Abstract: After forming a resist film made from a chemically amplified resist material, pattern exposure is carried out by irradiating the resist film with exposing light while supplying, between a projection lens and the resist film, a solution of water (having a refractive index of 1.44) that includes an antifoaming agent and is circulated and temporarily stored in a solution storage. After the pattern exposure, the resist film is subjected to post-exposure bake, and the resultant resist film is developed with an alkaline developer. Thus, a resist pattern made of an unexposed portion of the resist film can be formed in a good shape.

Abstract: An image recording device for exposing a sheet of photosensitive material is disclosed. The device has a plurality of roller pairs disposed upstream and downstream with respect to a conveyance direction of the photosensitive material. The plurality of roller pairs nip and convey the photosensitive material, ensuring flatness of the material at an exposure position. The device also has a support member that supports a back surface of the photosensitive material. The device also has a plurality of pressing members, disposed between pressing roller pairs, which press the photosensitive material against the support member. The device also has a release mechanism which causes the nipping and release of nipping by at least one of the roller pairs and the pressing and release of pressing by the pressing member.

Abstract: A method for fabricating a semiconductor device and an equipment for fabricating the semiconductor device are described.

Abstract: A digital camera capable of performing accurate document reading, and a document processing system utilizing the digital camera. In the document processing system, a document is divided into blocks and each block is sensed by a CCD 103; perspective correction is performed on the image data of each of the plurality of images obtained by divisionally sensing the document; and OCR process is performed on the corrected image data to convert the corrected image data to text data. The converted text data, corresponding to the image data of each of the plurality of images, is combined into one text data, and the combined text data is outputted for printing.

Abstract: A focus monitoring method of the invention is characterized by transferring the pattern of a photo mask for phase shift focus monitor onto a photoresist on a semiconductor substrate by using modified illumination. Photo mask for phase shift focus monitor has first and second light transmitting portions which are adjacent to each other while sandwiching a shielding pattern, and is constructed so that a phase difference other than 180 degrees occurs between exposure light passed through the first light transmitting portion and exposure light passed through the second light transmitting portion. Consequently, a focus monitoring method, a focus monitor system, and a semiconductor fabricating method with high detection sensitivity in the z direction and which do not require changing of an illumination aperture can be achieved.

Abstract: A substrate supporting film to be etched is held on a rotating stage. Ultraviolet light having a wavelength of 200 nm or shorter radiated from first lamps irradiates the film in air, thereby removing organic coatings from the film and making the surface of the film hydrophilic. A chemical solution applied to the hydrophilic film while rotating the substrate. Ultraviolet light having a wavelength longer than 200 nm is radiated from second lamps and onto the film through the chemical solution.

Abstract: An image printing apparatus includes a print head for printing images. A microcontroller that includes a wafer substrate is provided. Processor circuitry is positioned on the wafer substrate. Print head interface circuitry is also positioned on the wafer substrate and is connected between the processor circuitry and the print head. The print head interface circuitry is configured to facilitate communication between the processor circuitry and the print head. Bus interface circuitry that is discrete from the print head interface circuitry is connected to the processor circuitry so that the processor circuitry can communicate with devices other than the print head via a bus.

Abstract: An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.

Abstract: A reproduction process filming the painting or photograph to be reproduced; preparing the support onto which the image will be reproduced by formation onto the support of a base coat or film, normally obtained with paints; projecting the image to be reproduced onto the support; carrying out brush strokes of paint originating reliefs over the base coat, duplicating the ones in relief on the projected image; placing the treated support in the printing machine by centering the image projected on it in order for the brush strokes in relief to coincide with the corresponding ones of the projected image; printing the imitated image onto the support over the base coat and the reliefs; and treating the reproduced image with transparent coats.

Abstract: A system and method are described for modifying an exposure image in a radiation sensitive layer with a heterogeneous and non-uniform post exposure thermal treatment. The treatment may include providing different thermal flux to different regions of the radiation sensitive layer to concurrently create different temperatures in those regions. The different temperatures may cause different physicochemical transformation of the regions that may be used to reduce critical dimension errors in those regions. A post exposure bake hot plate may be configured to provide heterogeneous radiant energy flux to a radiation sensitive layer by providing adjustable spacers that adjust a separation distance between the hot plate and the layer. The adjustable spacers may be adjusted prior to exposure image modification by using an adjustment plate having openings to provide access to and adjustment of the adjustable spacers.

Abstract: An optical scanning apparatus that includes a light source, a polygon mirror for deflecting a plurality of light beams emitted from the light source, and an image focusing system for causing the light beams deflected by the polygon mirror to form spots on surfaces of a plurality of photosensitive drums, wherein the image focusing system is disposed between the polygon mirror and the photosensitive drums, and includes scanning lenses for causing the beams deflected by the polygon mirror to form spots on the respective surfaces of the photosensitive drums, and the central axes of the scanning lenses are spaced a predetermined distance from optical axes extended from the center of the light source.

Abstract: A mask and its application in sequential lateral solidification (SLS) crystallization of amorphous silicon are provided. The mask includes a light absorptive portion for blocking a laser beam and a plurality of stripe-shaped light transmitting portions for passing the laser beam. Each stripe-shaped light transmitting portion is rectangular-shaped, and each light-transmitting portion includes triangular-shaped or semicircular-shaped edges on both sides. The distance between the adjacent light transmitting portions is less than the width of the light transmitting portion. The width of the light transmitting portions is less than or equal to twice the maximum length of lateral grain growth that is to be grown by sequential lateral solidification (SLS).

Abstract: An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity adjuster including a substrate provided to be substantially parallel to the multi-axis electron lens, and a lens-intensity adjusting unit operable to adjust the lens intensity of the multi-axis electron lens applied to the electron beams passing through the lens openings, respectively.

Abstract: The transfer apparatus transfers an image displayed in an image display area of an image display unit of transmission type to an image forming area of a light-sensitive recording medium by means of light passing through the image display unit. The apparatus has an image processing section by means of which either a size or a display position of the image to be displayed in the image display area or both are adjusted prior to image display in accordance with either a size of the image forming area or a relative position of the image forming area with respect to the image display area or both.

Abstract: The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.

Abstract: A resin layer including a benzophenone compound is formed on a surface of a glass substrate, and a photoresist layer is formed on a surface of the resin layer. The photoresist layer is irradiated with a laser beam with a wavelength of 100 nm to 300 nm to form a latent image, and a resist pattern with recessed and protruding parts are formed in the photoresist layer by developing the photoresist layer in which the latent image has been formed.

Abstract: The present invention discloses a lithographic apparatus, a device manufacturing method, and a robotics system capable of specifying a trajectory to be followed by a substrate relative to a radiation beam comprising a position and/or an orientation as a function of time. The specified trajectory is characterized as a mathematical smooth function up to at least the third order which connects a first state and a second state, wherein both the first state and the second state comprise boundary values for at least the position and/or the orientation and for first and second derivatives of the position and/or orientation.

Abstract: A film fixing instrument for fixing films of different scales comprises: a loader for loading said films and comprising a loader window, said loader comprising a plurality of couplers on the sides of said loader window; an adjuster for adjusting said loader window, said adjuster comprising a plurality of fixers coupled with said a plurality of couplers, said loader selectively installed on said loader; a film clip for securing said films on said film fixing instrument. The films of different scales can be fixed on said film fixing instrument by adjusting the coupling method between said adjuster and said loader.

Abstract: Based on the information about the capability of a first exposure apparatus of correcting the distortion of a first mask transferred a wafer, the image forming characteristics of a second exposure apparatus is adjusted. Therefore, image forming characteristics can be appropriately adjusted (decreasing the correction residual error), considering the distortion of the pattern image of the first mask transferred onto the wafer by the first exposure apparatus. That is, in order to properly transfer the pattern of a second mask onto the wafer by using the second exposure apparatus, the image forming characteristics of the second exposure apparatus are so adjusted that the distortion of the image of the pattern of the second mask is almost the same of that of the first mask. Hence, good image registration is realized.

Abstract: Disclosed are systems and methods for facilitating printing through interface exportation. In one embodiment, a system and method pertain to exporting an imaging device-specific interface to a computing device, receiving printing selections entered by a user using the exported interface, and facilitating printing in accordance with the printing selections.

Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.

Abstract: A print-order receiving apparatus is capable of receiving a customer's order for photographic prints through a recording medium electronically recording image data therein. The apparatus includes a box-like apparatus body, a slot formed in the apparatus body for attaching the recording medium and a reading driver unit for reading the image date from the recording medium as attached in the slot. The slot defines an aperture plane with its peripheral edges, the aperture plane being upwardly inclined.

Abstract: Disclosed is an exposure method which includes the steps of closely contacting, to a workpiece, a mask having an opening formed with lengthwise directions extending in orthogonal directions, and projecting, onto the mask, exposure light being polarized in a direction other than the directions mentioned above.

Abstract: A reticle or mask for use in projecting a circuit pattern, having a transparent substrate with a reflective or dielectric layer thereon. An opaque or blocking layer is placed over the reflective layer. The opaque layer then has a predetermined circuit pattern etched therein. In one embodiment, the opaque layer and the reflective layer are the same size. In another embodiment, the opaque layer has a size larger than the reflective layer. This permits the opaque layer to be adjacent the substrate, which is advantageous when projection optics having a high numerical aperture are used. The reticle of the present invention has particular advantage when using source wavelengths of between 157 nanometers and 365 nanometers. The reflective layer or land has a reflectance greater than chrome, and preferably greater than sixty percent. Therefore, the reflective layer greatly reduces reticle warm-up and thermal distortion.

Abstract: Microlithography reticles are disclosed that include a high-contrast reticle-identification code (bar code). The bar code is configured as a pattern (usually linearly arrayed) of high-scattering regions (bar-code elements) each exhibiting a relatively high degree of reflection-scattering of irradiated probe light. The high-scattering regions are separated from one another by respective low-scattering regions each exhibiting a relatively low degree of reflection-scattering of incident probe light. For example, the low-scattering regions have smooth surfaces from which very little probe light is reflection-scattered, wherein each high-scattering region includes multiple scattering features such as line, channels, projections, or the like that provide multiple edges and/or points that reflection-scatter probe light.

Abstract: An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask, wherein non-polarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film, the openings having a width in a widthwise direction not greater than one-third of the exposure light and having its lengthwise directions extending in two or more directions along the mask surface, so that near-field light escaping from the openings is produced thereby to perform exposure of a pattern on the basis of the openings.

Abstract: A portable camera with inbuilt printer device, has input means for uploading software. The camera includes a digital image capture device, an inbuilt programming language interpreter internally connected to the digital image capture device for the manipulation of the digital image captured by the capture device and a script input means for inputting a self documenting program script for the manipulation and filtering of said captured digital image to produce visual alterations of the image. A card reader optically reads the script printed as an array of dots on one surface of a portable card, which has a visual example of the likely effect of the script on a second surface of the card. The script is interpreted and executed by the interpreter to modify the captured digital image in accordance with the script to produce a digital image modified, in a manner as visually exemplified on said second surface of said card, which is then printed out on the inbuilt printer device.

Abstract: An image data storage apparatus comprising an image data recording means for retrievably recording a scanned imaged data, and a branch transmission path for transmitting the scanned image data from a film reader to the image processor and/or the image data recording means. The apparatus further comprises means for switching the transmission mode to enable the image processor to receive the scanned image data retrieved from the image data recording means.

Abstract: In an image formation apparatus, a light emitted from a light source is deflected towards a condensing lens, the condensing lens condenses the light and focuses the light on an image carrier. An optical housing houses the condensing lens. The condensing lens is fixed to a fixing member and the fixing member is fixed to the optical housing. The condensing lens may be fixed to the fixing member with adhesive. The fixing member may be fixed to the optical housing with adhesive, screws, or snap fastners.

Abstract: The sloped edges of patterned photoresist material are made more vertical by treating the exposed and developed photoresist pattern to an edge correction process. A layer of acid-based material is deposited on the photoresist pattern. The layer is then exposed to acid-neutralizing light to create a top-to-bottom gradient of acidity. The structure is then exposed to heat to cause the acid to diffuse into the edge of the photoresist in amounts roughly proportional to the gradient. A subsequent development process removes the acid-based layer and also reshapes the photoresist edge in proportion to the acid diffusion, leaving a more vertical edge.

Abstract: A method for exposing photographic paper is disclosed that utilizes existing DPE processing labs. The method comprises illuminating a light transmittance device, the light transmittance device being controlled to display a digital image to be printed onto the photographic paper. The photographic paper is then exposed with the light transmitted through said light transmittance device.

Abstract: A mask for laser irradiation includes a base substrate, a laser beam shielding pattern on a first surface of the base substrate, wherein the laser beam shielding pattern is made of an opaque metallic material and has laser beam transmitting portions spaced apart from each other, and an anti-thermal oxidation layer covering the laser beam shielding pattern, wherein a second surface of the base substrate is an incident surface of a laser beam.

Abstract: A laser beam mask for shaping a laser beam includes a base substrate having first and second surfaces and having at least one first open portion, and a reflecting layer on the first surface of the base substrate, wherein the reflecting layer has at least one second open portion corresponding to the at least one first open portion and totally reflects the laser beam.

Abstract: Exposure systems may use pellicles made of perfluoropoly-ether. These materials may exhibit reduced darkening upon repeated exposures compared to other materials.

Abstract: A method of providing critical dimension (CD) gate control during photolithography is achieved by scanning a trial wafer from a batch by an exposure tool and then measuring the gate width to determine shot zones for bi-shot (BSE) exposure. The time delay based on shot or exposure order is determined for each BSE zone. The shot or exposure dose for the other wafers from the same or similar batch is then determined on the bi-shot exposure and the shot order.

Abstract: A method of capturing and processing sensed images includes the step of sensing a viewed image to generate a viewed image signal carrying data representing the viewed image. The viewed image signal is communicated to a central processor. A printed data storage device on which optically detectable data representing an image processing program is printed is read to generate a program signal carrying data representing the program. The program signal is communicated to the central processor. The program is executed at the central processor so that the central processor carries out an image processing operation on the viewed image in accordance with instructions carried by the program to generate output image data.

Abstract: The method and apparatus for reading an image read photoelectrically an original image by prescan, set reading conditions in accordance with prescanned data obtained by the prescan, and perform fine scan that photoelectrically reads the original image to obtain fine scanned data for producing output image data. The method and apparatus analyze data of a preset area of the original image for both the prescanned data and the fine scanned data to calculate image characteristic values of the prescanned data and the fine scanned data of the preset area, calculate a correction condition for the fine scanned data such that the image characteristic values of the prescanned data and fine scanned data match and process the fine scannned data on the correction condition.

Abstract: A method for exposing photographic paper is disclosed that utilizes existing DPE processing labs. The method comprises illuminating a light transmittance device, the light transmittance device being controlled to display a digital image to be printed onto the photographic paper. The photographic paper is then exposed with the light transmitted through said light transmittance device.

Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.

Abstract: A detector to measure EUV intensity at the reticle plane located at a reticle stage that is designed to travel in only the scan direction employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that project a mask image onto a wafer.

Abstract: A method is provided for reducing Critical Dimension (CD) non-uniformity in creating a patterned layer of semiconductor material. Two masking layers are respectively created, the first masking layer comprising a main pattern, an isolated pattern and a dummy pattern, the second masking layer exposing the dummy pattern. Methods of compensating for optical proximity effects and micro-loading, as provided by the invention, are applied in creating the first masking layer. The patterned first masking layer is transposed to an underlying layer creating a first pattern therein. The second masking layer removes the dummy features from the transposed first pattern, creating a second pattern therein comprising a main pattern and an isolated pattern to which compensation for optical proximity effects and micro-loading have been applied. The second pattern serves for additional etching of underlying semiconductor material.

Abstract: An exposure apparatus is made so as to have respective chambers in which a main exposure system, a substrate carrying system, and a mask carrying system are housed. The apparatus is structured so that the respective environments in the chambers are substantially independently maintained from each other. Substrate processing can be facilitated by incorporating photoelectric detection of the substrate center in association with handing-over of the substrate from one substrate carrying member to another, and/or storage of a cleaning substrate in a storage member which also holds substrates being processed by the apparatus.

Abstract: A chromeless photomask includes a main pattern portion and a complementary pattern portion formed in the surface of the transparent mask substrate adjacent to an outer peripheral edge of the main pattern portion. The main pattern and complementary portions are each formed by recessing a surface of a transparent mask substrate to produce respective protrusions and recesses that induce a phase difference of 180 degrees in light rays passing therethrough. The complementary pattern portion is designed to produce interference that prevents distortion in the photoresist pattern formed at a region by and corresponding to the edge of the main pattern portion of the photomask. Accordingly, the present invention provides for a relatively large secondary mask alignment margin.

Abstract: Reticles having reticle patterns suitable for reducing edge of array effects are provided. The reticle patterns may have transmission patterns etched in the periphery areas of the reticle patterns. Systems incorporating the reticles are also provided. Additionally, methods of forming and using the reticles are provided. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that is will not be used to interpret or limit the scope or meaning of the claims.

Abstract: A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a Mo/Si layer system with an optional protective outer coating of Ru. Furthermore, the multi-optical-layer optical element may be comprised of a plurality of interposed between Mo/Cr alloyed layers.

Abstract: A pattern region of a working reticle is divided into existing pattern portions and newly-forming pattern portions. With respect to the existing pattern portions, already-formed master reticle patterns are reduction-projected while stitching screens using an optical-type projection exposure apparatus. With respect to the newly-forming portions, enlarged patterns are formed by an electron beam drawing apparatus to form new master reticles, and reduced images of the newly formed master reticles are exposed while stitching screens using an optical-type projection exposure apparatus.

Abstract: An apparatus comprising a mask having an active device area and a moat. The moat substantially surrounds the mask active device area and has a width greater than a plasma specie diffusional length. A method comprising depositing a layer of resist on a mask substrate having transparent and opaque layers; and exposing the resist layer to radiation. The radiation is patterned to produce features within an active device area. The radiation is also patterned to produce a moat substantially surrounding the active device area having a width greater than a plasma specie diffusional length.

Abstract: The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. One aspect of the present subject matter relates to a method for forming non-orthogonal images in a raster-based photolithographic system. According to various embodiments of the method, a first image corresponding to a first data set is formed on a reticle when the reticle is at a first rotational position &thgr;1. The reticle is adjusted to a second rotational position &thgr;2. A second image corresponding to a second data set is formed on the reticle when the reticle is at the second rotational position &thgr;2. The second image is non-orthogonal with respect to the first image. Other aspects are provided herein.

Abstract: An incident optical system introduces a plurality of laser beams to an optical deflector from within a scanning range, the width of the plurality of laser beams being larger than the width of a deflection surface of the optical deflector in a main scanning direction. Principal rays of the plurality of laser beams, separated by a predetermined angle, cross each other near the deflection surface in a main scanning cross-section. A scanning optical device satisfies the expression &Dgr;&thgr;<(4&pgr;/N)×(1−&rgr;), where &Dgr;&thgr; represents the largest angle between principal rays of two of the plurality of laser beams, N represents the number of deflection surfaces of the optical deflector, and &rgr; represents the scanning efficiency of the deflection surface, which is the ratio of an image forming range to the theoretical maximum scanning width on the deflection surface of the optical deflector.

Abstract: An image printing apparatus includes a print head for printing images. A microcontroller that includes a wafer substrate is provided. Processor circuitry is positioned on the wafer substrate. Print head interface circuitry is also positioned on the wafer substrate and is connected between the processor circuitry and the print head. The print head interface circuitry is configured to facilitate communication between the processor circuitry and the print head. Bus interface circuitry that is discrete from the print head interface circuitry is connected to the processor circuitry so that the processor circuitry can communicate with devices other than the print head via a bus.