Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product Patents (Class 430/269)
  • Publication number: 20040063035
    Abstract: The invention provides a stereolithographic resin composition including a photo-curable component, a resin having a function of causing a reversible, quick sol-gel phase transition based on temperature change, and a filler, and a stereolithographic method using the resin composition.
    Type: Application
    Filed: September 26, 2003
    Publication date: April 1, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kazuhiko Nagano, Yoji Okazaki, Takeshi Fujii, Hiromi Ishikawa
  • Patent number: 6709795
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: March 23, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Patent number: 6703110
    Abstract: A non-skid surface for containers having a generally planar base layer with an upper surface, a lower surface, and a surface area. A plurality of bumps are disposed spaced apart over and projecting upward relative to the upper surface over a substantial portion of the surface area of the base layer. The bumps are shaped and arranged to accept a container placed on the non-skid surface such that a support rim of a bottom of the container registers between bumps and rests solely on the upper surface of the base layer. The bumps are shaped and arranged to accept a container in this manner in a plurality of positions over the surface area. A method of forming the non-skid surface can include selecting at least a size and a shape of a first container bottom rim. A plurality of first container rim locations are plotted in a first repeating location pattern of a desired spacing. Each of the plurality of first container rim locations corresponds to the first container bottom rim size and shape.
    Type: Grant
    Filed: January 28, 2002
    Date of Patent: March 9, 2004
    Assignee: Rubbermaid Incorporated
    Inventor: David M. Stitchick
  • Patent number: 6703189
    Abstract: A method for simultaneously forming microstructures in substrates and altering their chemical character. The method involves exposing a surface portion of a substrate to light source, which is strong enough and of the appropriate wavelength to cause ablation of the substrate. The ablation of the substrate is controlled to form microstructures therein, such as channels. The ablation is conducted under a chemical atmosphere, which causes a change in the chemical functionality of the microstructures. The chemical atmosphere can be a gas, liquid or solid that is provided on the substrate surface. The method can be used to fabricate or modify microfluidic systems.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: March 9, 2004
    Assignee: National Institute of Standards and Technology
    Inventors: Emanuel A. Waddell, Jr., Timothy J. Johnson, Gary W. Kramer, Laurie E. Locascio
  • Publication number: 20040023145
    Abstract: A liquid radiation-curable composition that comprises
    Type: Application
    Filed: July 31, 2002
    Publication date: February 5, 2004
    Applicant: 3D Systems, Inc.
    Inventors: Khalil M. Moussa, Jiaching Liu
  • Publication number: 20040023158
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polyethylene articles.
    Type: Application
    Filed: November 22, 2002
    Publication date: February 5, 2004
    Inventor: John Alan Lawton
  • Patent number: 6685869
    Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer. A process for producing a three-dimensional object which comprises the use of a washing agent having a Hansen-solubility between 27-35 (Mpa)½.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: February 3, 2004
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co. Ltd.
    Inventors: Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi
  • Publication number: 20040013977
    Abstract: A liquid radiation-curable composition that comprises
    Type: Application
    Filed: January 7, 2003
    Publication date: January 22, 2004
    Applicant: 3D Systems, Inc.
    Inventor: Bettina Steinmann
  • Patent number: 6672193
    Abstract: A clearance between an upper knife and a lower knife of a slitter is set at 30 to 100 &mgr;m, and the slitter cuts a sensitized printing plate. In the sensitized printing plate cut by the slitter, there is a shear droop which is 20 to 30 &mgr;m high at the cut part, and a burr which is less than 50 &mgr;m high. If the maximum height of a surface roughness of a cut surface of the sensitized printing plate is 1.2 &mgr;m to 12 &mgr;m on the average, a hydrophilic property of the cut part improves and the stain of a frame can be decreased.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: January 6, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuhiro Annoura, Takanori Masuda, Koichiro Aono, Tsutomu Kato
  • Publication number: 20030232131
    Abstract: In a method and an apparatus for coating an object with photosensitive material, a roller stabilizes a supply amount of the photosensitive material and is disposed between the object and a slit coater, so that the stabilized photosensitive material is supplied to the object through the slit coater. The photosensitive material includes additives for controlling amount of a solid powder, a boiling point and a surface tension thereof. Accordingly, the photosensitive material may be uniformly coated on the object.
    Type: Application
    Filed: May 1, 2003
    Publication date: December 18, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Sung-Ki Jung
  • Patent number: 6664023
    Abstract: A method for the controlled aging of a photoresist which provides an aged photoresist that has a targeted photospeed which is faster than a conventional unaged photoresist is provided. Specifically, the inventive method includes the step of aging a solution containing at least a photoresist resin composition at a temperature below the thermal decomposition of the photoresist resin composition, but not below 20° C., for a time period that is effective in achieving a targeted photospeed which is faster than a photospeed of an unaged photoresist.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: December 16, 2003
    Assignee: International Business Machines Corporation
    Inventors: Laird MacDowell, Erik Puttlitz
  • Publication number: 20030224257
    Abstract: An authenticatable product comprising a non-opaque latent image layer of anisotropic polymer material having background optical properties with a given preferred direction of anisotropy and a given proportion of crystallinity, the latent image layer being treated so as to include: a first localized modification in the latent image layer being associated with a first latent image; and a second localized modification in the latent image layer being associated with a second latent image such that, when viewed directly, the first latent image and the second latent image are indistinguishable from the remainder of the latent image layer and, under polarized visualization, a maximum contrast between the first latent image and the remainder of the latent image layer is actualized at a different orientation of polarized visualization than a maximum contrast between the second latent image and the remainder of the latent image layer.
    Type: Application
    Filed: June 3, 2002
    Publication date: December 4, 2003
    Applicant: Latent Image Technology Ltd.
    Inventor: Andrey Karasev
  • Patent number: 6627376
    Abstract: In stereolithographic apparatus and method, a mask is formed on a light-transmissible member (glass plate) on the basis of stereolithographic data for one layer of photohardenable resin; photohardenable resin of one layer is successively supplied to form an unhardened resin layer of photohardenable resin; if necessary, a film having light transmission is attached onto the unhardened resin layer so as to cover the unhardened resin layer in close contact with the unhardened resin layer; the light-transmissible member having the mask on or above the film; the unhardened resin layer is plane-exposed to light through the mask to harden the photohardenable resin of the unhardened resin layer; and the light-transmissible member and the film are evacuated from the hardened photohardenable resin layer after the exposure by the exposure means, thereby obtaining a desired three-dimensional object through stereolithography. As the photohardenable resin may be used having a melting temperature ranging from 5 to 90° C.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: September 30, 2003
    Assignee: Teijin Seiki Co., Ltd.
    Inventor: Takakuni Ueno
  • Publication number: 20030166840
    Abstract: A composition that expands or contracts upon a change in exposure to light energy is provided that comprises a protein or protein-based polymeric material having an inverse temperature transition in the range of liquid water, wherein at least a fraction of the monomers in the polymer contain an light energy-responsive group that undergoes a change in hydrophobicity or polarity upon a change in exposure to light energy and is present in an amount sufficient to provide a shift in the inverse temperature transition of the polymer upon the change in exposure to light energy. Compositions of the invention, including those further containing a side-chain chemical couple, can be used in a variety of different applications to produce mechanical work, cause turbidity changes, cause chemical changes in an enclosed environment, or transduce other free energies by varying the exposure to light energy on the composition.
    Type: Application
    Filed: January 12, 2001
    Publication date: September 4, 2003
    Inventors: Dan W. Urry, David A. Tirrell, Catherine Jean Heimbach
  • Publication number: 20030157435
    Abstract: The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.
    Type: Application
    Filed: November 6, 2002
    Publication date: August 21, 2003
    Inventors: John W Goodby, Alan W Hall, Keith M Blackwood, Paul E Y Milne, Andrew G Biggs, Ryan M Heath, Robert W Bannister
  • Publication number: 20030157427
    Abstract: The present invention provides a thermal recording material comprising a plurality of layers including at least a thermal recording layer on a support that is characterized in that an intermediate layer composed of gelatin as a binder is provided between at least one pair of two adjacent layers of the plurality of layers. Further, the steps for forming the thermal recording material by coating and drying the respective coating liquids for forming each layer that are characterized in that the drying process of the intermediate layer is performed while controlling wet membrane surface temperature at no higher than 35° C.
    Type: Application
    Filed: September 26, 2002
    Publication date: August 21, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Toshio Hara
  • Publication number: 20030152847
    Abstract: Lithographic printing form precursors comprising positive working polymeric coatings on substrates may during storage or transportation undergo undesirable changes in their imaging properties. It has been found that acceptable properties can be restored by carrying out a heat treatment which involves a relatively short heating stage followed by accelerated cooling.
    Type: Application
    Filed: January 30, 2002
    Publication date: August 14, 2003
    Inventors: Maru Aburano, Shoichi Hotate, Shinji Shimizu, Yasuhiko Kojima
  • Publication number: 20030149124
    Abstract: A radiation curable resin composition suitable for making three dimensional objects comprising at least one epoxy compound, a cationic photoinitiator, wherein the resin composition has a first color or no color before cure and wherein a three dimensional object made from the resin by subjecting the resin to radiation shows a second color which is different from the color of the resin composition before cure.
    Type: Application
    Filed: November 26, 2002
    Publication date: August 7, 2003
    Inventors: Glen A. Thommes, John A. Lawton, Xiaorong You
  • Patent number: 6593388
    Abstract: Enhancement of the rates of cationic polymerizations initiated by onium salts has been achieved through the use of oligomeric and polymeric electron-transfer photosensitizers derived from a polymerizable compound substituted with a polynuclear aromatic group, including epoxides, oxetanes, and ethylenically unsaturated compounds. The polymerizable compound is substituted with residues derived from anthracene, naphthalene, perylene, pyrene, fluorene, carbazole, indole, benzocarbazole, acridone, phenothiazine, and thianthrene, particularly carbazole.
    Type: Grant
    Filed: April 4, 2001
    Date of Patent: July 15, 2003
    Assignee: Renssealer Polytechnic Institute
    Inventor: James V. Crivello
  • Publication number: 20030124467
    Abstract: A process for producing an optical element which has excellent heat resistance and adhesion to a substrate. This process comprises applying a liquid composition for forming an optical element to the molding surface of a substrate having a regular pattern surface consisting of areas having high wettability and areas having low wettability as the molding surface and curing the composition to form projections in the areas having high wettability. A solution containing at least one compound selected from the group consisting of a hydrolyzable compound which can be hydrolyzed and polycondensed and a hydrolyzed/polycondensed product thereof is used as the liquid composition for forming an optical element.
    Type: Application
    Filed: October 31, 2002
    Publication date: July 3, 2003
    Inventors: Tsutomu Minami, Masahiro Tatsumisago, Kiyoharu Tadanaga, Atsunori Matsuda, Mitsuhiro Kawazu, Hiroaki Yamamoto, Koichiro Nakamura
  • Patent number: 6586494
    Abstract: A radiation-curable inkjet composition for forming 3-D models or images comprising a semi-crystalline or crystalline, low-shrinkage, radiation-curable oligomeric material, a photoinitiator, and a diluent, said inkjet composition having a viscosity of between about 10 to about 50 cps at at least one temperature between 50 to 140° C.
    Type: Grant
    Filed: August 8, 2001
    Date of Patent: July 1, 2003
    Assignee: Spectra Group Limited, Inc.
    Inventors: Alexandre Mejiritski, Oleg V. Grinevich, Dustin B. Martin, Douglas C. Neckers
  • Publication number: 20030104313
    Abstract: The present invention provides compositions comprising a cationically curable component and a substantially compatible free radical polymerizable component. Compatible free radical polymerizable components include alkoxylated free radical polymerizable components. Objects obtained by curing the present compositions, for instance by rapid prototyping the compositions, have an improved clarity.
    Type: Application
    Filed: March 6, 2002
    Publication date: June 5, 2003
    Inventor: John A. Lawton
  • Patent number: 6569373
    Abstract: Compositions for use in the manufacture of 3-D objects including compositions for use as a support and/or release material in the manufacture of said 3-D objects are provided. The compositions for use in the manufacture of 3-D objects comprise at least one reactive component, at least one photo-initiator, at least one surface-active agent and at least one stabilizer. The compositions for use as a support and/or release material comprise at least one non-reactive and low-toxicity compound, at least one surface-active agent, at least one stabilizer and optionally at least one reactive component and at least one photo-initiator. Methods for manufacturing a 3-D object using the compositions of the present invention are also provided.
    Type: Grant
    Filed: March 12, 2001
    Date of Patent: May 27, 2003
    Assignee: Object Geometries Ltd.
    Inventor: Eduardo Napadensky
  • Publication number: 20030072886
    Abstract: A method of forming a liquid film characterized by dropping a liquid on a substrate from a dropping unit while rotating the substrate, moving the dropping unit in the radial direction from the inner periphery of the substrate to the outer periphery of the substrate so that the move pitch of the dropping unit in the radial direction occurring in every revolution of the substrate may change slightly, and forming a liquid film on the substrate by adjusting the feed speed of the liquid to the substrate from the dropping unit, while lowering the rotational frequency of the substrate gradually, so that the liquid on the substrate may not move due to centrifugal force by rotation of the substrate, along with the move of the dropping unit in the radial direction of the substrate.
    Type: Application
    Filed: July 25, 2002
    Publication date: April 17, 2003
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventor: Shinichi Ito
  • Publication number: 20030068584
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Application
    Filed: November 18, 2002
    Publication date: April 10, 2003
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Publication number: 20030059686
    Abstract: A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body.
    Type: Application
    Filed: September 12, 2001
    Publication date: March 27, 2003
    Inventors: Hironori Kobayashi, Masato Okabe, Manabu Yamamoto
  • Publication number: 20030059708
    Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer.
    Type: Application
    Filed: May 30, 2002
    Publication date: March 27, 2003
    Inventors: Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi
  • Patent number: 6537721
    Abstract: A phase change optical recording medium is provided wherein the power of the laser beam per unit area required in the initialization is reduced. The optical recording medium has a phase change recording layer satisfying the relations: AI≦8.0%, and CI/AI≧3.0 when the medium is initialized with a light beam having a wavelength &lgr;I, and said recording layer exhibits a reflectivity AI in amorphous region and a reflectivity CI in crystalline region at said wavelength &lgr;I.
    Type: Grant
    Filed: February 14, 2000
    Date of Patent: March 25, 2003
    Assignee: TDK Corporation
    Inventors: Hiroyasu Inoue, Makoto Takahashi, Hajime Utsunomiya
  • Publication number: 20030003405
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Application
    Filed: August 29, 2002
    Publication date: January 2, 2003
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Publication number: 20030003380
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Application
    Filed: August 29, 2002
    Publication date: January 2, 2003
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Patent number: 6498226
    Abstract: This invention provides cycloaliphatic polyimide having the following formula (I): wherein 1 and n are integers from 4 to 7; m is an integer from 0 to 2; p is an integer from 1 to 8; polycyclic aliphatic compound R reprents C1-8 cycloalkyl, cycloalkenyl, cycloalkynyl, norbornenyl, decalinyl, adamantanyl, or cubanyl. That cycloaliphatic polyimide can be a through transparent film, their thermal stability is over 430° C. and dielectric constant is about 2.7.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: December 24, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Wen-Ling Lui, Chih-Hsiang Lin, Wei-Ling Lin, Woan-Shiow Tzeng
  • Publication number: 20020177073
    Abstract: The present invention relates to stereolithographic compositions containing an actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, and at least one cationic reactive modifier containing at least two reactive groups per molecule or at least one polyether polyol or mixtures thereof. The cationic reactive modifier has at least one chain extension segment with a molecular weight of at least about 100 and not more than about 2,000. The polyether polyol has a molecular weight greater than or equal to about 4,000. The use of the cationically reactive modifiers and polyether polyol modifiers substantially increases the flexibility and toughness of the cured articles without compromising photospeed, accuracy and wetting-recoatability of the compositions. The present invention further relates to a method of producing a cured product, particularly three-dimensional shaped articles by treating the composition described above with actinic radiation.
    Type: Application
    Filed: June 13, 2002
    Publication date: November 28, 2002
    Inventors: Anastasios P. Melisaris, Wang Renyi, Thomas H. Pang
  • Publication number: 20020177065
    Abstract: A method of utilizing laser energy to mark on a coated substrate is disclosed, wherein the coating is dried at a temperature below that necessary to permanently affix the coating to the substrate prior to the coated substrate being exposed to said laser energy. The dried coating is selectively removed by the laser energy in precise patterns that can be quickly and widely varied. The method of the present invention can be incorporated as a component of time-critical manufacturing processes.
    Type: Application
    Filed: March 21, 2001
    Publication date: November 28, 2002
    Inventor: Hussein M. Sahi
  • Publication number: 20020170897
    Abstract: The present invention relates to the use of a laser to remove surface contamination and oxidation from a ball grid array substrate. The laser etching can be configured to cover the entire substrate or pinpointed to the epoxy molding compound/solder resist (EMC/SR) interfaces. Additionally, a laser can be used to roughen the surface of a substrate to provide better adhesion when attaching the die to the substrate.
    Type: Application
    Filed: May 21, 2001
    Publication date: November 21, 2002
    Inventor: Frank L. Hall
  • Patent number: 6482576
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Grant
    Filed: August 8, 2000
    Date of Patent: November 19, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Publication number: 20020160309
    Abstract: The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof.
    Type: Application
    Filed: May 14, 2002
    Publication date: October 31, 2002
    Applicant: VANTICO INC.
    Inventors: Thomas H. Pang, Anastasios P. Melisaris, Wang Renyi, John W. Fong
  • Publication number: 20020150368
    Abstract: In a polymer waveguide comprising a cladding layer with a low refractive index and a core layer with a high refractive index of a substantially rectangular section covered with the cladding layer, the core layer and a side cladding layer constituting the cladding layer in its portion located on both sides of the core layer are formed of a material comprising a branched polysilane compound containing a silicone compound. By virtue of this constitution, the polymer waveguide has a low loss and causes no significant change in optical characteristics upon a change in ambient temperature.
    Type: Application
    Filed: March 22, 2002
    Publication date: October 17, 2002
    Applicant: HITACHI CABLE, LTD.
    Inventor: Katsuyuki Imoto
  • Patent number: 6465540
    Abstract: An ultraviolet curable resin composition includes (A) an ultraviolet curable resin, (B) an epoxy compound having at least two epoxy groups in one molecule, (C) a photopolymerization initiator and (D) a diluent. The ultraviolet curable resin (A) is obtained by the steps of polymerizing an ethylenically unsaturated monomer component containing (a) an ethylenically unsaturated monomer having epoxy group and (b) a compound having at least two ethylenically unsaturated groups in one molecule to prepare a copolymer, reacting the copolymer with (c) an ethylenically unsaturated monomer having carboxyl group to prepare a chemical intermediate, and reacting the chemical intermediate with (d) one of saturated and unsaturated polybasic acid anhydrides. This resin composition will be preferably used to prepare a photo solder resist ink developable with diluted alkaline aqueous solution.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: October 15, 2002
    Assignee: Goo Chemical Co., Ltd.
    Inventors: Tatsuya Kubo, Masatoshi Fujimoto, Soichi Hashimoto
  • Publication number: 20020132872
    Abstract: Photocurable resin composition for photofabrication of three-dimensional objects comprising
    Type: Application
    Filed: October 18, 2001
    Publication date: September 19, 2002
    Inventors: Tetsuya Yamamura, Yukitoshi Kato, Takayoshi Tanabe, Takashi Ukachi
  • Publication number: 20020123002
    Abstract: A coating film 2 of an uncured resin composition which is curable in response to irradiation with an energy beam is formed on the surface of a molding 1. A desirable portion of the coating film 2 is irradiated with the energy beam. Thus, the portion of the coating film 2 irradiated with the energy beam is cured to form a surface decorative layer 3.
    Type: Application
    Filed: October 29, 2001
    Publication date: September 5, 2002
    Applicant: MATSUSHITA ELECTRIC WORKS, LTD.
    Inventors: Mikio Masui, Keiji Higashi
  • Patent number: 6432607
    Abstract: A photocurable resin composition capable of producing a three-dimensional object which has excellent dimensional accuracy with a small volume shrinkage factor and excellent heat resistance with a high heat distortion temperature as well as excellent transparency and mechanical properties. This composition comprises at least one imidated acrylic compound (i) represented by the following formula: wherein R1 is an alicyclic group, an aromatic group or an aliphatic group which may be substituted, R2 is a residual group of amino alcohol, R3 is hydrogen atom or methyl group, and n is 1 or 2; (ii) a radical polymerizable compound and/or a cationic polymerizable compound other than the above imidated acrylic compound; and (iii) a photopolymerization initiator. The weight ratio of the imidated acrylic compound to the radical polymerizable compound and/or cationic polymerizable compound is 80:20 to 10:90.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: August 13, 2002
    Assignees: Teijin Seiki Co., Ltd., Toagosei Co., Ltd.
    Inventors: Yorikazu Tamura, Tsuneo Hagiwara, Makoto Ohtake
  • Publication number: 20020106577
    Abstract: Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without causing gelation, and a method of forming a copper pattern, a circuit board and a ceramic multilayer substrate using the photosensitive copper paste. The photosensitive copper paste includes a mixture of an organic binder having an acid functional group, a copper powder and a photosensitive organic component. The copper powder has a surface layer having a thickness of at least 0.1 &mgr;m from the surface composed CuO as a main component. The copper powder also has an oxygen content of about 0.8% to 5% by weight.
    Type: Application
    Filed: November 30, 2001
    Publication date: August 8, 2002
    Applicant: Murata Manufacturing Co., Ltd.
    Inventor: Masahiro Kubota
  • Publication number: 20020106584
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles.
    Type: Application
    Filed: September 10, 2001
    Publication date: August 8, 2002
    Inventors: John A. Lawton, Chander P. Chawla
  • Patent number: 6420075
    Abstract: The present invention relates to a microminiaturization technique to achieve the miniaturization and higher integration of IC chip and to the improvement of a mask used in its manufacturing process. In other words, the phases of lights transmitted through the mask is controlled within one mask pattern. Specifically, a transparent film is formed in such a manner that it covers a mask pattern along a pattern formed by magnifying or demagnifying the mask pattern or otherwise a groove is formed in a mask substrate. A phase difference of 180° is generated between the lights transmitted through the mask substrate and the transparent film or the groove, causing interference with each light to offset each other. Therefore, the pattern transferred onto a wafer has an improved resolution, being used in the invention.
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: July 16, 2002
    Assignee: Hitachi, Ltd.
    Inventor: Yoshihiko Okamoto
  • Patent number: 6416773
    Abstract: The invention relates to cosmetic or dermatological preparations comprising a) 0.1 to 10% by weight of one or more 3,3-diphenylacrylates of the formula I, and b) 0.1 to 10% by weight of one or more dibenzoylmethane derivatives of the formula II, in which the substituents R1 to R10 independently of one another have the meanings given in the description.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: July 9, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Thomas Heidenfelder, Volker Schehlmann, Thomas Wünsch, Wilma M. Dausch
  • Publication number: 20020086247
    Abstract: A method for providing color to a stereolithographically produced model is disclosed. This method comprises obtaining data representing the model, such that the data is readable by a stereolithographic model generating machine for solidifying layers of a liquid resin in a vat creating resin layers to create successive cross sections of the model. Each of the resin layers are exposed with energy effective for solidifying the resin. One or more portions of at least one of the resin layers are overexposed with an energy according to a coloring or shading indicated in the data. The model is heated with an effective amount of heat to induce a color or shading change in substantially only the overexposed portions of the model. The model is removed from the vat and cleaned. Next, the model can be exposed to an energy source, followed by the finishing of the model.
    Type: Application
    Filed: September 21, 2001
    Publication date: July 4, 2002
    Inventor: Dorsey D. Coe
  • Patent number: 6413696
    Abstract: The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof.
    Type: Grant
    Filed: June 22, 2000
    Date of Patent: July 2, 2002
    Assignee: Vantico Inc.
    Inventors: Thomas H. Pang, Anastasios P. Melisaris, Wang Renyi, John W. Fong
  • Publication number: 20020081505
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles.
    Type: Application
    Filed: January 4, 2002
    Publication date: June 27, 2002
    Applicant: DSM Desotech Inc.
    Inventors: John A. Lawton, Chander P. Chawla
  • Patent number: 6379866
    Abstract: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: April 30, 2002
    Assignee: DSM Desotech Inc
    Inventors: John A. Lawton, Chander P. Chawla
  • Publication number: 20020048717
    Abstract: The present invention relates to a photocurable liquid resin composition comprising: (A) a cationically polymerizable organic compound; (B) a cationic photopolymerization initiator; (C) an ethylenically unsaturated monomer; (D) a radical photopolymerization initiator; (E) a polyether polyol compound having one or more hydroxyl groups in one molecule; and, optionally, includes elastomer particles having a specific particle diameter and/or an epoxy-branched alicyclic compound.
    Type: Application
    Filed: August 8, 2001
    Publication date: April 25, 2002
    Inventors: Tetsuya Yamamura, Akira Takeuchi, Tsuyoshi Watanabe, Takashi Ukachi