Abstract: A molecularly imprinted substrate and sensors employing the imprinted substrate for detecting the presence or absence of analytes are described. One embodiment of the invention comprises first forming a solution comprising a solvent and (a) a polymeric material capable of undergoing an addition reaction with a nitrene, (b) a crosslinking agent (c) a functionalizing monomer and (d) an imprinting molecule. A silicon wafer is spincoated with the solution. The solvent is evaporated to form a film on the silicon wafer. The film is exposed to an energy source to crosslink the substrate, and the imprinting molecule is then extracted from the film. The invention can be used to detect an analyte by forming films which are then exposed to a reaction energy to form a crosslinked substrate. The imprinting molecules are extracted from the crosslinked substrate. The film is exposed to one or more of the imprinting molecules for a period of time sufficient to couple the imprinting molecules to the film.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains a benzotriazole UV-absorbing dye.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains a 2-hydroxybenzophenone UV-absorbing dye.

Abstract: A laser recording element comprising a base having thereon a dye layer comprising an image dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith, the base comprising a composite film laminated to at least one side of a support, the dye layer being on the composite film side of the base, and the composite film comprising a microvoided thermoplastic core layer and at least one substantially void-free thermoplastic surface layer.

Abstract: A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.

Abstract: Acid can be generated by exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor and heating the superacid in admixture with a secondary acid generator capable of undergoing thermal decomposition to produce a secondary acid. The superacid catalyzes decomposition of the secondary acid generator, thus increasing the quantity of strong acid present in the medium. The resultant secondary acid can be used to effect a color change in an acid-sensitive material, so providing an imaging process.

Abstract: A laser dye-ablative recording element comprising a support having on one side thereof a dye layer comprising an image dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith to absorb at a given wavelength of the laser used to expose the element, the image dye being substantially transparent in the infrared region of the electromagnetic spectrum and absorbing in the region of from about 300 to about 700 nm and not having substantial absorption at the wavelength of the laser used to expose the element, and the other side of the support having thereon a conductive backing layer of resistivity <5.times.10.sup.12 .OMEGA./.quadrature..

Abstract: Disclosed is a method for developing a silver halide photographic light-sensitive material with a developer having a pH within the range of 9.5 to 10.7 through an automatic processor, wherein said silver halide photographic light-sensitive material comprises a support and thereon, at least one silver halide emulsion layer comprising silver halide grains containing at least 60 mol % of silver chloride, comprising the steps of:replenishing a first developer replenishing-solution having lower activity than a starter for a developer; andreplenishing a second developer replenishing-solution having the substantially same activity as said starter for a developer.

Abstract: A laser dye-ablative recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains an arylazo phenol, naphthol or aniline UV-absorbing dye.

Abstract: An optical recording medium has a substrate and a recording film of phthalocyanine coloring matter provided on the substrate. A recording power is determined in such a manner that a .beta. value represented by the following equation becomes a value between -0.3 and 0.beta.=(A1+A2)/(A1-A2)where A1 represents a peak level in a plus range and A2 represents a peak level in a minus range of a reproduced signal coupled with alternating current.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains an oxalanilide UV-absorbing dye.

Abstract: The present invention relates to a resist processing device and resist processing method that enable resist pattern formation with a high degree of accuracy, and furthermore, enable in continuous dry etching, an isotropic etching possessing extremely high selectivity. The resist processing device is provided with at least a mechanism for the radiation of ultraviolet rays onto a substrate having a resist formed thereon, and a mechanism for the introduction of inert gas into the device. The resist processing method is characterized in that the radiation of ultraviolet rays onto a substrate which has a resist form thereon is conducted in an inert gas atmosphere.

Abstract: A method for producing a three-dimensional object having selected elements which are colored a different color than the color of other elements of the object, comprising the steps of:a. providing a film of a photohardenable composition containing a photoresponsive agent,b. irradiating the film in a cross-sectional pattern of the object to be formed so as to form hardened areas in the film.c. selectively irradiating one or more portions of the cross-sectional pattern corresponding to the selected elements which are desired to be colored a different color than the color of other elements of the object with radiation which activates the photoresponsive agent, the photoresponsive agent thereby producing color in or removing color from the selectively irradiated portions of the cross-sectional pattern, the steps being performed with radiation of a different wavelength than the radiation used in performing step b,d. repeating steps a, b and c to form successive adjacent cross-sectional patterns of the object, ande.

Abstract: Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator.

Abstract: A laser recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, and wherein said dye layer also contains a 2-cyano-3,3-diarylacrylate UV-absorbing dye.

Abstract: A laser dye-ablative recording element comprising a support having thereon a dye layer comprising a yellow dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith, the yellow dye comprising curcumin.

Abstract: Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing (a) a vinyl ether oligomer, and (b) mono and/or multifunctional vinyl ether monomers.

Abstract: A black laser dye-ablative recording element comprising a support having thereon a dye layer comprising a mixture of at least one cyan, magenta and yellow dye dispersed in a polymeric binder, said dye layer having an infrared-absorbing material associated therewith, said cyan dye having the formula: ##STR1## wherein: R.sup.1, R.sup.2, R.sup.3, X, Y, J and m are as defined.

Abstract: A photo-setting resin is shaped into a three-dimensional resin model by scanning successive resin solution layers of a photo-setting resin solution with a radiation beam to form a stack of scanned set layers of photo-setting resin, each of the successive resin solution layers having a shaped region of an isometric section. The radiation beam is scanned along a contour line of the shaped region to set the shaped region along the contour line, and scanned in a raster scanning mode to set the shaped region inwardly of the contour line. Specifically, the radiation beam is scanned along a first line which is spaced a first distance inwardly from the contour line thereby to set the shaped region along the first line, and the radiation beam is scanned inwardly of a second line which is spaced a second distance inwardly from the contour line thereby to set the shaped region inwardly of the second line. The first distance is smaller than the second distance.

Abstract: Dense sintered parts of ceramic and/or metallic materials are formed using stereo photolithography. An initial flowable mixture of sinterable inorganic particles, photocurable monomer, photoinitiator and dispersant is flowed over a substrate and cured in a selective pattern. Subsequent layers of the mixture are flowed over the substrate and cured to build a three dimensional body. The body is then fired to produce a dense sintered part. Parts having in excess of 95% of theoretical density can be produced.

Abstract: A mask includes a first layer which is transparent with respect to an exposure light, and a phase shift mask pattern which is formed on the transparent layer. The pattern includes one or more phase shift regions adapted for transmitting the exposure light impinging thereon and shifting the phase of the transmitted light relative to the phase of light which passes through a portion of the mask having no phase shift layer.

Abstract: Photosensitive compositions comprisinga) 5-95% by weight of a polyester of formula I, II or III ##STR1## wherein R.sub.1 is the radical of a cyclic anhydride of a dicarboxylic acid after removal of the --O--CO--O-- grouping, which radical may be substituted by C.sub.1 -C.sub.22 alkyl, C.sub.5 -C.sub.10 cycloalkyl, C.sub.3 -C.sub.6 alkenyl, C.sub.6 -C.sub.10 aryl, halogen or C.sub.1 -C.sub.22 alkyl which is interrupted by --O-- or --CO--O--,R.sub.2 is hydrogen, unsubstituted or halogen-substituted C.sub.1 -C.sub.22 alkyl, C.sub.5 -C.sub.10 cycloalkyl, C.sub.7 -C.sub.22 aralkyl, C.sub.6 -C.sub.10 aryl or a radical --CH.sub.2 --O--R.sub.5 or --CH.sub.2 --O--CO--R.sub.5, wherein R.sub.5 is C.sub.1 -C.sub.22 alkyl, C.sub.5 -C.sub.6 cycloalkyl or C.sub.6 -C.sub.10 aryl,R.sub.3 is hydrogen, orR.sub.2 and R.sub.3, together with the linking carbon atoms, are a cyclopentylene or cyclohexylene radical,R.sub.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.

Abstract: This invention provides a photoswitchable compound comprising interconvertible mirror image units or interconvertible chiral diastereomeric units connected as pendant groups to a stiff polymer having interconvertible left- and right-handed helical portions of its backbone. Further provided by this invention is a photoswitchable compound formed by the method comprising combining an amount of the compound capable of optical activity and capable of changing its optical activity with an amount of a stiff polymer comprised of interconvertible left- and right-handed helical portions. Additionally, this invention provides a method for reversibly storing optical data comprising providing a material comprised of a mixture of a stiff polymer having interconvertible left- and right-handed helical portions and connected units, said units being capable of optical activity and capable of changing its optical activity and irradiating said material with light capable of changing the optical activity of said material.

Abstract: The invention relates to photosensitive compositions comprisingA) from 40 to 80% by weight of at least one liquid epoxy resin having an epoxy functionality of equal to or greater than 2,B) from 0.1 to 10% by weight of at least one cationic photoinitiator for component A),C) from 5 to 40% by weight of at least one liquid cycloaliphatic or aromatic diacrylate,D) from 0 to 15% by weight of at least one liquid poly(meth-)acrylate having a (meth-)acrylate functionality of greater than 2, the proportion of component D) constituting a maximum of 50% by weight of the total (meth-)acrylate content,E) from 0.1 to 10% by weight of at least one radical photoinitiator for component C) and, where appropriate, D) andF) from 5 to 40% by weight of at least one OH-terminated polyether, polyester or polyurethane,which are especially suitable, for example, for the manufacture of photopolymerized layers, especially of three-dimensional objects.

Abstract: A liquid photosensitive composition comprising(1) 40 to 80% by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and a molecular weight (Mw) of 500 to 10,000,(2) 5 to 40% by weight of a hydroxyl group containing aliphatic or cycloaliphatic di(meth)acrylate,(3) 0 to 40% by weight of a mono(meth)acrylate or of a mono-N-vinyl compound having a Mw of not more than 500,(4) 0.1 to 10% by weight of a photoinitiator,(5) 0 to 30% by weight of an aliphatic or cycloaliphatic di(meth)acrylate which differs from (2), of an aliphatic tri(meth)acrylate or of an aromatic di- or tri(meth)acrylate, and(6) 0 to 5% by weight of customary additives, such that the proportion of components (1) to (6) together is 100% by weight.The composition is a photosensitive composition which can be polymerised by irradiation with actinic light and which is suitable for the production preferably of three-dimensional objects by the stereolithographic technique.

Abstract: A coated material comprising a substrate which is coated with a layer of a pyrrolopyrrole of formula I ##STR1## wherein R.sub.1 and R.sub.2 may be 4-pyridyl and X.sub.1 and X.sub.2 are O, said compound of formula I being at least partially in the form of a salt of a strong acid, is suitable for use as an optical recording material and, owing to its electrical conductivity and photoconductivity, as antistatically treated material, as sensor, photoreceptor and solar battery.

Abstract: A stable, image-retaining, optically switchable film produced from a purple membrane in a high-pH polyvinyl alcohol solution forms an optical memory for data storage. The film, when dry, can be exposed to light to convert BR molecules to their M state, which is stable, and which allows long-term image storage. The image can be erased by exposing the film to yellow light to thereby switch all the molecules to the M state, and then a reverse image can be obtained using blue light. By controlling the location and wavelength of the incident light, pixels can be selected and exposed for information storage.

Abstract: Photopolymerisable compositions comprising(a) a tetraacrylate of formula I or II ##STR1## wherein R.sub.1 is a hydrogen atom or methyl,X.sub.1 and X.sub.2 are each independently of the other --O-- or --CO--O--,R.sub.2 is a divalent aliphatic, cycloaliphatic or aromatic radical of a diglycidyl compound that contains no more glycidyl ether or ester groups,A is a divalent aliphatic, cycloaliphatic or aromatic radical of a diisocyanate compound that contains no more isocyanate groups,n is an integer from 1 to 8, andR.sub.3 is a tetravalent cycloaliphatic radical of a diepoxide compound that contains no more 1,2-epoxide groups at the cycloaliphatischen ring,(b) at least one liquid radically polymerisable compound that differs from component a), and(c) a radical photoinitiator, are suitable preferably for the production of three-dimensional objects by the stereolithographic technique.

Abstract: An ablative recording element comprising a support having thereon, in order, a barrier layer and a colorant layer comprising a colorant dispersed in a polymeric binder, the colorant layer having an infrared-absorbing material associated therewith, and wherein the barrier layer comprises a vinyl polymer having recurring units of the following formula: ##STR1## wherein R.sup.1 and R.sup.2 each independently represents a halogen atom; a haloalkyl group with at least one halogen atom in its .beta.-position of the carbon to which R.sup.1 or R.sup.2 is attached; a ketal group; an acetal group; a thioketal group; a thioacetal group; a substituted or unsubstituted alkyl group; or a group containing a double or triple bond between any two atoms, one of which is adjacent to the carbon to which R.sup.1 or R.sup.2 is attached;with the proviso that at least one of R.sup.1 and R.sup.2 represents a group containing a double or triple bond between any two atoms, one of which is adjacent to the carbon to which R.sup.1 or R.

Abstract: Novel (cyclo)aliphatic epoxy compounds that contain at least one acrylate group in the molecule and at least one cycloaliphatic epoxy group can be used for the production of coating formulations, adhesives, photoresists or in stereolithography. As they contain a cohesive homogeneous network, the three-dimensional objects produced have very good green strength and very good strength properties.

Abstract: Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulaeR.sup.1 --(OC.sub.c H.sub.2c).sub.d --{[T]--(C.sub.c H.sub.2c O).sub.d-1 --(C.sub.c H.sub.2c)}.sub.g --OR.sup.1 (I) ##STR1## wherein: R.sup.1 is a hydrogen atom or a C.sub.1 -C.sub.8 alkyl group;R.sup.2 is a methyl or phenyl group;[T] is a polysiloxane group [PS] terminated as described in the specification in more detail;[PS] is the group of formula ##STR2## and [Alk] is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.

Abstract: A method of fabricating a phase shifting reticle that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. A transparent quartz substrate is coated with a film of an oxidizable silicon material. The silicon is then coated with a material suitable for isolating the silicon material from an oxidizing environment. A resist coating is placed atop the isolation material, developed and etched, exposing the isolation in a predetermined pattern. The isolation material is etched and the substrate placed in an oxidizing environment. The silicon material expands to a predetermined thickness, forming a phase shifter on the substrate. Next, the remaining isolation material and unoxidized silicon are removed, forming transmission regions adjacent the phase shifters. Then the remaining resist is removed to form opaque or light blocking areas on the substrate to complete formation of a phase shifting reticle.

Abstract: A process of forming a single color, dye ablation image having an improved D-min comprising imagewise-heating by means of a laser, a dye-ablative recording element comprising a transparent support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith to absorb at a given wavelength of the laser used to expose the element, the image dye being substantially transparent in the infrared region of the electromagnetic spectrum and absorbs in the region of from about 300 to about 700 nm and does not have any substantial absorption at the wavelength of the laser used to expose the element, the laser exposure taking place through the dye side of the element, and removing the ablated image dye material to obtain the image in the dye-ablative recording element, wherein the element contains a substantially transparent, hydrophilic, organic or inorganic polymeric dye barrier layer between the support and the dye layer.

Abstract: An apparatus and related method for providing a substantially flat working surface of photocurable resin for the formation of a next layer of a stereolithographic part. A substantially flat surface of a rigid member is substantially covered by and spaced from the resin by a substance or film, which is placed in contact with the photocurable resin to form the working surface. Various embodiments are described including where the rigid member is a quartz including a fused silica plate, a bar, a vat wall, the face of a CRT, a fiber-optic bundle, or the bottom of a piston, and also including embodiments where the substance or film is a thin teflon or mylar film, an inert liquid, wax, a thin coating of trichlorosilane or ethoxysilane, or oxygen-saturated resin. Embodiments are also described whereby the next layer is exposed by transmitting solidifying radiation through the member and substance or film.

Abstract: Acid can be generated by exposing a superacid precursor to actinic radiation effective to generate superacid from the superacid precursor and heating the superacid in admixture with a secondary acid generator capable of undergoing thermal decomposition to produce a secondary acid. The superacid catalyzes decomposition of the secondary acid generator, thus increasing the quantity of strong acid present in the medium. The resultant secondary acid can be used to effect a color change in an acid-sensitive material, so providing an imaging process.

Abstract: In an optical recording medium comprising an organic dye base recording layer and a reflective layer on a resin substrate having a groove of 1,100 to 2,300 .ANG. deep formed in one surface thereof, signals are written by directing recording light to the recording layer within the groove from the back side of the substrate at a relative linear velocity of at least 3.6 m/s whereby record marks are formed in the recording layer as a result of partial decomposition of the dye while deforming the groove bottom surface. The deformation of the groove bottom surface is minimized to less than 18% of the groove depth. The medium requires a short time for recording and offers reduced jitter on reproduction.

Abstract: Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator.

Abstract: The present invention can precisely manufacture an X-ray mask pattern at intervals of less than 10 nm by using a thin film crystalline growth method, applying a laminated layer body of a fine structure having a precision of less than 1 atomic layer onto a substrate, and utilizing the difference in X-ray absorption coefficients. A method of manufacturing an X-ray exposure mask comprises the steps of alternately laminating two kinds of material consisting of a combination of a semiconductor, metal and insulator having substantially equal lattice constants and largely different coefficients of X-ray absorption on a substrate of a crystal body to thicknesses of less than 10 .ANG. by an epitaxial crystal growth method, and manufacturing a mask for exposing streak-like X-rays on a desired resist as a result of the largely different coefficients of X-ray absorption between each layer.

Abstract: A photo-solidification modeling apparatus and a photo-solidification modeling method, wherein the reliability of an operation for coating the upper surface of a solidified layer with an unsolidified liquid is improved and the time required to carry out the same operation is reduced. To meet the purpose, a clearance is formed between the lower surface of a recoater travelling on a solidified layer and the upper surface of the solidified layer. When this condition is satisfied, an unsolidified liquid is introduced onto the solidified layer by virtue of both the force of the lower surface of the recoater which drags the unsolidified liquid and the nature of the unsolidified liquid entering the clearance. When recesses are provided in the lower surface of the recoater, the liquid adsorbed to the surfaces of the recesses is also introduced onto the unsolidified layer.

Abstract: A method of forming a pattern using a phase shift mask which comprises applying at least first and second exposures. At least one exposure is conducted by using a phase shifting mask and at least the other exposure is conducted for compensating the amount of light at a phase shifting boundary of the phase shifting mask, the pattern having an inter-pattern distance on a substrate of less than 2.4.times..lambda./NA.The method of the present invention is applicable also to the formation of a pattern to which the existing phase shifting technique can not be applied, as well as to a pattern in which sub-patterns as the phase shifting portions can not be provided, whereby a pattern at a high resolution power can be obtained irrespective of the pattern shape.

Abstract: A method of writing and reading or writing, reading and erasing information in an optical recording medium is provided in which in an optical recording medium an optically active compound which is an inherently chiral dissymmetric olefinic chromophore is subjected to the action of circularly polarized light or is caused to undergo cis-trans isomerization during writing, is subjected to linearly polarized light during reading, and is subjected to linearly or circularly polarized light or light of a wavelength suitable to effect cis-trans isomerization for erasing.

Abstract: A method for reducing curl in three dimensional computer generated models, created by the sequential exposure of adjacent layers of a photoformable composition, comprising exposing each layer twice, the first exposure being with an image modulated exposure further modulated to produce a series of isolated, anchored islets along the imaged areas, and the second exposure also being image modulated but without the additional modulation, so as to fuse the islets into a continuous solid image.

Abstract: A method of transferring a micropattern onto a substrate includes the step of forming a multilayer film consisting of at least two layers on the substrate, the first exposing step of exposing the uppermost layer of the multilayer film through a first mask having a pattern equal to or larger than the micropattern, the step of positioning a second mask such that a main pattern thereof overlaps a transfer area of the uppermost layer of the multilayer film, the second mask having the main pattern corresponding to the micropattern and an auxiliary pattern arranged in the vicinity of the main pattern, and the second exposing step of exposing a layer other than the uppermost layer of the multilayer film through the second mask.

Abstract: A method useful for stereolithography that yields enhanced photospeed, as well as a photocurable polymer composition well adapted for use with same, are disclosed.A preferred combination includes 1,2-dimethoxy-2-phenyl acetophenone, benzophenone, and triphenyl phosphine combined with a polyurethane (meth)acrylate oligomer.

Abstract: A process of forming a single color, dye ablation image having an improved D-min comprising imagewise-heating by means of a laser, in the absence of a separate receiving element, a dye-ablative recording element comprising a support having thereon a dye layer comprising an image dye dispersed in a polymeric binder, the dye layer having an infrared-absorbing material associated therewith to absorb at a given wavelength of the laser used to expose the element, the image dye being substantially transparent in the infrared region of the electromagnetic spectrum and absorbs in the region of from about 300 to about 700 nm and does not have any substantial absorption at the wavelength of the laser used to expose the element, the laser exposure taking place through the dye side of the element, and removing the ablated image dye material to obtain an image in the dye-ablative recording element, wherein the infrared-absorbing material is a cyanine dye having a perfluorinated organic counterion.

Abstract: Certain squaric acid derivatives are useful for the thermochemical generation of acid. The squaric acid derivatives may be used in imaging media in conjunction with acid-sensitive materials which undergo a color change when contacted by the acid generated from the squaric acid derivatives. Preferably, the acid-sensitive materials undergo an irreversible color change, so that the image can be fixed by neutralizing all the acid generated with excess base, thereby preventing further color change in the image during long term storage.

Abstract: An infra-red sensitive acid-generating medium comprises a binder, an iodonium salt; and a squarylium dye capable of absorbing infra-red radiation having a wavelength within the range of about 700 to about 1200 nm, the dye having a squarylium ring the 1- and 3-positions of which are each connected, via a single sp.sup.2 carbon atom, to a pyrylium, thiopyrylium, benzpyrylium or benzthiopyrylium nucleus, at least one of the sp.sup.2 carbon atoms having a hydrogen atom attached thereto, and the 2-position of the squarylium ring bearing an O.sup.-, amino or substituted amino, or sulfonamido group.

Abstract: Compounds of formula I ##STR1## wherein n is 0 or 1, p is a number from 1 to 8,q is 2 or 3, andR.sub.1 is unsubstituted phenyl or phenyl which is substituted by one to three halogen, C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.8 alkoxy, C.sub.2 -C.sub.8 alkoxyalkyl or/and C.sub.1 -C.sub.4 alkylthio, are suitable for use as initiators for photopolymerising compounds containing ethylenically unsaturated double bonds.

Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chips and to the improvement of a mask used in its manufacturing process. In other words, the phase of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern, or otherwise a groove is formed in a mask substrate. A phase difference of 180.degree. is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.