Target profile for a physical vapor deposition chamber target

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target, according to the new design.

FIG. 2 is a bottom perspective view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a right side elevation view thereof.

FIG. 6 is a left side elevation view thereof.

FIG. 7 is a front elevation view thereof.

FIG. 8 is a back elevation view thereof; and,

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.

Dashed lines in FIGS. 1-9 represent features of the target profile for a physical vapor deposition chamber target that form no part of the claimed design.

Claims

We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

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Patent History
Patent number: D894137
Type: Grant
Filed: May 9, 2019
Date of Patent: Aug 25, 2020
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventors: William Johanson (Gilroy, CA), Kirankumar Savandaiah (Bangalore), Anthony Chih-Tang Chan (Sunnyvale, CA), Siew Kit Hoi (Singapore), Prashant Prabhakar Prabhu (Karwar)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Suzanne E Tisdell
Application Number: 29/690,617
Classifications