Abstract: A portable camera with inbuilt printer device, has input means for uploading software. The camera includes a digital image capture device, an inbuilt programming language interpreter internally connected to the digital image capture device for the manipulation of the digital image captured by the capture device and a script input means for inputting a self documenting program script for the manipulation and filtering of said captured digital image to produce visual alterations of the image. A card reader optically reads the script printed as an array of dots on one surface of a portable card, which has a visual example of the likely effect of the script on a second surface of the card.

Abstract: A system and method for ordering visual prints from digital image data. The system and method include acquiring digital images from a digital image storage medium, assigning a unique identification code to the acquired digital images, storing the acquired digital images in association with the unique identification code, printing at least one index sheet of the digital image, the at least one index sheet containing visual print ordering information and the unique identification code, providing visual print information, producing visual prints based on the print order information, and providing the visual prints to a customer.

Abstract: A near-field light exposure mask provided with a plurality of apertures each having a width small than the wavelength of light used for exposure. In the mask described above, among the plurality of apertures, apertures adjacent to each other are disposed at a necessary distance so that near-field light effused from one of the apertures adjacent to each other does not overlap that generated from the other aperture.

Abstract: An object of this invention is to properly set an original reading position in sheetfed scanning. To achieve this object, a background near a sheetfed scanning position is read to detect the distal end of a white sheet member arranged near a platen roller, and the reading position in sheetfed scanning is set.

Abstract: Plural line sensors are arranged parallel to each other in a predetermined order and with a predetermined interval, and they read different lines on a manuscript respectively. A delay module outputs an image signal output from at least one of the plural line sensors with a delay for a number of lines according to a number of pixels which corresponds to shifts of reading positions of the plural line sensors. An ahead-reading signal acquiring module outputs the image signal acquired from at least one line sensor other than a last stage line sensor of the plural line sensors as an ahead-reading signal. The image processing device outputs the image signal wherein the shifts of the reading positions of the plural line sensors are corrected by the delay module, and outputs the ahead-reading signal acquired by the ahead-reading signal acquiring module.

Abstract: A semiconductor manufacturing system of the present invention includes exposure value detection means for detecting an exposure value, pattern size detection means for detecting a pattern size, size comparison means for calculating a size difference between the pattern size and a target value, optimum exposure value calculation means for calculating an optimum exposure value based on the exposure value and the size difference, and an exposure value control means. In the semiconductor device manufacturing method of the present invention, the optimum exposure value is calculated based on the exposure value and the size difference, and exposure is performed at the optimum exposure value. A semiconductor device of the present invention is manufactured by the manufacturing method.

Abstract: A device having a substrate and a pattern structure formed on the substrate in accordance with plural processes including a multiple exposure process having (i) a step for photoprinting a fine stripe pattern on the substrate and (ii) a step for photoprinting a predetermined mask pattern on the substrate, such that the fine stripe pattern and the mask pattern are printed superposedly, wherein, in the pattern structure, a particular structural portion of the device is disposed in a portion where the fine stripe pattern and the mask pattern are printed superposedly.

Abstract: A system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.

Abstract: A carriage structure is disclosed for an image-reading device that acquires image data from a document while an optical unit is moved along the document. The carriage structure is formed of molded plastic with reinforcing sheet metal members incorporated therein, and the optical unit, including a light source, photoelectric conversion device and optical elements, are positioned at predetermined positions on the carriage and are supported by, and incorporated within, the carriage structure. The reinforcing sheet metal members are bent into at least one of an L-shape, a V-shape, a crank shape, or a tilted V-shape in order to achieve a desired rigidity for the carriage structure.

Abstract: An image sensing and processing apparatus includes an image sensor that is capable of generating signals carrying data relating to an image sensed by the image sensor. The apparatus includes a microcontroller. The microcontroller includes a wafer substrate. VLIW processor circuitry is positioned on the wafer substrate. Image sensor interface circuitry is positioned on the wafer substrate and is connected between the VLIW processor circuitry and the image sensor. The image sensor interface circuitry is configured to facilitate communication between the VLIW processor circuitry and the image sensor. Bus interface circuitry that is discrete from the image sensor interface circuitry is connected to the VLIW processor circuitry so that the VLIW processor circuitry can communicate with devices other than the image sensor via a bus.

Abstract: A wafer exposure apparatus includes a special wafer cooling unit, namely, an air showerhead, for controlling the temperature of a wafer which is to be transferred from a wafer pre-alignment system to a wafer stage of photolithography exposure equipment. The wafer which has been heated in the course of being transferred from a spin coater to the wafer pre-alignment system, and may be further heated by sensors of the wafer pre-alignment system, is cooled to the same temperature as that of a wafer stage. Accordingly, a thermal equilibrium may be rapidly established between the wafer and the wafer stage when the wafer is transferred to the wafer stage. Accordingly, excessive thermal expansion of the wafer caused by a difference in temperature between the wafer and the wafer stage is prevented. Therefore, an excessive error in aligning the wafer with the optics of the photolithography exposure equipment can be prevented.

Abstract: The invention consists in a process which contemplates:

Abstract: An integrated circuit fabrication process for patterning features at sub-lithographic dimensions is disclosed herein. The process includes sequentially exposing a of a film of arylalkoxysilane with a photobase generator, and catalytic amount of water coated on top of a conventional lipophilic photoresist layer provided over a substrate and exposed to a radiation at a first and a second lithographic wavelengths. The first lithographic wavelength is shorter than the second lithographic wavelength. Exposure to the first lithographic wavelength causes a self-aligned mask to form within the photoresist layer.

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: Methods and apparatus are disclosed for peripherally supporting X-ray-reflective mirrors such as used in X-ray microlithography systems and other X-ray optical systems. The methods provide effective physical support while reducing certain deformations in the reflective surface of the mirror. An embodiment of the method or mirror-support apparatus utilizes multiple “pushing” and “pushing” devices that apply a compressive stress and tensile stress, respectively, to respective locations on the peripheral-side surface of the mirror. One or more pushing devices and one or more pulling devices can be used as required. For example, at time of mirror fabrication, respective pushing devices can be placed adjacent concave-deviation regions and respective pulling devices can be placed adjacent convex-deviation regions on the reflective surface of the mirror.

Abstract: An exposure method which irradiates a slit-shaped illumination light IL on a reticle Ri and a substrate while moving them synchronously so as to sequentially transfer images of patterns formed on the reticle Ri to the substrate 4, wherein a density filter Fj having an attenuating part for gradually reducing the distribution of illuminance of the illumination light IL is moved in synchronization with the movement of the reticle Ri.

Abstract: Temperature is detected by a temperature sensor disposed near a recording head. When the detection result is a temperature that is higher than room temperature, an appropriate movement amount of the recording head is calculated from a relation between response speed of the temperature sensor and a LED light amount, and a moving speed of the recording head is controlled. When the result of the detection by the temperature sensor is a temperature that is lower than room temperature, an appropriate exposure amount is calculated from the relation between the response speed of the temperature sensor and the LED light amount, and the amount of light emitted by LEDs is controlled.

Abstract: A method and apparatus for replicating patterns with a resolution well below the diffraction limit, uses broad beam illumination and standard photoresist. In particular, visible exposure (&lgr;=410 nm) of silver nanoparticles in close proximity to a thin film of g-line resist (AZ 1813) can produce selectively exposed areas with a diameter smaller than &lgr;/20. The technique relies on the local field enhancement around metal nanostructures when illuminated at the surface plasmon resonance frequency. The method is extended to various metals, photosensitive layers, and particle shapes.

Abstract: An automatic self-service installation for printing photographs stored in digital form includes a digital medium reader for reading and retrieving digital data from stored image(s) which a user wishes to restore on a paper print. A central processing unit manages the installation and permits interaction with a user. An interacting device, actuatable by the user allows user selection of image(s) within the digital medium for printing, and production of the image(s) on paper medium. An exposure system for the selected image(s) is associated with a facility for storing and moving a photosensitive paper. A chemical treatment unit includes developing baths and a facility for automatic transfer of developed photosensitive paper into the baths. The installation also includes a facility for drying paper print(s) obtained after printing and a receptacle for storing and permitting removal of the produced print(s).

Abstract: The image recording method and apparatus focus or image a two-dimensional image formed by a group of two-dimensionally disposed light source elements through an optical system on a recording medium which is moving in a relative relation to the group two-dimensionally disposed light source elements. The method and apparatus deflect light from the group of two-dimensionally disposed light source elements to move the image focused on the recording medium in synchronism with a movement of the recording medium such that the image can remain stationary at least in a main scanning direction in a relative relation to the recording medium. The group of two-dimensionally disposed light source elements can be produced by a two-dimensional spatial light modulator illuminated with an illumination light flux.

Abstract: Plural line sensors are arranged parallel to each other in a predetermined order and with a predetermined interval, and they read different lines on a manuscript respectively. A delay module outputs an image signal output from at least one of the plural line sensors with a delay for a number of lines according to a number of pixels which corresponds to shifts of reading positions of the plural line sensors. An ahead-reading signal acquiring module outputs the image signal acquired from at least one line sensor other than a last stage line sensor of the plural line sensors as an ahead-reading signal. The image processing device outputs the image signal wherein the shifts of the reading positions of the plural line sensors are corrected by the delay module, and outputs the ahead-reading signal acquired by the ahead-reading signal acquiring module.

Abstract: A scanning projection exposure apparatus includes a mask stage (RST) which moves with a mask (R) being placed thereon, a wafer stage (WST) which moves with a wafer (W) being placed thereon, a reference plate (22) fixed to the mask stage (RST) and having a mark, and a detection system (23) capable of optically detecting the mark. The position of the mark on the reference plate (22) is detected by the detection system (23). The mask stage (RST) is further moved in the scanning exposure direction. A mark on the mask (R) is detected by the detection system (23) with reference to the position of the mark on the reference plate (22). A deformation amount of the mask (R) is obtained. The mask stage (RST) and wafer stage (WST) are scanned in synchronism with each other with respect to a projection optical system (8). A pattern on the mask (R) is projected onto the wafer (W) through the projection optical system (8).

Abstract: In exposing a photocurable resin to light, the light is irradiated on the photocurable resin while a base material to which the photocurable resin is applied is immersed in a liquid. An apparatus for carrying out the exposure includes an exposure tank in which a liquid does not dissolve the photocurable resin is reserved and a light source irradiating light to the photocurable resin is immersed in the liquid reserved in the tank. The exposure tank has two opposite side walls which have exposure windows closed by transparent plates respectively. The apparatus may include a plurality of light sources disposed so as to correspond to the representative exposing window. A temperature of the liquid in which the base material is immersed is controlled.

Abstract: A printing cartridge is releasably engageable with a printing device having a linear reader for reading a barcode and a central processor capable of interpreting data carried on a barcode. The printing cartridge includes a housing. Media and media colorant supply arrangements are positioned within the housing and contain a supply of media and a supply of media colorant, respectively. Feed mechanisms are positioned in the housing for feeding the media and the media colorant to a printing mechanism. A barcode is depicted on the housing, the barcode being readable by the linear reader and defining a code representing data relating to the media and the media colorant.

Abstract: A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.

Abstract: An apparatus for compensating light exposure on different, subsequently irradiated target areas (11, 12) in a photosensitive medium (2) on a semiconductor wafer (1). In order to improve exposure dose uniformity the apparatus comprises a mask filter (9) with a plurality of oblong transparent (31) and oblong opaque elements (32; 41) inserted between a light source (3) and said photosensitive medium (2) so that light (4) traverses through said plurality of transparent elements (31) to expose the photosensitive medium. Each of said plurality of oblong opaque elements (32; 41) is rotatable around a longitudinal axis (42) so as to define the area masked by the projection of the opaque element on the photosensitive medium and to continuously adjust a ratio between irradiated and non-irradiated areas on the photosensitive medium.

Abstract: The present invention is directed to an optical device that includes an optically transparent mask blank that is characterized by a mask blank light transmission variation. An anti-reflective coating is disposed on the optically transparent component resulting in an optical device transmission variation that is less than the mask blank transmission variation. The present invention provides a simple solution to the problem of mitigating Fabry-Perot interference effects in a photomask. Disposing an anti-reflective coating on the light incident side of the photomask substantially reduces multiple reflections of the illuminating UV light. The illumination light propagates through the photomask only once. The AR coating also prevents any cumulative effects due to birefringence, surface roughness, or inhomogeneity.

Abstract: A method of designing an alignment target system to minimize lens aberrations is disclosed. A first layer alignment target's pitch is selected based on the minimum feature size of the circuit. The second layer alignment target's pitch is selected based on the diffraction pattern of the first layer's target and the illumination settings of the second layer. Displacement errors are minimized when the second layer target's 1st diffraction order overlaps the first layer target's 0th diffraction order.

Abstract: Deviation signals (Ex, Ey, Ez, E&thgr;x, E&thgr;y, and E&thgr;z) are sent to PI compensators (7) for respective motion modes. Position control is done by the operation of each PI compensator (7) so as to eliminate the deviation signal. Gain compensators (4) regarding the stiffness receive velocity signals (Vx, Vy, Vz, V&thgr;x, V&thgr;y, and V&thgr;z), and apply the skyhook stiffness for the respective motion modes. A motion mode distribution calculating unit (8) regarding an air spring converts the sum of a sign-inverted output from each gain compensator (4) and an output from a corresponding PI compensator (7) into a driving signal for each air valve (AV). Power amplifiers (10) drive the air valves (AV) in accordance with outputs from the motion mode distribution calculating unit (8). The air valves (AV) control the internal pressures of air springs (SU).

Abstract: In a color printer having plural photosensitive drums for respective recording color components, when images are continuously formed on recording sheets, lengths of image data of one page in its main scan direction and its sub scan direction are held for plural pages. Then, image data writing and reading addresses to and from a delay memory for delaying the image data according to an inter-drum distance are controlled for each page on the basis of the held lengths of the image data in its main scan direction and its sub scan direction, whereby an interval between the successively transported recording sheets is shortened.

Abstract: A method of fabricating a display system includes bonding a silicon substrate to a second substrate with an insulating layer. The silicon substrate is thinned to form a thin film silicon-on-insulator (SOI) structure. A matrix display circuit is formed with the SOI structure. A light shield pattern is formed over regions of the matrix display circuit. A light source, the matrix display circuit and a magnifying lens are positioned within a display housing such that light from the light source is directed onto the display and an image on the display is magnified by the lens for viewing by a user.

Abstract: A printing cartridge includes a housing. An array of switch actuators is positioned on the housing. The array of switch actuators represents data relating to at least one of: a serial number of the cartridge, a media and a media colorant so that when a switch array is actuated by the array of switch actuators, a signal carrying such data can be generated.

Abstract: A method of producing an image of least a portion of a photographic image onto a photographic receiver including receiving a digital image corresponding to the photographic image, the digital image comprising pixels, and locating the relative optical position of a photographic image, the lens, and the photographic receiver in response to pixels of the digital image and illuminating a portion of the photographic image of high subject content to produce an image of such portion onto the photographic receiver.

Abstract: It is an object to make it possible to easily carry out alignment of an exposure apparatus. A process for forming a latent image, which comprises irradiating a master plate having a pattern with exposure light and irradiating a substrate coated with a resist with the exposure light transmitted through said master plate or reflected on said master plate via a projection optical system, thereby forming the image of the pattern on the substrate, wherein the image of said pattern is formed on said substrate by making use of a change in color of a predetermined substance, included in said resist, that changes color upon irradiation with said exposure light.

Abstract: A camera provides a photo 7 printed on print media via printer device 6 under the control of a central processor 4. The photo 7 is a print of an image 5 provided by a CCD sensor 3. The photo 7 includes print media having, in addition, a magnetically recordable medium whereby sound processed by sound chip 10 received from sound microphone 13 and/or processed by central processor 4 can be recorded with magnetic recording head 16 on the photo 7. The photo 7 is printed using an ink jet printer on suitable ink jet compatible print media preferably with the magnetically recordable medium on the rear of the photo 7 and the image 2 on the front surface of the photo 7.

Abstract: It is determined whether it is necessary to execute processing for automatically measuring a shot compensation parameter. Processing is reduced by performing automatic measurement of the shot compensation parameter only when such measurement is necessary. This is followed by measuring a wafer compensation parameter automatically. Depending upon whether or not automatic measurement of the shot compensation parameter has been performed, it is determined whether to calculate a relative parameter &dgr; between the shot compensation parameter and wafer compensation parameter or to calculate a shot compensation parameter from a stored relative parameter &dgr; and a wafer compensation parameter. This maintains alignment precision. The units comprising the apparatus are driven to perform exposure in accordance with the shot compensation parameter and wafer compensation parameter obtained.

Abstract: An apparatus and method for providing gross location, planarization, and mechanical restraint to one or more electronic components such as semiconductor dice to be subjected to stereolithographic processing. A double platen assembly having a first platen and a second platen mutually removably connected and configured and arranged to substantially secure an electronic component assembly in position therebetween. At least one of the platens is configured such that a portion of electronic components of a carrier substrate secured by the double platen assembly is viewable for exposure to an energy beam such as a laser beam used to cure a liquid into an associated dielectric stereolithographic packaging structure. Another embodiment includes the use of an adhesive coated film for holding locating and securing a plurality of individual electronic components for processing. A method of forming solder balls is also disclosed.

Abstract: An apparatus for improving sheet feeding in a direction of movement to a process station, including: a contact surface having ribs spaced along contact surface in the direction of movement, apertures being defined in the space between each rib; a blower; and an air plenum for supplying a vacuum generated by the blower to the contact surface so that when an leading edge of the sheet passes by the contact surface the vacuum pulls the leading edge of the sheet towards contact surface.

Abstract: An image reading apparatus for imaging an original document or photographic film includes an original placement bed on which to place the original, and a reading device to form an image of the original. A transparent original adapter, detachably connected to the image reading apparatus, includes a delivery device that moves the original along an original placement plane of the original placement bed. The transparent original adapter also includes a lighting device that illuminates the original as the reading device forms the image of the original. A film position adjustment device adjusts the original away from the original placement plane when the original is moved, and against the original when the image of the original is read by the reading device.

Abstract: A positive photoresist bead is removed from an edge surface of a substrate by exposing the photoresist bead with light from an exposing source along a plurality of non-parallel paths approximately normal to the surface of the photoresist bead. The light may be simultaneously directed by a light guide along the non-parallel paths, or a mount may support the light guide adjacent the bead to move the light guide to various positions to direct the light along the non-parallel paths. Alternatively, plural light sources direct light to the bead along non-parallel paths. In any case, the exposed photoresist bead is then removed with a solvent.

Abstract: A focus monitoring method of the invention is characterized by transferring the pattern of a photo mask for phase shift focus monitor onto a photoresist on a semiconductor substrate by using modified illumination. Photo mask for phase shift focus monitor has first and second light transmitting portions which are adjacent to each other while sandwiching a shielding pattern, and is constructed so that a phase difference other than 180 degrees occurs between exposure light passed through the first light transmitting portion and exposure light passed through the second light transmitting portion. Consequently, a focus monitoring method, a focus monitor system, and a semiconductor fabricating method with high detection sensitivity in the z direction and which do not require changing of an illumination aperture can be achieved.

Abstract: A Chromeless phase shift mask utilizes a line width control region having an incline phase shift structure located between a transparent region and a phase shift region and tapered from the edge of the phase shift layer to produce destructive interference of an incident radiation transmitted through the line width control region, and the intensity of the transmitted radiation is thereby decreased. Therefore, the line width of non-exposure region can be freely controlled by the line width control region and not restricted to the wavelength of the incident radiation.

Abstract: A transparency scanning mechanism of a CIS scanner for scanning a transparency includes a plane light source mounted on the upper cover of the scanner, for projecting the transparency. A guide device is mounted on the upper cover and located adjacent to the plane light source for guiding the transparency to face the plane light source. Thus, the CIS scanner may be used to scan the transparency. The scanning mechanism and the upper cover may be made integrally, thereby decreasing cost of fabrication. In addition, the upper cover may be provided with a driving device and/or a retaining device adjacent to the guide device, to mate with movement of the transparency, so that the transparency may be moved conveniently, thereby preventing the transparency from being tilted and deviated.

Abstract: A method for using an excimer laser to pattern electrodeposited photoresist on a sloped surface of a wafer substrate includes depositing a layer of photoresist on top of a substrate that includes a sloped surface and scanning an excimer laser beam over the layer of photoresist to expose the layer of photoresist in a desired pattern. The scanning step includes projecting the excimer laser beam in a small beam spot onto the substrate and scanning the small beam spot of the excimer layer beam relative to the substrate to define the pattern sequentially onto the substrate, including the sloped surface.

Abstract: An eject mechanism with a grip in a finisher is disclosed, in which papers ejected from a digital output device are temporarily stacked on a paper eject tray and exactly aligned so that the papers are gripped to move to a stacker tray without scattering. The eject mechanism with a grip in a finisher includes a paper eject tray that temporarily receives papers ejected from a digital output device, a paper moving means gripping the papers received in the paper eject tray to move them, and a stacker tray stacking the papers moved from the paper moving means, wherein the paper moving means includes a guide side plate provided with a rail groove circulating along the papers and a curved cam disposed near the rail groove, a paper grip means driven to grip the papers received in the paper eject tray when it is in contact with the curved cam while moving along the rail groove of the guide side plate, and a driving means that drives the paper grip means to circulate it along the rail groove.

Abstract: A method of designing an alignment target system to minimize lens aberrations is disclosed. A first layer alignment target's pitch is selected based on the minimum feature size of the circuit. The second layer alignment target's pitch is selected based on the diffraction pattern of the first layer's target and the illumination settings of the second layer. Displacement errors are minimized when the second layer target's 1st diffraction order overlaps the first layer target's 0th diffraction order.

Abstract: In a printing device which prints a color image on a photosensitive material by allowing an exposing head to modulate light from a light source for each pixel in accordance with image information, the exposing head is constituted by superposing three LCS's in the light-axis direction. The respective LCS's control the transmission and interruption of only the respective blue, green and red color components so that color tones in the respective pixels with respect to an image printed on printing paper are controlled based upon the subtractive color process. Therefore, it is possible to eliminate the generation of pixel offsets in an image printed on the photosensitive material by using a simple structure, and consequently to provide a printing device having a superior processability.

Abstract: A preexposure apparatus comprises a film supply station ST1 for arranging a film cartridge 14 containing a film 12 accommodated therein, a film-drawing station-ST3 for automatically drawing the film 12 over its entire length, an exposure station ST5 for exposing a predetermined portion of the drawn film 12 with an image by the aid of an exposure section 32, a winding station ST6 for automatically rewinding the film 12 after the exposure into the film cartridge 14, and a withdrawing station ST8 for withdrawing the film cartridge 14. Accordingly, the predetermined portion of the film can be preexposed with a desired image automatically and efficiently.

Abstract: The present invention relates to a photolithography processing system and a method thereof that is able to detect the presence of impure matters remaining on the surface of a wafer in the process of forming a pattern mask and then determine a subsequent processing step of the wafer with reference to the result of the detection. The photolithography processing system includes: a table positioned near a loader where a carrier is positioned for supporting a wafer that is being transported by a robot; a plurality of illumination tools positioned for illuminating the surface of the wafer positioned on the table; a camera for taking pictures of the surface of the wafer; and a controller for controlling operations of the robot, the illumination tools and for detecting the presence of impure matters on the surface of the wafer.

Abstract: In order to form three or more steps on a substrate with high precision, a first mask is formed to an area on the substrate corresponding with every other step, and also etching is performed on the area of the substrate to which the first mask is not formed, a second mask is formed to an area on the substrate to which the first mask has not been formed, and also etching is performed on the area on the substrate to which the first and the second masks are not formed.