Differential Fluid Etching Apparatus Patents (Class 156/345.1)
- With mechanical polishing (i.e., CMP-chemical mechanical polishing) (Class 156/345.12)
- With measuring, sensing, detection or process control means (Class 156/345.15)
- With means to supply, remove, or recycle liquid etchant outside of etching tank or chamber (e.g., supply tanks or pipe network) (Class 156/345.18)
- With mechanical mask or shield or shutter for shielding workpiece (Class 156/345.19)
- Running length workpiece (e.g., etching indeterminate length strip) (Class 156/345.2)
- Liquid etchant spray type (Class 156/345.21)
- With plural etching zones for a single discrete workpiece in apparatus (Class 156/345.22)
- With specified workpiece support (Class 156/345.23)