Abstract: An apparatus for manufacturing an optical disc master, having (a) a turntable upon which is received a disc having a resist layer composed of a resist material, the resist material comprising an incomplete oxide of a transition metal on a substrate, the oxygen content of the incomplete oxide being smaller than the oxygen content of the stoichiometric composition corresponding to a valence of the transition metal, which increases the absorption of ultraviolet rays and visible light rays, the resist material being an amorphous inorganic material containing an oxide; and (b) an exposure system operatively configured to selectively expose the resist layer to ultraviolet rays or visible light.

Abstract: A printer comprises a print mechanism and a wireless communication module including a wireless transceiver and a configuration module. The configuration module is adapted to electronically query at least one available wireless device to determine at least one wireless security parameter of the at least one available wireless device and to receive a response from the queried at least one available wireless device, via the wireless transceiver, for configuring the printer for wireless association in a wireless computing network including the at least one available wireless device.

Abstract: A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.

Abstract: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

Abstract: Fiducials having substantially continuous portions made on a substrate allow the position of the substrate to be determined. An approach for making fiducials involves moving first and second fiducial devices together back and forth across the substrate along a trajectory having a component along the lateral axis of the substrate while the substrate and the first and second fiducial devices are in relative motion along the longitudinal axis of the substrate. The first fiducial device operates to make one fiducial on the substrate during the movement along the trajectory and the relative motion. The second fiducial device operates to make another fiducial on the substrate during the movement along the trajectory and the relative motion. The fiducials may be formed so that they have a constant spatial frequency with the first fiducial being out of phase with respect to the second fiducial.

Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.

Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.

Abstract: A printing apparatus with low cost which precisely positions a lenticular sheet while not lowering the usage efficiency of the sheet may be provided. When a margin area is not intentionally formed at an edge portion of a lenticular sheet, based on the print data and the lenticular sheet size, an area serving as an image forming area will certainly be set even with the misalignment in print position of an image. When a margin area is intentionally formed at an edge portion of the lenticular sheet, based on the print data i.e. the set value of the margin area and the lenticular sheet size, the area serving as an image forming area will certainly be set even with the misalignment in print position of an image is calculated. An edge portion of the area necessarily serving as an image forming area obtained by steps S14 and S16 will be determined as the print position of a detection pattern.

Abstract: A detector to measure a property of radiation is disclosed. The detector comprises first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal.

Abstract: A liquid application device capable of applying liquid to different size medium includes a transfer device for transferring the medium, a regulating member for regulating a transferring position of the transferred medium, and a liquid applicator including an application member for applying liquid to the medium transferred by the transfer means and a retention member for retaining the liquid in a liquid retention space which is formed by causing the retention member to abut on the application member. In addition, a storage device stores the liquid, a supply channel supplies the liquid in the storage device to the liquid retention space, a collection channel collects the liquid in the liquid retention space into the storage device, and a supply port is formed in the retention member and is connected to the supply channel. Also, a collection port is formed in the retention member and is connected to the collection channel, and a pump generates a flow of liquid in a liquid channel.

Abstract: This invention provides method and apparatus for performing chemical and biochemical reactions in solution using in situ generated photo-products as reagent or co-reagent. Specifically, the method and apparatus of the present invention have applications in parallel synthesis of molecular sequence arrays on solid surfaces.

Abstract: The invention relates to detecting targets located within patterns. The invention operates in the pupil plane by filtering the fourier transform from the surrounding pattern. In particular the method includes performing a fourier transform on reflected radiation data to form fourier transform data; removing portions of the fourier transform data which correspond to the target to form reduced fourier transform data; interpolating the portions of the reduced fourier transform data which were removed, to form product fourier transform data; and subtracting the product fourier transform data from the fourier transform data.

Abstract: Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.

Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.

Abstract: The present invention provides a circuit interrupting device which is capable of providing protection against electrical surge through its innovative electrical discharge design; establishing or discontinuing electrical continuity among the input power source, output load, and user accessible load through its innovative contacts connection/disconnection design; automatic or manual testing of the condition of the key components in the circuit interrupting device by way of a simulated leakage current; and testing whether the device is properly wired by way of a reset switch.

Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.

Abstract: An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

Abstract: A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

Abstract: Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.

Abstract: An LED-based UV illuminator is disclosed that includes a plurality of LED light sources that emit UV light, and a plurality of dichroic mirrors. The dichroic mirrors are arranged relative to the LED light sources and configured to direct the UV light along a common optical path. A light homogenizer, such as a light pipe, is arranged along the common optical path and acts to homogenize the UV light. The UV illuminator has a collection efficiency of greater than 50% and an illumination output equal to or greater than 850 mW/mm2. Lithography systems that utilize the LED-based UV illuminator are also disclosed.

Abstract: An image sensing and printing device includes a housing. An area image sensor is positioned on the housing for sensing a viewed image to be printed on media and for generating pixel data representing the viewed image. A printing mechanism is arranged on the housing. The printing mechanism defines a media feed path and includes a printhead assembly that includes a pagewidth printhead having at least one printhead chip that spans the media feed path. A feed mechanism feeds media along the media feed path so that the printhead can carry out a printing operation on the media. A processor is positioned in the housing. The processor includes processing circuitry. An image sensor interface is connected to the processing circuitry for receiving pixel data from the image sensor, converting the pixel data into an internal format and writing the converted pixel data to the processing circuitry. The processing circuitry is configured to convert the pixel data to print image data.

Abstract: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

Abstract: The information processing method of the present invention is provided that specifies an extraction period for extracting apparatus data to be generated by an industrial apparatus and analyzes a state of the industrial apparatus based on the apparatus data having an occurrence time within the extraction period. The information processing method includes a period changing step of changing the extraction period so as to enable the apparatus data required for the analysis of the state to be included, when the apparatus data required for the analysis of the state is not included within the extraction period.

Abstract: An aperiodic multilayer structure (2, 2?) comprising a plurality of alternating layers of a first (4, 4?) and a second (6, 6?) material and a capping layer (10, 10?) covering these alternating layers, wherein the structure (2, 2?) is characterized in that the thickness of the alternating layers chaotically varies in at least a portion of said structure (2, 2?). The invention further comprises design method comprising the step of define a time interval and a first plurality of periodic multilayer structures (A), then calculate a first merit function (?R(?)10*I(?)d?) and define a first domain for each first structures. The method further includes the step of apply at least one random mutation to each first structures inside the associated first domain and calculate a second merit function (?R(?)10*I(?)d? for the at least one mutation.

Abstract: A method of assembling composite structures from objects in fluid includes providing a plurality of objects, each having a preselected size, shape, and spatial distribution of surface structural features characterizing a surface roughness; dispersing the objects into the fluid; and introducing a depletion agent. The depletion agent includes a plurality of particles having a size distribution preselected causing an attractive force arising from a depletion attraction between at least a first object and second object of the plurality in at least one relative position and orientation based on the preselected spatial distribution of surface structural features on the first and second objects, and the depletion attraction between the first and second objects forms at least one rigid bond or slippery bond at or proximate to respective surface portions based on the preselected spatial distribution of surface structural features on the first and second objects to form a two-object composite structure.

Abstract: A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values.

Abstract: A portable communication device and method of use is provided. In one embodiment, the method of using a handheld mobile telephone includes capturing a plurality of images via an image input device; storing the plurality of images in a memory, receiving a first speech input, identifying command information in said first speech input; retrieving information from memory based, at least in part, on the command information. The method may further include generating a request related to an article of commerce that includes, at least in part, the information retrieved from memory, determining a destination for transmitting the request, and wirelessly transmitting said request through a mobile telephone network to the destination.

Abstract: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.

Abstract: A wavelength shift measuring apparatus of the present invention is a wavelength shift detection sensor (WLCD1) which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter (BS2) splitting the light beam emitted from the light source into a plurality of light beams and to synthesize two light beams among the plurality of light beams to generate an interference light, a spacer member (SP) provided so that an optical path length difference of the two light beams split by the beam splitter (PBS2) is constant, and a plurality of photoelectric sensors (PD) detecting the interference light generated by the beam splitter (BS2). The plurality of photoelectric sensors (PD) output a plurality of interference signals having phases shifted from one another based on the interference light to calculate a wavelength shift using the plurality of interference signals.

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.

Abstract: A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal or a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of either the patterning support or the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.

Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

Abstract: An arithmetic apparatus connected to a communication net connected to a vibration isolation device. The apparatus includes a reception unit that receives seismic information via the communication net from a seismic observation device, an estimation unit that estimates seismic vibration which will arrive at the vibration isolation device, on the basis of the seismic information received by the reception unit, and a transmission unit that transmits information on the seismic vibration estimated by the estimation unit to the vibration isolation device via the communication net.

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of rotationally symmetric disk materials, like magnetic and optical disks, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cone. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the disk is in contact or close proximity with the disk. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cone surface comprises metal nano holes or nanoparticles.

Abstract: An apparatus including: a reception section to receive operation information from an operation terminal; a display section; and a controller that selectively executes a first control to display in the display section an operation screen corresponding to the operation information received by the reception section, and a second control not to display the operation screen.

Abstract: A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or more first magnets arranged on the first movable object and configured to cooperate with the first coil assembly, and one or more second magnets arranged on the second movable object and configured to cooperate with the second coil assembly.

Abstract: An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference fringe formed by the interferometer when a location of a movable element of the interferometer in an optical axis direction of the optical system is a first location, a second acquisition step of acquiring a second interference fringe formed by the interferometer when the location of the movable element in the optical axis direction is a second location different from the first location, a determination step of determining a pupil-center coordinate of the optical system based on the acquired first interference fringe and the acquired second interference fringe, and a computation step of computing the optical characteristic of the optical system using the pupil-center coordinate determined in the determination step.

Abstract: The present invention relates to an ink reservoir for being received within the former of a printer roll. The reservoir includes a first portion defining one or more channels for each providing ink to a respective output port. A second portion is also provided which bears one or more ink bladders for each containing a respective type of ink. In use, each ink bladder is in fluid communication with a respective channel.

Abstract: The present invention provides an exposure apparatus including a measuring unit which includes an imaging optical system configured to guide light having propagated through a projection optical system to an image sensor, and is configured to measure the overall birefringence of the imaging optical system and the projection optical system, a calibration unit which is set on a side of an object plane of the projection optical system in order to measure a birefringence of the imaging optical system, and is configured to reflect the light from the measuring unit back to the measuring unit without using the projection optical system, and a calculation unit configured to isolate, from the result of measuring the overall birefringence, the birefringence of the imaging optical system measured by the measuring unit, thereby calculating the birefringence of the projection optical system.

Abstract: In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a passive noise damper configured to dampen gas borne noise caused by movement of a movable part of the lithographic apparatus.

Abstract: The disclosure relates to a support structure for an optical element and an optical element module including such a support structure. The disclosure also relates to a method of supporting an optical element. The disclosure may be used in the context of photolithography processes for fabricating microelectronic devices, such as semiconductor devices, or in the context of fabricating devices, such as masks or reticles, used during such photolithography processes.

Abstract: A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable object. The position measuring system includes an optical x-z-encoder configured to measure a displacement of a radiation source, a first grating, and a detector with respect to a second grating of the encoder. The first grating includes an alignment marker. A controller is configured to define a zero level of the moveable object with respect to the reference frame in at least one of the x- and z-direction by performing the scanning along the first grating, the alignment marker during the scanning step causing changes in the phase of the response of both the first positive and negative orders.

Abstract: Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

Abstract: In an image formation system, at least two copying machines are connected to each other. One of these machines functions as a master machine and the other functions as a slave machine. When the link copy mode is set in the master machine and when the user tries to select an operation mode which can not be executed in the master and slave machines concurrently, then copying is prohibited.

Abstract: A pair of support members each having a spring section in a part thereof support a mirror element, and a pair of drive mechanisms arranged respectively corresponding to a pair of the support members transform the spring sections of the corresponding support members, thereby changing a distance between each of support points at which the support members support the mirror element and a base. Accordingly, the mirror element can be translated by driving all of the drive mechanisms, or the mirror element can be inclined with respect to the base by driving some of the drive mechanisms.

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract: A solid-state imaging apparatus includes a plurality of unit cells, each including a plurality of pixels having mutually different color components and a first selecting unit outputting one of the signals from the plurality of pixels selectively. The unit cells are classified into groups. The solid-state imaging apparatus further includes holding units, each provided to each of the unit cells and holding the signal output from the first selecting unit, a plurality of common output lines for outputting signals of mutually different color components, and second selecting units, each selecting one of the plurality of common output lines to output the signals held in the holding unit to the selected common output line. The first selecting units severally output a signal of a different color component from each of the unit cell groups.

Abstract: A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described. According to the method and the equipment, a semiconductor substrate is irradiated with a particle beam through an opening formed in a thin film portion of a stencil mask having the thin film portion and a supporting portion supporting the thin film portion. The method and the equipment are controlled so that the supporting portion of the stencil mask can be irradiated with the fringe of the particle beam. As a result, the method and the equipment provide suppressing deterioration such as deformation or breakage of the stencil mask.