical cell and generating a potential difference between a cathode portion of the electronic assembly and the sacrificial anode portion. The methods further may include separating the electronic assembly from the substrate by electrochemically oxidizing the sacrificial anode portion to dissolve the sacrificial anode portion within the electrically conductive solution.

Abstract: An electropolishing fixture with a plunger mechanism. The plunger mechanism can establish contact between a device and an anode mandrel during an electropolishing process while the device is immersed in an electrolytic bath.

Abstract: Methods of delaminating a graphene film (60) from a metal substrate (50) are disclosed that substantially preserve the metal substrate. The methods include forming a support layer (80) on the graphene film and then performing an electrochemical process in an electrochemical apparatus (10). The electrochemical process creates gas bubbles (36) at the metal-film interface (64), thereby causing the delamination. The graphene film and support layer form a structure (86) that is collected by a take-up roller (120). The support layer and graphene structure are then separated to obtain the graphene film.

Abstract: The utilization of single crystal diamond in a nano- or micro-machine (N/MEMS) device is difficult, and there has been no report on such utilization. The reason for this resides in that it is difficult to grow single crystal diamond on an oxide which is a sacrifice layer. In a conventional technique, a cantilever or the like is produced by forming polycrystalline diamond or nanodiamond on an oxide as a sacrifice layer, but the mechanical performance, vibration characteristics, stability, and reproducibility of the produced cantilever or the like are unsatisfactory. In the present invention, utilizing the fact that the high concentration ion-implanted region in a diamond substrate 101 is modified into graphite, the layer 104 modified into graphite as a sacrifice layer is removed by electrochemical etching to obtain the diamond layer remaining on the resultant substrate as a movable structure. The produced cantilever 106 exhibited high frequency resonance.

Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.

Abstract: The invention relates to a method of manufacture of an intravascular functional element that can be introduced into a hollow organ and that comprises at least one wire (10) of an alloy having nickel and titanium as alloying elements, with the following steps: preparation of a metal body of the wire (10) with a metallic surface, then formation of a first oxide layer on the metallic surface of the metal body, then performance of a heat treatment of the wire (10) in a nitrogen-containing salt bath for thermal formation of a second mixed oxide layer on the first oxide layer, wherein the total layer thickness is 15 nm to 100 nm and the mixed oxide layer contains TiO2 and at least one nitride, especially titanium oxynitride and/or titanium nitride.

Abstract: An example component machining method includes immersing a surface of a component within a fluid during a machining process. The method heats the surface during the machining to vary the machining process at the surface relative to other surfaces of the component.

Abstract: Provided are low friction coatings with improved abrasion, wear resistance and methods of making such coatings. In one form, the coating includes: i) an under layer selected from the group consisting of CrN, TiN, TiAlN, TiAlVN, TiAlVCN, TiSiN, TiSiCN, TiAlSiN and combinations thereof, wherein the under layer ranges in thickness from 0.1 to 100 ?m, ii) an adhesion promoting layer selected from the group consisting of Cr, Ti, Si, W, CrC, TiC, SiC, WC, and combinations thereof, wherein the adhesion promoting layer ranges in thickness from 0.1 to 50 ?m and is contiguous with a surface of the under layer, and iii) a functional layer selected from the group consisting of a fullerene based composite, a diamond based material, diamond-like-carbon and combinations thereof, wherein the functional layer ranges from 0.1 to 50 ?m and is contiguous with a surface of the adhesion promoting layer.

Abstract: Disclosed is a method of treating the surface of an electrically conducting substrate surface wherein a tool comprising an ion-conducting solid material is brought into contact at least in some areas with the substrate surface. The tool conducts the metal ions of the substrate and an electric potential is applied so that an electrical potential gradient is applied between the substrate surface and the tool in such a manner that metal ions are drawn from the substrate surface or deposited onto the substrate surface by means of the tool.

Abstract: An apparatus and method for electrochemically treating the struts of an intravascular stent is disclosed. An intravascular stent is mounted in a chamber and is electrochemically treated in order to remove a portion of the stent struts in order to form an airfoil shape. The airfoil-shaped stent struts will reduce turbulent blood flow in the vasculature in which the stent is implanted thereby improving clinical outcome.

Abstract: The preferentially electropolished stent system and method of manufacture includes a stent delivery system including a catheter; a balloon operably attached to the catheter; and a stent disposed on the balloon. The stent includes an elongate body having an abluminal surface and a luminal surface; wherein the abluminal surface has an abluminal average roughness less than or equal to 0.030 microns; and the luminal surface has at least one rough portion having an luminal average roughness greater than or equal to 0.036 microns.

Abstract: The present invention concerns an electrochemical pattern replication method, ECPR, and a construction of a conductive electrode for production of applications involving micro and nano structures. An etching or plating pattern, which is defined by a conductive electrode, a master electrode, is replicated on an electrically conductive material, a substrate. The master electrode is put in close contact with the substrate and the etching/plating pattern is directly transferred onto the substrate by using a contact etching/plating process. The contact etching/plating process is performed in local etching/plating cells, that are formed in closed or open cavities between the master electrode and the substrate.

Abstract: An actively heated aluminum baffle component such as a thermal control plate or baffle ring of a showerhead electrode assembly of a plasma processing chamber has an exposed outer aluminum oxide layer which is formed by an electropolishing procedure. The exposed outer aluminum oxide layer minimizes defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer during plasma processing compared to an identically shaped component having a Type III anodized surface.

Abstract: The invention relates to a ceramic implant, especially a dental implant, comprising a structured or porous surface for at least partially inserting into a bone. An especially advantageous surface is obtained when it is at least partially modified by a salt melt. These excellent osteointegration properties can be obtained by a method whereby the surface is modified in a salt melt at least in the regions exposed to the bones and/or soft tissue, optionally following a previous modification of the surface whereby material has been removed.

Abstract: The invention relates to a permanent cathode (1) to be used as an electrode in the electrowinning of metals, including a permanent cathode plate (4) at least partially made of steel and providing the possibility of electrochemically depositing metal from an electrolytic solution onto its surface (6), in which case the dimensions of the grain boundaries (7) on the surface (6) of the permanent cathode plate (4) are arranged to be suitable for the adhesion of deposited metal on the surface and the stripping of metal from the surface at least in a part of the surface that is in contact with the electrolyte. The invention also relates to a method for treating the surface of a permanent cathode.

Abstract: A system used in polishing the metal includes a base assembly and an electrolytic cell assembly. The base assembly has a support stand which is mounted on to a connecting element. The base assembly further includes a holding cylinder that is provided with a hook or similar kind of means that is adapted to hold an anode fixture. A process of polishing the metal using system includes providing stripping solution which is free of cyanide is taken in a glass beaker of the electrolytic cell assembly and is heated. Further, the products that are to be polished are mounted on to the anode fixture using the plurality of hooks.

Abstract: An apparatus, a method, and an electrolytic solution are described for electropolishing metallic stents made, for example, of high-strength medical alloys. The apparatus may include an electropolishing container made from material of low thermal conductivity. The apparatus may include at least one spiral cathode for optimization of solution agitation and/or voltage distribution in the electrolytic solution. Further, an electrolytic solution including at least dimethylsulfate is described. A method for improved electropolishing to consistently produce smooth surfaces is also described.

Abstract: A new fractionation device shows desirable features for exploratory screening and biomarker discovery. The constituent MSCs may be tailored for desired pore sizes and surface properties and for the sequestration and enrichment of extremely low abundant protein and peptides in desired ranges of the mass/charge spectrum. The MSCs are effective in yielding reproducible extracts from complex biological samples as small as 10 ?l in a time as short as 30 minutes. They are inexpensive to manufacture, and allow for scaled up production to attain the simultaneous processing of a large number of samples. The MSCs are multiplexed, label-free diagnostic tools with the potential of biological recognition moiety modification for enhanced specificity. The MSCs may store, protect and stabilize biological fluids, enabling the simplified and cost-effective collection and transportation of clinical samples.

Abstract: An electropolishing fixture with a plunger mechanism. The plunger mechanism can establish contact between a device and an anode mandrel during an electropolishing process while the device is immersed in an electrolytic bath.

Abstract: An electroplating etching apparatus includes a power supply to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.

Abstract: A feed control method for wire cutting electrochemical discharge machining is disclosed. The method determines whether a contact event has occurred using a wire electrode, based on variations in wire tension when being cut. A wire is cut with an ideal feed speed when the wire electrode is not in contact with a workpiece.

Abstract: A system and method is described for electropolishing tubular metallic prostheses. In one aspect, the system provides a continuously changing set of points of contact between anode and prosthesis. In another aspect, the cathode is given a conical shape to correct for current concentrations that would otherwise exist and unevenly affect the amount of electropolishing over the length of the prosthesis.

Abstract: This invention relates to a method for texturing a silicon surface and silicon wafers made by the method, where the method comprises immersing the wafers in an alkaline solution at pH>10, and applying a potential difference between the wafer and a platinum electrode in the electrolyte in the range of +10 to +85 V.

Abstract: Even a site having a complicated curved surface shape, such as a welded spot on a bottom of a nuclear reactor core, is simply and electrolytically etched without discharging an etching liquid in a large amount, whereby grain boundary on the surface of the nuclear reactor core internals can be confirmed visually. When the surface of nuclear reactor core internals is electrolytically etched, a sponge provided with holes having a communicating structure is integrated with an etching liquid, and the etching liquid is gelled, while the integrated combination is disposed in front of an electrode, followed by the application of voltage to turn on electricity at a state in which said electrode is electrically connected to the cathode of a direct-current power supply, and brought into contact with or approximated to the surface of the core internals electrically connected to the anode of the direct-current power supply.

Abstract: A process for manufacturing silicon-based nanoparticles by electrochemical etching of a substrate, wherein the substrate is a metallurgical-grade or upgraded metallurgical-grade silicon, the substrate including an impurity content greater than 0.01%.

Abstract: In an electropolishing method passing large current, an electrolytic solution is given a viscosity by reacting an organic acid (a phosphoric acid solution or a mixed solution of phosphoric acid and sulfuric acid) with a silicon dioxide as a gelling agent, the electrolytic solution is continuously introduced to an electrolysis case and concurrently the first introduced electrolytic solution is discharged to progress the electropolishing. The electrolysis case has a cathode at a specific height from a lower open end of a frame in a specific size and depth, an introduction port on the cathode for introducing the electrolytic solution with specific viscosity, and a discharge port for discharging the solution from the frame. It is possible to shorten the distance of the cathode in the electrolysis case from the open end corresponding to the work-piece surface, and control the resistant of the electrolytic solution, so that the large current can be passed and the operation time can be reduced.

Abstract: In a method of producing an exhaust-gas heat exchanger of a motor vehicle, at least one component of the exhaust-gas heat exchanger, e.g. an outer jacket or ducts arranged in the outer jacket or metal sheets, is subjected to an electrochemical machining process to produce a homogenous and smooth surface. The electrochemical machining process may involve plasma-polishing or electro-polishing.

Abstract: The invention at hand relates to a method for processing and repairing a metal component with at least one finished or nearly finished partial component surface and at least one working surface to be further processed by means of an electrochemical treatment process and abutting the at least one finished or nearly finished partial component surface, with the process comprising the following steps: a) application of an electrically conductive layer on at least one area of the at least one finished or nearly finished partial component surface abutting the working surface to be processed, with the layer containing a metal or a metal alloy that has a similar or the same as, or a desiredly different electrochemical erosion behavior than the metal component; and b) electrochemical treatment of the working surface and of the layer, with the layer being completely or nearly completely eroded. The invention moreover relates to a component of a gas turbine or of a high or low pressure compressor.

Abstract: A method for making a ferritic stainless steel article having an oxidation resistant surface includes providing a ferritic stainless steel comprising aluminum, at least one rare earth metal and 16 to less than 30 weight percent chromium, wherein the total weight of rare earth metals is greater than 0.02 weight percent. At least one surface of the ferritic stainless steel is modified so that, when subjected to an oxidizing atmosphere at high temperature, the modified surface develops an electrically conductive, aluminum-rich, oxidation resistant oxide scale comprising chromium and iron and a having a hematite structure differing from Fe2O3, alpha Cr2O3 and alpha Al2O3. The modified surface may be provided, for example, by electrochemically modifying the surface, such as by electropolishing the surface.

Abstract: A cylinder block plate processing apparatus in which one end side of an inner peripheral surface of a cylinder of a cylinder block is sealed to circulate a process liquid to perform pre-plating or plating processing of the cylinder inner peripheral surface. The apparatus includes: an apparatus body having a workpiece mount table on which the cylinder block is placed; a workpiece holding tool that is provided on the workpiece mount table so as to be vertically movable; an electrode support member including an electrode cylinder mounted to the apparatus body; a processing solution supply member that supplies a processing solution to the electrode support member; an electrode operated by the electrode cylinder; a sealing jig provided to one end of the electrode; a driving mechanism that drives the sealing jig; and a control circuit that controls operations of the processing solution supply member and the driving mechanism.

Abstract: An example component finishing method includes immersing a surface of a component within a fluid during a finishing process. The method heats fluid near the surface during the finishing to create a convection current within the fluid that carries a byproduct of the finishing away from the surface.

Abstract: A nanoscale lithographic method in which a reusable conductive mask, having a pattern of conductive surfaces and insulating surfaces, is positioned upon a substrate whose surface contains an electrically responsive resist layer over a buried conductive layer. When an electric field is applied between the conductive mask and buried conductive layer, the resist layer is altered in portions adjacent the conductive areas of the mask. Selective processing is performed on the surface of the substrate, after mask removal, to remove portions of the resist layer according to the pattern transferred from the mask. The substrate may be a target substrate, or the substrate may be utilized for a lithographic masking step of another substrate. In one aspect of the invention the electrodes to which the charge is applied are divided, such as into a plurality of rows and columns wherein any desired pattern may be created without the need to fabricate specific masks.

Abstract: Provided are cleaning methods and systems to remove unintended metallic deposits from electroplating apparatuses using reverse current deplating techniques. Such cleaning involves positioning a cleaning (deplating) disk in an electroplating cup similar to a regular processed substrate. The front surface of the cleaning disk includes a corrosion resistant conductive material to form electrical connections to deposits on the cup's surfaces. The disk is sealed in the cup and submerged into a plating solution. A reverse current is then applied to the front conductive surface of the disk to initiate deplating of the deposits. Sealing compression in the cup may change during cleaning to cause different deformation of the lip seal and to form new electrical connections to the deposits. The proposed cleaning may be applied to remove deposits formed during electroplating of alloys, in particular, tin-silver alloys widely used for semiconductor and wafer level packaging.

Abstract: The invention relates to a process for electrochemically removing a coating from coated workpieces by means of a voltage applied in an electrolyte bath between the workpiece and a counter-electrode. According to the invention, a rising voltage profile is selected during the coating removal process. This has the effect that the voltage applied at the start is low, and therefore the workpieces are not damaged, but nevertheless the rise in the voltage prevents the coating removal process taking an uneconomically long time.

Abstract: A process for creating porous anode foil for use in an electrolytic capacitor of an implantable cardioverter defibrillator is provided. The process includes electrochemical drilling a plurality of etched metal foils in sequence one after the other in a bath containing electrochemical drilling (ECD) solution initially having a pH of less than 5. Alternatively, an etched foil sheet may be passed through the bath in a substantially continuous manner such that a portion of said etched foil sheet is in contact with the ECD solution is electrochemically drilled to generate pores. Electrochemical drilling is achieved when a current is passed to the foil or portion of the foil sheet in solution.

Abstract: According to various embodiment, a system includes an electrolytic cutting tool. The electrolytic cutting tool includes a first cathode configured to be positioned at a first gap away from a first side of a workpiece, a second cathode configured to be positioned at a second gap away from a second side of the workpiece. The first and second cathodes are positioned opposite from one another. The electrolytic cutting tool also includes a first electrolyte passage configured to flow a first electrolyte through the first gap between the first cathode and the workpiece, a second electrolyte passage configured to flow a second electrolyte through the second gap between the second cathode and the workpiece, and a power supply configured to flow current through the first gap and the second gap to cause electrolytic dissolution through the workpiece from both the first side and the second side.

Abstract: Embodiments of the present invention include systems and methods for low-rate electrochemical (wet) etch that use a net cathodic current or potential. In particular, some embodiments achieve controlled etch rates of less than 0.1 nm/s by applying a small net cathodic current to a substrate as the substrate is submerged in an aqueous electrolyte. Depending on the embodiment, the aqueous electrolyte utilized may comprise the same type of cations as the material being etched from the substrate. Some embodiments are useful in etching thin film metals and alloys and fabrication of magnetic head transducer wafers.

Abstract: A method for making a ferritic stainless steel article having an oxidation resistant surface includes providing a ferritic stainless steel comprising aluminum, at least one rare earth metal and 16 to less than 30 weight percent chromium, wherein the total weight of rare earth metals is greater than 0.02 weight percent. At least one surface of the ferritic stainless steel is modified so that, when subjected to an oxidizing atmosphere at high temperature, the modified surface develops an electrically conductive, aluminum-rich, oxidation resistant oxide scale comprising chromium and iron and a having a hematite structure differing from Fe2O3, alpha Cr2O3 and alpha Al2O3. The modified surface may be provided, for example, by electrochemically modifying the surface, such as by electropolishing the surface.

Abstract: A porous metal article includes a substrate, a metal layer formed on the substrate, and a porous metal layer formed on the metal layer. The metal layer is a noble metal layer doped with M, M comprising an element selected from a group consisting of aluminum, magnesium and calcium, the content of M in the metal layer is between about 30 wt % and about 70 wt %. The metal layer has a thickness between about 1 micrometer and about 8 micrometers. The porous metal layer has a thickness between about 2 micrometers and about 4 micrometers.

Abstract: A polishing pad for an electrochemical planarization tool comprises a patterned surface that forms appropriate electrolyte flow channels for directing an electrolyte from the center to the periphery thereof. Consequently, a continuous electrolyte flow may be established, thereby significantly reducing the accumulation of contaminants in the polishing pad, thereby contributing to enhanced process uniformity so that frequent rinsing of the polishing pad and replacement of the electrolyte solution may be avoided.

Abstract: A linear guide, in particular for a device for electrochemical metal machining, that guides a linear movement of a quill that is moved periodically in a machine frame in order to periodically modify a working gap between a cathode situated on the quill and a workpiece in the direction of the longitudinal axis of the quill, the quill being connected to the machine frame by a plurality of connecting rods, the connecting rods being situated, in the no-load, non-deflected state, essentially parallel to the longitudinal axis of the quill, and the connecting rods having at the point of connection to the quill, as well as at the point of connection to the machine frame, a notch hinge in order to enable, via the hinge, the periodic linear movement of the quill, and the flexibilities of these notch hinges being based on elasticities in their structures formed by targeted thinning of the material.

Abstract: An ELID honing device includes a honing tool 10 positioned above a workpiece 1 having a hollow cylindrical inner surface, and vertically movable and rotationally drivable about a vertical rotation axis while being rockably suspended from an upper end, and a honing guide 20 positioned in proximity to an upper portion of the workpiece to guide the honing tool to the hollow cylindrical inner surface. The honing tool 10 has a fixed guide 12 having a predetermined radius R from the rotation axis to its outer peripheral surface, and honing stones 14a and 14b having outer peripheral surfaces movable in parallel from a diameter-increased position outside the radius R to a diameter-reduced position inside the radius R and capable of being electrolytically dressed. Further, the honing guide 20 has a hollow cylindrical ELID electrode 22 having an inner surface 22a for guiding an outer peripheral surface of the fixed guide of the honing tool and capable of being subjected to a negative voltage.

Abstract: A cold cathode field emission electron source capable of emission at levels comparable to thermal sources is described. Emission in excess of 6 A/cm2 at 7.5 V/?m is demonstrated in a macroscopic emitter array. The emitter is comprised of a monolithic and rigid porous semiconductor nanostructure with uniformly distributed emission sites, and is fabricated through a room temperature process which allows for control of emission properties. These electron sources can be used in a wide range of applications, including microwave electronics and x-ray imaging for medicine and security.

Abstract: An electropolishing or electroplating system and method for metal conveyor belts is described. In some embodiments, the system has a metal conveyor belt held in constant tension; a tank for holding an electrolytic fluid, the tank having an interior space suitable to contain the fluid, a metal plate and the metal conveyor belt; and an electrical current supply. In an electropolishing application, the current passes from the metal conveyor belt, through the fluid and into the metal plate. In an electroplating application, the current passes from the metal plate, through the fluid and into the metal conveyor belt.

Abstract: A porous metal article includes a substrate; a metal layer formed on the substrate; and a porous metal layer formed on the metal layer. The metal layer is a noble metal layer doped with M that is at least one element selected from a group consisting of aluminum, magnesium and calcium, the content of M in the metal layer is between about 30 wt % and about 70 wt %.

Abstract: The invention concerns a process for the polishing of metallic dental prostheses, such as frames. In order to reproducibly obtain a defined surface roughness with no need for additional finishing, it is proposed for the dental prosthesis to be polished by means of plasma polishing.

Abstract: A fuel cell, having a first electrode, a second electrode, and a membrane element, in which the membrane element is disposed between the first electrode and the second electrode. At least one of the electrodes has a flow field plate and at least one flow conduit, through which a reactant can be conducted, extends in at least one outer surface of the flow field plate. The flow field plate has at least one microreaction chamber, and the microreaction chamber is disposed in the outer surface and on the flow conduit. A catalyst is disposed on at least a part of the microreaction chamber in such a way that the catalyst has contact simultaneously with the membrane element and the inflowing reactant.