Abstract: A packaged, optically active integrated circuit device is shown is manufactured by mounting the integrated circuit (201) onto a first part of a lead frame (206) using epoxy (209). Electrical connections (207) are made using conventional wire bonding techniques between the integrated circuit (201) and peripheral parts (205) of the lead frame (206). Optical adhesive (202) is dispensed onto the surface of the integrated circuit to surround the optically active element (208). A glass lid (203) is placed onto the surface of the integrated circuit (201) aligned with the optical adhesive (202). This provides a mounted and covered assembly. The mounted and covered assembly is placed in a mould tool having projection with a soft surface opposite to and in contact with the exposed surface of the glass lid (203).

Abstract: The present invention provides amorphous silicon thin-film transistors and methods of making such transistors for use with active matrix displays. In particular, one aspect of the present invention provides transistors having a structure based on a channel passivated structure wherein the amorphous silicon layer thickness and the channel length can be optimized. In another aspect of the present invention thin-film transistor structures that include a contact enhancement layer that can provide a low threshold voltage are provided.

Abstract: A semiconductor structure includes an epitaxial surface semiconductor layer having a first dopant polarity and a first crystallographic orientation, and a laterally adjacent semiconductor-on-insulator surface semiconductor layer having a different second dopant polarity and different second crystallographic orientation. The epitaxial surface semiconductor layer has a first edge that has a defect and an adjoining second edge absent a defect. Located within the epitaxial surface semiconductor layer is a first device having a first gate perpendicular to the first edge and a second device having a second gate perpendicular to the second edge. The first device may comprise a performance sensitive logic device and the second device may comprise a yield sensitive memory device.

Abstract: Systems and/or methods that facilitate programming content to a plurality of nonvolatile memory devices are presented. A wafer program component facilitates programming content to a plurality of memory devices contained on a wafer. The wafer program component can interface with the wafer and can employ parallel processes to program the memory devices on the wafer at substantially the same time. The content programmed to the memory devices can be the same content or different content. A portion of the content can be access-restricted where authentication information is to be provided in order to be granted access to such content, where access-restricted content can include content associated with subscriptions or personal information of a user(s).

Abstract: A gate array cell adapted for standard cell design methodology or programmable gate array that incorporates a dual gate FET device to offer a range of performance options within the same unit cell area. The conductivity and drive strength of the dual gate device may be selectively tuned through independent processing of manufacturing parameters to provide an asymmetric circuit response for the device or a symmetric response as dictated by the circuit application.

Abstract: An integrated circuit has a plurality of first memory cells, which are electrically coupled along a first line, and additionally has a plurality of second memory cells which are electrically coupled along a second line. The integrated circuit furthermore has a switching unit having a plurality of switching elements having in turn a first contact and a second contact. The first contact of a first switching element is coupled to the plurality of first memory cells, and the first contact of a second switching element is coupled to the plurality of second memory cells. In addition, the first contact of a third switching element is coupled to the second contact of the first switching element, and the first contact of a fourth switching element is coupled to the second contact of the second switching element.

Abstract: In a NAND-type nonvolatile reprogrammable memory array, inter-cell coupling resistance between adjoining memory cells is reducing by forming metal silicide insets embedded in the diffusion zone of the inter-cell coupling region. The diffusion zone includes a shallow implant region and a deep implant region. In one embodiment, the shallow implant region defines shallow source/drain regions for floating gate transistors of the memory cells. The size of the metal silicide insets are controlled to not compromise isolation PN junctions defined by the shallow and deep implant region. In one embodiment, the metal silicide insets include nickel.

Abstract: The invention relates to a method for producing a matrix of electronic components, comprising a step of producing an active layer on a substrate, and a step of individualizing the components by forming trenches in the active layer at least until the substrate emerges. The method comprises steps of depositing a layer of functional material on the active layer, depositing a photosensitive resin on the layer of material in such a way as to fill said trenches and to form a thin film on the upper face of the components, at least partially exposing the resin to radiation while underexposing the portion of resin in the trenches, developing the resin in such a way as to remove the properly exposed portion thereof, removing the functional material layer portion that shows through after the development step, and removing the remaining portion of resin.

Abstract: In a multiport SRAM memory cell of the present invention, an access transistor of a first port is disposed in a p-type well, and an access transistor of a second port is disposed in a p-type well. The gates of all of transistors disposed in a memory cell extend in the same direction. With the configuration, a semiconductor memory device having a low-power consumption type SRAM memory cell with an increased margin of variations in manufacturing, by which a bit line can be shortened in a multiport SRAM memory cell or an associative memory, can be obtained.

Abstract: A variable-resistance material memory array includes a series of variable-resistance material memory cells. The series of variable-resistance material memory cells is in parallel with a corresponding series of control gates. A select gate is also in series with the variable-resistance material memory cells. Writing/reading/erasing to a given variable-resistance material memory cell includes turning off the corresponding control gate, while turning on all other control gates. Devices include the variable-resistance material memory array.

Abstract: Variable-resistance material memories include a buried salicide word line disposed below a diode. Variable-resistance material memories include a metal spacer spaced apart and next to the diode. Processes include the formation of one of the buried salicide word line and the metal spacer. Devices include the variable-resistance material memories and one of the buried salicided word line and the spacer word line.

Abstract: A programmable phase change material (PCM) structure includes a heater element formed at a BEOL level of a semiconductor device, the BEOL level including a low-K dielectric material therein; a first via in electrical contact with a first end of the heater element and a second via in electrical contact with a second end of the heater element, thereby defining a programming current path which passes through the first via, the heater element, and the second via; a PCM element disposed above the heater element, the PCM element configured to be programmed between a lower resistance crystalline state and a higher resistance amorphous state through the use of programming currents through the heater element; and a third via in electrical contact with the PCM element, thereby defining a sense current path which passes through the third via, the PCM element, the heater element, and the second via.

Abstract: A semiconductor device having a plurality of layers and a plurality of circuit elements arranged in tiles. At least one of the plurality of layers in the semiconductor device may be a via layer configured to determine the connections of the plurality of circuit elements. The semiconductor device may include an interconnection quilt having a plurality of metal layers disposed to interconnect the plurality of circuit elements. The plurality of circuit elements may be analog circuit element and/or digital circuit elements. The tiles may be analog tiles and digital tiles that form a mixed signal structured array.

Abstract: A method of handling an IC wafer that includes a multiplicity of dice is described. Solder bumps are formed on bond pads on the active surface of the wafer. The back surface of the bumped wafer is adhered to a first mount tape. The wafer is singulated while it is still secured to the first tape to provide a multiplicity of individual dice. The active surfaces of the singulated dice are then adhered to a second tape with the first tape still adhered to the back surfaces of the dice. The first tape may then be removed. In this manner, the back surfaces of the dice may be left exposed and facing upwards with the active surfaces of the dice adhered to the second tape. The described method permits the use of a conventional die attach machine that is not designated for use as a flip-chip die attach machine.

Abstract: A nonvolatile storage device includes a plurality of bit lines 21 arranged in a column direction on a substrate; a plurality of word lines 35 arranged in a row direction on the substrate; a memory cell array 20 having a plurality of memory cells 31, where a store state of each of the memory cells 31 changes according to an electric signal relatively applied to the word line 35 and the bit line 21; a word line selection unit having a needle 51 relatively movable with respect to the substrate which comes into contact with one word line 35, setting the word line 35 in contact with the needle 51 to a selection state; and a sense amplifier 48 detecting through the bit line an electrical signal exhibiting the store state of the memory cell 31 to be connected to the word line.

Abstract: A semiconductor device includes a plurality of a word lines. The word lines have a set of odd word lines and a set of even word lines. The odd and the even word lines are located from a first end region to a second end region through the cell region located between the first and the second end regions. The odd word lines are divided in the first end region and the even word lines are divided in the second end region to form dummy word line portions.

Abstract: An integrated circuit having an array of memory cells is disclosed. One embodiment provides selection transistors for selecting one of a plurality of memory cells. The selection transistor is a tunnel field effect transistor in order to reduce a leakage current when the transistor is in its non-conducting state. Furthermore an operation method and a method for production are described.

Abstract: A filler cell for use in fabricating an integrated circuit. The filler cell couples a power supply rail of an adjacent logic cell to a power supply rail of another adjacent logic cell. The filler cell also has a diode to bleed charge accumulated on the power rails of the adjacent logic cells to the substrate. The diode is reverse biased during normal integrated circuit operation. A method for fabricating an integrated circuit with a power grid. At least one filler cell is placed on the integrated circuit to bleed away charge accumulated on the power grid during the fabrication of the integrated circuit. The filler cell is connected to a supply rail of an adjacent logic cell.

Abstract: One embodiment provides a semiconductor wafer structure including a semiconductor wafer and a spacer layer. The semiconductor wafer includes active areas. The spacer layer is configured to provide spacing between the semiconductor dice in a stacked die package and the spacer layer is disposed on one side of the semiconductor wafer.

Abstract: An object of the present invention is to prevent a thin film integrate circuit from peeling off during the process of transferring to a base material. By a manufacturing method of the present invention, a separation layer is formed selectively on a surface of a substrate; thus, a first region where the separation layer is provided and a second region where the separation layer is not provided are formed. A thin film integrated circuit is formed over the separation layer. Then, an opening portion for exposing the separation layer is formed, en etching agent is introduced into the opening portion to remove the separation layer. Thus, a space is generated in the region provided with the separation layer, whereas a space is not generated in the region without the separation layer. Therefore, the thin film integrated circuit can be prevented from peeling off even after the separation layer is removed, by providing the region where the space is not generated after that.

Abstract: A semiconductor device includes an anti-fuse portion and a memory cell portion each including a MOSFET structure having a gate insulating film formed on a semiconductor substrate and a gate electrode formed on the gate insulating film; wherein a depletion ratio in the gate electrode of the anti-fuse portion is different from the depletion ratio in the gate electrode of the memory cell portion, and the depletion ratio in the gate electrode of the anti-fuse portion is lower than the depletion ratio in the gate electrode of the memory cell portion.

Abstract: A method of making a nonvolatile memory device includes forming a first electrode, forming at least one nonvolatile memory cell including a diode and a metal oxide antifuse dielectric layer over the first electrode, and forming a second electrode over the at least one nonvolatile memory cell. In use, the diode acts as a read/write element of the nonvolatile memory cell by switching from a first resistivity state to a second resistivity state different from the first resistivity state in response to an applied bias.

Abstract: The present invention is a manufacturing method for a semiconductor device having steps of; aligning a program head 80 having a program dot array corresponding to each OTP-ROM cell array 21 provided in areas 12 to be a plurality of semiconductor chips arranged in a semiconductor wafer to the OTP-ROM cell array 21 in one of the areas to be the plurality of semiconductor chips 12; and programming the OTP-ROM cell array 21 with a different pattern for each of the areas to be the plurality of semiconductor chips 12 by using the program head 80.

Abstract: A plurality of inner leads, a plurality of outer leads formed in one with each of the inner lead, a bar lead of the square ring shape arranged inside a plurality of inner leads, a corner part lead which has been arranged between the inner leads of the end portion of the inner lead groups which adjoin among four inner lead groups corresponding to each side of the bar lead, and was connected with the bar lead, and a tape member joined to the tip part of each inner lead, a bar lead, and a corner part lead are included. Since the corner part lead is formed as an object for reinforcement of a frame body between adjoining inner lead groups, the rigidity of the lead frame can be increased.

Abstract: In one embodiment of the present invention, a method for connecting a plurality of bit lines to sense circuitry comprises providing a plurality of bit lines extending from a memory array in a first metal layer. The plurality of bit lines are separated from each other by an average spacing x in a first region of the first metal layer. The method further comprises elevating a portion of the plurality of bit lines into a second metal layer overlying the first metal layer. The elevated bit lines are separated from each other by an average spacing y in the second metal layer, with y>x. The method further comprises extending a portion of the plurality of bit lines into a second region of the first metal layer. The extended bit lines are separated from each other by an average spacing z in the second region of the first metal layer, with z>x. The method further comprises connecting a bit line in the second metal layer and a bit line in the first metal layer to the sense circuitry.

Abstract: Embodiments of the present invention relate generally to integrated circuits, methods for manufacturing an integrated circuit, memory modules, and computing systems.

Abstract: An arrangement of nonvolatile memory devices, having at least one memory device level stacked level by level above a semiconductor substrate, each memory level comprising an oxide layer substantially disposed above a semiconductor substrate, a plurality of word lines substantially disposed above the oxide layer; a plurality of bit lines substantially disposed above the oxide layer; a plurality of via plugs substantially in electrical contact with the word lines and, an anti-fuse dielectric material substantially disposed on side walls beside the bit lines and substantially in contact with the plurality of bit lines side wall anti-fuse dielectrics.

Abstract: A semiconductor device comprising a programming circuit that includes an active device on or in a substrate and a programmable electronic component on the substrate. The programmable electronic component includes at least one carbon nanotube having a segment with an adjusted diameter. The programmable electronic component has a value that depends upon the adjusted diameter. The programming circuit also includes interconnects that couple the active device to the programmable electronic component. The active device is configured to control a current transmitted to the programmable electronic component.

Abstract: A multi-function core base cell includes a set of functional microcircuits. These microcircuits are used to design a Library of Logic Function Macros. The functional macros consisting of one or more microcircuits have a fixed and complete physical layout similar to a conventional standard cell library macro set. In addition to a core functional macro set, primary input/output buffers and commonly used single and dual port memory blocks are also defined in the library. The library includes all the ASIC synthesis, simulation, and physical design rules.

Abstract: An integrated circuit device can include a plurality of field effect transistors (FETs) having channel depths no greater than a first depth, and at least a first switch junction FET (JFET) having a source coupled to a signal transmission input node, a drain coupled to a signal transmission output node, and a gate. The first switch JFET has a channel depth greater than the first depth. Switch JFETs can enable low resistance configurable switch paths to be created for interconnecting different portions of a same integrated circuit device.

Abstract: Methods are described for improving the retention of a memory device by execution of a retention improvement procedure. The retention improvement procedure comprises a baking process of the memory device in a high temperature environment, a verifying process of the memory device that checks the logic state of memory cells, and a reprogramming process to program the memory device once again by programming memory cells in a 0-state to a high-Vt state. The baking step of placing the memory device in a high temperature environment causes a charge loss by expelling shallow trapped charges, resulting in the improvement of retention reliability.

Abstract: An integrated circuit having a memory cell array and a method of forming an integrated circuit is disclosed. One embodiment provides bitlines running along a first direction, wordlines running along a second direction substantially perpendicular to the first direction, active areas and bitline contacts. The bitline contacts are arranged in columns extending in the second direction and in rows extending in the first direction. A distance between neighboring bitlines is DL, and a distance between neighboring bitline contacts is DC, DC being measured parallel to the first direction. The following relation holds: 1/2.25?DL/DC?1/1.75.

Abstract: A variable resistance memory array, programming a variable resistance memory element and methods of forming the array. A variable resistance memory array is formed with a plurality of word line transistors surrounding each phase change memory element. To program a selected variable resistance memory element, all of the bitlines are grounded or biased at the same voltage. A top electrode select line that is in contact with the selected variable resistance memory element is selected. The word line having the word line transistors surrounding the selected variable resistance memory element are turned on to supply programming current to the element. Current flows from the selected top electrode select line through the variable resistance memory element into the common source/drain region of the surrounding word line transistors, across the transistors to the nearest bitline contacts. The word lines are patterned in various lattice configurations.

Abstract: A method of making a circuitized substrate which includes at least one and possibly several capacitors as part thereof. In one embodiment, the substrate is produced by forming a layer of capacitive dielectric material on a dielectric layer and thereafter forming channels with the capacitive material, e.g., using a laser. The channels are then filled with conductive material, e.g., copper, using selected deposition techniques, e.g., sputtering, electro-less plating and electroplating. A second dielectric layer is then formed atop the capacitor and a capacitor “core” results. This “core” may then be combined with other dielectric and conductive layers to form a larger, multilayered PCB or chip carrier. In an alternative approach, the capacitive dielectric material may be photo-imageable, with the channels being formed using conventional exposure and development processing known in the art.

Abstract: A semiconductor memory device having a double-patterned memory cell array that includes a plurality of first bit lines spaced apart from each other and having a first pattern, a plurality of second bit lines spaced apart from each other and having a second pattern, the second bit lines being between the first bit lines to define an alternating array of first and second bit lines, the first and second patterns being different from each other, a first main memory cell array defined by a first portion of the alternating array, a second main memory cell array defined by a second portion of the alternating array, bit lines in the first main memory cell array having a substantially same regularity as bit lines in the second main memory cell array, and a dummy array between the first main memory cell array and the second main memory cell array.

Abstract: A nonvolatile memory structure with pairs of serially connected select transistors connected to the top and optionally to the bottom of NAND series strings of groups of the dual-sided charge-trapping nonvolatile memory cells for controlling connection of the NAND series string to an associated bit line. A first of the serially connected select transistors has an implant to make a threshold voltage of the implanted first serially connected select transistor different from a non-implanted second serially connected select transistor. The pair of serially connected top select transistors is connected to a first of two associated bit lines. Optionally, the NAND nonvolatile memory strings further is connected a pair of serially connected bottom select transistors that is connected to the second associated bit line.

Abstract: A nonvolatile memory element and associated production methods and memory element arrangements are presented. The nonvolatile memory element has a changeover material and a first and second electrically conductive electrode present at the changeover material. To reduce a forming voltage, a first electrode has a field amplifier structure for amplifying a field strength of an electric field generated by a second electrode in a changeover material. The field amplifier structure is a projection of the electrodes which projects into the changeover material. The memory element arrangement has multiple nonvolatile memory elements which are arranged in matrix form and can be addressed via bit lines arranged in column form and word lines arranged in row form.

Abstract: In one aspect, a semiconductor device is provided which includes a data block including M parallel and sequentially arranged data lines numbered {0, 1, 2, . . . n, n+1, . . . , m?1, m}, where M, n and m are positive integers, and where n<m, and M=m+1, and a first decoder region and a second decoder region respectively located on opposite sides of the data block. A first data line group among the M data lines extend to the first decoder region from the data block, and a second data line group among the M data lines extend to the second decoder region from the data block. The first data line group includes even numbered data lines among the data lines {0, 1, 2, . . . n}, and odd numbered data lines among the data lines {n+1, . . . m?1, m}, and the second data line group includes odd numbered data lines among the data lines {0, 1, 2, . . . n}, and even numbered data lines among the data lines {n+1, . . . m?1, m}.

Abstract: In a manufacturing method of a semiconductor device, a semiconductor substrate having a plurality of semiconductor chips formed on one of principal surfaces of the substrate is cut into the plurality of semiconductor chips through dicing. A first cutting process is formed on one of the principal surfaces of the substrate to produce two cutting grooves between two neighboring ones of the plurality of semiconductor chips, each cutting groove being adjacent to one of the neighboring ones of the plurality of semiconductor chips. A second cutting process is performed on the other of the principal surfaces of the substrate to produce a cutting groove overlapping the two cutting grooves produced by the first cutting process.

Abstract: A method of creating an improved sensitivity capacitive fingerprint sensor involves forming vias from a first side of a sensor chip having an array of capacitive sensors, making the vias electrically conductive, and attaching a cover plate over the first side of the sensor chip spaced from the sensor chip by a distance of less than 25 ?m. An improved sensitivity capacitive fingerprint sensor has a capacitive sensor array including multiple sensor cells and electrically conductive, through-chip vias extending from connection points for sensor cell circuitry to a back side of the capacitive sensor array, a chip including active detection circuitry and electrical connection points, the electrical connection points being respectively connected to corresponding ones of the sensor cell circuitry connection points, and a cover plate, disposed above the sensor cells at a spacing of less than 25 ?m.

Abstract: A semiconductor device, capable of improving integration density and solving problems that may occur in a laser repair process, and a method of fabricating the same are provided. A fuse circuit is formed in a cell region, not in a peripheral region, and thus it is possible to reduce the size of a semiconductor chip.

Abstract: A semiconductor device includes a fin-fuse and an SOI transistor. The SOI transistor is located on an SOI substrate and has a source region and a drain region. The fin-fuse is connected to one of the source/drain regions and has a fusible link located on the SOI substrate. The fusible link has a homogeneous dopant concentration.

Abstract: According to an embodiment, there is provided a thin film transistor substrate divided into a display area displaying the image and a non-display besides the display area, the thin film transistor substrate comprising: a common voltage line for MPS (mass production system) test and a grounding line for MPS (mass production system) test formed at the edge of the non-display area in parallel; an insulating layer covering the common voltage line for MPS (mass production system) test and the grounding line for MPS (mass production system) test; and an electrode layer formed on the insulating layer corresponded to the common voltage line for MPS (mass production system) test and the grounding line for MPS (mass production system) test. Thus, the present invention provides a thin film transistor substrate and a fabricating method thereof for minimizing defects due to static electricity.

Abstract: A method and a fused compound wafer including at least one first MEMS sensor and at least second MEMS sensor includes a first wafer. The first wafer includes at least one first MEMS sensor first subassembly and at least one second MEMS sensor first subassembly. A second wafer includes at least one first MEMS sensor second subassembly, at least one second MEMS sensor second assembly, and a fusing matrix. The fusing matrix includes a first joint configured to encapsulate each of the at least one first MEMS sensor first assembly and each of the at least one first MEMS sensor second assembly forming each at least one first MEMS sensor. A second joint is configured to encapsulate each of the at least one second MEMS first subassembly and each of the at least one second MEMS second subassembly forming each at least one second MEMS sensor.

Abstract: Non-volatile and radiation-hard switching and memory devices using vertical nano-tubes and reversibly held in state by van der Waals' forces and methods of fabricating the devices. Means for sensing the state of the devices include measuring capacitance, and tunneling and field emission currents.

Abstract: A memory device includes a bit line, a first word line, a bit line contact, an electrode, a second word line and a contact tip. The bit line may extend along a first direction. The first word line is formed over the bit line and extends in a second direction. The bit line contact is formed between adjacent first word lines. The bit line contact may have an upper face substantially higher than the first word lines. The electrode contacting with the bit line contact may include an elastic material bending by an electric field among the electrode, the first word line and the second word line. The second word line is disposed over the electrode and corresponds to at least one of the first word lines. The contact tip formed at a lateral portion of the electrode may protrude toward the first and the second word lines.

Abstract: A modified layer 5 and an altered layer 8 are formed outside a dicing point of a dicing area 3. Thus without forming another interface between different physical properties on the dicing point, it is possible to prevent chipping from progressing along a crystal orientation from an interface between a semiconductor element 2 and a semiconductor substrate 1 and from a surface of the semiconductor element during dicing, thereby suppressing the development of chipping to the semiconductor element.

Abstract: A wafer dividing method for dividing a wafer along a first set of plural streets extending parallel to each other, and a second set of plural streets extending parallel to each other and extending perpendicularly to the first set of the streets, the wafer having a plurality of rectangular regions defined on the face thereof by these streets. The wafer dividing method includes a groove forming step of forming grooves along the streets on the face of the wafer, and a grinding step of grinding the back of the wafer after the groove forming step. The grooves formed by the groove forming step include grooves having a first depth D1, and grooves having a second depth D2 which is greater than the first depth D1 (D2>D1).

Abstract: A method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes a substrate of semiconductor material having a first conductivity type, source and drain regions formed in the substrate, a block of conductive material disposed over and electrically connected to the source, and a floating gate having a first portion disposed over and insulated from the source region and a second portion disposed over and insulated from the channel region. The floating gate first portion includes a sloped upper surface and a side surface that meet at an acute edge. An electrically conductive control gate is disposed over and insulated from the channel region for controlling a conductivity thereof.

Abstract: An array of vertical transistor cells formed in a substrate for selecting one of a plurality of memory cells by selecting a word line and a bit line is disclosed. In one embodiment, for minimizing the area of a cell and reducing complexity in production a plurality of parallel insulating trenches filled with an insulating material and a plurality of perpendicular gate electrode trenches is formed, the gate electrode trenches filled with a suitable gate electrode material disrupted by the insulating material thus forming separate gate electrodes arranged below the reference plane. The insulating trenches and the gate electrode trenches form distinct active areas of transistors in the substrate, wherein two gate electrodes located at opposing sidewalls of an active area form a double gate electrode of a transistor, and wherein a plurality of gate electrodes is coupled to a word line running perpendicular to the gate electrode trenches and above the reference plane.