Abstract: The present invention relates to a rubbing machine with realigning functions for use in an LCD manufacturing process and also to a rubbing method which is conducted using the same. The rubbing machine is used to determine the direction of alignment by rubbing an alignment film coated on a substrate disposed on a stage. In this rubbing machine, an realigning section for realigning a rubbing cloth is disposed on the portion of a rubbing roll in such a manner that the realigning section be in contact with the rubbing cloth.

Abstract: According to one aspect, the invention provides a blocking apparatus and a blocking method for precisely aligning a button holder against a block during blocking process of lens manufacturing. According to another aspect, the invention provides a blocking apparatus a blocking method for automatically applying a wax material on a button. In one embodiment, the blocking apparatus includes an automatic wax delivery system having an automatic retractable dispensing nozzles for wax delivery.

Abstract: A device for polishing having a polishing wheel for mounting an arbor to which a film can be secured. The wheel is either manually or motor driven. A ferrule holder is on a carrier also driven by the drive shaft at a predetermined indexed rate. The polishing procedure may be acoustically monitored.

Abstract: A grinding water tank unit which enables reuse of grinding water that has been used for processing an eyeglass lens, includes: a tank in which the grinding water is stored; a filter, disposed in the tank, for filtering the grinding water to be separate from processing debris, the filter having a sealed hollow portion; a first water suction pump; and a first water suction passage which connects the hollow portion to the first pump, and through which the grinding water filtered by the filter is sucked by suction of the first pump.

Abstract: A gas turbine component blank is shaped by clamping the gas turbine component blank into a fixture that accurately positions the gas turbine component blank in three dimensions. The positioning is accomplished against stops accurately machined into a base of the fixture, by first supporting the gas turbine component blank on one set of stops that prevents movement in the direction perpendicular to a plane of the base, and then operating a movable clamp to force the gas turbine component blank against other sets of stops that limit the movement of the gas turbine component blank in directions lying in the base plane. The clamp has a compound movement that simultaneously forces the gas turbine component blank against stops that prevent movement in orthogonal directions lying in the base plane. The gas turbine component blank is thereafter shaped, preferably by grinding the sides of the root precursor of the gas turbine component blank.

Abstract: The invention is directed to chemical-mechanical polishing pads comprising a transparent window comprising a polymer resin having a first index of refraction and an inorganic material having a second index of refraction. The transparent window has a light transmittance of about 10% or more at a wavelength of about 200 nm to about 10,000 nm. The difference between the first index of refraction and the second index of refraction is about 0.3 or less at the wavelength.

Abstract: The wafer 11 that is the object of polishing is held by a polishing head 12, and rotates together with the polishing head 12. A polishing body 14 is attached to the polishing member 13 by bonding using an adhesive agent or two-sided adhesive tape, etc. As is shown in (b), the polishing body 14 is constructed by laminating a soft member 15, a hard elastic member 16 and a polishing pad 17. The hard elastic member 16 is constructed so that the amount of deformation of the hard elastic member 16 at the polishing load that is applied during polishing is smaller than the step difference that is permitted in the above-mentioned wafer in the interval corresponding to the maximum pattern of the above-mentioned semiconductor integrated circuits, and is larger than the TTV that is permitted in the above-mentioned wafer in the interval corresponding to one chip. As a result, the requirements of both “wafer global removal uniformity” and local pattern planarity” can be satisfied.

Abstract: An apparatus for supplying chemicals in a chemical mechanical polishing (CMP) process includes a plurality of chemical solution supply sources for supplying different chemical solutions in a pump-less manner by using a pressure applied at the chemical solution supply sources, each supply source having an associated feed line, re-circulating line, and means for measuring and controlling flow rates of the chemical solutions supplied through the feed lines. The chemical solutions are delivered via a plurality of delivery lines to a mixer, thereby providing a mixed chemical solution to a chemical injection part of a polishing apparatus. Each means for measuring and controlling flow rates is mounted in the feed lines.

Abstract: A wafer support system comprising a segmented susceptor having top and bottom sections and gas flow passages therethrough. A plurality of spacers projecting from a recess formed in the top section of the susceptor support a wafer in spaced relationship with respect to the recess. A sweep gas is introduced to the bottom section of the segmented susceptor and travels through the gas flow passages to exit in at least one circular array of outlets in the recess and underneath the spaced wafer. The sweep gas travels radially outward between the susceptor and wafer to prevent back-side contamination of the wafer. The gas is delivered through a hollow drive shaft and into a multi-armed susceptor support underneath the susceptor. The support arms conduct the sweep gas from the drive shaft to the gas passages in the segmented susceptor. The gas passages are arranged to heat the sweep gas prior to delivery underneath the wafer.

Abstract: An end face polishing apparatus with improved polishing precision regardless of the length of ferrules when end faces of the ferrules are polished is provided. In an end face polishing apparatus polishing a rod-shaped member mounted at a polishing fixture by pressing the rod-shaped member against a lapping member on a lapping machine provided on a surface plate that is supported at the main body of the apparatus to rotate and rock, there are a plurality of rod-shaped guide members provided at the polishing fixture radially outwardly projecting and a tubular member capable of supporting the polishing fixture through the guide members on the surface plate. In this way, the guide member sat the polishing fixture and the tubular member abut against each other so that the movement of the polishing fixture in the pressing direction is restricted.

Abstract: Disclosed is a device for grinding a liquid crystal display panel improving the efficiency of using equipment by independently operating first and second grinding units for grinding the unit liquid crystal display panel. The present invention includes a first grinding unit grinding edges of short or long sides of the unit liquid crystal display panel in a normal mode and a second grinding unit grinding the edges of the short or long sides of the unit liquid crystal display panel that are not ground by the first grinding unit in the normal mode or grinding the edges of the long and short sides of the unit liquid crystal display panel in an emergency mode.

Abstract: An eyeglass lens processing apparatus for processing an eyeglass lens includes: a processing chamber inside which a lens grinding tool is disposed; a tank which stores grinding water; a drain hose connecting the processing chamber with the tank; a filter for eliminating bubbles attached to an outlet of the drain hose, which includes a large number of pores having a size such that permits passing of processing debris stemming from rough processing and inhibits passing of bubbles larger than the processing debris.

Abstract: The invention relates to a wide-wheel grinding machine having at least one grinding head attached to a machine frame by a cross arm and having a drive motor for the grinding head which is mounted at one end of the cross arm. The machine is made of non-metal castings and damps both the drive and grinding vibrations from the grinding head as close to the source as possible. Multi-head machines are assembled in accordance with the number of grinding heads on the basis of frame modules which are similar in shape.

Abstract: Surface planarization equipment of a semiconductor wafer safely transfers wafers to an unloading cassette. In addition to the unloading cassette, the surface planarization equipment includes a loading cassette configured to hold wafers awaiting surface planarization, an index table including a plurality of first rotary vacuum wafer chucks that receive wafers from the loading cassette, at least one grinding head disposed above the index table and operative to perform a planarization process on the wafers supported by the chucks, a cleaning and drying unit including a second wafer rotary vacuum chuck receiving the wafers from the index table after the planarization process is completed and from which the cleaned and dried wafers are transferred to the unloading cassette. A position detector includes one or more sensors disposed beside respective ones of the vacuum chucks to stop the chucks at desired positions.

Abstract: The invention relates to a wide-wheel grinding machine having at least one grinding head attached to a machine frame by a cross arm and having a drive motor for the grinding head which is mounted at one end of the cross arm. The machine is made of non-metal castings and damps both the drive and grinding vibrations from the grinding head as close to the source as possible. Multi-head machines are assembled in accordance with the number of grinding heads on the basis of frame modules which are similar in shape.

Abstract: A gas turbine component such as a turbine blade is clamped into a fixture having a base upon which a remainder of the fixture is supported, a stop which limits the movement of the gas turbine component, and two clamp arms affixed to the base and controllably clamping against the lower side of the platform of the gas turbine component to force the gas turbine component against the stop. When the gas turbine component is clamped in this position, its root may be readily shaped as by grinding.

Abstract: A tool for grinding and polishing diamond and a method for polishing diamond in which a single crystal diamond, a diamond thin film, a sintered diamond compact and the like can be polished at low temperatures without causing cracks, fractures or degradation in quality therein. The tool and method provide a polishing operation which is easy to accomplish, provides stable polishing quality, and provides decreased costs while maintaining stable grinder performance. The grinder is formed of a main component which is an intermetallic compound consisting of one kind or more of elements selected from the group of Al, Cr, Mn, Fe, Co, Ni, Cu, Ru, Rh, Pd, Os, Ir and Pt and one kind or more of elements selected from the group of Ti, V, Zr, Nb, Mo, Hf, Ta and W. The diamond polishing method includes pushing the above stated grinder against the diamond, and rotating or moving the grinder relative to the diamond while keeping the portion of the diamond subjected to polishing at room temperature.

Abstract: A method and apparatus for controlling a polishing characteristic of a polishing pad used in planarization of a substrate. The method preferably includes controlling the temperature of a planarizing surface of the polishing pad so that waste matter accumulations on the planarizing surface soften and/or become more soluble, and/or material comprising the planarizing surface attains approximately its glass transition temperature. The waste matter accumulations and/or a portion of the planarizing surface are in this way softened and more easily removed. The planarizing surface is either heated directly by directing a flow of heated planarizing liquid or heated air to the planarizing surface or indirectly by heating a support surface beneath the polishing pad or by heating the air proximate to the polishing pad.

Abstract: The transmission of the rotational movement to the driving pinion of the carriage is provided by:

Abstract: In a method for performing a finish machining on a tooth surface of a gear to be machined, in the state that at least one counter gear 2 is meshed with the gear 1 to be machined, both gears are rotated while supplying water or an aqueous solution 4 which contains no abrasive grains to meshing portions of both gears so that a surface having a small surface roughness is formed on the tooth surface of the gear 1 to be machined.

Abstract: An improved system for magnetorheological finishing of a substrate comprising a vertically oriented bowl-shaped carrier wheel having a horizontal axis. The carrier wheel is preferably an equatorial section of a sphere, such that the carrier surface is spherical. The wheel includes a radial circular plate connected to rotary drive means and supporting the spherical surface which extends laterally from the plate. An electromagnet having planar north and south pole pieces is disposed within the wheel, within the envelope of the sphere and preferably within the envelope of the spherical section defined by the wheel. The magnets extend over a central wheel angle of about 120° such that magnetorheological fluid is maintained in a partially stiffened state ahead of and beyond the work zone. A magnetic scraper removes the MRF from the wheel as the stiffening is relaxed and returns it to a conventional fluid delivery system for conditioning and re-extrusion onto the wheel.

Abstract: A grinding water tank unit which enables reuse of grinding water that has been used for processing an eyeglass lens, includes: a tank in which the grinding water is stored; a filter, disposed in the tank, for filtering the grinding water to be separate from processing debris, the filter having a sealed hollow portion; a first water suction pump; and a first water suction passage which connects the hollow portion to the first pump, and through which the grinding water filtered by the filter is sucked by suction of the first pump.

Abstract: A supplemental handle for a hand-held machining tool (18), has at least one grip element (10, 12, 14, 16) that is connectable with a housing (26) of the hand-held machine (18) by means of an insulating device (20, 22, 24) for insulating oscillations. The insulating device (20, 22, 24) includes at least one bearing unit (28, 30, 32, 34), and the grip element (10, 12, 14, 16) is guided in at least one direction by means of the bearing unit (28, 30, 32, 34). The bearing unit (28) has at least one bearing bolt (26), about which the grip element (10, 12) is pivotable. The insulating device may include at least one torsion spring.

Abstract: A gantry is constrained to move around the walls of a cylindrical, concrete tank. A rotating, high pressure water spray nozzle is mounted to a moveable platform on the gantry and connected to a source of water at a pressure of over 20,000 psi. The distance between the nozzle and an opposing surface of the wall of the tank is selected so the nozzle can remove the surface of the concrete and produce a selected surface roughness. The platform is moved vertically, with the gantry moving around the tank, so the surface of the concrete is systematically removed and roughened. A shotcrete or gunnite sprayer is then mounted to the platform, and the roughened surface sprayed with shotcrete or gunnite which sticks to the roughened surface. A tensioning head is then mounted to the platform, and wires or cables are tensioned as they are wrapped around the walls.

Abstract: A mortiser has a housing mounted on a support post and there is a collet on the housing for holding a mortise chisel. A chisel drive coupling is on the housing. A chisel drive shaft extends through the housing and connects with the chisel drive coupling. A reciprocal engagement mechanism is capable of selectively engaging the chisel drive coupling. An operating lever may thus be quickly indexed so that the mortise chisel may be filly lowered without the user pulling the operating lever fully toward him/her and downward. The mortiser also has a finely adjustable ram fence and a depth stop. The collet has a notched or elliptical bore to prevent jamming of the chisel shank in the collet.

Abstract: The present invention relates to an automated system and a process for repairing a component having at least one surface. The system broadly comprises a scanner device for generating an image of each component surface having a repair material thereon and a programmed central processing unit for generating instructions for performing an operation to remove any excess repair material from each surface of the component and to blend each surface of the component. The system further includes a programmable robot for holding the component during the scanning process and during the subsequent operation. The system further includes a cell having a plurality of tools for performing different blending operations and/or polishing surfaces of the component. A process for performing the repair of the component is also described.

Abstract: This polishing apparatus permits for polishing of hard-material coated complex films that traditionally have been difficult to polish due to the hardness of the films, the fragility of the substrate, and the inherent distortion of the film. The polishing apparatus includes a rotary turn-table, a holder for a wafer having the film, a shaft connected to the center of the holder for transmitting rotation and pressure to the holder and permitting the holder to incline, an arm rotatably supporting the holder, a cylinder for applying pressure to the center of the shaft, a driving device for rotating the shaft, and at least one auxiliary shaft. The auxiliary shaft pushes peripheral points along a diameter of the holder in order to impart a swaying motion on the holder.

Abstract: An improved system for magnetorheological finishing of a substrate comprising a vertically oriented bowl-shaped carrier wheel having a horizontal axis. The carrier wheel is preferably an equatorial section of a sphere, such that the carrier surface is spherical. The wheel includes a radial circular plate connected to rotary drive means and supporting the spherical surface which extends laterally from the plate. An electromagnet having planar north and south pole pieces is disposed within the wheel, within the envelope of the sphere and preferably within the envelope of the spherical section defined by the wheel. The magnets extend over a central wheel angle of about 120° such that magnetorheological fluid is maintained in a partially stiffened state ahead of and beyond the work zone. A magnetic scraper removes the MRF from the wheel as the stiffening is relaxed and returns it to a conventional fluid delivery system for conditioning and re-extrusion onto the wheel.

Abstract: A method of lapping semiconductor wafers includes the step of transmitting sounds generated during the lapping process to a receiver, allowing the operator to use sound to more quickly detect problems associated with starting the lap process.

Abstract: A hand-guided and operated electrically-powered hand tool, in particular a belt sander or the like, is comprised of a working tool part (2) projecting from a housing for the working of a workpiece. The housing (1) has on the side facing away from the working tool part (2) a handle (4) for guiding the tool. Planar surfaces on bearing surfaces (5) arranged on the handle provide for stable bearing of the electrically-powered hand tool in a change position. In the change-position, there is no contact between the working tool part and the workpiece, so that uncomplicated replacement of the tool part is possible.

Abstract: An apparatus to induce very small bubbles of gas into a stream of deionized water without allowing large bubbles to be entrained is disclosed for use in Chemical Mechanical Polishing for semiconductor manufacture. The apparatus includes a cylinder possessing a central axis positioned vertically, a gas inlet, a deionized water inlet positioned essentially above the gas inlet, a deionized water with gas outlet positioned essentially above the deionized water inlet and a vent outlet positioned essentially above the deionized water with gas outlet. The apparatus introduces an essentially gaseous composition into the cylinder through the gas inlet into deionized water in the cylinder. The gas travels through the deionized water inlet to a level in the cylinder above the position of the deionized water with gas outlet, wherein the gaseous composition is further constrained to enter as bubbles with a predetermined size range in the deionized water through the deionized water inlet.

Abstract: Apparatus and methods for substantial planarization of solder bumps. In one embodiment, an apparatus includes a planarization member engageable with at least some of the plurality of outer surfaces to apply a planarization action on one or more of the outer surfaces to substantially planarize the plurality of outer surfaces, and a securing element to securely position the bumped device during engagement with the planarization member. Through application of “additive” and/or “subtractive” processes, the solder balls are substantially planarized.

Abstract: A method is provided for processing a metal foil sheet to produce magnetic recording media. The method comprises providing an elongate metal foil sheet having a first side and a second side. The sheet is advanced through a plurality of processing stations in equal unit length segments such that each segment receives the same treatment to form a magnetic recording medium from each segment. Method are also provided to prepare the foil surfaces by polishing, texturing, cleaning, and stress relieving, to coat the prepared surfaces with at least one metal layer, to finish the coated layers by buffing, burnishing, and lubricating, and to form disk units from the prepared, coated and finished surfaces.

Abstract: The present invention discloses an improvement on a wafer carrier ring for use in a chemical-mechanical polishing apparatus for uniformly polishing semiconductor wafers. The apparatus comprises of a ring assembly, a stainless steel backing plate and a rubber bladder for holding the ring assembly and the backing plate. The ring assembly comprises of two rings. The first ring is made of a soft material such as Delrin or PBT for holding the stainless steel backing plate which is attached to the wafer. A top portion of the first ring is cutoff to leave an annular notch. The second ring is made of a hard material such as stainless steel and is fitted into the annular notch of the first ring. Both rings are attached to the rubber bladder through two sets of screws which are evenly spaced through a circular path concentric to the circumference of the first ring.

Abstract: A moveable device for finishing surfaces, in particular curved vertical surfaces. The device includes a moveable support structure for supporting a finishing apparatus, rollers and a motor for moving the device, and a finishing apparatus.

Abstract: A polishing tool includes a tool body and a polishing member which is mounted rotatably on the tool body and which has a central hole unit formed through the polishing member. The working surface of the polishing member has a plurality radially extending slots which are spaced apart from each other in an angularly equidistant relation and which extend from the inner periphery of the working surface to the outer periphery of the working surface. A plurality of flat working surface sections are defined on the working surface of the polishing member by the slots. When a slurry consisting of a lubricating liquid and abrasive grains flows onto the working surface of the polishing member via the central hole unit and when the polishing member is rotated on the tool body, each of the abrasive grains moves across all of the slots and from the inner periphery of the working surface to the outer periphery of the working surface, by hydrodynamic effect, so as to polish positively and effectively the workpiece.

Abstract: A fastener (50) is disclosed suitable for securing a grinding wheel (92) to the spindle of an angle grinder, the fastener (50) being capable of tightening and loosening by hand. The fastener (50) comprises a first disc-shaped component (52) having a first pressure transmitting surface (53) adapted to bear against the grinding wheel (92), and a second disc-shaped component (54) having a threaded hub (56) non-rotatably fixed thereto. The first and second components (52, 54) are assembled on the hub (56) so as to be rotatable with respect to each other, and the second component (54) is adapted to apply an axially directed compressive force to press the first component (52) against the grinding wheel when a torque is applied to the second component (54).

Abstract: A contact lens having a smooth surface is made through use of a computer implementing a spline approximation of corneal topology. Piecewise polynomials approximating the corneal topology have equal first and second derivatives where they join. A curve representing the central optical portion of the lens and the piecewise polynomial adjacent to the central optical portion curve have an equal first derivative where they join. A contact lens is cut corresponding to the smooth surface defined by the piecewise polynomials.