Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product Patents (Class 430/269)
  • Publication number: 20080090058
    Abstract: A thin-film layer structure (100) includes a substrate (102), a plurality of banks (104) with a roughly same height formed on the substrate, and a plurality of thin-film layers (106). The plurality of banks defines a plurality of spaces therein, and the plurality of spaces is arranged in rows and columns. A volume distribution of the plurality of spaces receiving the thin-film layers made of a same material in each row is irregular. A method for manufacturing a thin-film layer structure is also provided.
    Type: Application
    Filed: July 23, 2007
    Publication date: April 17, 2008
    Applicant: ICF TECHNOLOGY LIMITED.
    Inventor: CHING-YU CHOU
  • Patent number: 7358283
    Abstract: A radiation curable composition comprising: A) at least one urethane poly(meth) acrylate compound; B) at least one poly(meth)acrylate compound; C) at least one polyester poly(meth)acrylate compound; D) at least one silicone poly(meth)acrylate compound; E) at least one visible light range free radial photopolymerization initiator; and F) at least one UV light range free radical polymerization initiator.
    Type: Grant
    Filed: April 1, 2005
    Date of Patent: April 15, 2008
    Assignee: 3D Systems, Inc.
    Inventor: Pingyong Xu
  • Publication number: 20080085462
    Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 10, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Keith Frank Best, Enno Van Den Brink, Cheng-Qun Gui, Budiman Sutedja, Peter Ten Berge
  • Patent number: 7348128
    Abstract: A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under hydrous conditions as well as exhibiting high cure-related sensitivity and high flexibility and being uniformly solidified even under highly hydrous conditions, a photosensitive resin composition containing the resin, and a novel compound. The photosensitive resin is a saponified poly(vinyl acetate)-based photosensitive resin having a structural unit represented by formula (1): (wherein R1 represents H or Me; R2 represents a linear or branched C2-C10 alkylene group; n is an integer of 1 to 3; X represents m is an integer of 0 to 6; and Y represents an aromatic ring or a single bond).
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: March 25, 2008
    Assignee: Toyo Gosei Co., Ltd.
    Inventors: Seigo Yamada, Masahiro Takano, Mitsuharu Miyazaki, Shin Utsunomiya
  • Publication number: 20080038665
    Abstract: The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having a refractive index of at least 1.6, and a method of obtaining a high refractive index periodical structure which comprises subjecting the photosensitive resin composition to photolithography.
    Type: Application
    Filed: June 17, 2004
    Publication date: February 14, 2008
    Inventors: Christopher K. Ober, Yasuharu Murakami
  • Patent number: 7313253
    Abstract: The present invention relates generally to steganography and data hiding. In one implementation we provide a method including: obtaining auxiliary data; providing a mask for a photo-reactive material, the mask corresponding at least in part to the auxiliary data; and exposing the material through the mask to steganographically impart the auxiliary data in the photo-reactive material. The auxiliary data is machine-readable from the exposed material. In another implementation the material is exposed through photolithographic illumination. Of course, other implementations are described and claimed as well.
    Type: Grant
    Filed: January 10, 2007
    Date of Patent: December 25, 2007
    Assignee: Digimarc Corporation
    Inventors: Bruce L. Davis, Geoffrey B. Rhoads
  • Publication number: 20070279605
    Abstract: Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a chamber, a vacuum pump, an evacuation duct connecting the pump to the chamber, and an infrared-radiation propagation-inhibiting device. The chamber accommodates “exposure components” of the exposure system. The vacuum pump evacuates gas from the chamber. The infrared-radiation propagation-inhibiting device is situated, for example, in the chamber, in an inlet from the chamber into the evacuation duct, and/or in the evacuation duct itself, and impedes the incidence of infrared radiation from the pump into the chamber.
    Type: Application
    Filed: April 24, 2007
    Publication date: December 6, 2007
    Inventor: Shintaro Kawata
  • Patent number: 7300619
    Abstract: A pseudo composite material, may include, inter alia, a first phase and a second phase, wherein each phase may include, inter alia, an organic compound, wherein each phase comprising a multiplicity of construction layers, wherein the layers were deposited by ink-jet printing, wherein the pseudo composite material exhibits non-homogeneous three-dimensional structure. A method is disclosed for the preparation of a pseudo composite material. An apparatus is disclosed for printing a pseudo composite material. Furthermore, there is disclosed a method for printing a three-dimensional object using various suitable materials.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: November 27, 2007
    Assignee: Objet Geometries Ltd.
    Inventors: Eduardo Napadensky, Eliahu M. Kritchman, Avi Cohen
  • Patent number: 7294446
    Abstract: A data storage device and method of making the storage device wherein a digital and analog image may be stored thereon. The storage device includes a photosensitive layer capable of retaining an optical image thereon, which may be written in a digital format that can also be read digitally.
    Type: Grant
    Filed: October 29, 2001
    Date of Patent: November 13, 2007
    Assignee: Eastman Kodak Company
    Inventors: John P. Spoonhower, David L. Patton
  • Publication number: 20070246441
    Abstract: A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 25, 2007
    Inventors: Jin Wuk Kim, Yeon Heui Nam
  • Patent number: 7285363
    Abstract: A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiety, and further wherein the point volume of the activation has at least one dimension of less than about 1 micron. The method is of particular utility for water-soluble molecules, particularly biologically active water-soluble molecules.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: October 23, 2007
    Assignee: The University of Connecticut
    Inventors: Paul J. Campagnola, Amy R. Howell, Jun Wang, Steven L. Goodman
  • Patent number: 7282243
    Abstract: The present invention has as its object to provide a pattern forming method which, even if a pattern is formed by photolithography, can keep the edge of the opening portion of the pattern in a sharp state and yet, can make the wall surface of the recess of the pattern into a tapered shape, and a method of manufacturing an ink jet recording head to which the aforedescribed method is applied.
    Type: Grant
    Filed: December 7, 2005
    Date of Patent: October 16, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Norio Ohkuma, Hikaru Ueda, Maki Hatta, Masaki Ohsumi, Takayuki Ono
  • Patent number: 7255804
    Abstract: A process for making photonic crystal circuit and a photonic crystal circuit consisting of regularly-distributed holes in a high index dielectric material, and controllably-placed defects within this lattice, creating waveguides, cavities, etc. for photonic devices. The process is based upon the discovery that some positive ultraviolet (UV) photoresists are electron beam sensitive and behave like negative electron beam photoresists. This permits creation of photonic crystal circuits using a combination of electron beam and UV exposures. As a result, the process combines the best features of the two exposure methods: the high speed of UV exposure and the high resolution and control of the electron beam exposure. The process also eliminates the need for expensive photomasks.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 14, 2007
    Assignee: University of Delaware
    Inventors: Dennis W. Prather, Janusz Murakowski
  • Patent number: 7252699
    Abstract: Continuous, conducting metal patterns can be formed from metal nanoparticle containing films by exposure to radiation (FIG. 1). The metal patterns can be one, two, or three dimensional and have high resolution resulting in feature sizes in the order of micron down to nanometers. Compositions containing the nanoparticles coated with a ligand and further including a dye, a metal salt, and either a matrix or an optional sacrificial donor are also disclosed.
    Type: Grant
    Filed: December 17, 2001
    Date of Patent: August 7, 2007
    Assignee: The Arizona Board of Regents
    Inventors: Joseph W. Perry, Seth R. Marder, Francesco Stellacci
  • Patent number: 7247420
    Abstract: The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate. The method comprises the steps of: sequentially applying positive radiation-sensitive resin compositions 1 and 2 to form a two-layer laminate; subjecting the two-layer resist to single exposure and development to produce fine patterns having an undercut cross section; depositing and/or sputtering an organic or inorganic thin layer with use of the resist pattern as a mask; and lifting off the resist pattern to leave a pattern of the thin layer in desired shape.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: July 24, 2007
    Assignee: JSR Corporation
    Inventors: Masaru Ohta, Atsushi Ito, Isamu Mochizuki, Katsumi Inomata, Shin-ichiro Iwanaga
  • Patent number: 7241550
    Abstract: A multiphoton-absorption exposure apparatus for exposing a multiphoton absorption material by applying light to the multiphoton absorption material so that the light converges at a predetermined convergence position, in which an exposure-condition control unit is provided for changing an exposure condition so that optical reactions are more likely to occur when the predetermined convergence position is located deeper in the multiphoton absorption material.
    Type: Grant
    Filed: September 9, 2004
    Date of Patent: July 10, 2007
    Assignee: Fujifilm Corporation
    Inventor: Takeharu Tani
  • Patent number: 7232637
    Abstract: Disclosed are mesophasic optical articles, methods of making mesophasic articles and methods of using mesophasic articles. In particular, this invention relates to mesophasic optical articles that can be prepared in situ with out the need of calcination, sintering, solvent evaporation, or other common method.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: June 19, 2007
    Assignee: Inphase Technologies, Inc.
    Inventors: Michael C. Cole, Timothy J. Trentler
  • Patent number: 7183040
    Abstract: The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0–29 wt % of a cationically curable component having a linking aliphatic ester group, (B) 10–85 wt % of an epoxygroup containing component other than A, (C) 1–50 wt % of an oxetanegroup containing component, (D) 1–25 wt % of a multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator.
    Type: Grant
    Filed: July 21, 2003
    Date of Patent: February 27, 2007
    Assignee: DSM IP Assets B.V.
    Inventors: Jens C Thies, Aylvin J. A. A. Dias, John A. Lawton, David L. Winmill, Jigeng Xu, Xiaorong You
  • Patent number: 7175953
    Abstract: The description herein includes cyanine dyes and analogs of the vaso-active intestinal peptide. These are useful to provide peptide-dye conjugates for use as contrast media in optical diagnoses.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: February 13, 2007
    Assignee: Institute Fuer Diagnostik Forschung
    Inventors: Kai Licha, Andreas Becker, Wolfhard Semmler, Bertram Wiedenmann, Carsten Hessenius, Rudolf Volkmer-Engert, Jens Schneider-Mergner
  • Patent number: 7166409
    Abstract: A method of increasing the efficiency of a multiphoton absorption process and apparatus. The method includes: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons; exposing the photoreactive composition to at least one transit of light from the light source; and directing at least a portion of the first transit of the light back into the photoreactive composition using at least one optical element, wherein a plurality of photons not absorbed in at least one transit are used to expose the photoreactive composition in a subsequent transit.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: January 23, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Patrick R. Fleming, Robert J. DeVoe, Catherine A. Leatherdale, Todd A. Ballen, Jeffrey M. Florczak
  • Patent number: 7085469
    Abstract: This invention provides a process for producing a three-dimensional polyimide optical waveguide, which comprises: (I) irradiating a polyamic acid film with a laser beam while converging the laser beam at an inside portion of the film and relatively moving the light convergence point, the polyamic acid film containing: (a) a polyamic acid obtained from a tetracarboxylic dianhydride and a diamine; and (b) per 100 parts of the polyamic acid, from 0.5 part by weight to less than 10 parts by weight of a specific 1,4-dihydropyridine derivative represented by formula (I): and then, (II) heating the polyamic acid film to imidize the polyamic acid, thereby obtaining an optical waveguide having a continuous core region where the refraction index has been changed, in the thus formed polyimide film.
    Type: Grant
    Filed: November 5, 2003
    Date of Patent: August 1, 2006
    Assignee: Nitto Denko Corporation
    Inventors: Kazunori Mune, Ryuusuke Naitou, Amane Mochizuki, Atsushi Hino, Mika Horiike
  • Patent number: 7081328
    Abstract: An optical disk from which recorded data are read out by means of light irradiation has a substrate having recording pits as data on a surface thereof, and stacked films formed on the substrate. The stacked films contain a super-resolution film of a polymer matrix and semiconductor particles having an organic group covalently bonded thereto, and a reflective film reflecting light. The super-resolution film and the reflective film are provided in this order from a light incident side.
    Type: Grant
    Filed: March 29, 2001
    Date of Patent: July 25, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Todori, Toshihiko Nagase, Katsutaro Ichihara, Naoko Kihara
  • Patent number: 7072564
    Abstract: Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer that has units of the formula (R1SiO1.5) and (R22SiO), wherein R1 and R2 are the same or different, and are substituted and/or unsubstituted organic groups, and wherein the (R22SiO) units are present in an amount of 14 wt % or more based on the polymer; and a plurality of functional end and/or internal groups. Also included is a component for altering the solubility of the composition upon activation. The solubility of the composition in a dried state is alterable upon activation of the component such that the composition is developable in an aqueous developer solution. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: July 4, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James G. Shelnut, Matthew L. Moynihan
  • Patent number: 7072565
    Abstract: Provided are compositions which include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
    Type: Grant
    Filed: April 14, 2005
    Date of Patent: July 4, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James G. Shelnut, Nicola Pugliano, Matthew L. Moynihan, Hai Bin Zheng, Daniel E. Lundy, Nathan Pawlowski
  • Patent number: 7072563
    Abstract: Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether, and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: July 4, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James G. Shelnut, Nicola Pugliano, Matthew L. Moynihan, Hai Bin Zheng, Daniel E. Lundy, Nathan Pawlowski
  • Patent number: 7041711
    Abstract: To provide a polymerizable composition suitable for a lithographic printing plate precursor which can satisfy the requirements of high sensitivity, excellent storage stability and long press life and enables direct plate making from digital data from computer, etc. when recording is conducted a solid laser or semiconductor laser emitting ultraviolet ray, visible light or infrared ray and a compound therefore, the present invention relates to a photoradical polymerizable composition comprising a polyfunctional crosslinking agent having a specific structure represented by formula (I) or (II) defined in the specification.
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: May 9, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kazuto Kunita
  • Patent number: 7033724
    Abstract: A process for the manufacture of organically developable, photopolymerizable flexographic elements on flexible metallic supports by coating a flexible metallic support with a tack-free adhesive coating composition which is insoluble and non-swelling in printing inks and organic developers, attaching an elastomeric, photopolymerizable layer to a protective film, and laminating the photopolymerizable layer to the metallic support coated with said adhesive coating composition. A photopolymerizable flexographic element comprising a photopolymerizable layer which is attached to a metallic support by means of a tack-free adhesive film that is non-swelling and insoluble in printing inks and organic developers.
    Type: Grant
    Filed: August 16, 2001
    Date of Patent: April 25, 2006
    Assignee: BASF Aktiengesellschaft
    Inventors: Rolf Knöll, Thomas Telser, Hans Menn
  • Patent number: 7001853
    Abstract: This invention provides methods and systems, e.g., to control the flow of photo-polymerizable resins. In the method, e.g., flow of a photo-polymerizable resin is restricted from illuminated resin exclusion regions on a substrate surface by precisely situated flow barriers. A system to control photo-polymerizable resin flow includes, e.g., a light source, a mask and a substrate.
    Type: Grant
    Filed: August 28, 2003
    Date of Patent: February 21, 2006
    Assignee: Caliper Life Sciences, Inc.
    Inventors: Timothy B. Brown, Richard Kurth
  • Patent number: 6998214
    Abstract: A three dimensional optical data storage and retrieval system that includes a three dimensional optical data storage medium and an apparatus for providing access to data stored on the medium. The data storage medium includes an optical data storage material which either a low molecular weight or polymeric glassy solid that are capable of undergoing multi-photon excitation that are energetically different in the write and read cycles. The optical data storage materials provide substantially higher storage capacities relative to conventional materials, and show high robustness in that written and stored data can undergo multiple read cycles without erasure or overwriting. An apparatus for data recording and accessing stored data on the medium includes a controllable variable energy photo-emitting excitation source and an emission photo-detector.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: February 14, 2006
    Assignee: The Trustees of Boston College
    Inventors: John T. Fourkas, Christopher E. Olson, Michael J. R. Previte
  • Patent number: 6989225
    Abstract: A liquid radiation-curable composition that comprises (A) at least one polymerizing organic substance comprising a mixture of (1) at least one alicyclic epoxide having at least two epoxy groups; and (2) at least one difunctional or higher functional glycidylether of a polyhydric compound; (B) at least one free-radical polymerizing organic substance comprising a mixture of (1) optionally, at least one trifunctional or higher functional (meth)acrylate compound; and (2) at least one aromatic di(meth)acrylate compound; (C) at least one cationic polymerization initiator; (D) at least one free-radical polymerization initiator; (E) optionally, at least one hydroxyl-functional aliphatic compound; and (F) at least one hydroxyl-functional aromatic compound; wherein the concentration of hydroxyl groups in the radiation-curable composition is at least about 1.1 equivalent OH groups per kilogram; wherein the concentration of epoxy groups in the radiation-curable composition is at least about 5.
    Type: Grant
    Filed: January 7, 2003
    Date of Patent: January 24, 2006
    Assignee: 3D Systems, Inc.
    Inventor: Bettina Steinmann
  • Patent number: 6967224
    Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer. A process for producing a three-dimensional object which comprises the use of a washing agent having a Hansen-solubility between 27-35 (Mpa)1/2.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: November 22, 2005
    Assignee: DSM IP Assets B.V.
    Inventors: Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi
  • Patent number: 6951700
    Abstract: The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: October 4, 2005
    Assignee: Qinetiq Limited
    Inventors: John W Goodby, Alan W Hall, Keith M Blackwood, Paul E Y Milne, Andrew G Biggs, Ryan M Heath, Robert W Bannister
  • Patent number: 6893804
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Grant
    Filed: November 18, 2002
    Date of Patent: May 17, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G Duesman
  • Patent number: 6888853
    Abstract: A system and method for selectively process material on a processing surface of a printing form to create a fine structure or pattern for images or text. At least one fiber laser comprising a pump source and a laser fiber is provided. A laser gun is mounted adjacent the printing form and has at least a focusing optics. The fiber laser outputs a laser beam which is diffraction-limited to permit the focusing optics to focus the laser beam onto the processing surface of the printing form as a spot having a spot size sufficiently small to process the processing surface to create the fine structure or pattern images or text.
    Type: Grant
    Filed: September 1, 1999
    Date of Patent: May 3, 2005
    Assignee: Hell Gravure Systems GmbH
    Inventor: Heinrich Jürgensen
  • Patent number: 6875547
    Abstract: A method of crystallizing amorphous silicon using a mask having a transmitting portion including a plurality of stripes, wherein end lines of at least two stripes are not collinear; and a blocking portion enclosing the plurality of stripes includes the steps of setting the mask over a substrate having an amorphous silicon layer, applying a first laser beam to a first area of the amorphous silicon layer through the mask, thereby forming a first crystallization region, moving the substrate in a first direction, thereby disposing the blocking portion of the mask over the first crystallization region, and applying a second laser beam to the first area of the amorphous silicon layer through the mask, thereby forming a second crystallization region.
    Type: Grant
    Filed: April 22, 2003
    Date of Patent: April 5, 2005
    Assignee: LG. Philips LCD Co., Ltd.
    Inventor: Sang-Hyun Kim
  • Patent number: 6863859
    Abstract: The present invention relates to novel polymeric compositions that exhibit Reverse Thermal Gelation (RTG) properties for use as Support Materials (SM) in the manufacture of three-dimensional objects. These polymers are Temperature Sensitive Polymers that respond with a significant change of properties to a small change in temperature. Temperature Sensitive Polymers exhibit cloud point (CP) or lower critical solution temperature (LCST) in aqueous solutions. Water-soluble Temperature Sensitive Polymers are chosen to give low viscosity liquid at low temperature when dissolved in water and by that to permit easy dispensing at low temperature. Raising the temperature above their gelation temperature (Tgel) will result in solidification of the composition. At its gel position the material has favorable characteristics as a support and building material. The gel layers have the appropriate toughness and dimensional stability to support the model layers during the building process.
    Type: Grant
    Filed: August 15, 2002
    Date of Patent: March 8, 2005
    Assignee: Objet Geometries Ltd.
    Inventor: Avraham Levy
  • Patent number: 6835523
    Abstract: In an apparatus for fabricating a carbon coating, an object such as a magnetic r cording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: December 28, 2004
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Kenji Itoh, Shigenori Hayashi
  • Patent number: 6833231
    Abstract: A liquid radiation-curable composition that comprises (A) at least one polymerizing organic substance; (B) at least one free-radical polymerizing organic substance; (C) at least one cationic polymerization initiator; (D) at least one free-radical polymerization initiator; (E) at least one hydroxyl-functional compound; and (F) at least one epoxy interpenetrating polymer compound;
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: December 21, 2004
    Assignee: 3D Systems, Inc.
    Inventors: Khalil M. Moussa, Jiaching Liu
  • Publication number: 20040253550
    Abstract: Polymer aggregates in a photoresist layer may be dissolved or reduced in dimension by treatment with supercritical carbon dioxide. The supercritical carbon dioxide may be used before and/or after development of the photoresist. The SCCO2 treatment causes swelling of the photoresist and may allow polymer aggregates in the photoresist to be dissolved. Controlled release of the carbon dioxide de-swells the photoresist, resulting in reduced line edge roughness of openings in the photoresist and reduced resistance of metal lines formed in the openings.
    Type: Application
    Filed: June 11, 2003
    Publication date: December 16, 2004
    Inventors: Vijayakumar Ramachandrarao, Hyun-Mog Park, Subramanyam Iyer, Bob Turkot
  • Patent number: 6811931
    Abstract: A photomask plate with a film surface protective layer is characterized in that a protective layer forming solution is prepared by mixing a main constituent comprising a two-liquid cross-linked antifouling surface coating agent, prepared by combining a mixed resin of a fluororesin and an acrylic resin in a solvent mixture of n-butyl acetate, methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK), with a cross-linking curing agent, prepared by mixing a polyisocyanate prepolymer and ethyl acetate, and a diluent comprising n-butyl acetate, methyl ethyl ketone (MEK) and cellosolve (ethylene glycol monoethyl ether) acetate. This protective layer forming solution is applied to a film surface of a photomask plate photosensitive emulsion layer produced by forming the film surface of the photosensitive emulsion layer (an emulsion photomask) on a substrate. The protective layer forming solution is then aged to form a film surface protective layer in a laminated manner.
    Type: Grant
    Filed: April 18, 2002
    Date of Patent: November 2, 2004
    Assignee: Sineisha Co., Ltd.
    Inventor: Akio Fujioka
  • Patent number: 6811937
    Abstract: The present invention provides compositions comprising a cationically curable component and a substantially compatible free radical polymerizable component. Compatible free radical polymerizable components include alkoxylated free radical polymerizable components. Objects obtained by curing the present compositions, for instance by rapid prototyping the compositions, have an improved clarity.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: November 2, 2004
    Assignee: DSM Desotech, Inc.
    Inventor: John A. Lawton
  • Publication number: 20040202955
    Abstract: An inkjet method is used to make an offset lithographic printing master by imagewise application of droplets of a coalescing agent on a layer of imageable medium comprising hydrophobic polymer particles, pre-coated on a hydrophilic lithographic base. Treatment with a developer removes those areas of the layer that have not been imagewise coalesced, thereby revealing the underlying hydrophilic base to create a lithographic printing master. The combination of imageable media and coalescing agent may be used in the fully on-press fabrication of a negative-working lithographic master, which may optionally also be made on a re-usable base.
    Type: Application
    Filed: February 6, 2004
    Publication date: October 14, 2004
    Inventor: Jonathan W. Goodin
  • Publication number: 20040170915
    Abstract: The present invention relates to the use of a laser to remove surface contamination and oxidation from a ball grid array substrate. The laser etching can be configured to cover the entire substrate or pinpointed to the epoxy molding compound/solder resist (EMC/SR) interfaces. Additionally, a laser can be used to roughen the surface of a substrate to provide better adhesion when attaching the die to the substrate.
    Type: Application
    Filed: March 2, 2004
    Publication date: September 2, 2004
    Inventor: Frank L. Hall
  • Publication number: 20040170923
    Abstract: A liquid colored radiation-curable composition that comprises:
    Type: Application
    Filed: February 27, 2003
    Publication date: September 2, 2004
    Applicant: 3D Systems, Inc.
    Inventors: Alfred Steinmann, Bettina Steinmann, Manfred Hofmann
  • Publication number: 20040142274
    Abstract: The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0-29 wt % of a cationically curable component having a linking aliphatic ester group, (B) 10-85 wt % of an epoxygroup containing component other than A, (C) 1-50 wt % of an oxetanegroup containing component, (D) 1-25 wt % of a multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator.
    Type: Application
    Filed: July 21, 2003
    Publication date: July 22, 2004
    Inventors: Jens C. Thies, Aylvin J.A.A. Dias, John A. Lawton, David L. Winmill, Jigeng Xu
  • Publication number: 20040137368
    Abstract: A liquid radiation-curable composition that comprises
    Type: Application
    Filed: January 13, 2003
    Publication date: July 15, 2004
    Applicant: 3D Systems, Inc.
    Inventor: Bettina Steinmann
  • Patent number: 6762002
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: July 13, 2004
    Assignee: DSM Desotech, Inc.
    Inventors: John A. Lawton, Chander P. Chawla
  • Publication number: 20040131963
    Abstract: The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate.
    Type: Application
    Filed: October 27, 2003
    Publication date: July 8, 2004
    Inventors: Masaru Ohta, Atsushi Ito, Isamu Mochizuki, Katsumi Inomata, Shin-ichiro Iwanaga
  • Publication number: 20040115559
    Abstract: An optical information recording medium, especially a CD-RW medium, that can undergo direct overwriting at high speed is disclosed. The optical information recording medium includes a transparent substrate, at least a recording layer and a reflective layer on or above the substrate and is capable of performing at least one of recording, erasing and rewriting information by irradiating and scanning with focused light to thereby form and/or erase recording marks on the recording layer.
    Type: Application
    Filed: November 4, 2003
    Publication date: June 17, 2004
    Inventors: Masaki Kato, Katsuyuki Yamada
  • Patent number: RE39106
    Abstract: A photohardenable composition especially suitable for use in solid imaging. The compositions are characterized by their improved photospeed in combined with excellent initial green strength. The compositions allows for the production of articles by solid imaging processing techniques that show little or no distortion, high accuracy, excellent clarity. The compositions are low in toxicity and have low sensitivity to water.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: May 23, 2006
    Assignee: DSM IP Assets B.V.
    Inventors: John A. Lawton, William J. Nebe, Glen A. Thommes, Jonathan V. Caspar