Sputtering target for a physical vapor deposition chamber

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to one embodiment of the novel design.

FIG. 2 is a bottom perspective view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a right side plan view thereof.

FIG. 6 is a left side plan view thereof.

FIG. 7 is a front view thereof.

FIG. 8 is a back view thereof.

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.

FIG. 10 is a top perspective view of a sputtering target for a physical vapor deposition chamber, according to another embodiment of the novel design.

FIG. 11 is a bottom perspective view thereof.

FIG. 12 is a top plan view thereof.

FIG. 13 is a bottom plan view thereof.

FIG. 14 is a right side plan view thereof.

FIG. 15 is a left side plan view thereof.

FIG. 16 is a front view thereof.

FIG. 17 is a back view thereof; and,

FIG. 18 is an enlarged cross sectional view taken along line 18-18 in FIG. 13.

The broken lines show portions of a sputtering target for a physical vapor deposition chamber which form no part of the claimed design.

Claims

We claim the ornamental design for a sputtering target for a physical vapor deposition chamber, as shown and described.

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Patent History
Patent number: D908645
Type: Grant
Filed: Aug 26, 2019
Date of Patent: Jan 26, 2021
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: Kirankumar Neelasandra Savandaiah (Karnataka), David Gunther (San Jose, CA), Siew Kit Hoi (Singapore)
Primary Examiner: Michael C Stout
Assistant Examiner: Fritzgerald L Butac
Application Number: 29/703,194